Patents by Inventor Hironori Matsuoka

Hironori Matsuoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190001689
    Abstract: A liquid discharge apparatus including a liquid discharge head that discharges a liquid by vibrating a vibration plate by a drive element and changing a pressure in an internal space filled with the liquid, a pressurization supply unit that forcibly feeds the liquid into the liquid discharge head, and a controller that restricts drive of the drive element in accordance with a pressure condition in the liquid discharge head.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 3, 2019
    Inventors: Yukimasa ISHIDA, Hironori MATSUOKA
  • Publication number: 20180361741
    Abstract: A liquid ejecting head includes head units each of which includes a corresponding head substrate and ejects liquid, flexible cables each of which has one end connected to the corresponding head substrate, and a common member including the head units that are fixed thereto. In the liquid ejecting head, when a first direction, a second direction, and a third direction are directions that orthogonally intersect each other and the common member is placed on a virtual surface defined by the first direction and the second direction and has a thickness extending in the third direction, the common member extends more in the first direction than in the second direction. In addition, a fixation region in which each of the flexible cables and the corresponding head substrate are fixed to each other extends more in the second direction than in the first direction when viewed in the third direction.
    Type: Application
    Filed: June 13, 2018
    Publication date: December 20, 2018
    Inventors: Fumiya TAKINO, Hironori MATSUOKA
  • Publication number: 20180104959
    Abstract: A liquid discharge apparatus includes a casing, a liquid discharge head that includes a nozzle for discharging a liquid supplied from a liquid supply source provided in the casing, a waste liquid tank that accommodates in the casing a fluid emitted from the nozzle, and an outlet opening for emitting the fluid emitted from the nozzle to an outside of the casing without emitting the fluid into the waste liquid tank provided in the casing.
    Type: Application
    Filed: October 11, 2017
    Publication date: April 19, 2018
    Inventors: Manabu HANAKAWA, Yukimasa ISHIDA, Hironori MATSUOKA, Toshio SUKIGARA, Kazuhiro YAMATO, Yasunori KURAMOTO
  • Publication number: 20180058588
    Abstract: A valve includes a valve seat having a hole configured as a flow path, a valve body configured to open/close the flow path due to relative movement with respect to the valve seat, an opening member having a first surface fixed to one of the valve seat and the valve body, a second surface configured to separate away and abut the other one of the valve seat and the valve body, a third surface which intersects the first and second surfaces, and an opening penetrating the first and second surfaces, a fixing member that fixes the first surface to the one of the valve seat and the valve body, and an inclined portion, which makes an interval between the one of the valve seat and the valve body and the first surface long in a direction from the opening to the third surface.
    Type: Application
    Filed: July 28, 2017
    Publication date: March 1, 2018
    Inventors: Yukimasa ISHIDA, Kenji OCHIAI, Taiki HANAGAMI, Daisuke NOGUCHI, Hironori MATSUOKA
  • Patent number: 9293346
    Abstract: In a method for etching an organic film according to an embodiment, a target object that has an organic film is set in a processing chamber. Then, a processing gas containing COS gas and O2 gas is supplied to the processing chamber and a microwave for plasma excitation is supplied to the inside of the processing chamber to etch the organic film.
    Type: Grant
    Filed: March 26, 2013
    Date of Patent: March 22, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroyuki Takaba, Hironori Matsuoka
  • Patent number: 9105585
    Abstract: An etching method can selectively etch a second region formed of silicon oxide in a target object with respect to a first region formed of silicon in the target object. The etching method includes (a) processing the target object with plasma of a first processing gas containing fluorocarbon and fluorohydrocarbon by generating the plasma of the first processing gas with a microwave, and (b) after the processing of the target object with the plasma of the first processing gas, processing the target object with plasma of a second processing gas containing fluorocarbon by generating the plasma of the second processing gas with the microwave.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: August 11, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hironori Matsuoka, Hiroto Ohtake, Kosuke Kariu
  • Patent number: 9087798
    Abstract: An etching method can improve etching accuracy as well as secure selectivity when forming a dummy gate of a fin-type field effect transistor. In the etching method, the dummy gate of a fin-type field effect transistor is formed with a target object. In the etching method, a gate material deposited between multiple fins is etched by using surface wave plasma. A pressure in the etching method is 50 mTorr (6.67 Pa) or more, a frequency of a power to be applied to a mounting table configured to mount thereon the target object is in a range of 10 Hz or more to 200 Hz or less, and the power is pulse-modulated such that a duty ratio as a ratio of an ON-time to a pulse cycle is 50% or less.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: July 21, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroto Ohtake, Akinori Kitamura, Hironori Matsuoka, Yoko Noto
  • Publication number: 20150064924
    Abstract: In a method for etching an organic film according to an embodiment, a target object that has an organic film is set in a processing chamber. Then, a processing gas containing COS gas and O2 gas is supplied to the processing chamber and a microwave for plasma excitation is supplied to the inside of the processing chamber to etch the organic film.
