Patents by Inventor Hiroyuki Komatsu

Hiroyuki Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240312947
    Abstract: A semiconductor device according to an embodiment includes: an insulating substrate having a first metal layer and a second metal layer; a semiconductor chip on the first metal layer having an upper electrode and a lower electrode connected to the first metal layer; a bonding wire having a first end portion connected to the upper electrode and a second end portion connected to the second metal layer; a first resin layer covering the semiconductor chip and the bonding wire, the first resin layer containing a first resin; a second resin layer covering a bonding portion between the first end portion and the upper electrode containing a second resin having a Young's modulus higher than that of the first resin; a third resin layer on the first resin layer, the third resin layer containing a third resin having a moisture permeability lower than that of the first resin.
    Type: Application
    Filed: August 3, 2023
    Publication date: September 19, 2024
    Inventors: Tomohiro IGUCHI, Tatsuya HIRAKAWA, Shogo MINAMI, Hiroyuki MATSUO, Izuru KOMATSU
  • Publication number: 20240288773
    Abstract: A method includes: applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film; applying a composition for forming a resist film to the resist underlayer film to form a resist film; exposing the resist film to radiation; and developing the exposed resist film. The composition for forming a resist underlayer film includes: a polymer including a partial structure represented by formula (i); and a solvent. In the formula (i), Y1 is a sulfonyl group, a carbonyl group, or an alkanediyl group; Y2 is a sulfonyl group, a carbonyl group, or a single bond; when Y1 is an alkanediyl group, Y2 is a sulfonyl group or a carbonyl group, and when Y2 is a single bond, Y1 is a sulfonyl group or a carbonyl group; R1 is a monovalent organic group having 1 to 20 carbon atoms.
    Type: Application
    Filed: April 16, 2024
    Publication date: August 29, 2024
    Applicant: JSR CORPORATION
    Inventors: Masato DOBASHI, Hiroyuki KOMATSU, Eiji YONEDA, Satoshi DEI, Kengo EHARA, Sho YOSHINAKA, Takashi KATAGIRI
  • Patent number: 12071023
    Abstract: An electric vehicle control method for controlling a motor based on a torque command value in an electric vehicle includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; and a vehicle state control including a stop process of calculating a stopping basis torque target value so as to converge the torque command value to the disturbance torque estimation value in accordance with a decrease in the speed parameter, and a vibration damping process of calculating a stopping correction torque target value by performing filtering on the stopping basis torque target value.
    Type: Grant
    Filed: April 14, 2023
    Date of Patent: August 27, 2024
    Assignee: NISSAN MOTOR CO., LTD.
    Inventors: Hiroyuki Komatsu, Jun Motosugi, Akira Sawada, Yui Ito
  • Patent number: 12065534
    Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: August 20, 2024
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Motohiro Shiratani, Tatsuya Sakai
  • Publication number: 20240255852
    Abstract: A method for manufacturing a semiconductor substrate, includes applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film. A composition for forming a resist film is applied to the resist underlayer film to form a resist film. The resist film is exposed to radiation. The exposed resist film is developed. The composition for forming a resist underlayer film includes: a polymer having a sulfonic acid ester structure; and a solvent.
    Type: Application
    Filed: February 7, 2024
    Publication date: August 1, 2024
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Masato DOBASHI, Satoshi DEI, Kengo EHARA, Sho YOSHINAKA, Eiji YONEDA, Takashi KATAGIRI
  • Publication number: 20230391906
    Abstract: A production method for a cyclic olefin copolymer which is capable of efficiently producing a cyclic olefin copolymer by copolymerizing monomers including a norbornene monomer and ethylene while suppressing the formation of a polyethylene-like impurity. The monomers including a norbornene monomer and ethylene are polymerized in the presence of a metallocene catalyst containing a cyclopentadiene ligand which is substituted with an alkyl group optionally substituted with a halogen atom, or a trialkylsilyl group, and satisfies specific conditions for substituent(s).
