Patents by Inventor Hiroshi Igarashi

Hiroshi Igarashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050085284
    Abstract: A game system including: a music reproduction section which reproduces given music data stored in a storage section; a display control section which performs display control of changing a relative positional relationship among a direction mark which directs an operation to be performed by a player using an operation section, a special direction mark for the second game and a reference mark for timing judgment of the operation in association with a reproduction state of the music data to cause the direction mark and the reference mark to come closer; a timing acquisition section which acquires operation timing when the player operates the operation section for the direction mark; and a game calculation section which performs calculation processing of a first game of comparing the acquired operation timing with timing criteria and calculation processing of a second game differing from the first game based on operation information of the operation section for the special direction mark.
    Type: Application
    Filed: September 9, 2004
    Publication date: April 21, 2005
    Applicants: NAMCO LTD., NINTENDO CO., LTD.
    Inventors: Hiroyuki Onoda, Hiroumi Endo, Hiroshi Igarashi, Junji Takamoto, Takeshi Nagareda
  • Publication number: 20050085297
    Abstract: A game system includes: a direction mark storage section which stores image data of a direction mark which directs an operation of a player; a display control section which performs display control of a plurality of display objects including the direction mark; a timing acquisition section which acquires an operation timing; and an evaluation section which compares the acquired operation timing with a reference timing and evaluates the operation of the player. The display control section performs control of displaying the direction mark which directs the player to operate a plurality of operation regions by one mark. When the player operates the plurality of the operation regions of the operation section, the evaluation section evaluates the operation of the player by comparing the operation timing for the plurality of operation regions and the reference timing.
    Type: Application
    Filed: September 9, 2004
    Publication date: April 21, 2005
    Applicants: NAMCO LTD., NINTENDO CO., LTD.
    Inventors: Hiroyuki Onoda, Hiroumi Endo, Hiroshi Igarashi, Junji Takamoto, Takeshi Nagareda
  • Publication number: 20050056997
    Abstract: An operating apparatus for game machine includes a depressing member, and a main body of the depressing member is provided with three engaging protrusions and two depressing protrusions that downwardly protrude. For example, the two depressing protrusions are provided between the three engaging protrusions. In response to a beating operation by a player, the right side of the depressing member is depressed, and then, an engaging portion of the engaging protrusion at the left side is engaged with a rear surface of an upper surface panel. Accordingly, the depressing member is sure to be depressed at the right side without being upwardly actuated, and a rubber switch depressed by the depressing protrusion is brought into contact with a board. At this time, a contact provided on the board and a contact provided on the rubber switch are brought into contact with each other, and an operation signal according to the beating operation is output to the game machine.
    Type: Application
    Filed: September 10, 2004
    Publication date: March 17, 2005
    Inventors: Noboru Wakitani, Junji Takamoto, Takeshi Nagareda, Kuniaki Ito, Hideo Nagata, Hiroshi Igarashi, Akio Onda
  • Patent number: 6835320
    Abstract: A composite metal polybasic salt containing a trivalent metal, zinc metal and a divalent metal as metal components and having a novel crystal structure, and a method of preparing the same. The invention further deals with a composite metal polybasic salt which has anion-exchanging property, which by itself is useful as an anion-exchanger, capable of introducing anions suited for the use upon anion-exchange, and finds a wide range of applications, and a method of preparing the same. The composite metal polybasic salt has a particular chemical composition and X-ray diffraction peaks, exhibiting peaks at 2&thgr;=2 to 15°, 2&thgr;=19.5 to 24° and 2&thgr;=33 to 50°, and a single peak at 2&thgr;=60 to 64° in the X-ray diffraction (Cu-&agr;).
    Type: Grant
    Filed: March 6, 2001
    Date of Patent: December 28, 2004
    Assignee: Mizusawa Industrial Chemicals, Ltd.
    Inventors: Yoshinobu Komatsu, Hitoshi Ishida, Hiroshi Igarashi, Masami Kondo, Madoka Minagawa, Tetsu Sato, Teiji Sato
  • Publication number: 20040234442
    Abstract: A composite metal polybasic salt containing a trivalent metal, zinc metal and a divalent metal as metal components and having a novel crystal structure, and a method of preparing the same. The invention further deals with a composite metal polybasic salt which has anion-exchanging property, which by itself is useful as an anion-exchanger, capable of introducing anions suited for the use upon anion-exchange, and finds a wide range of applications, and a method of preparing the same. The composite metal polybasic salt has a particular chemical composition and X-ray diffraction peaks, exhibiting peaks at 2&thgr;=2 to 15°, 2&thgr;=19.5 to 24° and 2&thgr;=33 to 50°, and a single peak at 2&thgr;=60 to 64° in the X-ray diffraction (Cu-&agr;).
