Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured while a mold having a pattern formed thereon is pressed against the resin to transfer the pattern onto the substrate, the apparatus comprising a changing unit which includes a contact member having a contact surface that comes into contact with a side surface of the mold, and is configured to apply a force to the side surface of the mold through the contact member to change a shape of the pattern formed on the mold, and an adjusting unit configured to change at least one of an angle and a position of the contact member to adjust a contact state between the contact surface and the side surface of the mold.

Abstract: An imprint apparatus that molds an imprint material on a substrate using a mold, and forms a pattern on the substrate, the imprint apparatus includes a mold holding unit configured to hold the mold, which includes a surface including a pattern area, a substrate holding unit configured to hold the substrate, a first acquisition unit configured to acquire information concerning a difference in shape between the pattern area and a shot already formed on the substrate, and a control unit configured to control at least one of the mold holding unit and the substrate holding unit to adjust a spacing between the mold and the substrate, based on the information concerning the difference in shape acquired by the first acquisition unit, in a state where the pattern area and the imprint material are in contact with each other.

Abstract: A holding apparatus of the present invention for holding a mold, includes a chuck configured to attract the mold to hold the mold, including a plurality of holding units each of which is configured to hold the attracted mold, and including a support configured to support the plurality of holding units; and an actuator supported by the support and deforms the mold by applying a force. At least one of the holding units is supported by the support unit so as to be displaceable in the direction of the force applied by the actuator.

Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: A holding device of the present invention for holding a mold, the device includes a holder configured to attract the mold to hold the mold; an actuator supported by the holder so as to face a side of the mold, and configured to apply a force to the side to deform the mold; and a detector supported by the holder so as to face the side, and configured to detect a position of the side in a direction of the force. Here, the detector is configured to detect, as the position, a position of a first region in the side, the actuator is configured to apply the force to a second region in the side, and the second region is around the first region.

Abstract: An optical-element supporting device includes a first supporting unit and a second supporting unit configured to support an optical element. The first and second supporting units are spaced apart. The first and second supporting units support the optical element so as to constrain translational motion of the optical element along each of three axial directions and rotation of the optical element about each of the three axes. Where n is the number of axes constrained by the first supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, and m is the number of axes constrained by the second supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, n+m=6 is satisfied.

Abstract: A holding apparatus that holds an optical element above a base includes three holding units provided at different positions along an outer periphery of the optical element. Each holding unit includes a first member provided on the optical element, a second member provided on the base, a columnar third member extending in a direction perpendicular to both a tangential direction and a radial direction of the optical element, and a plate-shaped fourth member having a thickness in the radial direction of the optical element. The first member and the second member are connected to each other with the third member and the fourth member disposed therebetween.

Abstract: An optical-element supporting device includes a first supporting unit and a second supporting unit configured to support an optical element. The first and second supporting units are spaced apart. The first and second supporting units support the optical element so as to constrain translational motion of the optical element along each of three axial directions and rotation of the optical element about each of the three axes. Where n is the number of axes constrained by the first supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, and m is the number of axes constrained by the second supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, n+m=6 is satisfied.

Abstract: A holding apparatus that holds an optical element above a base includes three holding units provided at different positions along an outer periphery of the optical element. Each holding unit includes a first member provided on the optical element, a second member provided on the base, a columnar third member extending in a direction perpendicular to both a tangential direction and a radial direction of the optical element, and a plate-shaped fourth member having a thickness in the radial direction of the optical element. The first member and the second member are connected to each other with the third member and the fourth member disposed therebetween.

Abstract: In a second displacer (33), a final layer (33c) measuring 10 K or lower in temperature is filled with spherical particles (34) of HoCu.sub.2 which exhibit a specific heat greater than that of Er.sub.3 Ni. An intermediate layer (33d) of 10 K to 15 K is filled with spherical particles (35) of Er.sub.3 Ni, Er.sub.3 Co or Nd. Further, an initial layer (33e) of 15 K or higher is filled with spherical particles (36) of Pb. By the use of such regenerative materials that exhibit the highest specific heats respectively for the individual temperature regions of 10 K or lower, 10-15 K, and 15 K or higher, the second displacer (33) exhibits an enhanced refrigerating capacity, as compared with the case of filling the final layer with the spherical particles of Er.sub.3 Ni as conventionally done. This further makes it possible to construct the second displacer (33) in a compact size and in a reduced weight.

Abstract: Occurrence of leakage of refrigerant around a seal member in cryogenic state is suppressed. The seal member 32 is formed from unsaturated polyester-PTFE with an unsaturated polyester mixing ratio of 20% to 35%. A plurality of slits 36 extended axially and penetrating through radially are provided in an end portion 35 of an outer circumferential wall 32a. Thus, by a synergistic effect of the use of a material small in the heat shrinkage factor and the reduction of radial shrinkage of the whole outer circumferential wall 32a attributable to the aforementioned configuration, the sealing properties in the cryogenic state are enhanced so that the occurrence of leakage of refrigerant is suppressed to the utmost, thereby preventing deterioration in the refrigeratability.