    Type: Application
    Filed: September 16, 2021
    Publication date: December 7, 2023
    Inventors: Tomoyuki Tada, Naoyuki Wakitani, Hiroyuki Komatsu
  • Publication number: 20230312786
    Abstract: A production method for a cyclic olefin copolymer, which is capable of efficiently producing a cyclic olefin copolymer by copolymerizing monomers including a norbornene monomer and ethylene while suppressing the formation of a polyethylene-like impurity and an excessive increase in molecular weight. In the polymerization of monomers including a norbornene monomer and ethylene in the presence of a metallocene catalyst, the metallocene catalyst having a ligand including a cyclopentadiene ring and a structure in which a heteroatom being N, O, S or P is bonded to a transition metal of Group IV of the periodic table and an sp2 carbon, and an alkylmetal compound are used in combination.
    Type: Application
    Filed: June 4, 2021
    Publication date: October 5, 2023
    Inventors: Hiroyuki KOMATSU, Tomoyuki TADA
  • Publication number: 20230259032
    Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.
    Type: Application
    Filed: April 25, 2023
    Publication date: August 17, 2023
    Applicant: JSR CORPORATION
    Inventors: Miki TAMADA, Ryo KUMEGAWA, Hiroyuki KOMATSU, Motohiro SHIRATANI, Ken MARUYAMA, Sosuke OSAWA
  • Publication number: 20230249558
    Abstract: An electric vehicle control method for controlling a motor based on a torque command value in an electric vehicle includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; and a vehicle state control including a stop process of calculating a stopping basis torque target value so as to converge the torque command value to the disturbance torque estimation value in accordance with a decrease in the speed parameter, and a vibration damping process of calculating a stopping correction torque target value by performing filtering on the stopping basis torque target value.
    Type: Application
    Filed: April 14, 2023
    Publication date: August 10, 2023
    Applicant: NISSAN MOTOR CO., LTD.
    Inventors: Hiroyuki KOMATSU, Jun MOTOSUGI, Akira SAWADA, Yui ITO
  • Patent number: 11705331
    Abstract: A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: July 18, 2023
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
  • Publication number: 20230203229
    Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.
    Type: Application
    Filed: February 10, 2023
    Publication date: June 29, 2023
    Applicant: JSR CORPORATION
    Inventors: Miki TAMADA, Ryo KUMEGAWA, Motohiro SHIRATANI, Hiroyuki KOMATSU, Ken MARUYAMA, Sosuke OSAWA
  • Patent number: 11654778
    Abstract: Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: May 23, 2023
    Assignee: NISSAN MOTOR CO., LTD.
    Inventors: Hiroyuki Komatsu, Jun Motosugi, Akira Sawada, Yui Ito
  • Patent number: 11603480
    Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.
    Type: Grant
    Filed: August 1, 2019
    Date of Patent: March 14, 2023
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Motohiro Shiratani, Miki Tamada
  • Patent number: 11578230
    Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.
    Type: Grant
    Filed: March 9, 2021
    Date of Patent: February 14, 2023
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Ryo Kumegawa, Tatsuya Sakai
  • Patent number: 11525067
    Abstract: A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: December 13, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
  • Patent number: 11460767
    Abstract: A composition for film formation includes a polymer and a solvent. The polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a structural unit on at least one end of a main chain of the polymer. The first repeating unit includes a crosslinkable group. The second repeating unit differs from the first repeating unit. The third repeating unit differs from the first repeating unit and has higher polarity than polarity of the second repeating unit. The structural unit includes an interacting group capable of interacting with Si—OH, Si—H or Si—N.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: October 4, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
  • Patent number: 11462405
    Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: October 4, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
  • Patent number: 11426761
    Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.
    Type: Grant
    Filed: August 24, 2020
    Date of Patent: August 30, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
  • Publication number: 20220258617
    Abstract: Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value.
    Type: Application
    Filed: March 6, 2020
    Publication date: August 18, 2022
    Applicant: NISSAN MOTOR CO., LTD.
    Inventors: Hiroyuki KOMATSU, Jun MOTOSUGI, Akira SAWADA, Yui ITO
  • Publication number: 20220259741
    Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.
    Type: Application
    Filed: May 3, 2022
    Publication date: August 18, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro Shiratani