Patents by Inventor Hiroshi Kawasaki

Hiroshi Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200296146
    Abstract: A communication management system manages a session in which a plurality of terminal apparatuses shares a stroke image. The communication management system includes circuitry configured to: manage stroke information including a plurality of pieces of stroke data representing the stroke image; receive, from a first terminal apparatus, group operation information for designating one or more pieces of stroke data, which are operation targets, from among the plurality of pieces of stroke data; and restrict, based on the group operation information, an operation regarding the one or more pieces of stroke data by a second terminal apparatus, which is different from the first terminal apparatus.
    Type: Application
    Filed: March 12, 2020
    Publication date: September 17, 2020
    Inventors: Hiroshi HINOHARA, Shigeru NAKAMURA, Takeshi HOMMA, Yuichi KAWASAKI, Masashi OGASAWARA, Atsushi MIYAMOTO, Hideki SHIRO, Kenichiro MORITA
  • Publication number: 20200296145
    Abstract: A communication terminal includes circuitry configured to: start a download of a plurality of stroke data items corresponding to a plurality of stroke images drawn at another communication terminal from a communication management system; receive capture image data obtained by capturing a display screen displayed at the another communication terminal by the another communication terminal, from an image storage device that stores the capture image data; when the download of the plurality of stroke data items is not completed, control a display of the communication terminal to display a capture image corresponding to the received capture image data; and when the download of the plurality of stroke data items is completed, control the display to switch an image to be displayed on the display from the capture image currently being displayed to the plurality of stroke images corresponding to the downloaded plurality of stroke data items.
    Type: Application
    Filed: March 4, 2020
    Publication date: September 17, 2020
    Inventors: Takeshi HORIUCHI, Shigeru NAKAMURA, Yuichi KAWASAKI, Masashi OGASAWARA, Hiroshi HINOHARA, Takeshi HOMMA, Atsushi MIYAMOTO, Takafumi TAKEDA
  • Patent number: 10766120
    Abstract: A method for manufacturing a compressor scroll that appropriately impinges cavitation bubbles on target regions of a scroll. The method includes the step of water jet peening by jetting cavitation bubbles generated underwater by a water jet at a first side of an end plate (13A) of the scroll (13), with a center (P1, P2, P3) of the cavitation bubbles being offset from a center (O) of the spiral shape of a wall portion (13B) on the end plate (13A) and the step portion (13Aa) and the stepped portion (13Ba) positioned at an outer peripheral portion of the cavitation bubbles (C).
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: September 8, 2020
    Assignee: MITSUBISHI HEAVY INDUSTRIES AUTOMOTIVE THERMAL SYSTEMS CO., LTD.
    Inventors: Takayuki Hagita, Takaharu Maeguchi, Masafumi Hamasaki, Yukio Michishita, Yukihiro Kawai, Hiroshi Ogawa, Makoto Takeuchi, Kazuhide Watanabe, Takayuki Kuwahara, Masaki Kawasaki, Katsuhiro Fujita
  • Publication number: 20200278823
    Abstract: A screen sharing system is configured to perform screen sharing between a first information processing apparatus and a second information processing apparatus. The first information processing apparatus is configured to acquire, as screen-sharing information, an image displayed on the first information processing apparatus, and transmit the screen-sharing information to a first server, when a data amount of the screen-sharing information is below a threshold value, and transmit the screen-sharing information to a second server and transmit, to the first server, storage destination information indicating a storage destination of the screen-sharing information, when the data is greater than or equal to the threshold value.
    Type: Application
    Filed: February 27, 2020
    Publication date: September 3, 2020
    Inventors: Yuichi KAWASAKI, Shigeru NAKAMURA, Masashi OGASAWARA, Atsushi MIYAMOTO, Hiroshi HINOHARA, Takeshi HOMMA
  • Publication number: 20200275661
    Abstract: A compound represented by a formula (II), an N-oxide compound, or a salt thereof: wherein R1 is a hydrogen atom, a substituted or unsubstituted C1-6 alkyl group, or a halogeno group; R2 is a substituted or unsubstituted 5- to 6-membered heteroaryl group; R3 is a substituted or unsubstituted C6-10 aryl group or a substituted or unsubstituted 5- to 10-membered heteroaryl group; Y is an oxygen atom, a nitrogen atom, or a sulfur atom; A1, A2, A3 and A4 are each independently a carbon atom or a nitrogen atom, provided that two or more of A1 to A4 do not represent nitrogen atoms at the same time; X is a substituent; n represents the number of chemically acceptable substituents represented by X, and is any one of integers of 0 to 5; and when n is 2 or more, the substituents X may be the same or different from each other.
