Abstract: In general, one innovative aspect of the subject matter described in this specification can be embodied in methods that include the actions of receiving a key event at an input method editor (IME) server transmitted to the IME server from an IME client that is in communication with the IME server, wherein the IME server is a stateful server that stores both requests and responses of a communication session between the IME server and the IME client, and the IME client is a stateless IME client that issues a request to the IME server based on the key event, identifying, by the IME server, one or more logographic characters based on the key event, generating, by the IME server, rendering information corresponding to the one or more logographic characters, and transmitting the rendering information from the IME server to the IME client to display the one or more logographic characters.

Abstract: A base film-forming composition includes a compound including a group capable of reacting with Si—OH or Si—H, and a solvent. The base film-forming composition is for forming a base film provided between a layer including a silicon atom and a directed self-assembling film in a directed self-assembly lithography process. The receding contact angle of the base film for pure water is no less than 70° and no greater than 90°. The compound is preferably represented by formula (1). In the formula (1), A represents a linking group having a valency of (m+n); D represents a monovalent organic group having at least 10 carbon atoms; E represents the group capable of reacting with Si—OH or Si—H; and m and n are each independently an integer of 1 to 200.

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

Abstract: A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R? represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Abstract: A base film-forming composition includes a compound including a group capable of reacting with Si—OH or Si—H, and a solvent. The base film-forming composition is for forming a base film provided between a layer including a silicon atom and a directed self-assembling film in a directed self-assembly lithography process. The receding contact angle of the base film for pure water is no less than 70° and no greater than 90°. The compound is preferably represented by formula (1). In the formula (1), A represents a linking group having a valency of (m+n); D represents a monovalent organic group having at least 10 carbon atoms; E represents the group capable of reacting with Si—OH or Si—H; and m and n are each independently an integer of 1 to 200.

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700.

Abstract: A control device for electric motor vehicle using a motor as a traveling drive source and configured to decelerate by a regenerative braking force of the motor includes a motor torque command value setter configured to set a first torque target value for traveling based on the vehicle information as a motor torque command value for traveling based on the vehicle information before a speed parameter proportional to a traveling speed of an electric motor vehicle becomes equal to or less than a predetermined value, and set a second torque target value for stopping the electric motor vehicle and maintaining a vehicle stopped state as the motor torque command value when the speed parameter becomes equal to or less than the predetermined value, a motor controller configured to control the motor on the basis of the motor torque command value.

Abstract: A pattern-forming method includes providing a metal-containing film directly or indirectly on a substrate. A directed self-assembling film is provided directly or indirectly on the metal-containing film such that a plurality of phases of the directed self-assembling film is formed. At least a part of the plurality of phases of the directed self-assembling film is removed such that a pattern of the directed self-assembling film is formed. The metal-containing film and the substrate are sequentially etched using the pattern of the directed self-assembling film as a mask.

Abstract: A control device for electric motor vehicle configured to decelerate by a regenerative braking force of the motor detects an accelerator operation amount, calculates a motor torque command value and controls the motor on the basis of the calculated motor torque command value. Further, a speed parameter proportional to a traveling speed is detected, and a feedback torque for stopping the electric motor vehicle is calculated on the basis of the detected speed parameter. Furthermore, the speed parameter is estimated in accordance with a state of the electric motor vehicle, and a feedforward torque is calculated on the basis of the estimated speed parameter. When accelerator operation amount is not larger than a predetermined value and the electric motor vehicle stops shortly, the motor torque command value is converged to zero on the basis of the feedback torque and the feedforward torque with a reduction in the traveling speed.

Abstract: A control device for electric motor vehicle is configured to decelerate by a regenerative braking force of the motor when an accelerator operation amount decreases or becomes zero. The control device detects the accelerator operation amount, calculates a motor torque command value, and controls the motor on the basis of the motor torque command value calculated. The control device detects a speed parameter proportional to a traveling speed and calculates a feedback torque for stopping the vehicle on the basis of the speed parameter detected. The control device also estimates a disturbance torque acting on the motor and converges, as the speed parameter is reduced, the motor torque command value to the disturbance torque on the basis of the feedback torque when the accelerator operation amount decreases or becomes zero and the electric motor vehicle stops shortly. The control device adjusts the feedback torque according to the disturbance torque.

Abstract: A composition for pattern formation capable of forming a directed self-assembling film having a regular array structure with fine pitches accompanied by fewer defects, and in turn capable of forming a pattern having a fine and favorable shape. A composition for pattern formation contains a block copolymer that forms a phase separation structure by directed self-assembly, and a solvent, in which the block copolymer has a first block composed of a first repeating unit that includes a silicon atom, a second block composed of a second repeating unit that does not include a silicon atom, and a first group that bonds to at least one end of the main chain and links to the first block, in which the first group is a monovalent group that forms a compound having C log P of no less than 2.4 provided that a methyl group is bonded thereto.

Abstract: A motor control device of a vehicle includes a motor and a lock mechanism for locking the rotation of vehicle wheels. The motor control device includes a detection device for detecting release of the lock mechanism, a damping control device for suppressing torsional vibration of a drive shaft, and a current control device for controlling current flowing to the motor on the basis of a motor torque command value set by the damping control device. The current control device channels an excitation current for generating a magnetic flux in the motor on the basis of the detection result of the detection device.

Abstract: A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R? represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Abstract: A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different.

Abstract: A motor control device of a vehicle includes a motor and a lock mechanism for locking the rotation of vehicle wheels. The motor control device includes a detection device for detecting release of the lock mechanism, a damping control device for suppressing torsional vibration of a drive shaft, and a current control device for controlling current flowing to the motor on the basis of a motor torque command value set by the damping control device. The current control device channels an excitation current for generating a magnetic flux in the motor on the basis of the detection result of the detection device.

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700.

Abstract: A pattern-forming method includes providing a metal-containing film directly or indirectly on a substrate. A directed self-assembling film is provided directly or indirectly on the metal-containing film such that a plurality of phases of the directed self-assembling film is formed. At least a part of the plurality of phases of the directed self-assembling film is removed such that a pattern of the directed self-assembling film is formed. The metal-containing film and the substrate are sequentially etched using the pattern of the directed self-assembling film as a mask.