Patents by Inventor Hiroshi Awaji

Hiroshi Awaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4910293
    Abstract: An amphiphilic high polymer comprises a linear recurring unit containing at least divalent organic group (R.sub.1) having at least two carbon atoms, at least divalent organic group (R.sub.2) having at least two carbon atoms, and at least one C.sub.10-30 hydrocarbon-containing group (R.sub.3) which may have one or more substituent groups, said organic groups R.sub.1 and R.sub.2 being connected to each other by a divalent connecting group, and said hydrocarbon-containing group R.sub.3 being boned to said recurring unit by a covalent bond, and the method for producing the same comprises polycondensating a combination of monomers containing R.sub.1 and R.sub.2.
    Type: Grant
    Filed: October 11, 1988
    Date of Patent: March 20, 1990
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji
  • Patent number: 4897461
    Abstract: An amphiphilic polyimide precursor having at least 70% by mole of the recurring unit of the formula (1): ##STR1## wherein R.sup.1 is a tetravalent group having at least 2 carbon atoms, R.sup.2 is a bivalent group having at least 2 carbon atoms, and R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are hydrogen atom or a monovalent group having 1 to 30 carbon atoms selected from an aliphatic group, an alicyclic group, an aromatic group, a group in which an aliphatic group is combined with an alicyclic group or an aromatic group, and their groups substituted by a halogen atom, nitro group, amino group, cyano group, methoxy group or acetoxyl group, provided that at least one, preferably at least two, of R.sup.3, R.sup.4, R.sup.5 and R.sup.
    Type: Grant
    Filed: June 29, 1988
    Date of Patent: January 30, 1990
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji
  • Patent number: 4868281
    Abstract: A polymer has a linear recurring unit in which a first organic group (R.sub.1) having at least two carbon atoms and a valence of at least three and a second organic group (R.sub.2) having at least two carbon atoms and a valence of at least two are bonded together alternatively through a divalent connecting group, and containing at least one hydrocarbon group (R.sub.3) having 10 to 30 carbon atoms which is linked to the recurring unit by an ionic bond and which may be substituted.
    Type: Grant
    Filed: June 19, 1987
    Date of Patent: September 19, 1989
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji
  • Patent number: 4839219
    Abstract: A thin film comprising a polymer having linear recurring units wherein an organic group R.sup.1 is combined alternately with an organic group R.sup.2 through a bivalent bonding group, wherein each of said group R.sup.1 and said group R.sup.2 has a valence of at least 2 and has at least 2 carbon atoms; each of said linear recurring units having at least one hydrocarbon-containing group R.sup.3 having 10 to 30 carbon atoms bonded with covalent bond, and a device having the thin film. The thin film of the invention is formed by building-up layers of the above polymer by LB technique, and the obtained film can be subjected to ring closure and to elimination of a known LB compound added as occasion demand by heat treatment to provide a thin film having a thickness of not more than 10,000 .ANG. and excellent heat resistance, chemical resistance and mechanical properties, and the device having the thin film is useful particularly as electric and electronic devices.
    Type: Grant
    Filed: May 19, 1987
    Date of Patent: June 13, 1989
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji
  • Patent number: 4822853
    Abstract: An amphiphilic polyimide precursor having at least 70% by mole of the recurring unit of the formula (1): ##STR1## wherein R.sup.1 is a tetravalent group having at least 2 carbon atoms, R.sup.2 is a bivalent group having at least 2 carbon atoms, and R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are hydrogen atom or a monovalent group having 1 to 30 carbon atoms selected from an aliphatic group, an alicyclic group, an aromatic group, a group in which an aliphatic group is combined with an alicyclic group or an aromatic group, and their groups substituted by a halogen atom, nitro group, amino group, cyano group, methoxy group or acetoxyl group, provided that at least one, preferably at least two, of R.sup.3, R.sup.4, R.sup.5 and R.sup.
    Type: Grant
    Filed: July 15, 1986
    Date of Patent: April 18, 1989
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji
  • Patent number: 4740396
    Abstract: A process for forming a built-up thin film of a high polymer which is inherently difficult of film formation by the Langmuir-Blodgett process. A high polymer is modified so as to enable film formation by the Langmuir-Blodgett process by introducing a substituent group for imparting a hydrophobic nature to a recurring unit of the high polymer, and the thus-modified high polymer is mixed with a known Langmuir-Blodgett film compound for film formation by the Langmuir-Blodgett process. A high polymer used in the present invention includes linear recurring units each of which is composed of an at least divalent first organic group R.sub.1 having at least two carbon atoms and an at least divalent second organic group R.sub.2 having at least two carbon atoms, the first organic group R.sub.1 and the second organic group R.sub.2 being connected with each other by a divalent bonding group; and at least one hydrocarbon-containing group R.sub.
    Type: Grant
    Filed: February 3, 1987
    Date of Patent: April 26, 1988
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Masakazu Uekita, Hiroshi Awaji