Abstract: An electric cable includes at least one electric wire, and a plurality of string-shaped bodies each extending in a longitudinal direction of the electric cable and twisting with one another around the at least one electric wire being a core. The plurality of string-shaped bodies has connection parts twisting with one another excluding the at least one electric wire. The connection parts are connected to a frame of an underwater robot.

Abstract: A congestion information transmission terminal device 40 includes a location information acquisition unit 41 for acquiring location information 410 indicating a location of an own device, an output unit 43 for outputting input request information 430 for prompting a user to input congestion information 420 indicating a result of an evaluation performed by the user with respect to a congestion situation of people around, a congestion information acquisition unit 42 for acquiring the congestion information 420 by the user's input operation in response to the input request information 430, and a transmission unit 46 for transmitting the location information 410 acquired by the location information acquisition unit 41 and the congestion information 420 acquired by the congestion information acquisition unit 42 to a congestion situation evaluation device 50 for evaluating a congestion situation related to communication environment.

Abstract: An electric cable includes at least one electric wire, and a plurality of string-shaped bodies each extending in a longitudinal direction of the electric cable and twisting with one another around the at least one electric wire being a core. The plurality of string-shaped bodies has connection parts twisting with one another excluding the at least one electric wire. The connection parts are connected to a frame of an underwater robot.

Abstract: An information processing apparatus (10) includes a comparison unit (11) for comparing a plurality of pieces of RF measured information (1046) indicating signal reception information measured for each of a plurality of radio terminals (31 to 34) with a plurality of pieces of RF prediction information (1045) predicted as reception information in one radio terminal for each of a plurality of local areas, and an aggregation unit (12) for aggregating the number of radio terminals which have measured the measured information which is within a predetermined range of the prediction information, among the plurality of pieces of measured information, for each of the plurality of local areas.

Abstract: An information processing apparatus (10) includes a comparison unit (11) for comparing a plurality of pieces of RF measured information (1046) indicating signal reception information measured for each of a plurality of radio terminals (31 to 34) with a plurality of pieces of RF prediction information (1045) predicted as reception information in one radio terminal for each of a plurality of local areas, and an aggregation unit (12) for aggregating the number of radio terminals which have measured the measured information which is within a predetermined range of the prediction information, among the plurality of pieces of measured information, for each of the plurality of local areas.

Abstract: An image signal processing apparatus performs gradation control on respective pixels. Specifically, the image signal processing apparatus includes an image signal processing unit which controls light emission and non-light emission of respective subfields so as to provide a field having a level of brightness. Here, the field is a unit display period of the pixels and divided into the subfields which have different light emission periods and are arranged in a predetermined sequence. In the predetermined sequence, the subfields are arranged in a manner such that a subfield having the shortest light emission period among the subfields is in the first place, one of a subfield having the longest light emission period and a subfield having the second longest light emission period among the subfields is in the second place, and the other one is in the third place.

Abstract: An image system includes: a display device configured to display an image; and an eyeglasses device for viewing the image displayed by the display device, wherein the display device includes: a display portion configured to display in time series the image to be viewed through the eyeglasses device; a signal generation portion configured to generate a synchronization signal for synchronizing timing of switching of frames of the image; and a transmission portion configured to transmit the synchronization signal, the eyeglasses device includes: an optical filter portion configured to adjust an amount of light of the image; a reception portion configured to receive the synchronization signal transmitted from the transmission portion; and a control portion configured to control action of the optical filter portion corresponding to the switching of the frames of the image, based on the synchronization signal, the signal generation portion further generates a parameter signal including action information for defini

Abstract: An image signal processing apparatus outputs, alternately on a-per frame basis, a first image to be displayed to one of left and right eyes of a viewer and a second image to be displayed to the other eye, and transmits, to a pair of image viewer glasses, a synchronizing signal for controlling timing of opening and closing of optical filters so as to allow the viewer to see the output frames through corresponding eyes. Specifically, the apparatus includes: a persistence amount detecting unit which detects a persistence amount indicating an effect of a first frame in the first image on a second frame in the second image and immediately following the first frame; and an optical-filter adaptive control unit which generates the synchronizing signal indicating timing of opening and closing of the optical filter corresponding to the second frame. The timing is changed based on the persistence amount detected.

Abstract: A semiconductor wafer 11 is irradiated for scanning with a charged particle beam 6 so as to detect secondary charged particles 9 obtained from the wafer 11 as a result of the irradiation of the beam 6. A detected image of an inspection area obtained based on scanning information and on a detection signal derived from the secondary charged particles 9 is compared with a detected image of a reference area to find a difference therebetween. The difference is compared with a threshold value to detect a defect candidate. Defect information including positional information about the defect candidate is generated in such a manner as to include a relative position of a predetermined feature point within each of repeat patterns formed on the semiconductor wafer 11 with regard to the origin of a coordinate area established in each of these repeat patterns, and a relative position of the defect candidate with regard to the feature point.

Abstract: A color conversion device generates color data in a second color gamut based on first converted color data and input color data, which are obtained from input color data in a first color gamut, and outputs the color data in the second color gamut. The color conversion device includes a first color mapping unit which generates the first converted color data by mapping the input color data into the second color gamut; a color mixing unit which generates color data by mixing the first converted color data and second converted color data at a ratio corresponding to the first color gamut and the second color gamut; and a color data output unit which outputs the color data.

Abstract: There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.

Abstract: Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (1) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good.

Abstract: An image system comprises an image display device which displays images, and image viewing eyeglasses used for viewing images displayed by the image display device.

Abstract: The instant application describes a method for detecting crosstalk on a display surface compartmentalized into display regions by image patterns that are contained in an input image signal to a display device. The method includes steps of: displaying a first image and a second image on a display surface, the first image including first pattern images having main regions depicted with different brightness from each other and the second image including second pattern images having the main regions and sub regions depicted with different brightness from the main regions; taking an image of the display surface to obtain image data; and comparing at least one of the first and second images with the image data to detect the crosstalk. The first and second pattern images are displayed in a center region at a center of the display surface and adjacent regions adjacent to the center region.

Abstract: A charged-particle microscope device and a method of controlling charged-particle beams are provided, which are capable of signal detection at the time when the charged state of an observation sample or a defect portion becomes optimum. Charge accumulation-waiting time T from an initial irradiation with an electron beam 21 for enhancing charge accumulation on an observation sample 100 until a next irradiation with the electron beam 21 for sample observation is set depending on the state of the observation sample 100 or a defect portion 112 generated on the observation sample 100. The irradiation with the electron beam 21 for enhancing charge accumulation and the irradiation with the electron beam 21 for sample observation are performed on the observation sample 100 on the basis of the charge accumulation-waiting time T.

Abstract: The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.

Abstract: An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.

Abstract: Provided are a stereoscopic display device and stereoscopic display system, and a stereoscopic display device and glasses for stereoscopic video image observation, which are capable of reducing flicker attributable to the influence of a fluorescent lamp while preventing increase in crosstalk. Specifically, provided is a stereoscopic display system provided with: a stereoscopic display device which displays left-eye video images and right-eye video images alternatively in terms of time, the left-eye video images and right-eye video images being based on inputted left-eye video signals and right-eye video signals; and glasses for stereoscopic observation which comprise left-eye shutter and right-eye shutter configured to adjust quantities of light passing through the glasses toward the respective left and right eyes, and with which the left-eye video images and right-eye video images are observed.

Abstract: Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good.

Abstract: A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.