Abstract: According to one embodiment, a thin-film transistor includes a semiconductor layer SC including a channel region, and a source region and a drain region on both sides of the channel region, a gate electrode GE, a first electrode SE connected to the source region via a first contact hole CH1, a second electrode DE connected to the drain region via a second contact hole CH2, a source line connected to the first electrode, and a drain line connected to the second electrode. A distance from the first and second contact holes to an end of the respective regions in a direction of a channel width is greater than or equal to 5 ?m and less than or equal to 30 ?m. The source line and the drain line extend in directions different from each other.

Abstract: According to one embodiment, a display device includes an insulating substrate, a thin-film transistor including a semiconductor layer formed on a layer above the insulating substrate, a gate electrode which at least partly overlaps the semiconductor layer, and a first electrode and a second electrode which are electrically connected to the semiconductor layer, and a light shielding layer formed between the thin-film transistor and the insulating substrate to at least partly overlap the semiconductor layer, the light shielding layer electrically connected to the gate electrode.

Abstract: According to one embodiment, a method of manufacturing a thin-film transistor includes forming a semiconductor layer on a gate electrode with an insulating layer 12 being interposed, forming interconnect formation layers on the semiconductor layer, forming a plurality of interconnects and electrodes by patterning the interconnect formation layers through etching, patterning the semiconductor layer in an island shape through etching after forming the electrodes, exposing a channel region of the semiconductor layer by etching a part of the electrodes on the semiconductor layer, and forming a protective layer so as to overlap the interconnects, the electrodes and the semiconductor layer having the island shape.

Abstract: Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

Abstract: Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

Abstract: According to one embodiment, a thin-film transistor includes a semiconductor layer SC including a channel region, and a source region and a drain region on both sides of the channel region, a gate electrode GE, a first electrode SE connected to the source region via a first contact hole CH1, a second electrode DE connected to the drain region via a second contact hole CH2, a source line connected to the first electrode, and a drain line connected to the second electrode. A distance from the first and second contact holes to an end of the respective regions in a direction of a channel width is greater than or equal to 5 ?m and less than or equal to 30 ?m. The source line and the drain line extend in directions different from each other.

Abstract: According to one embodiment, a display device includes an insulating substrate, a thin-film transistor including a semiconductor layer formed on a layer above the insulating substrate, a gate electrode which at least partly overlaps the semiconductor layer, and a first electrode and a second electrode which are electrically connected to the semiconductor layer, and a light shielding layer formed between the thin-film transistor and the insulating substrate to at least partly overlap the semiconductor layer, the light shielding layer electrically connected to the gate electrode.

Abstract: According to one embodiment, a method of manufacturing a thin-film transistor includes forming a semiconductor layer on a gate electrode with an insulating layer 12 being interposed, forming interconnect formation layers on the semiconductor layer, forming a plurality of interconnects and electrodes by patterning the interconnect formation layers through etching, patterning the semiconductor layer in an island shape through etching after forming the electrodes, exposing a channel region of the semiconductor layer by etching a part of the electrodes on the semiconductor layer, and forming a protective layer so as to overlap the interconnects, the electrodes and the semiconductor layer having the island shape.

Abstract: According to one embodiment, a display device includes thin-film transistor. The thin-film transistor includes a first semiconductor layer, a first insulating film, a gate electrode, a second insulating film, a second semiconductor layer, a first electrode and a second electrode. The gap between the bottom surface of the gate electrode and the upper surface of the first channel region of the first semiconductor layer is larger than the gap between the upper surface of the gate electrode and the bottom surface of the second channel region of the second semiconductor layer.

Abstract: Provided is a sheet-shaped mold possessing a high strength and having a low breakage rate in demolding even in a case where the mold is thin and has a large-area. The sheet-shaped mold is prepared by combining a cured silicone rubber containing a polyorganosiloxane and a fiber for reinforcing the cured silicone rubber. The fiber may comprise a cellulose nanofiber. The sheet-shaped mold may have an uneven pattern on at least one surface (or side) thereof. The fiber may be surface-treated with a hydrophobizing agent. The fiber may forma nonwoven fabric, and the nonwoven fabric may be impregnated with the cured silicone rubber. The cured silicone rubber may comprise a two-component curable silicone rubber having a polydimethylsiloxane unit. The sheet-shaped mold may be a mold for nanoimprint lithography using a photo-curable resin.

