Patents by Inventor Hiroyuki Takahama

Hiroyuki Takahama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12125728
    Abstract: Embodiments of a substrate carrier are provided herein. In some embodiments, a substrate carrier includes a base plate, wherein the base plate is a thin, solid plate with no through holes or embedded components; and a plurality of raised portions extending from the base plate, wherein the plurality of raised portions include first raised portions and second raised portions, the first raised portions disposed radially inward from the second raised portions, wherein the base plate and the plurality of raised portions define pockets configured to retain a plurality of substrates, and wherein an upper surface of the second raised portions have a greater surface area than an upper surface of the first raised portions.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: October 22, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Fred Eric Ruhland, Sumit S. Patankar, Vijay D. Parkhe, Daniel Lee Diehl, Mingwei Zhu, Hiroyuki Takahama, Randy D. Schmieding
  • Publication number: 20220099426
    Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.
    Type: Application
    Filed: November 19, 2021
    Publication date: March 31, 2022
    Inventors: Tomoharu MATSUSHITA, Aravind KAMATH, Jallepally RAVI, Cheng-Hsiung TSAI, Hiroyuki TAKAHAMA
  • Patent number: 11251028
    Abstract: Substrate processing chambers with integrated shutter garage are provided herein. In some embodiments, a pre-clean substrate processing chamber may include a chamber body, wherein the chamber body includes a first side configured to be attached to mainframe substrate processing tool, and a second side disposed opposite the first side, a substrate support configured to support a substrate when disposed thereon, a shutter disk garage disposed on the second side of the process chamber, and a shutter disk assembly mechanism comprising a rotatable shaft, and a robot shutter arm coupled to the shaft, wherein the robot shutter arm includes a shutter disk assembly support section configured to support a shutter disk assembly, and wherein the shutter disk assembly mechanism is configured to move the robot shutter arm between a storage position within the shutter garage and a processing position within the process chamber over the substrate support.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: February 15, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Cheng-Hsiung Matt Tsai, Ananthkrishna Jupudi, Sarath Babu, Manjunatha P. Koppa, Hiroyuki Takahama
  • Patent number: 11201078
    Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: December 14, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tomoharu Matsushita, Aravind Kamath, Jallepally Ravi, Cheng-Hsiung Tsai, Hiroyuki Takahama
  • Publication number: 20200234991
    Abstract: Embodiments of a substrate carrier are provided herein. In some embodiments, a substrate carrier includes a base plate, wherein the base plate is a thin, solid plate with no through holes or embedded components; and a plurality of raised portions extending from the base plate, wherein the plurality of raised portions include first raised portions and second raised portions, the first raised portions disposed radially inward from the second raised portions, wherein the base plate and the plurality of raised portions define pockets configured to retain a plurality of substrates, and wherein an upper surface of the second raised portions have a greater surface area than an upper surface of the first raised portions.
    Type: Application
    Filed: January 17, 2020
    Publication date: July 23, 2020
    Inventors: FRED ERIC RUHLAND, SUMIT S. PATANKAR, VIJAY D. PARKHE, DANIEL LEE DIEHL, MINGWEI ZHU, HIROYUKI TAKAHAMA, RANDY D. SCHMIEDING
  • Publication number: 20190348264
    Abstract: Substrate processing chambers with integrated shutter garage are provided herein. In some embodiments, a pre-clean substrate processing chamber may include a chamber body, wherein the chamber body includes a first side configured to be attached to mainframe substrate processing tool, and a second side disposed opposite the first side, a substrate support configured to support a substrate when disposed thereon, a shutter disk garage disposed on the second side of the process chamber, and a shutter disk assembly mechanism comprising a rotatable shaft, and a robot shutter arm coupled to the shaft, wherein the robot shutter arm includes a shutter disk assembly support section configured to support a shutter disk assembly, and wherein the shutter disk assembly mechanism is configured to move the robot shutter arm between a storage position within the shutter garage and a processing position within the process chamber over the substrate support.
    Type: Application
    Filed: May 7, 2019
    Publication date: November 14, 2019
    Inventors: Cheng-Hsiung Matt Tsai, Ananthkrishna Jupudi, Sarath Babu, Manjunatha P. Koppa, Hiroyuki Takahama
  • Publication number: 20180233396
    Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.
    Type: Application
    Filed: March 24, 2017
    Publication date: August 16, 2018
    Inventors: TOMOHARU MATSUSHITA, ARAVIND KAMATH, JALLEPALLY RAVI, CHENG-HSIUNG TSAI, HIROYUKI TAKAHAMA
  • Patent number: 9095600
    Abstract: The present invention relates to a novel preventive and/or therapeutic drug for myocardial infarction. The present invention provides a preventive and/or therapeutic drug for myocardial infarction or myocardial ischemia-reperfusion injury, the drug containing a lipid membrane structure retaining adenosine.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: August 4, 2015
    Assignees: OSAKA UNIVERSITY, NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER, DAIICHI SANKYO COMPANY, LIMITED
    Inventors: Tetsuo Minamino, Masafumi Kitakaze, Masatsugu Hori, Hiroyuki Takahama, Hiroshi Kikuchi, Kouichi Hashimoto, Hideo Kobayashi, Ayako Iijima, Daigo Asano
  • Publication number: 20100098753
    Abstract: The present invention relates to a novel preventive and/or therapeutic drug for myocardial infarction. The present invention provides a preventive and/or therapeutic drug for myocardial infarction or myocardial ischemia-reperfusion injury, the drug containing a lipid membrane structure retaining adenosine.
    Type: Application
    Filed: September 18, 2009
    Publication date: April 22, 2010
    Applicants: Osaka University, JAPAN AS REP. BY THE PRES. OF NAT'L. CARDIO. CENTR, DAIICHI SANKYO COMPANY, LIMITED
    Inventors: Tetsuo MINAMINO, Masafumi Kitakaze, Masatsugu Hori, Hiroyuki Takahama, Hiroshi Kikuchi, Kouichi Hashimoto, Hideo Kobayashi, Ayako IIJIMA, Daigo Asano
  • Publication number: 20050194100
    Abstract: A substrate support is provided that features a lift pin having at least one larger diameter shoulder section that forms a relief region between the lift pin and a guide hole disposed through a substrate support. The shoulder section minimizes contact between the substrate support and lift pin guide hole, thereby reducing pin scratching, particle generation, component wear, and increasing the useful life of the pin. In another embodiment, a flat-bottom tip is provided to promote self-standing of the lift pin, reducing pin tilting or leaning of the lift pin within the guide hole.
    Type: Application
    Filed: May 3, 2005
    Publication date: September 8, 2005
    Inventors: David Or, Keith Koai, Hiroyuki Takahama, Takahiro Ito, Koji Ota, Hiroshi Sato
  • Patent number: 6887317
    Abstract: A substrate support is provided that features a lift pin having at least one larger diameter shoulder section that forms a relief region between the lift pin and a guide hole disposed through a substrate support. The shoulder section minimizes contact between the substrate support and lift pin guide hole, thereby reducing pin scratching, particle generation, component wear, and increasing the useful life of the pin. In another embodiment, a flat-bottom tip is provided to promote self-standing of the lift pin, reducing pin tilting or leaning of the lift pin within the guide hole.
    Type: Grant
    Filed: September 10, 2002
    Date of Patent: May 3, 2005
    Assignee: Applied Materials, Inc.
    Inventors: David T. Or, Keith K. Koai, Hiroyuki Takahama, Takahiro Ito, Koji Ota, Hiroshi Sato
  • Publication number: 20040045509
    Abstract: A substrate support is provided that features a lift pin having at least one larger diameter shoulder section that forms a relief region between the lift pin and a guide hole disposed through a substrate support. The shoulder section minimizes contact between the substrate support and lift pin guide hole, thereby reducing pin scratching, particle generation, component wear, and increasing the useful life of the pin. In another embodiment, a flat-bottom tip is provided to promote self-standing of the lift pin, reducing pin tilting or leaning of the lift pin within the guide hole.
    Type: Application
    Filed: September 10, 2002
    Publication date: March 11, 2004
    Inventors: David T. Or, Keith K. Koai, Hiroyuki Takahama, Takahiro Ito, Koji Ota, Hiroshi Sato
  • Patent number: 5589224
    Abstract: The present invention provides a shield arrangement that prevents deposition in the area of the chamber surrounding the substrate. This shield arrangement is equipped with a wall-like member which surrounds a substrate, and includes a projecting annular flange and a substrate support which extends in the horizontal direction beyond the substrate, and includes a groove therein. The annular flange is received in the groove to shield the deposition region of the chamber from the remainder of the chamber.
    Type: Grant
    Filed: September 22, 1994
    Date of Patent: December 31, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Avi Tepman, Takeshi Jinbo, Hiroyuki Takahama, Akihiko Saito
  • Patent number: 5548964
    Abstract: A cooling structure for a vacuum device includes an external frame portion positioned between vacuum chamber flange and cryopump flange; a cooling panel formed in a partition surrounded by said external frame, the cooling panel having an opening that allows a fluid flow between said vacuum chamber and said cryopump; a cooling means positioned in contact with an exposed peripheral cooling panel surface for cooling said cooling panel; and a coolant feeding means for supplying coolant to the cooling means.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: August 27, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Takeshi Jinbo, Hiroyuki Takahama
  • Patent number: D568914
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: May 13, 2008
    Assignee: Applied Materials, Inc.
    Inventors: David T. Or, Keith K. Koai, Hiroyuki Takahama, Takahiro Ito, Koji Ota, Hiroshi Sato
  • Patent number: D904640
    Type: Grant
    Filed: January 21, 2019
    Date of Patent: December 8, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Fred Eric Ruhland, Sumit S. Patankar, Vijay D. Parkhe, Daniel Lee Diehl, Mingwei Zhu, Hiroyuki Takahama, Randy D. Schmieding