Patents by Inventor Hiroshi Hashigami

Hiroshi Hashigami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160079466
    Abstract: A solar cell wherein: an emitter layer is formed on a light-receiving-surface side of a crystalline silicon substrate, with a dopant of the opposite conductivity type from the silicon substrate added to said emitter layer; a passivation film is formed on the surface of the silicon substrate; and an extraction electrode and a collector electrode are formed. Said extraction electrode extracts photogenerated charge from the silicon substrate, and said collector electrode contacts the extraction electrode at least partially and collects the charge collected at the extraction electrode. The extraction electrode contains a first electrode that consists of a sintered conductive paste containing a dopant that makes silicon conductive. Said first electrode, at least, is formed so as to pass through the abovementioned passivation layer. The collection electrode contains a second electrode that has a higher conductivity than the aforementioned first electrode.
    Type: Application
    Filed: October 23, 2015
    Publication date: March 17, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Takenori Watabe, Mitsuhito Takahashi, Shintarou Tsukigata, Takashi Murakami, Ryo Mitta, Yoko Endo, Hiroyuki Otsuka
  • Patent number: 9224888
    Abstract: A solar cell has a passivation film formed on a crystalline silicon substrate that has at least a p-n junction, and an electrode formed by printing and heat-treating a conductive paste. The solar cell has a first electrode comprising an extraction electrode, which extracts photogenerated carriers from the silicon substrate, formed so as to contact the silicon substrate and a second collector electrode, which collects the carriers collected at the extraction electrode, formed so as to contact the first electrode. Other than the point of contact between the first electrode and the second electrode, at least, the second electrode contacts the silicon substrate only partially or not at all. By leaving the passivation film between the collector electrode and the silicon, either completely or partially, the solar cell reduces charge losses at electrode/silicon interfaces, improves the short-circuit current and open voltage, and yields improved characteristics.
    Type: Grant
    Filed: December 1, 2011
    Date of Patent: December 29, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Naoki Ishikawa, Takenori Watabe, Hiroyuki Otsuka
  • Patent number: 8859320
    Abstract: Disclosed in a method that is for producing a solar cell and that is characterized by performing an annealing step on a semiconductor substrate before an electrode-forming step. By means of performing annealing in the above manner, it is possible to improve the electrical characteristics of the solar cell without negatively impacting reliability or outward appearance. As a result, the method can be widely used in methods for producing solar cells having high reliability and electrical characteristics.
    Type: Grant
    Filed: July 12, 2011
    Date of Patent: October 14, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryo Mitta, Mitsuhito Takahashi, Hiroshi Hashigami, Takashi Murakami, Shintarou Tsukigata, Takenori Watabe, Hiroyuki Otsuka
  • Publication number: 20130255747
    Abstract: A solar cell has a passivation film formed on a crystalline silicon substrate that has at least a p-n junction, and an electrode formed by printing and heat-treating a conductive paste. The solar cell has a first electrode comprising an extraction electrode, which extracts photogenerated carriers from the silicon substrate, formed so as to contact the silicon substrate and a second collector electrode, which collects the carriers collected at the extraction electrode, formed so as to contact the first electrode. Other than the point of contact between the first electrode and the second electrode, at least, the second electrode contacts the silicon substrate only partially or not at all. By leaving the passivation film between the collector electrode and the silicon, either completely or partially, the solar cell reduces charge losses at electrode/silicon interfaces, improves the short-circuit current and open voltage, and yields improved characteristics.
    Type: Application
    Filed: December 1, 2011
    Publication date: October 3, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Naoki Ishikawa, Takenori Watabe, Hiroyuki Otsuka
  • Publication number: 20130247957
    Abstract: A solar cell has: an emitter layer formed on a light-receiving-surface side of a crystalline silicon substrate, with a dopant of the opposite conductivity type from the silicon substrate added to the emitter layer, a passivation film formed on the surface of the silicon substrate, an extraction electrode and a collector electrode. The extraction electrode extracts photogenerated charge from the silicon substrate and the collector electrode collects the charge collected at the extraction electrode. The extraction electrode contains a first electrode that consists of a sintered conductive paste. The first electrode, at least, is formed so as to pass through the passivation layer. The collection electrode contains a second electrode that has a higher conductivity than the first electrode. This solar cell reduces contact-resistance losses between the silicon and the electrodes, resistance losses due to electrode resistance, and optical and electrical losses in the emitter layer.
    Type: Application
    Filed: December 1, 2011
    Publication date: September 26, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Takenori Watabe, Mitsuhito Takahashi, Shintarou Tsukigata, Takashi Murakami, Ryo Mitta, Yoko Endo, Hiroyuki Otsuka
  • Publication number: 20130171763
    Abstract: Disclosed in a method that is for producing a solar cell and that is characterized by performing an annealing step on a semiconductor substrate before an electrode-forming step. By means of performing annealing in the above manner, it is possible to improve the electrical characteristics of the solar cell without negatively impacting reliability or outward appearance. As a result, the method can be widely used in methods for producing solar cells having high reliability and electrical characteristics.
    Type: Application
    Filed: July 12, 2011
    Publication date: July 4, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryo Mitta, Mitsuhito Takahashi, Hiroshi Hashigami, Takashi Murakami, Shintarou Tsukigata, Takenori Watabe, Hiroyuki Otsuka
  • Publication number: 20120174960
    Abstract: Disclosed is a solar cell which is provided with: a semiconductor substrate having a light-receiving surface and a non-light-receiving surface; a PN junction section formed on the semiconductor substrate; a passivation layer formed on the light-receiving surface and/or the non-light-receiving surface; and power extraction electrodes formed on the light-receiving surface and the non-light-receiving surface. The solar cell is characterized in that the passivation layer includes an aluminum oxide film having a thickness off 40 nm or less. As a result of forming a aluminum oxide film having a predetermined thickness on the surface of the substrate, it is possible to achieve excellent passivation performance and excellent electrical contact between silicon and the electrode by merely firing the conductive paste, which is conventional technology.
    Type: Application
    Filed: May 24, 2010
    Publication date: July 12, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Takenori Watabe, Hiroyuki Otsuka
  • Patent number: D785559
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: May 2, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Otsuka, Takenori Watabe, Hiroshi Hashigami, Ryo Mitta, Shun Moriyama, Chikara Mori
  • Patent number: D786189
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: May 9, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Otsuka, Takenori Watabe, Hiroshi Hashigami, Ryo Mitta, Shun Moriyama, Chikara Mori