Abstract: A semiconductor memory device includes a silicon chip and sub-arrays formed in the chip. In each of the sub-arrays, memory cells arranged in a matrix form, word lines provided for respective rows of each of the sub-arrays, and bit lines provided for respective columns of each of the sub-arrays are arranged. Further, in the chip, amplifier groups for amplifying data read out from the memory cells are arranged for the respective sub-arrays. Amplifiers connected to respective bit lines are provided in the amplifier groups and the amplifiers each have a function of continuously holding data read out from the memory cell.

Abstract: According to this present invention, a semiconductor device includes source and drain diffusion layers, and a gate electrode formed on a substrate between the source diffusion layer and the drain diffusion layer. In addition, antioxidant films are respectively formed on the source diffusion layer and the drain diffusion layer. These antioxidant films are used for controlling a diffusion rate of an impurity contained in the source diffusion layer and the drain diffusion layer.

Abstract: There is provided a semiconductor memory including a plurality of word lines, a plurality of bit lines intersecting the word lines, and a memory cell array having memory cells arranged at respective intersections of the word lines and bit lines. Word line selecting circuits select the word lines in accordance with an address signal and word line driving circuits are connected to the word lines for driving selected word lines. Selective stress applying circuitry selectively applies stress, during a stress test, to word lines in one of a plurality of word line groups into which all word lines are classified. The selective stress applying circuits includes an arrangement of MOS transistors and pads for applying stress to a word line group during the stress test.