Patents by Inventor Hiroyuki Komatsu

Hiroyuki Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11426761
    Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.
    Type: Grant
    Filed: August 24, 2020
    Date of Patent: August 30, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
  • Patent number: 11421912
    Abstract: Provided is a packing material which packs at least a unit main body of an air conditioner to be installed in a ceiling, the packing material including: a cover part for covering an opening part through which components inside the unit main body are exposed; and a cut and bent up part which has a slit part for inserting a protruding portion of the unit main body and fixes the cover part on the unit main body. The packing material can eliminate the need for a curing sheet and a tape for fixing the curing sheet while keeping out dust etc.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: August 23, 2022
    Assignee: Mitsubishi Electric Corporation
    Inventors: Masaaki Maruyama, Takaaki Takishita, Tatsuo Furuta, Hiroyuki Hatakeyama, Naoya Matsunaga, Takahiro Komatsu
  • Publication number: 20220259741
    Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.
    Type: Application
    Filed: May 3, 2022
    Publication date: August 18, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro Shiratani
  • Publication number: 20220258617
    Abstract: Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value.
    Type: Application
    Filed: March 6, 2020
    Publication date: August 18, 2022
    Applicant: NISSAN MOTOR CO., LTD.
    Inventors: Hiroyuki KOMATSU, Jun MOTOSUGI, Akira SAWADA, Yui ITO
  • Patent number: 11370872
    Abstract: A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: June 28, 2022
    Assignee: JSR Corporation
    Inventors: Masafumi Hori, Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka
  • Patent number: 11335559
    Abstract: A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle ? (°) of water on the sidewall of the pattern satisfies inequality (1).
    Type: Grant
    Filed: July 28, 2020
    Date of Patent: May 17, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka, Tomoki Nagai
  • Publication number: 20220145113
    Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.
    Type: Application
    Filed: January 25, 2022
    Publication date: May 12, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro SHIRATANI
  • Publication number: 20220089809
    Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.
    Type: Application
    Filed: December 3, 2021
    Publication date: March 24, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro SHIRATANI, Tatsuya SAKAI
  • Patent number: 11270883
    Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: March 8, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Motohiro Shiratani
  • Patent number: 11211246
    Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: December 28, 2021
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
  • Publication number: 20210189553
    Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.
    Type: Application
    Filed: March 9, 2021
    Publication date: June 24, 2021
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Miki TAMADA, Ryo KUMEGAWA, Tatsuya SAKAI
  • Publication number: 20210166935
    Abstract: A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.
    Type: Application
    Filed: January 14, 2021
    Publication date: June 3, 2021
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Tomohiro ODA, Hitoshi OSAKI, Masafumi HORI, Takehiko NARUOKA
  • Publication number: 20210082689
    Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.
    Type: Application
    Filed: September 11, 2020
    Publication date: March 18, 2021
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro SHIRATANI
  • Patent number: 10950438
    Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: March 16, 2021
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
  • Patent number: 10923342
    Abstract: A selective modification method of a base material surface includes subjecting at least a part of a surface of a base material to at least one surface treatment selected from the group consisting of an oxidization treatment and a hydrophilization treatment. The base material includes a surface layer and includes an oxide, a nitride or an oxynitride of silicon, or a combination thereof in a first region of the surface layer. A nonphotosensitive composition is applied directly or indirectly on the surface of the base material after the surface treatment. The nonphotosensitive composition includes: a first polymer containing a nitrogen atom; and a solvent. It is preferred that the base material contains a metal in a second region which is other than the first region of the surface layer. In the surface treatment step, an O2 plasma treatment is preferably conducted.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: February 16, 2021
    Assignee: JSR CORPORATION
    Inventors: Hitoshi Osaki, Hiroyuki Komatsu
  • Publication number: 20200384499
    Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.
    Type: Application
    Filed: August 24, 2020
    Publication date: December 10, 2020
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Tomoki NAGAI
  • Publication number: 20200357633
    Abstract: A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle ? (°) of water on the sidewall of the pattern satisfies inequality (1).
    Type: Application
    Filed: July 28, 2020
    Publication date: November 12, 2020
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Tomohiro ODA, Masafumi HORI, Takehiko NARUOKA, Tomoki NAGAI
  • Patent number: 10710463
    Abstract: The control device for the electric vehicle determines whether or not the starting operation of the vehicle has been performed by the driver, calculates the disturbance torque estimated value Td necessary for maintaining the vehicle stop state corresponding to the disturbance acting on the vehicle, and performs a control such that the driving torque of the motor converges to the disturbance torque estimated value Td when the vehicle is determined to be just before stop of the vehicle during running or determined to have undergone the starting operation. Then, the control device for the electric vehicle controls the responsiveness of the driving torque to the disturbance acting on the vehicle, and increases the responsiveness of the driving torque of the motor compared with the responsiveness of the driving torque just before stop of the vehicle when the starting operation is determined to have been performed.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: July 14, 2020
    Assignee: NISSAN MOTOR CO., LTD.
    Inventors: Akira Sawada, Ken Itou, Takashi Nakajima, Yuji Katsumata, Hiroyuki Komatsu
  • Patent number: 10691019
    Abstract: A pattern-forming method includes forming a base pattern having recessed portions on a front face side of a substrate directly or via other layer. The recessed portions of the base pattern are filled with a first composition to form a filler layer. Phase separation of the filler layer is allowed to form a plurality of phases of the filler layer. A part of the plurality of phases of the filler layer is removed to form a miniaturized pattern. The forming of the base pattern includes: forming a resist pattern on the front face side of the substrate; forming a layer of a second polymer on lateral faces of the resist pattern; and forming a layer of a third polymer that differs from the second polymer on a surface of the substrate or on a surface of the other layer.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: June 23, 2020
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Takehiko Naruoka, Masafumi Hori, Hitoshi Osaki, Tomohiro Oda
  • Publication number: 20200118819
    Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.
    Type: Application
    Filed: October 10, 2019
    Publication date: April 16, 2020
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Tomoki NAGAI