Abstract: A hard-coated antiglare film is provided that is excellent in antiglare properties and image sharpness and that can prevent glare from occurring. The hard-coated antiglare film includes a transparent plastic film substrate and a hard-coating antiglare layer that is formed on at least one surface of the transparent plastic film substrate and that is formed of fine particles and a curable hard-coating resin. The hard-coating antiglare layer has a thickness in the range of 20 to 30 ?m. The fine particles have a weight average particle size in the range of 7 to 15 ?m. The difference obtained by subtracting the refractive index of the fine particles from that of the curable hard-coating resin that has been cured is in the range of ?0.06 to ?0.01 or 0.01 to 0.06.

Abstract: A hard-coated antiglare film that has excellent antiglare properties, prevents a glare phenomenon from occurring, and prevents white blur from occurring to have excellent display contrast in bright light. The hard-coated antiglare film includes a transparent plastic film substrate and a hard-coating antiglare layer containing fine particles. The hard-coating antiglare layer is formed on at least one surface of the transparent plastic film substrate. The hard-coating antiglare layer has a surface with an uneven structure. The hard-coated antiglare film has a total haze value ht in the range of 40 to 70%. The relationship between the total haze value ht and an inner haze value hi obtained due to scattering inside the hard-coating antiglare layer is a relationship of the total haze value ht?the inner haze value hi.

Abstract: A hard-coated antiglare film is provided that has high hardness and excellent antiglare properties and can prevent white blur from occurring when viewed from oblique directions. The hard-coated antiglare film of the present invention includes a transparent plastic film substrate and a hard-coating antiglare layer that is formed of fine particles and a hard-coating resin on at least one surface of the transparent plastic film substrate. The hard-coating antiglare layer has a thickness of 15 to 30 ?m, the fine particles have a weight average particle size of 30 to 75% of a thickness of the hard-coating antiglare layer, in the unevenness of the hard-coating antiglare layer surface that is formed by the fine particles, an average tilt angle ?a is 1.0° to 2.0°, and an arithmetic average surface roughness Ra according to JIS B 0601 (1994 version) is 0.12 to 0.30 ?m.

Abstract: A hard-coated antiglare film is provided that has high hardness, high scratch resistance, and good antiglare properties. In the hard-coated antiglare film of the present invention including a transparent plastic film substrate, a hard-coating layer containing fine particles is formed on at least one surface of the transparent plastic film substrate, the hard-coating layer has a thickness in the range of 15 to 30 ?m, the fine particles have a weight average particle size of 30 to 75% of a thickness of the hard-coating layer, the average tilt angle ?a of the unevenness of the hard-coating layer surface is in the range of 0.4° to 1.5°, and the hard-coating layer is formed using a resin for forming the hard-coating layer containing three specific resin components.

Abstract: A hard-coating layer is formed on at least one surface of a transparent plastic film substrate using a material for forming a hard-coating layer. The material contains Components A, B, and C. Component A is at least one of urethane acrylate and urethane methacrylate. Component B is at least one of polyol acrylate and polyol methacrylate. Component C is a polymer containing a repeating unit represented by General Formula 1 indicated below.

Abstract: By using oxygen-containing silicon wafers obtained by the CZ method and by combining the first heat treatment comprising controlled heat-up operation (ramping) with the second heat treatment comprising high-temperature heat treatment and medium temperature heat treatment in accordance with the process for producing high-resistance silicon wafers according to the present invention, it is possible to obtain high-resistance silicon wafers capable of maintaining their high resistance even after heat treatment in the process of device manufacture while efficiently inhibiting the formation of oxygen donors and preventing changes in resistivity. Further, excellent epitaxial wafers and SOI wafers can be produced using those high-resistance silicon wafers and, therefore, they can be applied in a wide field including high-frequency communication devices and analog/digital hybrid devices, among others.

Abstract: The invention is directed to a hard-coated film, comprising: a transparent film substrate; and a hard-coating layer formed on at least one side of the transparent film substrate, wherein the hard-coating layer is made from a material containing a urethane acrylate, a polyol (meth)acrylate and a (meth)acrylic polymer having an alkyl group containing at least two hydroxyl groups. There can be provided a hard-coated film that has high hardness and good flexibility and is resistant to curling due to hardening and shrinking and a method of manufacturing a hard-coated film in which a reduction in production efficiency associated with an increase in the number of manufacturing steps is prevented.

