Abstract: An inkjet recording device is disclosed that is capable of precisely defining the gap between a conveyance belt and a recording head and maintaining good flatness of the conveyance belt and a recording medium being conveyed. A guide unit is arranged to push a portion of the conveyance belt from the inner side to approach the recording unit. The guide unit has a number of projecting ribs formed on the surface of the guide unit in contact with the conveyance belt and arranged to be perpendicular to the rolling direction of the conveyance belt.

Abstract: The present invention provides a clock control type processor which can permit and accommodate a temporary delay in a processing operation also in a system in which processing times are not constant, and realize the accommodation while reducing the power consumption as much as possible. In this clock control type processor, a block difference detection circuit 20 detects a difference between a processing block address and a writing block address and outputs a block difference signal 105, and a clock control circuit 16 controls a clock.

Abstract: In optical disc drive, laser diode is used, and also HFM (High Frequency Module) oscillator is used to reduce laser mode hopping noise. Big EMI noise is radiated by the HFM current for optical noise reduction, or by the switching current for write-strategy of recording. Then conventionally, shield was required in order to reduce EMI noise radiated by the current driving a laser diode. By giving a jitter to the HFM signal superimposed to the current of laser diode or switching signal by write-strategy for recording, a spectrum is diffused and the peak value of an EMI noise is reduced.

Abstract: A method of confirming a certificate by using a management computer that issues the certificate is disclosed. The management computer is coupled to an application terminal for applying for issuance of the certificate and to a confirmation terminal for reading a display code printed on the certificate.

Abstract: An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first and second block patterns for shaping the electron beam. Magnification of the first block pattern to a first exposure pattern which is to be exposed by the electron beam having a first current shaped by the first block pattern is different with magnification of the second block pattern to a second exposure pattern which is to be exposed by the electron beam having a second current shaped by the second block pattern.

Abstract: A method of producing a vertical bipolar PNP transistor is disclosed. The phosphorous profile in the base layer is controlled. Carbon that is incorporated in the base layer in the vicinity of the base-collector junction suppresses the diffusion of phosphorous deeper than implanted in a subsequent thermal step. PNP transistors with a narrow phosphorous-doped base can thus be manufactured with a cut-off frequency increased from 23 GHz to 30 GHz.

Abstract: A set of keyword candidates having orientation, with keywords input by a user as an origin, is appropriately presented.

Abstract: The present invention is to provide a method for removing adhesive in a short time without requiring any solvent, a repair of which has conventionally been required for a long time, and there is provided a method for repairing a circuit connection part where circuit members having a large number of opposed circuits are connected electrically through an adhesive, wherein mutual joints at a circuit connection part requiring repair are separated, a basic material for transfer is bonded through a transfer adhesive for transfer to at least one circuit member where the adhesive remains and then the adhesive remaining on the circuit member and the transfer adhesive are removed from the circuit member along with the basic material for transfer.

Abstract: A system for processing a handwritten document, including a receiving terminal configured to acquire handwritten information that is handwritten on a document. The receiving terminal includes a format acquisition part which acquires the format of the document from the format storage terminal, a printing part which prints the document based on the format acquired by the format acquisition part, a handwritten information acquiring part which acquires the handwritten information that is handwritten on the document, and a handwritten information transmitting part which transmits the handwritten information to the document receiving terminal.

Abstract: The present invention relates to a method for producing a polymer/conductive carbon composite electrode comprising dehydration condensation polymerization of a tetramine derivative and a tetracarbonyl compound in the presence of an electrically conductive carbon material. The synthetized polymer comprises quinoxaline structural units such as polyphenyl quinoxaline (PPQ) and serves as an active material having proton conductivity. The composite material for electrode obtained by the method has a large capacity of inserting/releasing a proton and excellent in durability. An electrode comprising the composite material and a secondary battery comprising the electrode is excellent in safety and reliability high-speed current characteristics, has a longer life and a larger gravimetric energy density (Wh/kg).

Abstract: An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.

Abstract: A semiconductor device manufacturing system for manufacturing a semiconductor device on a wafer, comprising: a first exposure apparatus for exposing the wafer using a light source while moving the wafer with a predetermined interval; and a second exposure apparatus for exposing the wafer by irradiating a plurality of electron beams on the wafer, the plurality of electron beams having an interval of substantially N times or 1/N times, where N is a natural number, of the predetermined interval.

Abstract: An APC is provided in a five-axis controlling vertical machining center. A spindle head is movable in three mutually transverse axes directions to a workpiece. A table disposed below swings to be positioned and is directed upwardly and indexed. A pallet setup base is provided outside a machining area. A pallet change arm has pallet grip portions for gripping and releasing the pallets. The arm makes a swivel motion and makes an ascending and descending motion. Thus, the pallet is transferred between the table and the pallet setup base and is received and discharged to the table and the pallet setup base.

Abstract: An airbag comprises an airbag body, and a wrapping member made tearable for preventing the airbag body from returning to its unfolded state. The airbag body is folded and housed on the peripheral edge of an opening on the inner side of a car body, and is folded up into a rod shape so that it may be inflated when an inflating gas flows thereinto so as to cover the opening. The wrapping member is made flexible and long and is wrapped on the outer periphery of the folded airbag body substantially all along the length of the same, so that it may extend obliquely to the axial direction of the airbag body folded up into the rod-like shape. Moreover, the airbag is restrained in its proper folded state substantially all along its length by a simple wrapping operation.

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.

Abstract: An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first and second block patterns for shaping the electron beam. Magnification of the first block pattern to a first exposure pattern which is to be exposed by the electron beam having a first current shaped by the first block pattern is different with magnification of the second block pattern to a second exposure pattern which is to be exposed by the electron beam having a second current shaped by the second block pattern.

Abstract: A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams has a multi-axis that includes: a plurality of magnetic conductive member arranged to be substantially parallel to each other, the magnetic conductive members having a plurality of openings; and a non-magnetic conductive member provided between the magnetic conductive members, the non-magnetic conductive member having a plurality of through holes. The openings of the magnetic conductive members and the through holes of the non-magnetic conductive members form together a plurality of lens openings operable to converge the electron beams independently of each other by allowing the electron beams to pass therethrough, respectively.

Abstract: A steering wheel horn switch includes two contact members and a support member, which supports the contact member and is formed from a light metallic material, and the contact member and the support member are electrically conducted to each other in such a manner to form a horn operating circuit. An electric conductor having electrical conductivity, which is higher than the electrical conductivity of the support member, is disposed between the contact member and the support member in such a way as to come in contact with both the contact member and the support member. The electric conductor is in contact with the support member so that the contact area therebetween is larger than the contact area between the contact member and the support member in the case when the contact member is singly brought into contact with the support member, or so that the electric conductor is brought into contact with the support member by being pushed by the support member.

Abstract: This invention is about a method of digital circuit design using programming language. It can solve problems raised by describing hardware using programming language, e.g. difficulties in describing changes within the same time step, and limitations in designing by sequential process. Separate variables are used to indicate registers and input of the registers. After the process of module section, the secondary variables are assigned to primary variables in a non-blocking assignment section. Combination circuits, which are used by more than one modules in module section, are defined in a assignment section and before module execution. Several clocks and gated clocks are described in non-blocking assignment section and loop section.