Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold is described. The apparatus includes a measurement unit that measures one of a displacement and a position of a second surface opposite to a first surface on a side of a pattern region of the mold in a portion of the mold. The portion includes the pattern region and is deformed into a convex shape toward a side of the substrate upon bringing the imprint material on the substrate and the pattern region into contact with each other. The apparatus also includes a control unit that controls a distance between the mold and the substrate based on a measurement value of the measurement unit, such that a shape of the pattern region is kept constant upon curing the imprint material.

Abstract: [Problem] The provision of an imprint apparatus that is beneficial in improving the overlap precision of a mold and resin on a substrate. [Method for Solving the Problem] In an imprint apparatus, which is configured so as to transfer a pattern from a mold onto a resin surface by pressing the mold onto the resin that is disposed on the substate surface, has a magnification correction mechanism including actuators for applying a force to a side of the mold via a contact member, and correcting the shape of a patterned portion that has been formed on the mold; and displacement members displaceable by fluid pressure for changing an initial position for starting correction of the contact members of the magnification correction unit according to a size of the mold.

Abstract: An imprint apparatus that forms a pattern of a resin on a substrate that includes a plurality of substrate-side pattern regions by using a mold. The imprint apparatus includes a first mechanism applying a force to the mold to thereby deform a mold-side pattern region of the mold, a second mechanism heating the substrate-side pattern region to generate an uneven temperature distribution within the substrate-side pattern region for deforming the substrate-side pattern region, and obtaining shape difference information between the mold-side pattern region and the substrate-side pattern region, to control a shape of the mold-side pattern region by using the first mechanism based on the obtained shape difference information and controlling such that an uneven temperature distribution is formed in the substrate-side pattern region by using the second mechanism based on the obtained shape difference information.

Abstract: An imprint method for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The method includes deforming a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a first wavelength different from light having a second wavelength that is used for curing the imprint material, and curing the imprint material by irradiating the light having the second wavelength in a state in which the substrate-side pattern region is deformed and the mold is contacted with the imprint material. The step of deforming includes forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the first wavelength with an uneven illumination distribution.

Abstract: In order to provide an imprint device capable of reducing pattern defects, the imprint device which brings a mold into contact with an imprint material on a substrate and transfers a shape of a surface of the mold onto the substrate includes: a mold holding part which holds the mold; a substrate holding part which holds the substrate; and a measuring unit which measures a contact force generated when a part of the mold or the mold holding part is brought into contact with a predetermined contact part, wherein the contact part is installed at a position in a predetermined plane different from a position in the predetermined plane of the substrate held by the substrate holding part and is installed at a height position corresponding to a height of a surface of the substrate held by the substrate holding part.

Abstract: The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus including a measurement unit configured to measure one of a displacement and a position of a second surface opposite to a first surface on a side of a pattern region of the mold in a portion of the mold, the portion including the pattern region and being deformed into a convex shape toward a side of the substrate upon bringing the imprint material on the substrate and the pattern region into contact with each other, and a control unit configured to control a distance between the mold and the substrate based on a measurement value of the measurement unit such that a shape of the pattern region is kept constant upon curing the imprint material.

Abstract: A hydraulic unit includes—a hydraulic pump, a motor configured to drive the hydraulic pump, an oil cooler configured to cool hydraulic oil discharged from the hydraulic pump, a cooling fan configured to supply cooling air to the motor and the oil cooler, a shroud provided between the cooling fan and the oil cooler, arid a controller disposed adjacent to the motor. The controller controls the motor. The oil cooler includes a pair of headers, and a heat exchange unit provided between the pair of headers. The shroud includes a wall section covering at least one of the pair of headers. The controller includes a drive circuit configured to drive the motor, and a heat sink that cools the drive circuit. Part of the cooling air blown out from the cooling fan is guided toward the heat sink.

Abstract: An imprint method for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The method includes deforming a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a first wavelength different from light having a second wavelength that is used for curing the imprint material, and curing the imprint material by irradiating the light having the second wavelength in a state in which the substrate-side pattern region is deformed and the mold is contacted with the imprint material. The step of deforming includes forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the first wavelength with an uneven illumination distribution.

Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The imprint apparatus includes a light irradiation unit configured to irradiate the imprint material with light having a first wavelength for curing, and a heating unit configured to heat a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a second wavelength different from the light having the first wavelength. The heating unit is configured to heat the partial region to deform the substrate-side pattern region by forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the second wavelength with an uneven illumination distribution.

Abstract: In order to provide an imprint device capable of reducing pattern defects, the imprint device which brings a mold into contact with an imprint material on a substrate and transfers a shape of a surface of the mold onto the substrate includes: a mold holding part which holds the mold; a substrate holding part which holds the substrate; and a measuring unit which measures a contact force generated when a part of the mold or the mold holding part is brought into contact with a predetermined contact part, wherein the contact part is installed at a position in a predetermined plane different from a position in the predetermined plane of the substrate held by the substrate holding part and is installed at a height position corresponding to a height of a surface of the substrate held by the substrate holding part.

Abstract: An imprint apparatus for forming a pattern on a substrate by contacting an imprint material on the substrate with a mold includes a mold holding member configured to hold the mold and a mold deforming mechanism for applying a force to a side surface of the mold in a direction along a pattern face of the mold in which the pattern is formed in order to deform the pattern formed in the mold held by the mold holding member. The mold deforming mechanism includes a contact portion to contact with the side surface of the mold to press against the side surface. The contact portion is shaped such that a dimension of part of the contact portion to contact with the side surface of the mold is less than a dimension of part of the contact portion away from the side surface of the mold.

Abstract: An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis).

Abstract: The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured while a mold having a pattern formed thereon is pressed against the resin to transfer the pattern onto the substrate, the apparatus comprising a changing unit which includes a contact member having a contact surface that comes into contact with a side surface of the mold, and is configured to apply a force to the side surface of the mold through the contact member to change a shape of the pattern formed on the mold, and an adjusting unit configured to change at least one of an angle and a position of the contact member to adjust a contact state between the contact surface and the side surface of the mold.

Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. A heating unit heats a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a first wavelength different from light having a second wavelength for curing the imprint material. The heating unit heats the partial region to deform the substrate-side pattern region by forming an uneven temperature distribution on the substrate-side pattern region by an irradiation of the light having the first wavelength with an uneven illumination distribution.

Abstract: An imprint apparatus that transfers a pattern formed on a mold onto a resin on a substrate. A light irradiation unit irradiates the resin with light to cure the resin. A shape correction mechanism applies a force to the mold to deform a pattern region formed on the mold. A heating mechanism heats a substrate-side pattern region formed on the substrate to deform the substrate-side pattern region. A control unit obtains information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and controls the shape correction mechanism and the heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. The control unit controls a temperature distribution in the substrate-side pattern region by using the heating mechanism.

Abstract: A holding apparatus of the present invention for holding a mold, includes a chuck configured to attract the mold to hold the mold, including a plurality of holding units each of which is configured to hold the attracted mold, and including a support configured to support the plurality of holding units; and an actuator supported by the support and deforms the mold by applying a force. At least one of the holding units is supported by the support unit so as to be displaceable in the direction of the force applied by the actuator.

Abstract: An imprint apparatus that molds an imprint material on a substrate using a mold, and forms a pattern on the substrate, the imprint apparatus includes a mold holding unit configured to hold the mold, which includes a surface including a pattern area, a substrate holding unit configured to hold the substrate, a first acquisition unit configured to acquire information concerning a difference in shape between the pattern area and a shot already formed on the substrate, and a control unit configured to control at least one of the mold holding unit and the substrate holding unit to adjust a spacing between the mold and the substrate, based on the information concerning the difference in shape acquired by the first acquisition unit, in a state where the pattern area and the imprint material are in contact with each other.

Abstract: An imprint apparatus for forming a pattern on a substrate by contacting an imprint material on the substrate with a mold includes a mold holding member configured to hold the mold and a mold deforming mechanism for applying a force to a side surface of the mold in a direction along a pattern face of the mold in which the pattern is formed in order to deform the pattern formed in the mold held by the mold holding member. The mold deforming mechanism includes a contact portion to contact with the side surface of the mold to press against the side surface. The contact portion is shaped such that a dimension of part of the contact portion to contact with the side surface of the mold is less than a dimension of part of the contact portion away from the side surface of the mold.

Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use is an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis).