Patents by Inventor Hiroshi Yanagita

Hiroshi Yanagita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11914296
    Abstract: [Problem to be Solved] An object is to provide a compound with good heat resistance. And another object is to provide a coating made exhibits less film shrinkage, good gap filling property and good planarization. [Solution] The present invention provides an ethynyl derived composite and a composition comprising thereof. And the present invention provides a method for manufacturing a coating by it, and a method for manufacturing a device.
    Type: Grant
    Filed: February 23, 2023
    Date of Patent: February 27, 2024
    Assignee: Merck Patent GmbH
    Inventors: Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura
  • Publication number: 20230194989
    Abstract: [Problem to be Solved] An object is to provide a compound with good heat resistance. And another object is to provide a coating made exhibits less film shrinkage, good gap filling property and good planarization. [Solution] The present invention provides an ethynyl derived composite and a composition comprising thereof. And the present invention provides a method for manufacturing a coating by it, and a method for manufacturing a device.
    Type: Application
    Filed: February 23, 2023
    Publication date: June 22, 2023
    Inventors: Shigemasa NAKASUGI, Yusuke Hama, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura
  • Publication number: 20230093724
    Abstract: A method of manufacturing a semiconductor device capable of detecting occurrence of a Hi-K disappearance is provided. The method of manufacturing a semiconductor device includes a step of manufacturing a test pattern including a reference resistance, a gate leakage resistance through which a gate leakage current flows and connected in series with the reference resistance, and a step of measuring a change in voltage at a connection node between the reference resistance and the gate leakage resistance caused by the flow of the gate leakage current.
    Type: Application
    Filed: July 28, 2022
    Publication date: March 23, 2023
    Inventors: Atsushi AMO, Hiraku CHAKIHARA, Hiroshi YANAGITA, Akio ONO
  • Patent number: 11609498
    Abstract: [Problem to be Solved] An object is to provide a compound with good heat resistance. And another object is to provide a coating made exhibits less film shrinkage, good gap filling property and good planarization. [Solution] The present invention provides an ethynyl derived composite and a composition comprising thereof. And the present invention provides a method for manufacturing a coating by it, and a method for manufacturing a device.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: March 21, 2023
    Assignee: MERCK PATENT GMBH
    Inventors: Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura
  • Patent number: 11522699
    Abstract: An information processing system includes a first authentication terminal for authenticating a first user, a second authentication terminal for authenticating a second user, a device for authenticating the device, and an authentication server that performs authentication using a registered authentication function. The authentication server registers an authentication function of the first authentication terminal based on an operation of the first user. When authentication using the first authentication terminal is requested through the device, the authentication server authenticates the first user and registers an authentication function of the device. When registration of an authentication function of the second authentication terminal is requested through the device, the authentication server registers the authentication function when the authentication function of the device has been registered.
    Type: Grant
    Filed: September 16, 2020
    Date of Patent: December 6, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventor: Hiroshi Yanagita
  • Patent number: 11450805
    Abstract: An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: September 20, 2022
    Assignee: MERCK PATENT GMBH
    Inventors: Shigemasa Nakasugi, Hiroshi Yanagita, Kazunori Kurosawa, Takashi Sekito, Yusuke Hama, Yuriko Matsuura
  • Publication number: 20220294802
    Abstract: An information processing apparatus includes: a processor configured to: receive authentication information for using a group that manages use of a service; and when the received authentication information does not satisfy a first current condition that is a condition of authentication information to which a condition having a highest security level is applied, for each item of a condition of the authentication information defined for each group to which a user belongs, present information that prompts to change the authentication information.
    Type: Application
    Filed: August 13, 2021
    Publication date: September 15, 2022
    Applicant: FUJIFILM Business Innovation Corp.
    Inventor: Hiroshi YANAGITA
  • Patent number: 11431716
    Abstract: An information processing apparatus includes: a registration unit that, for a role to be assigned to users who utilize a system, pre-registers authority to be granted and identity confirmation to be required in association with the role; a storage unit that, for each of the users, stores information on identity confirmation which has been performed by the users; and an authority control unit that, in response to assignment of a new role to a user, in a case where the storage unit stores information which indicates that the user has performed the identity confirmation associated to the new role, controls to validate authority associated with the new role.
    Type: Grant
    Filed: September 2, 2019
    Date of Patent: August 30, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventor: Hiroshi Yanagita
  • Publication number: 20220221794
    Abstract: To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydro-carbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
    Type: Application
    Filed: April 24, 2020
    Publication date: July 14, 2022
    Inventors: Takashi SEKITO, Shigemasa NAKASUGI, Hiroshi YANAGITA, Taku HIRAYAMA
  • Patent number: 11366389
    Abstract: The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 21, 2022
    Assignee: MERCK PATENT GMBH
    Inventors: Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yusuke Hama, Yuriko Matsuura
  • Publication number: 20210263414
    Abstract: The present invention relates to a photoresist composition comprising a polymer(s), a photo acid generator(s), a (C) compound(s) comprising unit EO and unit PO, and a solvent(s). And the present invention relates to a method for manufacturing a photoresist coating, etched photoresist coating, and etched Si containing layer(s). And the present invention relates to a method for a manufacturing a device.
