Abstract: A electron beam writing data creating device comprises a redundant part split means for splitting data into a redundant part formed by connecting redundant areas of graphic data processing areas with each other and an internal area defined in the graphic data processing area by the outer periphery of the redundant area. The redundant part split means splits design layout data into the redundant part and the internal area, for independently performing overlap removal processing in each area. Thus, a electron beam writing data creating device capable of effectively suppressing deterioration of dimensional accuracy of a writing pattern can be provided.

Abstract: A method of producing charged beam drawing data includes a basic figure processing step of performing a basic figure processing to design layout data to output basic figure data, a first segmenting step of converting the basic figure data as if segmenting a basic figure over a boundary of a figure processing region in the basic figure data by the boundary, a first searching step of searching a minute figure to draw which satisfies a prescribed size condition among the figures produced by segmenting in said first segmenting step, a restoring step of integrating the minute figure to draw searched by said first searching step and a figure adjacent to the minute figure, and performing a further basic figure processing to restore the figures in said basic figure data, an allocating step of allocating the figures restored by said restoring step to drawing fields, and a step of converting the figures allocated by the allocating step to charged beam drawing data.

Abstract: A charged beam pattern data generating method for generating high quality pattern data from the circuit layout design data of a semiconductor device for use by a charged beam drawing apparatus in the production of resist patterns or other semiconductor device manufacturing processes.

Abstract: A system for preventing deterioration of dimensional accuracy by reducing production of micro graphics at the time of production of drawing data to be input to a charged particle beam drawing apparatus. A CPU divides a design layout data into units of graphic data processing area (a step S1) and executes elimination of duplication and tone reversal processes in both X direction and Y direction (steps S2A, S2B) for the respective graphic data processing areas. Moreover, it performs, with reference to a micro graphic dimensional value, the graphic data processing result judging and selecting function in both the X direction and Y direction (a step S3) for the respective graphic data processing areas.