    Type: Application
    Filed: March 26, 2013
    Publication date: March 5, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroyuki Takaba, Hironori Matsuoka
  • Publication number: 20150044877
    Abstract: An etching method can improve etching accuracy as well as secure selectivity when forming a dummy gate of a fin-type field effect transistor. In the etching method, the dummy gate of a fin-type field effect transistor is formed with a target object. In the etching method, a gate material deposited between multiple fins is etched by using surface wave plasma. A pressure in the etching method is 50 mTorr (6.67 Pa) or more, a frequency of a power to be applied to a mounting table configured to mount thereon the target object is in a range of 10 Hz or more to 200 Hz or less, and the power is pulse-modulated such that a duty ratio as a ratio of an ON-time to a pulse cycle is 50% or less.
    Type: Application
    Filed: August 11, 2014
    Publication date: February 12, 2015
    Inventors: Hiroto Ohtake, Akinori Kitamura, Hironori Matsuoka, Yoko Noto
  • Publication number: 20140308817
    Abstract: An etching method can selectively etch a second region formed of silicon oxide in a target object with respect to a first region formed of silicon in the target object. The etching method includes (a) processing the target object with plasma of a first processing gas containing fluorocarbon and fluorohydrocarbon by generating the plasma of the first processing gas with a microwave, and (b) after the processing of the target object with the plasma of the first processing gas, processing the target object with plasma of a second processing gas containing fluorocarbon by generating the plasma of the second processing gas with the microwave.
    Type: Application
    Filed: April 16, 2014
    Publication date: October 16, 2014
    Inventors: Hironori Matsuoka, Hiroto Ohtake, Kosuke Kariu
  • Patent number: 8342633
    Abstract: A recording medium recording a computer readable computer program thereon, where the computer program enables the computer to generate dot recording data supplied to a dot recording device in order to perform dot recording using the dot recording device which repeats a main scanning pass and a transport based on the dot recording data so that a raster line along a main scanning direction is formed in multiple lines in a sub-scanning direction on a printing medium, where the main scanning pass is for performing the dot recording on the printing medium when an output head having a plurality of nozzles arranged in the sub-scanning direction moves in the main scanning direction, and where the transport is for enabling the printing medium to move in the sub-scanning direction, the computer program enables the computer to implement the functions of: determining a dot reduction degree for reducing the dot recording; setting a recording position of a changing target dot included in the dot recording data, according t
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: January 1, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Toshiki Saito, Hironori Matsuoka
  • Publication number: 20100321428
    Abstract: A storage medium storing a computer program that can be read by a computer, wherein the computer program causes the computer to generate dot recording data that is used in order for a dot recording device to perform dot recording and is supplied to the dot recording device that alternately performs, on the basis of the dot recording data, a main scanning pass to record a dot on a recording medium while moving an output head in a main scanning direction, the output head having a plurality of nozzles arranged in an auxiliary scanning direction, and a transfer operation to move the recording medium in the auxiliary scanning direction and that forms, on the recording medium, raster lines that extend in the main scanning direction and are arranged in the auxiliary scanning direction; when an M×N number of dots that are arranged in an M number of the raster lines and an N number of columns in a dot recording region are to be recorded in an M×N number of main scanning passes, the computer program causes the computer
    Type: Application
    Filed: May 24, 2010
    Publication date: December 23, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Toshiki Saito, Hironori Matsuoka
  • Publication number: 20100321429
    Abstract: A recording medium recording a computer readable computer program thereon, where the computer program enables the computer to generate dot recording data supplied to a dot recording device in order to perform dot recording using the dot recording device which repeats a main scanning pass and a transport based on the dot recording data so that a raster line along a main scanning direction is formed in multiple lines in a sub-scanning direction on a printing medium, where the main scanning pass is for performing the dot recording on the printing medium when an output head having a plurality of nozzles arranged in the sub-scanning direction moves in the main scanning direction, and where the transport is for enabling the printing medium to move in the sub-scanning direction, the computer program enables the computer to implement the functions of: determining a dot reduction degree for reducing the dot recording; setting a recording position of a changing target dot included in the dot recording data, according t
    Type: Application
    Filed: May 24, 2010
    Publication date: December 23, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Toshiki Saito, Hironori Matsuoka