Abstract: An electromagnetic valve manifold includes an electromagnetic valve including a discharge port, a manifold base including a discharge passage that is connected to the discharge port, and a check valve. The check valve includes a valve member, a valve housing including a valve seat, and an urging member. The valve housing includes a valve chamber that accommodates the valve member, a peripheral wall that defines the valve chamber, a valve hole that connects the valve chamber to the discharge port, and a discharge opening that connects the valve chamber to the discharge passage. The check valve is disposed in the discharge passage. The discharge opening is formed in the peripheral wall, at least a part of the discharge opening overlapping with the valve seat in a direction orthogonal to a moving direction of the valve member.

Abstract: Parts of a first coupling and a second coupling that protrude from manifold blocks each have the shape of an elongated tube. When the first coupling and the second coupling are viewed in the axial direction, the traverse direction of the first coupling and the second coupling agree with the arrangement direction of manifold blocks. A part of the tube insertion hole is a small diameter hole, which is a stadium-shaped hole. When the first coupling and the second coupling are viewed in the axial direction, the traverse direction of the small diameter hole agrees with the traverse direction of the first coupling and the second coupling.

Abstract: Parts of a first coupling and a second coupling that protrude from manifold blocks each have the shape of an elongated tube. When the first coupling and the second coupling are viewed in the axial direction, the traverse direction of the first coupling and the second coupling agree with the arrangement direction of manifold blocks. A part of the tube insertion hole is a small diameter hole, which is a stadium-shaped hole. When the first coupling and the second coupling are viewed in the axial direction, the traverse direction of the small diameter hole agrees with the traverse direction of the first coupling and the second coupling.

Abstract: A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.

Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports.

Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).

Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).

Abstract: A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.

Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).

Abstract: A defect inspection device is provided with an illumination optical system that irradiates light or an electron beam onto a sample, a detector that detects a signal obtained from the sample through the irradiation of the light or electron beam, a defect detection unit that detects a defect candidate on the sample through the comparison of a signal output by the detector and a prescribed threshold, and a display unit that displays a setting screen for setting the threshold. The setting screen is a two-dimensional distribution map that represents the distribution of the defect candidates in a three dimensional feature space having three features as the axes thereof and includes the axes of the three features and the threshold, which is represented in one dimension.

Abstract: When a size of a block on a wafer is equal to or smaller than an optical resolution of imaging optics, room for improvement in a signal-to-noise ratio has not been sufficiently considered in a conventional technique. One feature of the defect determination of the present invention is to include a filter processing for setting a predetermined partial area serving as a predetermined matrix for a first difference image, scanning the first difference image in the partial area, and outputting a second difference image, and a first threshold processing using a first threshold value for the second difference image. As a result, highly sensitive defect detection can be achieved.

Abstract: A defect inspection device is provided with an illumination optical system that irradiates light or an electron beam onto a sample, a detector that detects a signal obtained from the sample through the irradiation of the light or electron beam, a defect detection unit that detects a defect candidate on the sample through the comparison of a signal output by the detector and a prescribed threshold, and a display unit that displays a setting screen for setting the threshold. The setting screen is a two-dimensional distribution map that represents the distribution of the defect candidates in a three dimensional feature space having three features as the axes thereof and includes the axes of the three features and the threshold, which is represented in one dimension.

Abstract: In defect scanning carried out in a process of manufacturing a semiconductor or the like, a light detection optical system comprising a plurality of photosensors is used for detecting scattered light reflected from a sample. The photosensors used for detecting the quantity of weak background scattered light include a photon counting type photosensor having few pixels whereas the photosensors used for detecting the quantity of strong background scattered light include a photon counting type photosensor having many pixels or an analog photosensor. In addition, nonlinearity caused by the use of the photon counting type photosensor as nonlinearity of detection strength of defect scattered light is corrected in order to correct a detection signal of the defect scattered light.

Abstract: In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.