Abstract: There are provided a hard-coated antiglare film with high hardness, high scratch resistance and good antiglare properties, a method of manufacturing the film, an optical element using the film, and an image display including the film or the optical element. The hard-coated antiglare film of the invention includes a transparent film substrate and a hard-coating layer that contains fine particles and is formed on at least one side of the transparent film substrate, wherein the hard-coating layer has a thickness of 15 ?m to 30 ?m, the fine particles have an average particle size of 30% to 75% of the thickness of the hard-coating layer, and the fine particles form unevenness with a ?a value of 0.4° to 1.5° according to JIS B 0601.

Abstract: An antireflection layer is formed directly or through an other layer at least on one side of a transparent base film of an antireflection film. The antireflection layer is made of at least two kinds of low refractive index materials satisfying a relationship of refractive index: nd20?1.49. The antireflection layer is excellent in antireflection characteristics and mar resistance. When the antireflection layer is formed on a hard coat layer having an uneven surface roughened by particles, the antireflection film is excellent in antiglareness.

Abstract: A high-resistance silicon wafer is manufactured, in which a gettering ability and economical efficiency is excellent and an oxygen thermal donor is effectively prevented from being generated in a heat treatment for forming a circuit, which is to be implemented on the side of a device manufacturer. In order to implement the above, a high-temperature heat treatment at 1100° C. or higher is performed on a carbon doped high-resistance and high-oxygen silicon wafer in which specific resistivity is 100 ?cm or more and a carbon concentration is 5×1015 to 5×1017 atoms/cm3 so that a remaining oxygen concentration becomes 6.5×1017 atoms/cm3 or more (Old-ASTM). As this high-temperature treatment, an OD treatment for forming a DZ layer on a wafer surface, a high-temperature annealing treatment for eliminating a COP on the surface layer, a high-temperature heat treatment for forming a BOX layer in a SIMOX wafer manufacturing process and the like can be used.

Abstract: An antireflection layer is formed directly or through an other layer at least on one side of a transparent base film of an antireflection film. The antireflection layer is made of at least two kinds of low refractive index materials satisfying a relationship of refractive index: nd20?1.49. The antireflection layer is excellent in antireflection characteristics and mar resistance. When the antireflection layer is formed on a hard coat layer having an uneven surface roughened by particles, the antireflection film is excellent in antiglareness.

Abstract: A linearly polarized light separating film comprising a linearly polarized light separating film and a hard coat layer, which is preferably a thickness in the range of from 1 to 6 ?m, which is preferably formed with a resin coat layer having conductivity in which metal oxide fine particles are dispersed, on one side thereof, is good in scratch resistance, and in handleability.

Abstract: The present invention relates to a method of producing an electroconductive cellulose-based film having high uniformity and transparency and excellent in optical properties while preventing a bleaching phenomenon at the time of forming an electroconductive layer. The method of producing an electroconductive cellulose-based film according to the present invention is a method of producing an electroconductive cellulose-based film by coating a cellulose-based film with a coating solution containing a binder, superfine particles and a solvent to form an electroconductive layer thereon, wherein the coating solution comprises at least one kind of glycol monoalkyl ether-based solvent selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and propylene glycol monoethyl ether in an amount of 20 to 40% by weight based on the total solvent, and a ketone-based solvent in an amount of 20 to 50% by weight based on the total solvent.

Abstract: A piercing apparatus compact in size having a decreased number of hoses is suited for use as an iron runner port-opening machine for a blast furnace or the like furnace in an iron mill.

Abstract: A piercing apparatus compact in size having a decreased number of hoses is suited for use as an iron runner port-opening machine for a blast furnace or the like furnace in an iron mill.

Abstract: A piercing apparatus compact in size having a decreased number of hoses is suited for use as an iron runner port-opening machine for a blast furnace or the like furnace in an iron mill.

Abstract: A method of producing a hearth stave cooler including a cooling pipe cast therein for cooling furnace walls of a blast furnace or the like and having refractory bricks on the working side of the stave cooler, wherein one of the upper and lower surfaces of each refractory brick to be brought into contact with molten iron is covered with a heat-insulating buffer material, the other surface is covered with metal wool, and the back of each refractory brick is preferably covered with the heat-insulating buffer material or the metal wool and then the molten iron is cast.

Abstract: An aromatic copolyester composition comprising (A) an aromatic copolyester derived from terephthalic acid, isophthalic acid and a bisphenol and (B) a phosphite compound, or an aromatic copolyester composition comprising components (A) and (B) plus (C) a metal salt of an organic carboxylic acid. Molded articles prepared from such aromatic copolyester compositions have superior mechanical properties and fire retardancy and reduced coloration and crazing.