Patents by Inventor Hiroyuki Kyushima

Hiroyuki Kyushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9589774
    Abstract: The present invention relates to an electron multiplier and others to effectively suppress luminescence noise, even in compact size, in which each of multistage dynodes has a plurality of columns each having a peripheral surface separated physically, and in which each column is processed in such a shape that an area or a peripheral length of a section parallel to an installation surface on which the electron multiplier is arranged becomes minimum at a certain position on the peripheral surface in the column of interest.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: March 7, 2017
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Inoue
  • Patent number: 9460899
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: October 4, 2016
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Hiroyuki Kyushima, Hideki Shimoi, Akihiro Kageyama, Keisuke Inoue, Masuo Ito
  • Publication number: 20160172169
    Abstract: The present invention relates to an electron multiplier and others to effectively suppress luminescence noise, even in compact size, in which each of multistage dynodes has a plurality of columns each having a peripheral surface separated physically, and in which each column is processed in such a shape that an area or a peripheral length of a section parallel to an installation surface on which the electron multiplier is arranged becomes minimum at a certain position on the peripheral surface in the column of interest.
    Type: Application
    Filed: February 12, 2016
    Publication date: June 16, 2016
    Inventors: Hideki SHIMOI, Hiroyuki KYUSHIMA, Keisuke INOUE
  • Patent number: 9293309
    Abstract: The present invention relates to an electron multiplier and others to effectively suppress luminescence noise, even in compact size, in which each of multistage dynodes has a plurality of columns each having a peripheral surface separated physically, and in which each column is processed in such a shape that an area or a peripheral length of a section parallel to an installation surface on which the electron multiplier is arranged becomes minimum at a certain position on the peripheral surface in the column of interest.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: March 22, 2016
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Inoue
  • Publication number: 20150371835
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Application
    Filed: September 1, 2015
    Publication date: December 24, 2015
    Inventors: Hiroyuki KYUSHIMA, Hideki SHIMOI, Akihiro KAGEYAMA, Keisuke INOUE, Masuo ITO
  • Patent number: 9147559
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: September 29, 2015
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Hiroyuki Kyushima, Hideki Shimoi, Akihiro Kageyama, Keisuke Inoue, Masuo Ito
  • Patent number: 8961806
    Abstract: In a method comprising a modified region forming step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a plurality of modified spots within the object along a modified region forming line tilted in a first lateral direction with respect to a thickness direction of the object and the plurality of modified spots construct a modified region, and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the object with a space extending obliquely with respect to the thickness direction, the modified region forming step forms the plurality of modified spots such that the modified spots adjacent to each other at least partly overlap each other when seen in the first lateral direction.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: February 24, 2015
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Araki
  • Publication number: 20140111085
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Application
    Filed: December 20, 2013
    Publication date: April 24, 2014
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Hiroyuki KYUSHIMA, Hideki SHIMOI, Akihiro KAGEYAMA, Keisuke INOUE, Masuo ITO
  • Patent number: 8673167
    Abstract: A laser processing method for forming a hole in a sheet-like object to be processed made of silicon comprises a depression forming step of forming a depression in a part corresponding to the hole on a laser light entrance surface side of the object, the depression opening to the laser light entrance surface; a modified region forming step of forming a modified region along a part corresponding to the hole in the object by converging a laser light at the object after the depression forming step; and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the hole in the object; wherein the modified region forming step exposes the modified region or a fracture extending from the modified region to an inner face of the depression.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: March 18, 2014
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Araki
  • Patent number: 8643258
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: February 4, 2014
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hiroyuki Kyushima, Hideki Shimoi, Akihiro Kageyama, Keisuke Inoue, Masuo Ito
  • Patent number: 8587196
    Abstract: The photomultiplier tube 1 is provided with a casing 5 made of an upper frame 2 and a lower frame 4, an electron multiplying part 33 having dynodes 33a to 331 arrayed on the lower frame 4, a photocathode 41, and an anode part 34. Conductive layers 202 are installed on an opposing surface 20a of the upper frame 2. The electron multiplying part 33 is provided with base parts 52a to 52d of the respective dynodes 33a to 33d installed on the side of the lower frame 4, and power supplying parts 53a to 53d connected to the conductive layers 202 at one end parts of the respective base parts 52a to 52d in a direction along the opposing surface 40a. The base parts 52a to 52d are constituted in such a manner that the both end parts are joined to the opposing surface 40a, the central part is spaced away from the opposing surface 40a, and a cross sectional area at the one end part on the side of each of the power supplying parts 53a to 53d is made greater than a cross sectional area at another end part.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: November 19, 2013
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima
  • Patent number: 8492694
    Abstract: The photomultiplier tube 1 is provided with an electron multiplying part 33 having a plurality of stages of dynodes 33a to 33l arrayed along a direction at which electrons are multiplied on an inner surface 40a of a casing 5 and a photocathode 41 and an anode part 34 installed so as to be spaced away form the electron multiplying part 33 inside the casing 5. Each of the dynode 33c to 33e is provided with a plurality of columnar parts 51c to 51e where secondary electron emitting surfaces 53c to 53e are formed, thereby forming electron multiplying channels C between adjacent columnar parts.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: July 23, 2013
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima
  • Publication number: 20130033175
    Abstract: The present invention relates to an electron multiplier and others to effectively suppress luminescence noise, even in compact size, in which each of multistage dynodes has a plurality of columns each having a peripheral surface separated physically, and in which each column is processed in such a shape that an area or a peripheral length of a section parallel to an installation surface on which the electron multiplier is arranged becomes minimum at a certain position on the peripheral surface in the column of interest.
