Patents by Inventor Hiroyuki Oda

Hiroyuki Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12110422
    Abstract: Provided are a polishing method and a polishing composition that are applied to polishing of silicon carbide and allows reduction of rise in pH of the polishing composition and increase in pad temperature during polishing Provided is a method of polishing an object to be polished having a surface formed of silicon carbide. The method includes steps of preparing a polishing composition, and supplying the polishing composition to the object to be polished and polishing the object to be polished. The polishing composition contains permanganate, a metal salt A, and water. The metal salt A is a salt of a metal cation having a pKa of less than 7.0 in form of a hydrated metal ion, and an anion.
    Type: Grant
    Filed: December 5, 2023
    Date of Patent: October 8, 2024
    Assignee: FUJIMI INCORPORATED
    Inventors: Yuichiro Nakagai, Hiroyuki Oda, Yasuaki Ito, Shogaku Ide, Shinichiro Takami
  • Publication number: 20240316520
    Abstract: An ammonia decomposition system includes: a reactor filled with a catalyst for a decomposition reaction where ammonia which is a raw material is decomposed into hydrogen and nitrogen; and a diluent gas supply line for supplying a diluent gas having a lower ammonia concentration than the raw material, such that the diluent gas is mixed with the raw material before the raw material flows into the catalyst.
    Type: Application
    Filed: December 7, 2021
    Publication date: September 26, 2024
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Masakazu Sakaguchi, Shinya Tachibana, Hiroyuki Furuichi, Takahito Yonekawa, Erika Oda, Hiromi Ishii
  • Publication number: 20240199915
    Abstract: Provided is a polishing composition containing an abrasive, permanganate, an aluminum salt, and water. In the polishing composition, a relation of a content W1 [% by weight] of the abrasive, a concentration C1 [mM] of the permanganate, and a concentration C2 [mM] of the aluminum salt satisfies at least one condition of the following conditions [A], [B], and [C]: satisfying both of 500?(C1/W1) and 0.04?(C2/C1);??[A] satisfying both of 200?(C1/?(W1)) and 8?C2; and??[B] satisfying both of 500?(C1/W1) and 8?C2.
    Type: Application
    Filed: February 2, 2022
    Publication date: June 20, 2024
    Inventors: Yuichiro Nakagai, Yasuaki ITO, Hiroyuki ODA, Shogaku IDE, Shinichiro TAKAMI
  • Publication number: 20240181422
    Abstract: Provided is a method for producing an organic compound, said method including a step for repeating an operation in which a liquid containing an organic solvent is passed through a packed column packed with magnesium, a material containing an organic halide being added to the liquid before it is passed through. Further provided is a device for producing an organic compound, said device comprising: a packed column which is packed with magnesium; a liquid passing unit which repeats an operation in which a liquid containing an organic solvent is passed through the packed column; and a material adding unit which adds a material containing an organic halide to the liquid before it is passed through.
    Type: Application
    Filed: April 19, 2022
    Publication date: June 6, 2024
    Applicant: TOKUYAMA CORPORATION
    Inventors: Ryosuke NISHIMOTO, Hiroyuki ODA, Daisuke ABIKO, Wataru ICHINOSE, Takenori ISOMURA
  • Publication number: 20240117219
    Abstract: Provided is a polishing composition that can reduce increase in temperature of a polishing pad during polishing. The polishing composition provided by the present invention contains water, oxidant A selected from compounds other than peroxide, a first metal salt selected from alkaline-earth metal salts, and a second metal salt selected from salts each of which has a cation of a metal belonging to groups 3 to 16 in the periodic table, and an anion.
    Type: Application
    Filed: February 2, 2022
    Publication date: April 11, 2024
    Inventors: Yasuaki ITO, Hiroyuki ODA, Yuichiro NAKAGAI, Shogaku IDE, Naoto NOGUCHI, Shinichiro TAKAMI
  • Publication number: 20240117218
    Abstract: Provided are a polishing method and a polishing composition that are applied to polishing of silicon carbide and allows reduction of rise in pH of the polishing composition and increase in pad temperature during polishing. Provided is a method of polishing an object to be polished having a surface formed of silicon carbide. The method includes steps of preparing a polishing composition, and supplying the polishing composition to the object to be polished and polishing the object to be polished. The polishing composition contains permanganate, a metal salt A, and water. The metal salt A is a salt of a metal cation having a pKa of less than 7.0 in form of a hydrated metal ion, and an anion.
