Patents by Inventor Hiroyuki Ohtsuka

Hiroyuki Ohtsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180315869
    Abstract: A method for producing a solar cell having good photoelectric conversion characteristics with high productivity, including the steps of: forming a first electrode on a first main surface of a semiconductor substrate; applying an insulator film precursor to cover at least part of the first electrode; temporarily curing the insulator film precursor; applying a conductive paste to at least the insulator film precursor; curing the conductive paste to form a second electrode; and completely curing the insulator film precursor to form an insulator film, the method in which the step of applying the conductive paste so as to be electrically insulated from the first electrode is performed after the step of temporarily curing the insulator film precursor and at least part of the steps of curing the conductive paste to form the second electrode and completely curing the insulator film precursor to form the insulator film are concurrently performed.
    Type: Application
    Filed: November 7, 2016
    Publication date: November 1, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi HASHIGAMI, Toyohiro UEGURI, Takenori WATABE, Hiroyuki OHTSUKA
  • Publication number: 20180315876
    Abstract: Provided is a solar cell including, on a first main surface of a semiconductor substrate having a first conductivity type, a base layer which has the first conductivity type, and an emitter layer which is adjacent to the base layer and has a second conductivity type which is a conductivity type opposite to the first conductivity type, and further including a base collecting electrode provided on at least the base layer, and a part of the base collecting electrode is also arranged on the emitter layer adjacent to the base layer on which the base collecting electrode is arranged. Consequently, the inexpensive solar cell having high photoelectric conversion efficiency can be provided.
    Type: Application
    Filed: October 25, 2016
    Publication date: November 1, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takenori WATABE, Ryo MITTA, Hiroshi HASHIGAMI, Hiroyuki OHTSUKA
  • Patent number: 8766089
    Abstract: A semiconductor substrate having an electrode formed thereon, the electrode including at least silver and glass frit, the electrode including: a multi-layered structure with a first electrode layer joined directly to the semiconductor substrate, and an upper electrode layer formed of at least one layer and disposed on the first electrode layer. The upper electrode layer is formed by firing a conductive paste having a total silver content of 75 wt % or more and 95 wt % or less, the content of silver particles having an average particle diameter of 4 ?m or greater and 8 ?m or smaller with respect to the total silver content in the upper electrode layer being higher than that in the first electrode layer.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: July 1, 2014
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishikawa, Satoyuki Ojima, Hiroyuki Ohtsuka, Takenori Watabe, Shigenori Saisu, Toyohiro Ueguri
  • Patent number: 8319096
    Abstract: The present invention is directed to a semiconductor substrate having at least an electrode formed thereon, in which the electrode has a multilayer structure including two or more layers, of the multilayer structure, at least a first electrode layer directly bonded to the semiconductor substrate contains at least silver and a glass frit, and contains, as an additive, at least one of oxides of Ti, Bi, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ni, Si, Al, Ge, Sn, Pb, and Zn, and, of an electrode layer formed on the first electrode layer, at least an uppermost electrode layer to be bonded to a wire contains at least silver and a glass frit and does not contain the additive. This makes it possible to form, on a semiconductor substrate, an electrode adhered to the semiconductor substrate with sufficient adhesive strength and adhered to a wire via solder with sufficient adhesive strength by lowering both contact resistance and interconnect resistance.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: November 27, 2012
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishikawa, Hiroyuki Ohtsuka, Takenori Watabe, Satoyuki Ojima, Toyohiro Ueguri
  • Publication number: 20120289044
    Abstract: A semiconductor substrate having an electrode formed thereon, the electrode including at least silver and glass frit, the electrode including: a multi-layered structure with a first electrode layer joined directly to the semiconductor substrate, and an upper electrode layer formed of at least one layer and disposed on the first electrode layer. The upper electrode layer is formed by firing a conductive paste having a total silver content of 75 wt % or more and 95 wt % or less, the content of silver particles having an average particle diameter of 4 ?m or greater and 8 ?m or smaller with respect to the total silver content in the upper electrode layer being higher than that in the first electrode layer.
    Type: Application
    Filed: July 27, 2012
    Publication date: November 15, 2012
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Naoki ISHIKAWA, Satoyuki OJIMA, Hiroyuki OHTSUKA, Takenori WATABE, Shigenori SAISU, Toyohiro UEGURI
  • Patent number: 8253011
    Abstract: The present invention is directed to a semiconductor substrate having an electrode formed thereon, the electrode including at least silver and glass frit, the electrode including: a multi-layered structure constituted of a first electrode layer joined directly to the semiconductor substrate, and an upper electrode layer formed of at least one layer and disposed on the first electrode layer; wherein the upper electrode layer is formed by firing a conductive paste having a total silver content of 75 wt % or more and 95 wt % or less, the content of silver particles having an average particle diameter of 4 ?m or greater and 8 ?m or smaller with respect to the total silver content in the upper electrode layer being higher than that in the first electrode layer. As a consequence, it is possible to form the electrode, which has the high aspect ratio and hardly suffers an inconvenience such as a break, on the semiconductor substrate by a simple method.
    Type: Grant
    Filed: August 2, 2007
    Date of Patent: August 28, 2012
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishikawa, Satoyuki Ojima, Hiroyuki Ohtsuka, Takenori Watabe, Shigenori Saisu, Toyohiro Ueguri
  • Patent number: 8141484
    Abstract: A screen printing plate having at least an opening portion that discharges a printing material for forming a target printing pattern on a matter to be printed is provided in screen printing, and the screen printing plate is characterized in that the size of the opening portion is reduced from the target printing pattern and an opening end portion of the opening portion has a projection and recess pattern shaped differently from the target printing pattern shape. By this arrangement, bleeding of the printing material of the screen printing can be controlled and a high-quality and low-cost screen printing plate is provided which can print a target printing pattern accurately and with high transfer performance even for a fine design.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: March 27, 2012
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoyuki Ojima, Naoki Ishikawa, Hiroyuki Ohtsuka
  • Patent number: 8030223
    Abstract: A solar cell (100) comprising a semiconductor solar cell substrate (66) having a light receiving surface formed on the first major surface and generating photovoltaic power based on the light impinging on the light receiving surface, wherein the light receiving surface of the semiconductor solar cell substrate (66) is coated with a light receiving surface side insulating film (61) composed of an inorganic insulating material where the cationic component principally comprising silicon, and the light receiving surface side insulating film (61) is a low hydrogen content inorganic insulating film containing less than 10 atm % of hydrogen. A solar cell having an insulating film exhibiting excellent passivation effect insusceptible to aging can thereby be provided.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: October 4, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masatoshi Takahashi, Hiroyuki Ohtsuka, Hideki Matsumura, Atsushi Masuda, Akira Izumi
  • Publication number: 20100173447
    Abstract: A solar cell (100) comprising a semiconductor solar cell substrate (66) having a light receiving surface formed on the first major surface and generating photovoltaic power based on the light impinging on the light receiving surface, wherein the light receiving surface of the semiconductor solar cell substrate (66) is coated with a light receiving surface side insulating film (61) composed of an inorganic insulating material where the cationic component principally comprising silicon, and the light receiving surface side insulating film (61) is a low hydrogen content inorganic insulating film containing less than 10 atm % of hydrogen. A solar cell having an insulating film exhibiting excellent passivation effect insusceptible to aging can thereby be provided.
    Type: Application
    Filed: January 27, 2010
    Publication date: July 8, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masatoshi Takahashi, Hiroyuki Ohtsuka, Hideki Matsumura, Atsushi Masuda, Akira Izumi
  • Patent number: 7705236
    Abstract: The present invention is an electrode material comprising at least, a silver powder, a glass frit, and an organic vehicle, wherein a rate of Ag content of the electrode material is 75 wt % to 95 wt %, and a ratio of contents of Ag grains having an average grain diameter of 0.5 ?m to 3 ?m and Ag grains having an average grain diameter of 4 ?m to 8 ?m in the electrode material is (the Ag grains having an average grain diameter of 0.5 ?m to 3 ?m):(the Ag grains having an average grain diameter of 4 ?m to 8 ?m)=20-80 wt %:80-20 wt %, and a solar cell comprising an electrode formed by using the electrode material. Thereby, an electrode material that can be stably filled in an electrode groove formed on a semiconductor device and that an electrode with narrow line width and small resistance loss can be easily formed by, and a solar cell with high power having an electrode formed by using the electrode material are provided.
    Type: Grant
    Filed: June 15, 2005
    Date of Patent: April 27, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishikawa, Satoyuki Ojima, Hiroyuki Ohtsuka, Haruhiko Kano, Masanobu Yano
  • Patent number: 7615391
    Abstract: A method of fabricating a solar cell forms a large number of grooves on a first main surface of a p-type silicon single crystal substrate sliced out from a silicon single crystal ingot as described below. First an edge portion of a groove-carving blade is projected out from a flat substrate feeding surface of a working table by a predetermined height. The p-type silicon single crystal substrate is moved along the substrate feeding surface towards the rotating groove-carving blade while keeping a close contact of the first main surface thereof with the substrate feeding surface. Electrodes are then formed on the inner side face of thus-carved grooves only on one side in the width-wise direction thereof.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: November 10, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoyuki Ojima, Hiroyuki Ohtsuka, Masatoshi Takahashi, Takenori Watabe
  • Publication number: 20090243111
    Abstract: The present invention is directed to a semiconductor substrate having an electrode formed thereon, the electrode including at least silver and glass frit, the electrode including: a multi-layered structure constituted of a first electrode layer joined directly to the semiconductor substrate, and an upper electrode layer formed of at least one layer and disposed on the first electrode layer; wherein the upper electrode layer is formed by firing a conductive paste having a total silver content of 75 wt % or more and 95 wt % or less, the content of silver particles having an average particle diameter of 4 ?m or greater and 8 ?m or smaller with respect to the total silver content in the upper electrode layer being higher than that in the first electrode layer. As a consequence, it is possible to form the electrode, which has the high aspect ratio and hardly suffers an inconvenience such as a break, on the semiconductor substrate by a simple method.
    Type: Application
    Filed: August 2, 2007
    Publication date: October 1, 2009
    Applicants: SHIN-ETSU HANDOTAI CO., LTD., SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki Ishikawa, Satoyuki Ojima, Hiroyuki Ohtsuka, Takenori Watabe, Shigenori Saisu, Toyohiro Ueguri
  • Publication number: 20090194151
    Abstract: The present invention is directed to a semiconductor substrate having at least an electrode formed thereon, in which the electrode has a multilayer structure including two or more layers, of the multilayer structure, at least a first electrode layer directly bonded to the semiconductor substrate contains at least silver and a glass frit, and contains, as an additive, at least one of oxides of Ti, Bi, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ni, Si, Al, Ge, Sn, Pb, and Zn, and, of an electrode layer formed on the first electrode layer, at least an uppermost electrode layer to be bonded to a wire contains at least silver and a glass frit and does not contain the additive. This makes it possible to form, on a semiconductor substrate, an electrode adhered to the semiconductor substrate with sufficient adhesive strength and adhered to a wire via solder with sufficient adhesive strength by lowering both contact resistance and interconnect resistance.
    Type: Application
    Filed: July 12, 2007
    Publication date: August 6, 2009
    Applicants: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishikawa, Hiroyuki Ohtsuka, Takenori Watabe, Satoyuki Ojima, Toyohiro Ueguri
  • Publication number: 20090020158
    Abstract: The present invention is a method for manufacturing a solar cell by forming a p-n junction in a semiconductor substrate having a first conductivity type, wherein, at least: a first coating material containing a dopant and an agent for preventing a dopant from scattering, and a second coating material containing a dopant, are coated on the semiconductor substrate having the first conductivity type so that the second coating material may be brought into contact with at least the first coating material; and, a first diffusion layer formed by coating the first coating material, and a second diffusion layer formed by coating the second coating material the second diffusion layer having a conductivity is lower than that of the first diffusion layer are simultaneously formed by a diffusion heat treatment; a solar cell manufactured by the method; and a method for manufacturing a semiconductor device.
    Type: Application
    Filed: April 11, 2006
    Publication date: January 22, 2009
    Applicants: SHIN-ETSU HANDOTAI CO., LTD., NAOETSU ELECTRONICS CO., LTD., SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Ohtsuka, Masatoshi Takahashi, Naoki Ishikawa, Shigenori Saisu, Toyohiro Ueguri, Satoyuki Ojima, Takenori Watabe, Takeshi Akatsuka, Tsutomu Onishi
  • Publication number: 20090020156
    Abstract: The present invention is a method for manufacturing a solar cell by forming a pn junction in a semiconductor substrate having a first conductivity type to manufacture a solar cell, including at least: applying a first coating material containing a dopant onto the semiconductor substrate having the first conductivity type; and performing vapor-phase diffusion heat treatment to form a first diffusion layer in a region applied with the first coating material and a second diffusion layer, which is formed next to the first diffusion layer through vapor-phase diffusion, with a conductivity lower than a conductivity of the first diffusion layer at the same time, and provides a solar cell.
    Type: Application
    Filed: April 7, 2006
    Publication date: January 22, 2009
    Applicants: SHIN-ETSU HANDOTAI CO., LTD., SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Ohtsuka, Naoki Ishikawa, Masatoshi Takahashi
  • Publication number: 20080196608
    Abstract: The present invention is a screen printing plate 1 in which at least an opening portion 2 that discharges a printing material for forming a target printing pattern 4 on a matter to be printed is provided in screen printing, and the screen printing plate is characterized in that the size of the opening portion 2 is reduced from the target printing pattern 4 and an opening end portion 3 of the opening portion 2 has a projection and recess pattern shape different from the target printing pattern shape. By this arrangement, bleeding of the printing material of the screen printing can be controlled and a high-quality and low-cost screen printing plate is provided which can print a target printing pattern accurately and with high transfer performance even for a fine design.
    Type: Application
    Filed: May 2, 2006
    Publication date: August 21, 2008
    Applicants: SHIN-ETSU HANDOTAI CO., LTD., SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Satoyuki Ojima, Naoki Ishikawa, Hiroyuki Ohtsuka
  • Patent number: 7355114
    Abstract: An OECO solar cell using a semiconductor single crystal substrate having a plurality of grooves, wherein a minimum groove depth h of each groove always satisfies the relation of h?W1tan ? where ? represents an angle between a line connecting the lower end, along the thickness-wise direction of the semiconductor single crystal substrate, of an electrode formed in the groove and the upper end of the inner side face of the same groove having no electrode formed thereon, and a reference line normal to the thickness-wise direction, and W1 represents a distance between both opening edges of the groove; wherein the semiconductor single crystal substrate has thickness decreasing from a first side of a first main surface to a second side opposed to the first side; and wherein the plurality of grooves have a depth distribution of being deepest at a thickest position of the substrate, and a gradually becoming shallower towards a thinnest position of the substrate.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: April 8, 2008
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoyuki Ojima, Hiroyuki Ohtsuka, Masatoshi Takahashi, Takenori Watabe
  • Patent number: 7294779
    Abstract: A solar cell 1 has a number of grooves 2 formed in parallel with each other on a first main surface 24a of a silicon single crystal substrate. An electrode 6 is formed on the inner side face of each groove 2 on one side. Each groove 2 is formed in the direction in disagreement with the <110> direction on the first main surface 24a. This raises mechanical strength of the solar cell 1. The direction of formation of the grooves 2 preferably crosses the <110> direction nearest to the direction of formation at an angle of 4°˜45° on the acute angle side.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: November 13, 2007
    Assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Takenori Watabe, Hiroyuki Ohtsuka, Masatoshi Takahashi, Satoyuki Ojima, Takao Abe
  • Publication number: 20070249085
    Abstract: A method of fabricating a solar cell forms a large number of grooves on a first main surface of a p-type silicon single crystal substrate sliced out from a silicon single crystal ingot as described below. First an edge portion of a groove-carving blade is projected out from a flat substrate feeding surface of a working table by a predetermined height. The p-type silicon single crystal substrate is moved along the substrate feeding surface towards the rotating groove-carving blade while keeping a close contact of the first main surface thereof with the substrate feeding surface. Electrodes are then formed on the inner side face of thus-carved grooves only on one side in the width-wise direction thereof.
    Type: Application
    Filed: March 27, 2007
    Publication date: October 25, 2007
    Applicants: Shin-Etsu Handotal Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoyuki Ojima, Hiroyuki Ohtsuka, Masatoshi Takahashi, Takenori Watabe
  • Publication number: 20070215203
    Abstract: The present invention is an electrode material comprising at least, a silver powder, a glass frit, and an organic vehicle, wherein a rate of Ag content of the electrode material is 75 wt % to 95 wt %, and a ratio of contents of Ag grains having an average grain diameter of 0.5 ?m to 3 ?m and Ag grains having an average grain diameter of 4 ?m to 8 ?m in the electrode material is (the Ag grains having an average grain diameter of 0.5 ?m to 3 ?m):(the Ag grains having an average grain diameter of 4 ?m to 8 ?m)=20-80 wt %:80-20 wt %, and a solar cell comprising an electrode formed by using the electrode material. Thereby, an electrode material that can be stably filled in an electrode groove formed on a semiconductor device and that an electrode with narrow line width and small resistance loss can be easily formed by, and a solar cell with high power having an electrode formed by using the electrode material are provided.
    Type: Application
    Filed: June 15, 2005
    Publication date: September 20, 2007
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki Ishikawa, Satoyuki Ojima, Hiroyuki Ohtsuka, Haruhiko Kano, Masanobu Yano