    Type: Application
    Filed: May 31, 2012
    Publication date: February 7, 2013
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Hideki SHIMOI, Hiroyuki Kyushima, Keisuke Inoue
  • Patent number: 8354791
    Abstract: The photomultiplier tube 1 is provided with an upper frame 2 and a lower frame 4 which are arranged so as to oppose each other, with the respective opposing surfaces 20a, 40a made with an insulating material, a side wall part 3 which constitutes a casing together with the frames 2, 4, a plurality of stages of electron multiplying parts 33 which are arrayed so as to be spaced away sequentially from a first end side to a second end side on the opposing surface 40a of the lower frame 4, a photocathode 41 which is installed on the first end side so as to be spaced away from the electron multiplying parts 33, converting incident light from outside to photoelectrons, an anode part 34 which is installed on the second end side so as to be spaced away from the electron multiplying parts 33 to take out electrons multiplied by the electron multiplying parts 33 as a signal, and a wall-like electrode 32 which is arranged so as to enclose the photocathode 41 when viewed from a direction directly opposite to an opposing sur
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: January 15, 2013
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima
  • Patent number: 8330364
    Abstract: The present invention relates to a photomultiplier that realizes a significant improvement of response time characteristics by a structure enabling mass production. The photomultiplier comprises a sealed container, and, in the sealed container, a photocathode, an electron multiplier section, and an anode are respectively disposed. The electron multiplier section includes multiple stages of dynode units, and each of the multiple stages of dynode units is fixed with one end of the associated dynode pin while being electrically connected thereto. In particular, the dynode pin, whose one ends are fixed to the multiple stages of dynode units, are held within an effective region of the electron multiplier section contributing to secondary electron multiplication, when the electron multiplier section is viewed from the photocathode side.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: December 11, 2012
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Takayuki Ohmura, Hiroyuki Kyushima, Hideki Shimoi, Tsuyoshi Kodama
  • Publication number: 20120274204
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Application
    Filed: July 13, 2012
    Publication date: November 1, 2012
    Inventors: Hiroyuki KYUSHIMA, Hideki SHIMOI, Akihiro KAGEYAMA, Keisuke INOUE, Masuo ITO
  • Patent number: 8242694
    Abstract: The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: August 14, 2012
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hiroyuki Kyushima, Hideki Shimoi, Akihiro Kageyama, Keisuke Inoue, Masuo Ito
  • Publication number: 20120125892
    Abstract: A laser processing method for forming a hole in a sheet-like object to be processed made of silicon comprises a depression forming step of forming a depression in a part corresponding to the hole on a laser light entrance surface side of the object, the depression opening to the laser light entrance surface; a modified region forming step of forming a modified region along a part corresponding to the hole in the object by converging a laser light at the object after the depression forming step; and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the hole in the object; wherein the modified region forming step exposes the modified region or a fracture extending from the modified region to an inner face of the depression.
    Type: Application
    Filed: January 30, 2012
    Publication date: May 24, 2012
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Hideki SHIMOI, Hiroyuki KYUSHIMA, Keisuke ARAKI
  • Publication number: 20120125893
    Abstract: In a method comprising a modified region forming step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a plurality of modified spots within the object along a modified region forming line tilted in a first lateral direction with respect to a thickness direction of the object and the plurality of modified spots construct a modified region, and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the object with a space extending obliquely with respect to the thickness direction, the modified region forming step forms the plurality of modified spots such that the modified spots adjacent to each other at least partly overlap each other when seen in the first lateral direction.
    Type: Application
    Filed: July 19, 2011
    Publication date: May 24, 2012
    Applicant: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Araki
  • Publication number: 20120091889
    Abstract: The photomultiplier tube 1 is provided with an upper frame 2 and a lower frame 4 which are arranged so as to oppose each other, with the respective opposing surfaces 20a, 40a made with an insulating material, a side wall part 3 which constitutes a casing together with the frames 2, 4, a plurality of stages of electron multiplying parts 33 which are arrayed so as to be spaced away sequentially from a first end side to a second end side on the opposing surface 40a of the lower frame 4, a photocathode 41 which is installed on the first end side so as to be spaced away from the electron multiplying parts 33, converting incident light from outside to photoelectrons, an anode part 34 which is installed on the second end side so as to be spaced away from the electron multiplying parts 33 to take out electrons multiplied by the electron multiplying parts 33 as a signal, and a wall-like electrode 32 which is arranged so as to enclose the photocathode 41 when viewed from a direction directly opposite to an opposing sur
    Type: Application
    Filed: October 14, 2010
    Publication date: April 19, 2012
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Hideki SHIMOI, Hiroyuki KYUSHIMA