Abstract: According to one embodiment, a display device includes a TFT on an insulating substrate. The TFT includes a gate electrode, an insulating layer on the gate electrode, a semiconductor layer on the insulating layer, and a source electrode and a drain electrode each provided in contact with at least a part of the semiconductor layer. The source and drain electrodes have a laminated structure including a lower layer, an intermediate layer and an upper layer. The source and drain electrodes include sidewalls each including a first tapered portion on the upper layer side, a second tapered portion on the lower layer side and a sidewall protective film attached to the second tapered portion. The taper angle of the first tapered portion is smaller than that of the second tapered portion.

Abstract: Provided is a method for producing a microstructure that enables continuous transfer with good mold releasability even without subjecting the mold to a surface release treatment. The method for producing a microstructure according to the present invention includes preparing a mold having a relief-patterned surface. A substrate is separately prepared. A liquid photocurable transferable material layer is formed and sandwiched between the substrate and the mold to be shaped. The shaped transferable material layer is exposed to be converted into a photocured layer. The photocured layer is demolded from the mold to give the microstructure. The mold is prepared from a siloxane-bond-containing polymeric organic compound. The transferable material layer is formed from a photocurable composition including a cationically polymerizable compound (A) and a photoacid generator (B).

Abstract: Provided is a photosensitive composition for volume hologram recording layer formation. The photosensitive composition gives a volume hologram recording layer that has excellent moisture resistance and thermal stability, less undergoes cure shrinkage upon hologram recording, and offers excellent multiple recording properties. The photosensitive composition for volume hologram recording layer formation includes components (A), (B), (C), (D), and (E). Component (A) is at least one cationically polymerizable compound including a compound represented by Formula (1). Component (B) is a compound containing an active-proton-containing functional group. Component (C) is a thermal acid generator. Component (D) is a radically polymerizable compound. Component (E) is a radical-polymerization initiator. Components (A), (B), and (C) constitute a precursor material for three-dimensional cross-linked polymer matrix.

Abstract: Provided is a photosensitive composition for volume hologram recording capable of forming a volume hologram recording medium that less shrinks upon curing in hologram recording (in hologram formation) and resists cracking. The photosensitive composition for volume hologram recording contains an alicyclic epoxy compound (A) represented by Formula (I); a thermal acid generator (B); a radically polymerizable compound (C); a radical polymerization initiator (D); and at least one epoxy compound (E) selected from the group consisting of compounds represented by Formula (1), epoxidized fatty acid esters, and epoxidized conjugated diene polymers.

Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.

Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.

Abstract: Provided is a transmission-type volume hologram recording medium for use in a two-beam hologram recording system, which has a high diffraction efficiency and is capable of significantly reducing the intensity of higher-order diffracted light, which causes a noise, than first-order diffracted light. The transmission-type volume hologram recording medium includes two facing substrates of dissimilar materials and, held between them, a volume hologram recording layer of a volume hologram recording photosensitive composition. The substrates holding the volume hologram recording layer therebetween preferably have transparency in the visible light region and have thicknesses each from 2 to 2000 ?m. The difference in refractive index between the two substrates holding the volume hologram recording layer therebetween is preferably from 0.001 to 0.5. The difference in thickness between the two substrates holding the volume hologram recording layer therebetween is preferably from 1 to 1500 ?m.

Abstract: Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

Abstract: A photosensitive composition (I) for volume hologram recording includes a binder polymer (A), a photo-induced cationically polymerizable compound (B), a photoinitiator (C), and a sensitizing dye (D), in which the binder polymer (A) is a polymer containing naphthalene rings and having a weight-average molecular weight of 1×104 to 100×104. A method produces a photosensitive composition (II) for volume hologram recording by mixing a binder polymer (A?), a photo-induced cationically polymerizable compound (B?), a photoinitiator (C?), and a sensitizing dye (D?), in which the photo-induced cationically polymerizable compound (B?) has been subjected to a heating treatment at a temperature equal to or lower than the boiling point of the compound (B?).

Abstract: Disclosed is an oxetane-containing vinyl ether compound including one or more aromatic or non-aromatic carbocycles and/or two or more vinyl ether structures, such as a compound of Formula: wherein Ring Z1 is non-aromatic carbocycle; Ra is vinyl group of Formula: wherein each of R1, R2, and R3 is hydrogen or C1-C4 alkyl; Wa is single bond or organic group having a valence of (m+1); X1 is, for example, hydrocarbon; “m” and “q” are each 1 or 2; and “p” is 0 to 5. Also disclosed is an alicyclic epoxy-containing vinyl ether compound of Formula: wherein Ring Z2 is non-aromatic carbocycle; Rb is vinyl group of Formula: wherein R4, R5 and R6 are each hydrogen or C1-C4 alkyl; Wb is single bond or organic group having a valence of (r+1); Rc and Rd are hydrogen or alkyl; and “r” and “s” are 1 or 2.