    Type: Application
    Filed: June 17, 2019
    Publication date: August 26, 2021
    Inventors: Shunji KAWATO, Hiroshi YANAGITA, Yusuke HAMA, Takayuki SAO, Taku HIRAYAMA
  • Publication number: 20210266165
    Abstract: An information processing system includes a first authentication terminal that has an authentication function of authenticating a first user, a second authentication terminal that has an authentication function of authenticating a second user, a device that has an authentication function of authenticating the device, and an authentication server that performs authentication using a registered authentication function. The authentication server registers the authentication function of the first authentication terminal on a basis of an operation of the first user. When authentication using the first authentication terminal is requested through the device, the authentication server authenticates the first user and registers the authentication function of the device.
    Type: Application
    Filed: September 16, 2020
    Publication date: August 26, 2021
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Hiroshi YANAGITA
  • Publication number: 20210181636
    Abstract: The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.
    Type: Application
    Filed: October 30, 2018
    Publication date: June 17, 2021
    Inventors: Shigemasa NAKASUGI, Hiroshi YANAGITA, Takashi SEKITO, Yusuke HAMA, Yuriko MATSUURA
  • Publication number: 20200401046
    Abstract: [Problem to be Solved] An object is to provide a compound with good heat resistance. And another object is to provide a coating made exhibits less film shrinkage, good gap filling property and good planarization. [Solution] The present invention provides an ethynyl derived composite and a composition comprising thereof. And the present invention provides a method for manufacturing a coating by it, and a method for manufacturing a device.
    Type: Application
    Filed: December 17, 2018
    Publication date: December 24, 2020
    Applicant: Merck Patent GmbH
    Inventors: Shigemasa NAKASUGI, Yusuke HAMA, Hiroshi YANAGITA, Takashi SEKITO, Yuriko MATSUURA
  • Publication number: 20200084218
    Abstract: An information processing apparatus includes: a registration unit that, for a role to be assigned to users who utilize a system, pre-registers authority to be granted and identity confirmation to be required in association with the role; a storage unit that, for each of the users, stores information on identity confirmation which has been performed by the users; and an authority control unit that, in response to assignment of a new role to a user, in a case where the storage unit stores information which indicates that the user has performed the identity confirmation associated to the new role, controls to validate authority associated with the new role.
    Type: Application
    Filed: September 2, 2019
    Publication date: March 12, 2020
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Hiroshi YANAGITA
  • Publication number: 20200044158
    Abstract: An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.
    Type: Application
    Filed: December 20, 2017
    Publication date: February 6, 2020
    Inventors: Shigemasa NAKASUGI, Hiroshi YANAGITA, Kazunori KUROSAWA, Takashi SEKITO, Yusuke HAMA, Yuriko MATSUURA
  • Patent number: 10451971
    Abstract: [Problem] To provide a composition for an underlayer, which can form an underlayer having flattened surface. [Means for Solution] A composition for forming an underlayer, comprising a polymer having a repeating unit containing nitrogen and a solvent. An underlayer is formed by coating this composition on a substrate, preferably baking in an inert atmosphere, and then baking in the air containing oxygen.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: October 22, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masato Suzuki, Yusuke Hama, Hiroshi Yanagita, Go Noya, Shigemasa Nakasugi
  • Publication number: 20190048129
    Abstract: The present invention relates to a polymer, composition, the forming of a sacrificial layer and a method for producing a semiconductor device comprising a step during which a pattern is made using a photoresist by the photolithography method.
    Type: Application
    Filed: January 19, 2017
    Publication date: February 14, 2019
    Inventors: Shigemasa NAKASUGI, Yusuke HAMA, Kazunori KUROSAWA, Hiroshi YANAGITA, Go NOYA
  • Patent number: 10106428
    Abstract: [Problem] To provide a dispersion containing surface-modified silica nanoparticles highly dispersed in an organic dispersion medium and also having high transparency and storage stability. [Solution] Disclosed is a method for producing surface-modified silica nanoparticles comprising: preparing a first silica nanoparticle dispersion containing silica nanoparticles and an aqueous dispersion medium; replacing the aqueous dispersion medium in the first silica nanoparticle dispersion with an organic dispersion medium comprising at least one selected from cyclic esters or cyclic amides, to obtain a second silica nanoparticle dispersion; and mixing the second silica nanoparticle dispersion with a silane coupling agent represented by the formula (1): (each R1 is independently a hydrocarbon group of C1 to C20 and R2 is a hydrocarbon group of C1 to C3), to modify the surface of the silica nanoparticles.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: October 23, 2018
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Hiroshi Yanagita, Shigemasa Nakasugi, Hiroshi Hitokawa, Tomohide Katayama, Katsuyuki Sakamoto
  • Patent number: 9907011
    Abstract: A non-transitory computer readable medium stores a program causing a computer to execute a process. The process includes acquiring load information indicating load applied to each of multiple relay units which are included in a network system and which connect a terminal apparatus to the network system; determining, in response to a connection request being sent, a first relay unit with lower load than a second relay unit to which the connection request is sent by the terminal apparatus, based on the acquired load information; and providing information on the determined first relay unit to the terminal apparatus.
    Type: Grant
    Filed: March 24, 2015
    Date of Patent: February 27, 2018
    Assignee: FUJI XEROX CO., LTD.
    Inventor: Hiroshi Yanagita