    Type: Application
    Filed: May 3, 2004
    Publication date: November 25, 2004
    Inventors: Yoshinobu Komatsu, Hitoshi Ishida, Hiroshi Igarashi, Masami Kondo, Madoka Minagawa, Tetsu Sato, Teiji Sato
  • Publication number: 20040187793
    Abstract: The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.
    Type: Application
    Filed: November 14, 2003
    Publication date: September 30, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi
  • Patent number: 6796708
    Abstract: A wrist mountable electronic apparatus has a strap member having a pair of strap portions. Each of the strap portions has an end disposed in spaced-apart relation to the other so that inner peripheral surfaces of the ends of the strap portions form a hole having a first open end and a second open end opposite the first open end. Each of the inner peripheral surfaces of the strap portions has a stepped portion. A portable electronic apparatus is disposed in the hole of the strap member. A glass member is supported on the stepped portion of each of the strap portions for closing the first open end of the hole. A connecting structure free of adhesive connects the glass member to each of the strap portions. A waterproof member is disposed directly between only the glass member and the strap member for providing a watertight seal therebetween. A rear cover covers the second open end of the hole.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: September 28, 2004
    Assignee: Seiko Instruments Inc.
    Inventors: Hiroshi Kawamata, Takenori Matsunaga, Hiroshi Igarashi
  • Patent number: 6780913
    Abstract: A zinc borate having a particular crystallite size and containing very little sodium components and a method of preparing the same. The zinc borate has a particular chemical composition, has a crystallite size of not smaller than 40 nm as found from diffraction peaks of indexes of planes of (020), (101) and (200) in the X-ray diffraction image (Cu-k&agr;) and contains sodium components in amounts of not larger than 100 ppm as measured by the atomic absorptiometric method.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: August 24, 2004
    Assignee: Mizusawa Industrial Chemicals, Ltd.
    Inventors: Hiroshi Sawada, Hiroshi Igarashi, Akira Tatebe, Kazunori Sakao
  • Patent number: 6774173
    Abstract: This invention provides a clear paint composition for motorcars which contains 10-80% by weight of polyester resin containing units derived from alicyclic polybasic acid and/or alicyclic polyhydric alcohol, 5-50% by weight of polyisocyanate compound and 0-50% by weight of acrylic resin; and which forms coating having Universal Hardness (HU) of not more than 500 N/mm2.
    Type: Grant
    Filed: July 5, 2002
    Date of Patent: August 10, 2004
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Kazuhiro Kato, Kazuaki Kitazono, Yoshizumi Matsuno, Hiroshi Igarashi
  • Publication number: 20040146378
    Abstract: The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.
    Type: Application
    Filed: November 14, 2003
    Publication date: July 29, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi
  • Publication number: 20040147122
    Abstract: The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.
    Type: Application
    Filed: November 14, 2003
    Publication date: July 29, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi
  • Publication number: 20040127048
    Abstract: The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.
    Type: Application
    Filed: November 10, 2003
    Publication date: July 1, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi, Toshihiko Miyajima
  • Publication number: 20040127029
    Abstract: The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.
    Type: Application
    Filed: December 30, 2002
    Publication date: July 1, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi, Toshihiko Miyajima
  • Publication number: 20040127028
    Abstract: The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.
    Type: Application
    Filed: December 30, 2002
    Publication date: July 1, 2004
    Applicant: TDK CORPORATION
    Inventors: Tsutomu Okabe, Hiroshi Igarashi
  • Publication number: 20040109150
    Abstract: The image display apparatus reads image data, which is recorded by a digital camera etc., from a recording medium etc.; sets an in-focus frequency spectrum threshold for in-focus determination according to the resolution (pixel count) and compressibility of the inputted image data; analyzes a frequency spectrum of the image data; and determines whether a location where frequency components whose levels are higher than the threshold exist in an image. The location having the most frequency components whose levels are higher than the threshold is determined as an in-focus location. If an in-focus location exists, a mark showing the in-focus location is displayed on a screen of a display device. If no in-focus location exists in the image, the image display apparatus performs display of warning information and/or a warning by sound, and prompts the user to confirm necessity of printing.
