Abstract: To provide a coating solution for forming an ultraviolet-absorbing film which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time, and an ultraviolet-absorbing glass article having an ultraviolet-absorbing film formed by using such a coating solution, which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time. A coating solution which comprises a component derived from an epoxidized organooxysilane compound, a component derived from an organooxysilane compound which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and a component derived from an organooxysilane compound other than the above both organooxysilane compounds, and an ultraviolet-absorbing glass article obtained by using the coating solution.

Abstract: The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less.

Abstract: A process of manufacturing a single-crystal silicon-carbide substrate, includes contacting a surface of a single-crystal silicon-carbide plate with a surface of a polishing pad; and moving the surface of the single-crystal silicon-carbide plate relative to the surface of the polishing pad while supplying a polishing solution to the surface the polishing pad, to polish the surface of the single-crystal silicon-carbide plate. The polishing pad comprises a non-woven fabric or a porous resin. The polishing solution comprises an oxidizing agent which comprises a transition metal having oxidation-reduction potential of 0.5 V or more. Neither the polishing pad nor the polishing solution comprises an abrasive.

Abstract: The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less.

Abstract: The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less.

Abstract: To provide a liquid composition capable of forming a coating film which has sufficient ultraviolet-absorbing ability and infrared-absorbing ability. A liquid composition for forming a coating film comprising an infrared absorber selected from indium tin oxide, antinomy tin oxide and a composite tungsten oxide, an ultraviolet absorber selected from a benzophenone compound, a triazine compound and a benzotriazole compound, a dispersing agent having an acid value and/or an amine value, a binder component and a liquid medium, wherein the dispersing agent is contained in a content such that the product of the sum (mgKOH/g) of the acid value and the amine value of the dispersing agent, and the mass ratio of the dispersing agent to the infrared absorber, is from 2 to 30 (mgKOH/g).

Abstract: There is provided a polishing method for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate at a high polishing rate to obtain a high-quality surface that is smooth and excellent in surface properties. This polishing method is a method of supplying a polishing liquid to a polishing pad not including abrasive grains to bring a surface to be polished of the non-oxide single-crystal substrate and the polishing pad into contact with each other and polishing the surface to be polished by a relative movement between them, the method characterized in that the polishing liquid comprises: an oxidant whose redox potential is 0.5 V or more and which contains a transition metal; and water, and does not contain abrasive grains.

Abstract: A polishing agent for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate with a high polishing rate to obtain a smooth surface is provided. This polishing agent comprises an oxidant having redox potential of 0.5 V or more and containing a transition metal, silicon oxide particles, cerium oxide particles and a dispersion medium, in which a mass ratio of the silicon oxide particles to the cerium oxide particles is from 0.2 to 20.

Abstract: The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less.

Abstract: A non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate is polished at a high polishing rate, whereby a smooth surface is obtained. There is provided a polishing agent containing: an oxidant that contains a transition metal and has a redox potential of 0.5 V or more; silica particles that have an average secondary particle size of 0.2 ?m or less; and a dispersion medium, wherein a content ratio of the oxidant is not less than 0.25 mass % nor more than 5 mass %, and a content ratio of the silica particles is not less than 0.01 mass % and less than 20 mass %.

Abstract: A polishing agent for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate with a high polishing rate to obtain a smooth surface is provided. This polishing agent comprises an oxidant having redox potential of 0.5 V or more and containing a transition metal, silicon oxide particles, cerium oxide particles and a dispersion medium, in which a mass ratio of the silicon oxide particles to the cerium oxide particles is from 0.2 to 20.

Abstract: There is provided a polishing method for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate at a high polishing rate to obtain a high-quality surface that is smooth and excellent in surface properties. This polishing method is a method of supplying a polishing liquid to a polishing pad not including abrasive grains to bring a surface to be polished of the non-oxide single-crystal substrate and the polishing pad into contact with each other and polishing the surface to be polished by a relative movement between them, the method characterized in that the polishing liquid comprises: an oxidant whose redox potential is 0.5 V or more and which contains a transition metal; and water, and does not contain abrasive grains.

Abstract: To provide a liquid composition capable of forming a coating film which has sufficient ultraviolet-absorbing ability and infrared-absorbing ability. A liquid composition for forming a coating film comprising an infrared absorber selected from indium tin oxide, antinomy tin oxide and a composite tungsten oxide, an ultraviolet absorber selected from a benzophenone compound, a triazine compound and a benzotriazole compound, a dispersing agent having an acid value and/or an amine value, a binder component and a liquid medium, wherein the dispersing agent is contained in a content such that the product of the sum (mgKOH/g) of the acid value and the amine value of the dispersing agent, and the mass ratio of the dispersing agent to the infrared absorber, is from 2 to 30 (mgKOH/g).

Abstract: To provide a coating solution for forming an ultraviolet-absorbing film which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time, and an ultraviolet-absorbing glass article having an ultraviolet-absorbing film formed by using such a coating solution, which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time. A coating solution which comprises a component derived from an epoxidized organooxysilane compound, a component derived from an organooxysilane compound which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and a component derived from an organooxysilane compound other than the above both organooxysilane compounds, and an ultraviolet-absorbing glass article obtained by using the coating solution.

Abstract: Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.

Abstract: The present invention relates to a method for manufacturing a glass substrate for a magnetic disk, the method including: a polishing step of supplying a polishing slurry between a polishing cloth and a circular glass plate and polishing a main surface of the circular glass plate by the polishing cloth; and a slurry circulating step of allowing the polishing slurry to contain a polishing slurry used in the polishing step, in which the polishing slurry contains a cerium oxide particle having a median diameter of from 0.3 to 3 ?m and an acetylenic surfactant.

Abstract: The present invention provides a process for producing a polishing slurry, which achieves high-speed polishing of a principal plane of a glass substrate even when ceria crystal fine particles or ceria-zirconia solid solution crystal fine particles are employed. A process for producing a polishing slurry having a pH of from 2 to 7, comprising preparing a polishing slurry liquid containing abrasive particles, a dispersing agent and water, wherein the abrasive particles comprise ceria particles or ceria-zirconia solid solution particles and the dispersing agent comprises 2-pyridine carboxylic acid or glutamic acid; dispersing the abrasive particles of the polishing slurry liquid so that the reduction ratio of the crystallite diameter of the abrasive particles becomes at most 10%; subsequently adding water; and adding the same dispersing agent as the above dispersing agent.

Abstract: An infrared shielding film-coated glass plate comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises fine ITO particles having an average primary particle diameter of at most 100 nm dispersed in a matrix containing silicon oxide as the main component and containing nitrogen in an amount of at least 2 at % based on Si and has a film thickness of from 200 to 3,000 nm.

Abstract: Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.

Abstract: To provide an infrared shielding layer-coated glass plate excellent in visible light transmittance and radiowave transmittance, having a low infrared transmittance, and applicable to a site where mechanical durability is required, such as a window glass plate for an automobile, and its production process. An infrared shielding layer-coated glass plate comprising a glass substrate and an infrared shielding layer having the following first layer and the following second layer adjacent to each other formed on the glass substrate (provided that the first layer is present on the glass substrate side), wherein the first layer is a layer with a thickness of from 0.2 to 2 ?m, having such a structure that fine ITO particles with an average primary particle diameter of at most 100 nm are bound to one another by a metal oxide matrix containing silicon oxide and titanium oxide; and the second layer is a metal oxide layer with a thickness of from 0.02 to 0.3 ?m, containing silicon oxide and titanium oxide.