    Type: Application
    Filed: September 21, 2018
    Publication date: September 3, 2020
    Applicant: Nippon Soda Co., Ltd.
    Inventors: Tetsuo TAMAI, Syuichi ITO, Shinya KOUBORI, Takayuki FUJII, Shigeki NISHINO, Shinya WATANABE, Hideki KATO, Yasuhiro MIYASHITA, Satoshi MAKINO, Juri NOMURA, Mikiko KUNISHIMA, Tatsuhiro KAWASAKI, Hiroshi SANO
  • Publication number: 20200259090
    Abstract: A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 ?m.
    Type: Application
    Filed: March 30, 2018
    Publication date: August 13, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuko SONE, Hiroshi KAWASAKI, Yoshinori HIROBE, Katsunari OBATA, Asako NARITA, Hitoshi ISHIRO, Chiaki HATSUTA
  • Patent number: 10717157
    Abstract: Provided is a solder material having oxidation resistance at the time of melting solder or after melting it, as well as managing a thickness of oxide film at a fixed value or less before melting the solder. A Cu core ball 1A is provided with a Cu ball 2A for keeping a space between a semiconductor package and a printed circuit board and a solder layer 3A that covers the Cu ball 2A. The solder layer 3A is composed of Sn or a solder alloy whose main component is Sn. For the Cu core ball 1A, lightness is equal to or more than 65 in the L*a*b* color space and yellowness is equal to or less than 7.0 in the L*a*b* color space, and more preferably, the lightness is equal to or more than 70 and the yellowness thereof is equal to or less than 5.1.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: July 21, 2020
    Assignee: Senju Metal Industry Co., Ltd.
    Inventors: Takahiro Hattori, Hiroyoshi Kawasaki, Hiroshi Okada, Takahiro Roppongi, Daisuke Soma, Isamu Sato
  • Patent number: 10711333
    Abstract: Disclosed is a steel sheet having a predetermined chemical composition and a steel microstructure that contains, in area ratio, 15% or more and 55% or less of polygonal ferrite and 15% or more and 30% or less of martensite, and that contains, in volume fraction, 12% or more of retained austenite, in which the polygonal ferrite, the martensite, and the retained austenite have a mean grain size of 4 ?m or less, 2 ?m or less, and 2 ?m or less, respectively, and each have a mean grain aspect ratio of 2.0 or less, and in which a value obtained by dividing an Mn content in the retained austenite in mass % by an Mn content in the polygonal ferrite in mass % equals 2.0 or more.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: July 14, 2020
    Assignee: JFE STEEL CORPORATION
    Inventors: Yoshiyasu Kawasaki, Hiroshi Matsuda, Takeshi Yokota, Takako Yamashita, Kazuhiro Seto
  • Publication number: 20200173011
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Application
    Filed: February 11, 2020
    Publication date: June 4, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari OBATA, Toshihiko TAKEDA, Hiroshi KAWASAKI, Hiroyuki NISHIMURA, Atsushi MAKI, Hiromitsu OCHIAI, Yoshinori HIROBE
  • Publication number: 20200177742
    Abstract: A communication management system, a communication system, a communication control method, and a recording medium.