    Type: Application
    Filed: December 2, 2003
    Publication date: June 10, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hiroshi Igarashi
  • Publication number: 20040099826
    Abstract: A wafer processing apparatus on which a pod having an opening is detachably mounted is provided with a door unit and a mapping unit provided with a transmitting type sensor having an emitter and a detector forming a slot therebetween. The emitter and the detector are moved toward the opening in the pod and are plunged into the interior of the pod after a door is opened by the door unit, and the slot between the emitter and the detector crosses an end portion of a wafer to thereby detect the presence or absence of the wafer. Thereby, a mechanism portion liable to produce dust which may adhere to the wafer and cause the contamination thereof can be disposed separately from the pod.
    Type: Application
    Filed: November 3, 2003
    Publication date: May 27, 2004
    Applicant: TDK CORPORATION
    Inventors: Hiroshi Igarashi, Tsutomu Okabe, Toshihiko Miyajima
  • Publication number: 20040099824
    Abstract: A wafer processing apparatus on which a pod having an opening is detachably mounted is provided with a door unit and a mapping unit provided with a transmitting type sensor having an emitter and a detector forming a slot therebetween. The emitter and the detector are moved toward the opening in the pod and are plunged into the interior of the pod after a door is opened by the door unit, and the slot between the emitter and the detector crosses an end portion of a wafer to thereby detect the presence or absence of the wafer. Thereby, a mechanism portion liable to produce dust which may adhere to the wafer and cause the contamination thereof can be disposed separately from the pod.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 27, 2004
    Applicant: TDK CORPORATION
    Inventors: Hiroshi Igarashi, Tsutomu Okabe, Toshihiko Miyajima
  • Publication number: 20040087713
    Abstract: A water based coating composition prepared by dispersing a heat-curable coating composition into water in the presence of a suspension stabilizer comprising a block copolymer to obtain a water dispersion, followed by optionally removing an organic solvent from the water dispersion to obtain a water based coating composition having a mean particle size of 0.
    Type: Application
    Filed: April 3, 2003
    Publication date: May 6, 2004
    Inventors: Takeshi Fujii, Takashi Okubo, Hiroshi Igarashi, Takato Adachi, Tetsuo Ogawa
  • Patent number: 6706249
    Abstract: A composite metal polybasic salt containing a trivalent metal and magnesium as metal components and having a novel crystal structure, and a method of preparing the same. The invention further deals with a composite metal polybasic salt which has anion-exchanging property, which by itself is useful as an anion-exchanger, capable of introducing anions suited for the use upon anion-exchange, and finds a wide range of applications, and a method of preparing the same. The composite metal polybasic salt has a particular chemical composition and X-ray diffraction peaks, and further has a degree of orientation (Io) of not smaller than 1.5.
    Type: Grant
    Filed: March 6, 2001
    Date of Patent: March 16, 2004
    Assignee: Mizusawa Industrial Chemicals Ltd.
    Inventors: Yoshinobu Komatsu, Hitoshi Ishida, Hiroshi Igarashi, Masami Kondo, Madoka Minagawa, Tetsu Sato, Teiji Sato
  • Publication number: 20040049000
    Abstract: A water based coating composition prepared by dispersing by use of a suspension stabilizer into water a film-forming component of 30 to 90 percent by weight of (a) a blocked isocyanate compound having at least two blocked isocyanate groups in one molecule and a number average molecular weight of 150 to 5000, and 10 to 70 percent by weight of (b) a methylol group or methylol ether group-containing aminoplast crosslinking agent. The film-forming component can be dispersed into water in the form of a mean particle size by a 50 percent cumulative particle size of 0.1 to 10 &mgr;m. The coating film-forming component in the water based coating composition is very stable in water and is particularly suitable for the water-based coating composition. The coating film-forming component scarcely shows solubility and dispersibility into water by itself, but dispersion thereof with the suspension stabilizer shows excellent dispersion stability.
    Type: Application
    Filed: April 3, 2003
    Publication date: March 11, 2004
    Inventors: Takashi Okubo, Takato Adachi, Hisashi Isaka, Takeshi Fujii, Hiroshi Igarashi