Patents by Inventor Hiroyuki Komatsu
Hiroyuki Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230391906Abstract: A production method for a cyclic olefin copolymer which is capable of efficiently producing a cyclic olefin copolymer by copolymerizing monomers including a norbornene monomer and ethylene while suppressing the formation of a polyethylene-like impurity. The monomers including a norbornene monomer and ethylene are polymerized in the presence of a metallocene catalyst containing a cyclopentadiene ligand which is substituted with an alkyl group optionally substituted with a halogen atom, or a trialkylsilyl group, and satisfies specific conditions for substituent(s).Type: ApplicationFiled: September 16, 2021Publication date: December 7, 2023Inventors: Tomoyuki Tada, Naoyuki Wakitani, Hiroyuki Komatsu
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Publication number: 20230312786Abstract: A production method for a cyclic olefin copolymer, which is capable of efficiently producing a cyclic olefin copolymer by copolymerizing monomers including a norbornene monomer and ethylene while suppressing the formation of a polyethylene-like impurity and an excessive increase in molecular weight. In the polymerization of monomers including a norbornene monomer and ethylene in the presence of a metallocene catalyst, the metallocene catalyst having a ligand including a cyclopentadiene ring and a structure in which a heteroatom being N, O, S or P is bonded to a transition metal of Group IV of the periodic table and an sp2 carbon, and an alkylmetal compound are used in combination.Type: ApplicationFiled: June 4, 2021Publication date: October 5, 2023Inventors: Hiroyuki KOMATSU, Tomoyuki TADA
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Publication number: 20230259032Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.Type: ApplicationFiled: April 25, 2023Publication date: August 17, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Hiroyuki KOMATSU, Motohiro SHIRATANI, Ken MARUYAMA, Sosuke OSAWA
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Publication number: 20230249558Abstract: An electric vehicle control method for controlling a motor based on a torque command value in an electric vehicle includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; and a vehicle state control including a stop process of calculating a stopping basis torque target value so as to converge the torque command value to the disturbance torque estimation value in accordance with a decrease in the speed parameter, and a vibration damping process of calculating a stopping correction torque target value by performing filtering on the stopping basis torque target value.Type: ApplicationFiled: April 14, 2023Publication date: August 10, 2023Applicant: NISSAN MOTOR CO., LTD.Inventors: Hiroyuki KOMATSU, Jun MOTOSUGI, Akira SAWADA, Yui ITO
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Patent number: 11705331Abstract: A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.Type: GrantFiled: January 14, 2021Date of Patent: July 18, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
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Publication number: 20230203229Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.Type: ApplicationFiled: February 10, 2023Publication date: June 29, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Motohiro SHIRATANI, Hiroyuki KOMATSU, Ken MARUYAMA, Sosuke OSAWA
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Patent number: 11654778Abstract: Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value.Type: GrantFiled: March 6, 2020Date of Patent: May 23, 2023Assignee: NISSAN MOTOR CO., LTD.Inventors: Hiroyuki Komatsu, Jun Motosugi, Akira Sawada, Yui Ito
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Patent number: 11603480Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.Type: GrantFiled: August 1, 2019Date of Patent: March 14, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Motohiro Shiratani, Miki Tamada
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Patent number: 11578230Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.Type: GrantFiled: March 9, 2021Date of Patent: February 14, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Ryo Kumegawa, Tatsuya Sakai
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Patent number: 11525067Abstract: A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.Type: GrantFiled: July 31, 2019Date of Patent: December 13, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Patent number: 11462405Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.Type: GrantFiled: October 10, 2019Date of Patent: October 4, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Patent number: 11460767Abstract: A composition for film formation includes a polymer and a solvent. The polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a structural unit on at least one end of a main chain of the polymer. The first repeating unit includes a crosslinkable group. The second repeating unit differs from the first repeating unit. The third repeating unit differs from the first repeating unit and has higher polarity than polarity of the second repeating unit. The structural unit includes an interacting group capable of interacting with Si—OH, Si—H or Si—N.Type: GrantFiled: January 4, 2019Date of Patent: October 4, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
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Patent number: 11426761Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.Type: GrantFiled: August 24, 2020Date of Patent: August 30, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Publication number: 20220259741Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.Type: ApplicationFiled: May 3, 2022Publication date: August 18, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro Shiratani
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Publication number: 20220258617Abstract: Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value.Type: ApplicationFiled: March 6, 2020Publication date: August 18, 2022Applicant: NISSAN MOTOR CO., LTD.Inventors: Hiroyuki KOMATSU, Jun MOTOSUGI, Akira SAWADA, Yui ITO
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Patent number: 11370872Abstract: A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.Type: GrantFiled: January 4, 2019Date of Patent: June 28, 2022Assignee: JSR CorporationInventors: Masafumi Hori, Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka
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Patent number: 11335559Abstract: A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle ? (°) of water on the sidewall of the pattern satisfies inequality (1).Type: GrantFiled: July 28, 2020Date of Patent: May 17, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka, Tomoki Nagai
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Publication number: 20220145113Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.Type: ApplicationFiled: January 25, 2022Publication date: May 12, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro SHIRATANI
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Publication number: 20220089809Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.Type: ApplicationFiled: December 3, 2021Publication date: March 24, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro SHIRATANI, Tatsuya SAKAI
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Patent number: 11270883Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.Type: GrantFiled: September 11, 2020Date of Patent: March 8, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Motohiro Shiratani