Patents by Inventor Hirotaka Kitagawa

Hirotaka Kitagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10917080
    Abstract: A gate drive circuit has a capacitor and a gate drive voltage source connected in series with a gate terminal of a voltage-driven switching device. The gate drive source voltage feeds, as a gate drive voltage, a voltage higher than the sum of the voltage applied to a gate-source parasitic capacitance of the switching device when the switching device is in a steady ON state and the voltage applied to, of any circuit component interposed between the gate drive voltage source and the gate terminal of the switching device, a circuit component other than the capacitor (such as an upper transistor forming the output stage of the driver). No other circuit component (such as a resistor connected in parallel with the capacitor) is essential but the capacitor as the sole circuit component to be directly connected to the gate terminal of the switching device.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: February 9, 2021
    Assignee: Rohm Co., Ltd.
    Inventors: Tatsuya Yanagi, Hirotaka Otake, Takashi Sawada, Seiya Kitagawa
  • Publication number: 20200266423
    Abstract: In a battery casing a metal negative electrode that contains metal serving as a negative electrode active material and an air electrode are arranged so as to face each other in a state where at least a part of the metal negative electrode and the air electrode is immersed in an electrolytic solution inside a casing. The metal negative electrode is housed in a negative electrode housing in the casing. A separator separating the metal negative electrode and the air electrode is arranged at a side surface of the negative electrode housing. An opening through which inside of the negative electrode housing and outside of the negative electrode housing communicate with each other is provided on an upper surface of the negative electrode housing.
    Type: Application
    Filed: September 26, 2018
    Publication date: August 20, 2020
    Inventors: TOMO KITAGAWA, SHINOBU TAKENAKA, HIROTAKA MIZUHATA, MASAKI KAGA, TOYOKA AIMOTO
  • Patent number: 10739678
    Abstract: Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (?LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: August 11, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Hirotaka Kitagawa
  • Patent number: 10626287
    Abstract: A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: April 21, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Tadashi Oomatsu
  • Publication number: 20200026274
    Abstract: A generation positon of a gravity and an observation position are appropriately specified according to traffic environment and traffic rules. Thus, safety autonomous driving is enabled based on Theory of Relativity (gravitational field theory).
    Type: Application
    Filed: August 30, 2019
    Publication date: January 23, 2020
    Inventor: Hirotaka KITAGAWA
  • Publication number: 20200006829
    Abstract: A method for producing an air electrode includes a kneading step of kneading an oxygen reduction catalyst, a conductive auxiliary agent, and a water-repellent resin (binder) in a water solvent; and a rolling step of rolling with a roller the kneaded product produced in the kneading step. The rolling step includes rolling the kneaded product with the roller several times in many directions (at least two or more different rolling directions). In the formed air electrode, the water-repellent resin is fiberized in the air electrode, and the fibers thereof are oriented in many directions to form a netlike shape.
    Type: Application
    Filed: March 13, 2018
    Publication date: January 2, 2020
    Inventors: TOMO KITAGAWA, HIROTAKA MIZUHATA, KEIGO MITAMURA, SHINOBU TAKENAKA, SHUNSUKE SATA
  • Patent number: 10504739
    Abstract: A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, l q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: December 10, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto
  • Publication number: 20190356031
    Abstract: A metal-air battery includes a metal negative electrode (12), an oxygen-generating electrode placed on a surface of the metal negative electrode, and an air electrode placed on another surface of the metal negative electrode. The metal negative electrode includes at least a negative electrode active material layer facing the oxygen-generating electrode. A first separator placed in contact with the negative electrode active material layer is placed between the negative electrode active material layer and the oxygen-generating electrode.
    Type: Application
    Filed: January 31, 2018
    Publication date: November 21, 2019
    Inventors: SHINOBU TAKENAKA, HIROTAKA MIZUHATA, SHUNSUKE SATA, TOMO KITAGAWA
  • Publication number: 20190344238
    Abstract: Provided are a microcapsule encapsulating a solvent, the solvent having a solubility parameter of greater than or equal to 8 (cal/cm3)1/2 and less than 10 (cal/cm3)1/2 and a molecular weight of from 425 to 3,000; and a method for producing the microcapsule.
    Type: Application
    Filed: July 23, 2019
    Publication date: November 14, 2019
    Inventors: Yu ISOBE, Hirotaka KITAGAWA
  • Publication number: 20190334037
    Abstract: Provided are a coating composition including polymer particles having a number-average primary particle diameter of 30 nm to 200 nm, a siloxane resin which has a weight-average molecular weight of 600 to 6,000, is a siloxane resin including at least one unit selected from units (1), (2), and (3) described below, and has a total mass of the units (1), (2), and (3) being 95% by mass or more of a total mass of the siloxane resin, and a solvent and applications thereof. R1's each independently represent an alkyl group having 1 to 8 carbon atoms or an alkyl fluoride group having 1 to 8 carbon atoms, R2's each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and, in a case where both the units (1) and (2) are included, the alkyl groups having 1 to 8 carbon atoms represented by R1's or R2's may be identical to or different from each other.
    Type: Application
    Filed: July 10, 2019
    Publication date: October 31, 2019
    Inventors: Ayana FUJIMAKI, Hideaki TSUBAKI, Hirotaka KITAGAWA, Yu ISOBE
  • Publication number: 20190233677
    Abstract: Provided are a coating composition including nonionic polymer particles having a number-average primary particle diameter of 5 nm to 200 nm and a hydrolysable silane compound represented by Formula 1, an antireflection film which is a cured substance of the coating composition, a laminate including the antireflection film, a method for manufacturing the laminate, and a solar cell module including the laminate. In Formula 1, X represents a hydrolysable group or a halogen atom, Y represents a non-hydrolysable group, and n represents an integer of 0 to 2.
    Type: Application
    Filed: April 9, 2019
    Publication date: August 1, 2019
    Inventors: Hideaki TSUBAKI, Ayana FUJIMAKI, Hirotaka KITAGAWA
  • Patent number: 10344177
    Abstract: Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: July 9, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Enomoto
  • Publication number: 20190202010
    Abstract: The present invention provides a car body positioning jig device capable of limiting the restriction of movement of a welding device, etc. In the car body positioning jig device, at least a portion of a main body section is disposed closer to an internal space of a body assembly than an opening. The main body section comprises: a first positioning mechanism unit for adjustably supporting the position of a first positioning member that positions a first region of the opening; a second positioning mechanism unit for adjustably supporting the position of a second positioning member that positions a second region of the opening; and a frame part for supporting the first positioning mechanism unit and the second positioning mechanism unit.
    Type: Application
    Filed: September 14, 2017
    Publication date: July 4, 2019
    Inventors: Kazuki AKAMI, Akinori HASADO, Koichi TAKEUCHI, Hirotaka KITAGAWA, Hiroshi ICHINOMIYA, Masao SHIMOYAMA, Kazuhisa HADA
  • Patent number: 10261413
    Abstract: Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device. This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, a photopolymerization initiator (C), and a non-polymerizable compound (D) having a polyoxyalkylene structure in a proportion of 1% to 5% by mass, in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: April 16, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10246605
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10191375
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: January 29, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10189928
    Abstract: Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: January 29, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10175576
    Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: January 8, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto, Yuichiro Enomoto
  • Publication number: 20180120698
    Abstract: Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (?LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device.
    Type: Application
    Filed: December 22, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventor: Hirotaka KITAGAWA
  • Publication number: 20180037688
    Abstract: Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.
    Type: Application
    Filed: September 13, 2017
    Publication date: February 8, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Kazuhiro MARUMO, Hirotaka KITAGAWA, Tadashi OOMATSU