    Type: Application
    Filed: November 29, 2019
    Publication date: June 4, 2020
    Inventors: Takeshi HOMMA, Shigeru NAKAMURA, Yuichi KAWASAKI, Hiroshi HINOHARA, Kenichiro MORITA, Atsushi MIYAMOTO
  • Patent number: 10662496
    Abstract: Disclosed is a high-strength steel sheet having a tensile strength (TS) of 780 MPa or more and excellent in ductility, fatigue properties, balance between high strength and ductility, surface characteristics, and sheet passage ability that can be obtained by providing a predetermined chemical composition and a steel microstructure that contains, by area, 20-50% of ferrite, 5-25% of bainitic ferrite, and 5-20% of martensite, and that contains, by volume, 10% or more of retained austenite, in which the retained austenite has a mean grain size of 2 ?m or less, a mean Mn content in the retained austenite in mass % is at least 1.2 times the Mn content in the steel sheet in mass %, and the retained austenite has a mean free path of 1.2 ?m or less.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: May 26, 2020
    Assignee: JFE STEEL CORPORATION
    Inventors: Yoshiyasu Kawasaki, Hiroshi Matsuda, Kazunori Tahara, Takeshi Yokota, Kaneharu Okuda, Kazuhiro Seto
  • Patent number: 10662495
    Abstract: Disclosed is a high-strength steel sheet having a tensile strength (TS) of 780 MPa or more and excellent in ductility, fatigue properties, stretch flangeability, surface characteristics, and sheet passage ability that can be obtained by providing a predetermined chemical composition and a steel microstructure that contains, by area, 20-50% of ferrite, 5-25% of bainitic ferrite, 1-10% of martensite, and 5-15% of tempered martensite, and that contains, by volume, 10% or more of retained austenite, in which the retained austenite has a mean grain size of 2 ?m or less, a mean Mn content in the retained austenite in mass % is at least 1.2 times the Mn content in the steel sheet in mass %, the retained austenite has a mean free path of 1.2 ?m or less, and the tempered martensite has a mean free path of 1.2 ?m or less.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: May 26, 2020
    Assignee: JFE STEEL CORPORATION
    Inventors: Yoshiyasu Kawasaki, Hiroshi Matsuda, Kazunori Tahara, Takeshi Yokota, Kaneharu Okuda, Kazuhiro Seto
  • Publication number: 20200152877
    Abstract: A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a through hole is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the through hole, the metal mask and the resin mask being stacked, wherein the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.
    Type: Application
    Filed: January 13, 2020
    Publication date: May 14, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko TAKEDA, Hiroshi Kawasaki, Katsunari Obata
  • Patent number: 10597766
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Patent number: 10597768
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Patent number: 10570475
    Abstract: Disclosed is a high-strength steel sheet having a predetermined chemical composition, satisfying the condition that Mn content divided by B content equals 2100 or less, and a steel microstructure that contains, by area, 25-80% of ferrite and bainitic ferrite in total, 3-20% of martensite, and that contains, by volume, 10% or more of retained austenite, in which the retained austenite has a mean grain size of 2 ?m or less, a mean Mn content in the retained austenite in mass % is at least 1.2 times the Mn content in the steel sheet in mass %, and an aggregate of retained austenite formed by seven or more identically-oriented retained austenite grains accounts for 60% or more by area of the entire retained austenite.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: February 25, 2020
    Assignee: JFE STEEL CORPORATION
    Inventors: Yoshiyasu Kawasaki, Hiroshi Matsuda, Yoshie Obata, Shinjiro Kaneko, Takeshi Yokota, Kazuhiro Seto
  • Patent number: 10573815
    Abstract: A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, the metal mask and the resin mask being stacked, the resin mask which has about 40% or less of light ray transmittance at a wavelength of about 550 nm.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: February 25, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko Takeda, Hiroshi Kawasaki, Katsunari Obata
  • Patent number: 10554541
    Abstract: A communication control device includes an association table updater and a correction packet transmitter. The association table updater updates, when receiving from a first wireless device a packet containing an identification number of a first communication terminal connected to the first wireless device, an association table storing an address of the first wireless device and the identification number of the first communication terminal.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: February 4, 2020
    Assignee: ICOM INCORPORATED
    Inventors: Hiroshi Kawasaki, Yuma Oda, Yoshiaki Miyakoshi
  • Patent number: 10550446
    Abstract: A high-strength steel sheet with excellent formability and high yield ratio that has TS of 980 MPa or more and YR of 68% or more is obtained by providing a predetermined chemical composition and a steel microstructure that contains, in area ratio, 15 to 55% of polygonal ferrite, 8% or more of non-recrystallized ferrite, and 15 to 30% of martensite, and that contains, in volume fraction, 12% or more of retained austenite, in which the polygonal ferrite has a mean grain size of 4 ?m or less, the martensite has a mean grain size of 2 ?m or less, the retained austenite has a mean grain size of 2 ?m or less, and a value obtained by dividing an Mn content in the retained austenite (in mass %) by an Mn content in the polygonal ferrite (in mass %) equals 2.0 or more.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: February 4, 2020
    Assignee: JFE STEEL CORPORATION
    Inventors: Yoshiyasu Kawasaki, Hiroshi Matsuda, Takeshi Yokota, Takako Yamashita, Kazuhiro Seto
  • Patent number: D875451
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: February 18, 2020
    Assignee: Okamura Corporation
    Inventors: Hiroshi Saotome, Eiji Kawasaki