Patents by Inventor Hiromichi Hara

Hiromichi Hara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210003939
    Abstract: According to one embodiment, there is provided a toner cartridge used in an image forming apparatus including a processor which forms a toner pattern image on a photoconductive member, transfers the toner pattern image on a medium, and changes an image forming condition based on a detection result obtained by optically detecting the toner pattern image transferred onto the medium, the toner cartridge including: a toner accommodating container accommodating a toner, and a memory. The memory stores reference data which is determined according to toner characteristics in the toner accommodating container, and is used for applying a reference value for an optical detection result of a toner pattern formed by the toner on the medium.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Inventors: Tsuyoshi Itou, Kazuhisa Takeda, Masahiro Ikuta, Takafumi Hara, Hiromichi Mitamura, Shigeru Fujiwara, Hisanobu Ajima
  • Patent number: 10816912
    Abstract: According to one embodiment, there is provided a toner cartridge used in an image forming apparatus including a processor which forms a toner pattern image on a photoconductive member, transfers the toner pattern image on a medium, and changes an image forming condition based on a detection result obtained by optically detecting the toner pattern transferred onto the medium, the toner cartridge including: a toner accommodating container accommodating a toner, and a memory. The memory stores a plurality of reference data which are determined according to toner characteristics in the toner accommodating container and a value indicating an image forming execution amount, and are used for applying reference values for an optical detection result of a toner pattern formed by the toner on the medium.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: October 27, 2020
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Tsuyoshi Itou, Kazuhisa Takeda, Masahiro Ikuta, Takafumi Hara, Hiromichi Mitamura, Shigeru Fujiwara, Hisanobu Ajima
  • Patent number: 10809646
    Abstract: According to one embodiment, there is provided a toner cartridge used in an image forming apparatus including a processor which forms a toner pattern image on a photoconductive member, transfers the toner pattern image on a medium, and changes an image forming condition based on a detection result obtained by optically detecting the toner pattern image transferred onto the medium, the toner cartridge including: a toner accommodating container accommodating a toner, and a memory. The memory stores reference data which is determined according to toner characteristics in the toner accommodating container, and is used for applying a reference value for an optical detection result of a toner pattern formed by the toner on the medium.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: October 20, 2020
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Tsuyoshi Itou, Kazuhisa Takeda, Masahiro Ikuta, Takafumi Hara, Hiromichi Mitamura, Shigeru Fujiwara, Hisanobu Ajima
  • Publication number: 20200310285
    Abstract: According to one embodiment, there is provided a toner cartridge used in an image forming apparatus including a processor which forms a toner pattern image on a photoconductive member, transfers the toner pattern image on a medium, and changes an image forming condition based on a detection result obtained by optically detecting the toner pattern transferred onto the medium, the toner cartridge including: a toner accommodating container accommodating a toner, and a memory. The memory stores a plurality of reference data which are determined according to toner characteristics in the toner accommodating container and a value indicating an image forming execution amount, and are used for applying reference values for an optical detection result of a toner pattern formed by the toner on the medium.
    Type: Application
    Filed: June 4, 2019
    Publication date: October 1, 2020
    Inventors: Tsuyoshi Itou, Kazuhisa Takeda, Masahiro Ikuta, Takafumi Hara, Hiromichi Mitamura, Shigeru Fujiwara, Hisanobu Ajima
  • Publication number: 20200011525
    Abstract: Provided is a surface combustion burner which solves the passage blocking in a combustion part caused by dust, and enables stable combustion for a long term. The surface combustion burner comprises: a nozzle configured to discharge fuel gas and air for combustion; and a laminate, provided on a tip of the nozzle, in which a plurality of mesh plates is laminated, wherein the laminate includes a portion having an offset arrangement between at least any adjacent ones of the mesh plates.
    Type: Application
    Filed: March 22, 2018
    Publication date: January 9, 2020
    Applicant: JFE STEEL CORPORATION
    Inventors: Yukimasa HORIKAWA, Kazuaki HARA, Koji IWATA, Hiromichi FUJIWARA
  • Publication number: 20190377281
    Abstract: According to one embodiment, there is provided a toner cartridge used in an image forming apparatus including a processor which forms a toner pattern image on a photoconductive member, transfers the toner pattern image on a medium, and changes an image forming condition based on a detection result obtained by optically detecting the toner pattern image transferred onto the medium, the toner cartridge including: a toner accommodating container accommodating a toner, and a memory. The memory stores reference data which is determined according to toner characteristics in the toner accommodating container, and is used for applying a reference value for an optical detection result of a toner pattern formed by the toner on the medium.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 12, 2019
    Inventors: Tsuyoshi Itou, Kazuhisa Takeda, Masahiro Ikuta, Takafumi Hara, Hiromichi Mitamura, Shigeru Fujiwara, Hisanobu Ajima
  • Patent number: 10481509
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 19, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Publication number: 20190278185
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 12, 2019
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Patent number: 8780329
    Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: July 15, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiromichi Hara, Yasuyo Kawabata
  • Patent number: 7944546
    Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: May 17, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masatomi Yoshida, Hiromichi Hara
  • Patent number: 7821617
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: October 26, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Publication number: 20100079736
    Abstract: An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation floor, a detection unit configured to detect a relative position between the base structure and the reference base, and an adjustment unit, which is disposed at the installation floor of the base structure, configured to adjust an attitude of the base structure based on the results detected by the detection unit.
    Type: Application
    Filed: September 30, 2009
    Publication date: April 1, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroyuki Wada, Hiromichi Hara
  • Publication number: 20090195767
    Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
    Type: Application
    Filed: January 28, 2009
    Publication date: August 6, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masatomi Yoshida, Hiromichi Hara
  • Publication number: 20090168036
    Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
    Type: Application
    Filed: December 22, 2008
    Publication date: July 2, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiromichi Hara, Yasuyo Kawabata
  • Publication number: 20070160356
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Application
    Filed: March 20, 2007
    Publication date: July 12, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiromichi Hara
  • Patent number: 7227617
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Grant
    Filed: July 28, 2005
    Date of Patent: June 5, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Patent number: 7060414
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: June 13, 2006
    Assignee: JSR Corporation
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Publication number: 20060023180
    Abstract: Disclosed is an apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, a first anti-vibration mount being supported by the first unit and for supporting a first constituent element of the exposure system, and a second anti-vibration mount being supported by the second unit and for supporting a second constituent element of the exposure system.
    Type: Application
    Filed: July 28, 2005
    Publication date: February 2, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiromichi Hara
  • Publication number: 20050158657
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Application
    Filed: March 16, 2005
    Publication date: July 21, 2005
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Patent number: 6914663
    Abstract: An exposure apparatus has an optical system and transfers a pattern of a mask to a substrate via the optical system. The apparatus includes a structure, a partition wall which defines a space including an optical path of the optical system, and an elastic seal member which couples the structure and the partition wall to seal the space. The elastic seal member is arranged so that a hollow cylinder is compressed in a direction of an axis of the hollow cylinder. The hollow cylinder, in an uncompressed state, includes a member undulated in a cross section perpendicular to the axis and a shape of the uncompressed-state hollow cylinder in the cross section being substantially uniform along the axis.
    Type: Grant
    Filed: September 15, 2003
    Date of Patent: July 5, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara