Patents by Inventor Hiroyuki Sugimura

Hiroyuki Sugimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6207621
    Abstract: A surface of a given base material is hydrophilized by irradiating, for example, a vacuum ultraviolet light to itself. Then, on the surface is formed a monomolecular film made of a fluoroalkylsilane preferably having at least one of a long fluoroalkyl-chain and a long alkyl-chain which preferably have lengths of not less than 1 nm. Then, the base material and the monocular film are thermally treated and thereby a member having a high lubricative surface can be obtained which has strong couplings between the base material and the molecular film through a dehydrating condensation reaction.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: March 27, 2001
    Assignee: Nagoya University
    Inventors: Osamu Takai, Atsushi Hozumi, Hiroyuki Sugimura
  • Patent number: 6144793
    Abstract: The present invention provides a wavelength dependent compensation method in a variable optical attenuator which can precisely set the amount of attenuation within a wide range of wavelengths, and to provide superior operability. An optical signal 20a is emitted from a white light source 20 incident on a monochromator 21, and under control of a CPU 24, only an optical signal 20b of a specific wavelength is extracted and is made incident on a variable optical attenuator 22; in optical attenuator 22 under control of a CPU 24, optical signal 20b is attenuated; the power of attenuated optical signal 20c is measured by power measurer 23 under control of a CPU 24, producing compensating data; and using the pulse number corresponding to the rotation angle of the motor which activates the variable optical attenuator 22 according to this compensating data, the position of variable optical attenuator 22 is compensated to attain the desired amount of attenuation.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: November 7, 2000
    Assignee: Ando Electric Co., Ltd.
    Inventors: Yoshinori Matsumoto, Hiroyuki Sugimura
  • Patent number: 6044195
    Abstract: The present invention provides a wavelength dependent compensation method in a variable optical attenuator which can precisely set the amount of attenuation within a wide range of wavelengths, and to provide superior operability. An optical signal 20a is emitted from a white light source 20 incident on a monochromator 21, and under control of a CPU 24, only an optical signal 20b of a specific wavelength is extracted and is made incident on a variable optical attenuator 22; in optical attenuator 22 under control of a CPU 24, optical signal 20b is attenuated; the power of attenuated optical signal 20c is measured by power measurer 23 under control of a CPU 24, producing compensating data; and using the pulse number corresponding to the rotation angle of the motor which activates the variable optical attenuator 22 according to this compensating data, the position of variable optical attenuator 22 is compensated to attain the desired amount of attenuation.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: March 28, 2000
    Assignee: Ando Electric Co., Ltd.
    Inventors: Yoshinori Matsumoto, Hiroyuki Sugimura
  • Patent number: 5785838
    Abstract: The present invention provides a method for producing an oxide film wherein a sharp-pointed processing electrode is positioned close to the material to be processed in an oxygen-containing gas, and a voltage in the single digit range is impressed across the material and the electrode so that the surface of the material is positive and the electrode is negative thereby causing an electric current to flow across the material and the electrode. The surface of the material reacts electrochemically with oxygen adsorbed on the surface of the material to anodize the surface immediately proximate the electrode. The method makes possible the formation of a patterned oxide film with a resolution of 0.1 .mu.m or less, thus surpassing the limit of conventional oxide film production methods.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: July 28, 1998
    Assignee: Nikon Corporation by Hiroyuki Sugimura
    Inventors: Hiroyuki Sugimura, Tatsuya Uchida
  • Patent number: 5119235
    Abstract: A focusing screen of the type composed of a multitude of micro-lens-like curved surfaces arranged on a given plane is substantially regular in terms of their two-dimensional arrangement on the above-mentioned plane but exhibits some variation in terms of the height of the microscopic surface roughness formed by the micro-lens-like curved surfaces. The variation range is determined in correspondence with the pitch of the above-mentioned two-dimensional arrangement. Also disclosed is a method of manufacturing a focusing screen exhibiting an appropriate degree of randomness in terms of its surface configuration.
    Type: Grant
    Filed: December 19, 1990
    Date of Patent: June 2, 1992
    Assignee: Nikon Corporation
    Inventors: Toshiro Umeda, Hiroyuki Sugimura, Shinichi Tsukada, Noboru Yoneya, Akira Adachi, Asaji Masuko