Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

Abstract: An image forming apparatus includes a fixing device that fixes an image to a recording medium that is transported by applying heat; a guide member including a first guide surface that guides the recording medium to which the image has been fixed by the fixing device, a second guide surface that is opposite to the first guide surface and that guides the recording medium that is transported backward after being guided by the first guide surface, and a communicating portion that enables air to flow between the first guide surface and the second guide surface; and plural suction members that cool the recording medium guided by the first guide surface by sucking air in a direction toward the second guide surface of the guide member, the suction members being arranged in a transporting direction in which the recording medium is transported.

Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

Abstract: When updating a key to guarantee security, updating the key during decryption of update data causes an ECU to stop functioning due to a decryption failure. Therefore, an in-vehicle gateway or a key management device of the present invention includes: an update data acquisition unit that receives, from outside a vehicle, update data encrypted with a predetermined key; a key acquisition unit that receives a key from outside the vehicle; a key storage unit in which the key received by the key acquisition unit is stored; and a decryption unit that decrypts the update data acquired by the update data acquisition unit based on the key stored in the storage unit, in which the update data acquisition unit transmits a key acquisition request signal after completion of decryption of the update data by the decryption unit.

Abstract: A confidential information setting apparatus includes: a communication unit that acquires an encryption key and condition information, which is a condition for setting a secret key to a terminal, from a memory unit of a server and acquires a terminal ID, which is an identifier for uniquely identifying the terminal, and the secret key associated with the terminal ID and encrypted from a memory unit of a user apparatus; an encryption processing unit that decrypts the encrypted secret key with the encryption key; and a control unit that judges whether the decrypted secret key can be set to the terminal or not, based on the condition information and sets the secret key to the terminal when a result of the judgment indicates that the secret key can be set to the terminal.

Abstract: Provided is a filler powder that has a lower coefficient of thermal expansion than silica powder and is less likely to cause quality and color alteration of a resin when blended into the resin. The filler powder is made of a crystallized glass in which ?-quartz solid solution and/or ?-eucryptite is precipitated. The filler powder preferably has an average particle size D50 of 5 ?m or less. The filler powder preferably has a coefficient of thermal expansion of 5×10?7/° C. or less in a range of 30 to 150° C.

Abstract: A fixing device includes a pair of fixing members disposed to face each other in a fixing area, a movable member movably supporting at least one of the fixing members between first and second positions, a driving device including a contact member and a drive source to move the movable member between the first and second positions, and a controller that controls the driving device, and if a temperature of the one of the fixing members is equal to or higher than a preset temperature when the driving device moves the movable member from the second position to the first position, changes the control to make driving force constantly exceed a rotational load of the driving device in accordance with advancement of a time of increase in the rotational load as compared with when the temperature of the one of the fixing members is lower than the preset temperature.

Abstract: A biometric authentication system includes an information terminal having ID information, an acquisition terminal that acquires biometric information, and an authentication processing apparatus. The processing apparatus includes: a first part that acquires the ID and location information on the information terminal; a second part that communicates with the acquisition terminal to acquire the biometric information; a first storage part for storing an indication that the information terminal is located within a predetermined range; a second storage part that stores the ID and biometric reference information; and a controller.

Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.

Abstract: A low-pressure turbine of a jet engine includes: a turbine case; turbine blades rotatable about an axis of the turbine case; and a shroud including a plurality of shroud segments annularly placed along an inner peripheral surface of the turbine case while surrounding the turbine blades. Each shroud segment is provided with a projection and an outward groove. The shroud segment is fixed to the turbine case by allowing the projection to engage with a receiving groove of the turbine case in an axial direction, and allowing the outward groove to engage with an inward projection of the turbine case in a radial direction. The shroud segment is provided with a pressure receiving portion that receives a force to release an engaged state of the outward groove with the inward projection of the turbine case in a step of removing the shroud segment from the turbine case.