    Type: Application
    Filed: February 2, 2022
    Publication date: April 11, 2024
    Inventors: Yuichiro NAKAGAI, Hiroyuki ODA, Yasuki ITO, Shogaku IDE, Shinichiro TAKAMI
  • Publication number: 20240110080
    Abstract: Provided is a polishing composition containing an abrasive, permanganate, an aluminum salt, and water. In the polishing composition, a relation of a content W1 [% by weight] of the abrasive, a concentration C1 [mM] of the permanganate, and a concentration C2 [mM] of the aluminum salt satisfies at least one condition of the following conditions [A], [B], and [C]: satisfying both of 500?(C1/W1) and 0.04?(C2/C1);??[A] satisfying both of 200?(C1/?(W1)) and 8?C2; and??[B] satisfying both of 500?(C1/W1) and 8?C2.
    Type: Application
    Filed: December 5, 2023
    Publication date: April 4, 2024
    Inventors: Yuichiro NAKAGAI, Yasuaki ITO, Hiroyuki ODA, Shogaku IDE, Shinichiro TAKAMI
  • Publication number: 20240101867
    Abstract: Provided are a polishing method and a polishing composition that are applied to polishing of silicon carbide and allows reduction of rise in pH of the polishing composition and increase in pad temperature during polishing Provided is a method of polishing an object to be polished having a surface formed of silicon carbide. The method includes steps of preparing a polishing composition, and supplying the polishing composition to the object to be polished and polishing the object to be polished. The polishing composition contains permanganate, a metal salt A, and water. The metal salt A is a salt of a metal cation having a pKa of less than 7.0 in form of a hydrated metal ion, and an anion.
    Type: Application
    Filed: December 5, 2023
    Publication date: March 28, 2024
    Inventors: Yuichiro NAKAGAI, Hiroyuki ODA, Yasuaki ITO, Shogaku IDE, Shinichiro TAKAMI
  • Publication number: 20230063355
    Abstract: According to the present invention, there is provided a polishing composition used for polishing a gallium compound-based semiconductor substrate. The polishing composition includes a silica abrasive; a compound Cpho having a phosphoric acid group or a phosphonic acid group; and water. In addition, according to the present invention, there is provided a method for polishing a gallium compound-based semiconductor substrate. The method includes a first polishing step in which polishing is performed using a slurry S1 containing an abrasive A1 and water; and a second polishing step in which polishing is performed using a slurry S2 containing an abrasive A2 and water, in this order. The abrasive A2 contains a silica abrasive. The slurry S2 further contains a compound Cpho having a phosphoric acid group or a phosphonic acid group.
    Type: Application
    Filed: October 28, 2022
    Publication date: March 2, 2023
    Inventors: Hiroyuki Oda, Hiroki Kon, Naoto Noguchi, Shinichiro Takami
  • Publication number: 20230050880
    Abstract: Provided is a method for producing a halogenated hydrocarbon magnesium compound, the method including bringing a halogenated hydrocarbon compound into contact with magnesium having a specific surface area of 1×10?5 to 2×10?4 m2/g. Also provided are methods for producing a tertiary alcohol compound and an organosilicon compound, wherein said production method is utilized.
    Type: Application
    Filed: January 21, 2021
    Publication date: February 16, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Hiroyuki Oda, Ryosuke Nishimoto, Daisuke Abiko, Takenori Isomura
  • Patent number: 11319460
    Abstract: Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: May 3, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yasuaki Ito, Hiroyuki Oda, Naoto Noguchi
  • Publication number: 20220089911
    Abstract: Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.
    Type: Application
    Filed: December 3, 2021
    Publication date: March 24, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Yasuaki ITO, Hiroyuki ODA, Naoto NOGUCHI
  • Publication number: 20210276458
    Abstract: A controller, which serves as a pressure-feeding control portion, drives an air pump to pressure-feed air to massage airbags located in a seat. In addition, the controller, which serves as an inflation-deflation control portion, performs massage control that inflates and deflates the airbags while keeping the air pump driven by controlling the operation of intake-discharge valves in second flow passage (branch lines), which connects the air pump to the airbags. Furthermore, the controller, which serves as a decompression control portion, opens a discharge valve, which is located upstream of the intake-discharge valves, in a state in which the airbags are deflated during the massage control.
    Type: Application
    Filed: September 28, 2017
    Publication date: September 9, 2021
    Applicants: Aisin Seiki Kabushiki Kaisha, Toyota Jidosha Kabushiki Kaisha
    Inventors: Yuki FUJII, Akiyoshi SHIBATA, Hiroyuki ODA, Shunsuke HAYAKAWA, Shunsuke TANAKA, Shinichiro KOMAKI, Kenji HASHIMOTO
  • Patent number: 10953469
    Abstract: A metal powder having a BET specific surface area of 5 to 250 m2/g is obtained by contacting and mixing together a gas of a metal chloride (metal source gas) and a reducing gas (e.g., hydrogen gas) that have been separately heated so as to instantaneously form fine metal particles based on the gas phase reduction reaction thereof, and collecting the fine metal particles from the gas stream after the reaction.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: March 23, 2021
    Assignee: TOKUYAMA CORPORATION
    Inventors: Hiroyuki Oda, Naoto Mochizuki
  • Publication number: 20210024781
    Abstract: According to the present invention, there is provided a polishing composition used for polishing a gallium compound-based semiconductor substrate. The polishing composition includes a silica abrasive; a compound Cpho having a phosphoric acid group or a phosphonic acid group; and water. In addition, according to the present invention, there is provided a method for polishing a gallium compound-based semiconductor substrate. The method includes a first polishing step in which polishing is performed using a slurry S1 containing an abrasive A1 and water; and a second polishing step in which polishing is performed using a slurry S2 containing an abrasive A2 and water, in this order. The abrasive A2 contains a silica abrasive. The slurry S2 further contains a compound Cpho having a phosphoric acid group or a phosphonic acid group.
    Type: Application
    Filed: March 22, 2019
    Publication date: January 28, 2021
    Inventors: Hiroyuki ODA, Hiroki KON, Naoto NOGUCHI, Shinichiro TAKAMI
  • Publication number: 20200109313
    Abstract: Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.
    Type: Application
    Filed: March 19, 2018
    Publication date: April 9, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Yasuaki ITO, Hiroyuki ODA, Naoto NOGUCHI
  • Publication number: 20200023800
    Abstract: A vehicle seat device includes a reproduction control portion configured to inflate an airbag provided in a seat based on an internal pressure target value, an occupant detection portion configured to detect a seated state in which an occupant is seated on the seat, a body size detection portion configured to detect a size of the occupant, and a correction amount calculation portion configured to calculate, based on the size of the occupant, a correction amount to be used to correct the internal pressure target value in a non-seated state in which the occupant is not seated on the seat.
    Type: Application
    Filed: October 5, 2017
    Publication date: January 23, 2020
    Applicants: AISIN SEIKI KABUSHIKI KAISHA, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yuki FUJII, Akiyoshi SHIBATA, Hiroyuki ODA, Shunsuke HAYAKAWA, Shunsuke TANAKA, Shinichiro KOMAKI, Kenji HASHIMOTO
  • Patent number: 10406939
    Abstract: A pneumatic pressure control method for a vehicle seat includes: repeatedly detecting an internal pressure of a bladder provided inside the vehicle seat at intervals; correcting the internal pressure of the bladder based on a differential pressure between a detection value and a target value; and lengthening a detection interval to detect the internal pressure depending on a time elapsing from starting of the vehicle.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: September 10, 2019
    Assignees: AISIN SEIKI KABUSHIKI KAISHA, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Akiyoshi Shibata, Yuki Fujii, Hiroyuki Oda, Shunsuke Hayakawa, Shunsuke Tanaka, Kenji Hashimoto, Shinichiro Komaki
  • Patent number: 10315547
    Abstract: A vehicle seat device includes: a plurality of air bags configured to be provided inside a seat; a flow path having a shared section to communicate with each of the air bags; a plurality of intake valves each of which is arranged at a flow path position at an upstream of each of the air bags when air is pumped into each of the air bags; a plurality of exhaust valves arranged at flow path positions communicating with the shared section; and a control device configured to control operations of the intake valves and the exhaust valves, in which the control device adjusts a discharge speed of internal air by selectively opening the exhaust valves when the internal air of each of the air bags is discharged.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: June 11, 2019
    Assignee: AISIN SEIKI KABUSHIKI KAISHA
    Inventors: Akiyoshi Shibata, Yuki Fujii, Hiroyuki Oda, Shunsuke Hayakawa
  • Publication number: 20190152372
    Abstract: A pneumatic control device for a vehicle seat includes a forcible-delivery control unit, an opening-closing control unit, and a residual pressure release control unit. The forcible-delivery control unit drives an air pump to forcibly deliver air to an airbag, which is provided in a seat. The opening-closing control unit opens and closes an inlet valve, which is provided in a passage of the air. The passage is in communication with the airbag. The residual pressure release control unit opens an outlet valve provided in the passage on an upstream side of the inlet valve after driving of the air pump is stopped, thereby releasing the air sealed on the upstream side of the inlet valve in a closed state from the passage.
    Type: Application
    Filed: March 27, 2017
    Publication date: May 23, 2019
    Applicant: AISIN SEIKI KABUSHIKI KAISHA
    Inventors: Yuki FUJII, Akiyoshi SHIBATA, Hiroyuki ODA, Shunsuke HAYAKAWA