Abstract: Provided is a filler powder that has a lower coefficient of thermal expansion than silica powder and is less likely to cause quality and color alteration of a resin when blended into the resin. The filler powder is made of a crystallized glass in which ?-quartz solid solution and/or ?-eucryptite is precipitated. The filler powder preferably has an average particle size D50 of 5 ?m or less. The filler powder preferably has a coefficient of thermal expansion of 5×10?7/° C. or less in a range of 30 to 150° C.

Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.

Abstract: In the brushless motor, a magnetic recording disk is to be mounted on a hub. A base plate rotatably supports the hub on the upper surface. A laminated core is fixed on the upper surface of the base plate and has a ring portion and a plurality of teeth that extend radially from the ring portion. Coils are wound around the plurality of teeth. A cylindrical magnet is fixed to the hub and is magnetized for driving with a plurality of poles along the circumferential direction and is arranged to radially face the plurality of teeth of the laminated core. A wire of one end of one of the coils is drawn out to the bottom surface of the base plate through a hole arranged on the base plate. The wire is connected to a driving line for supplying a current to the coils at a position other than the position of the hole on the base plate. The hole of the base plate is plugged with a resin.

Abstract: A plasma processing apparatus includes a processing container, an exhaust unit, an exhaust plate, an RF power application unit connected to a second electrode but not connected to the first electrode and configured to apply an RF power with a single frequency, the second electrode being connected to no power supply that applies an RF power other than the RF power with the single frequency, a DC power supply connected to the first electrode but not connected to the second electrode, the first electrode being connected to no power supply that applies an RF power, and a conductive member within the process container grounded to release through plasma a current caused by the DC voltage, the conductive member supported by the first shield part and laterally protruding therefrom only at a position that is located, in a height-wise direction, between a mount face and the exhaust plate and below a bottom of a focus ring.

Abstract: Provided is an electrical element package, comprising an element substrate on which an electrical element is provided, a sealing substrate provided at a distance from a surface of the element substrate on a side of the electrical element so as to be opposed to the element substrate, and a glass frit for hermetically sealing a gap between the element substrate and the sealing substrate so as to surround the electrical element, wherein the electrical element package comprises a protective film for protecting an electrode from laser light applied in welding the glass frit, the protective film being provided between the element substrate and the glass frit.

Abstract: Disclosed are a method for assaying a target substance in a sample and an apparatus for the method. The method can specifically assay the target substance in the sample without using any antibody against the target substance. The assaying method includes simultaneously or successively bringing a labeled aptamer, the target substance in the sample and a solid phase into contact together, and then measuring the label of the aptamer which has not been bound on the solid phase. The labeled aptamer has a property of binding to the target substance. The solid phase carries an oligonucleotide immobilized on it in an excess amount relative to the target substance. The oligonucleotide is hybridizable with the labeled aptamer when the labeled aptamer is in a state that it is not bound to the target substance, but is not hybridizable with the labeled aptamer when the labeled aptamer is in a state that it is bound to the target substance.

Abstract: Provided is an ion-conducting material, comprising, as a composition in terms of mol o, 15 to 80% of P2O5, 0 to 70% of SiO2, and 5 to 35% of R2O, which represents the total content of Li2O, Na2O, K2O, Rb2O, Cs2O, and Ag2O.

Abstract: In the brushless motor, a magnetic recording disk is to be mounted on a hub. A base plate rotatably supports the hub on the upper surface. A laminated core is fixed on the upper surface of the base plate and has a ring portion and a plurality of teeth that extend radially from the ring portion. Coils are wound around the plurality of teeth. A cylindrical magnet is fixed to the hub and is magnetized for driving with a plurality of poles along the circumferential direction and is arranged to radially face the plurality of teeth of the laminated core. A wire of one end of one of the coils is drawn out to the bottom surface of the base plate through a hole arranged on the base plate. The wire is connected to a driving line for supplying a current to the coils at a position other than the position of the hole on the base plate. The hole of the base plate is plugged with a resin.