Abstract: Provided is an ejection device and an imprint apparatus which can suppress ejection failures and breakage of a mold. To achieve this, a circulation mechanism including a degassing unit is provided in an ejection head.

Abstract: An imprint apparatus comprises: a dispensing unit that dispenses a liquid to a substrate; a first measurement unit that measures a time from when a signal for causing the liquid to be dispensed is outputted to the dispensing unit until when the dispensed liquid passes through a predetermined position; a second measurement unit that measures a position of the liquid on the substrate that is dispensed by the dispensing unit; and a control unit that controls the measurement by the first measurement unit and the second measurement unit, wherein the control unit performs measurement by the second measurement unit based on a measurement result by the first measurement unit.

Abstract: A light scanning apparatus including: a rotary polygon mirror configured to deflect a laser beam emitted from a light source; optical elements configured to guide the laser beam to a photosensitive member; a housing having a bottom surface and a side wall portion standing from the bottom surface and intersecting with a longitudinal direction of the optical elements; and a plurality of wall portions provided on the bottom surface so as to intersect with the longitudinal direction between the bottom surface and a lens of the optical elements that is closest to the rotary polygon mirror, the plurality of wall portions forming an air flow path for guiding an air flow caused by rotation of the rotary polygon mirror from a first space in which the rotary polygon mirror is arranged to a second space opposite to the first space with respect to the lens.

Abstract: An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.

Abstract: An image acquisition apparatus includes an imaging optical system configured to form an image of a subject, an imaging unit including an image sensor configured to capture the image of the subject formed by the imaging optical system, a cooler thermally connected to the image sensor, and a heat-transfer reduction unit with an opaque portion located between the imaging optical system and the imaging unit, wherein the opaque portion includes an aperture through which incident light to the image sensor passes.

Abstract: An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.

Abstract: An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.

Abstract: An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.

Abstract: An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.

Abstract: An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.

Abstract: An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate supporting portion configured to support the liquid together with the substrate, and a frame portion formed so as to surround the supporting surface. The frame portion includes a depression and a member whose top surface is located in a plane including the supporting surface.

Abstract: An exposure apparatus exposes a substrate to light via an immersion liquid and includes a stage configured to hold the substrate and to be moved. The stage includes a chuck configured to hold the substrate, a support member arranged around the chuck and configured to support the immersion liquid, a recovery path configured to recover the immersion liquid having entered a gap between the substrate and the support member, and a temperature-regulating path through which the temperature-regulated liquid flows. The temperature-regulating path is connected with the recovery path.

Abstract: An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.

Abstract: An apparatus for adjusting temperature of an object includes a heat radiation member, a deflection member to deflect heat radiation from the heat radiation member toward a region of the object, and an adjusting system to adjust temperature of the heat radiation member.

Abstract: An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.

Abstract: In order to improve a responsiveness of the radiation cooling and to switch a cooling position, an exposure apparatus for exposing an object includes a cooling mechanism for radiation-cooling the object, and a regulator for regulating a radiant heat transfer amount between said cooling mechanism and the object.

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.

Abstract: This invention relates to a mirror holding method, wherein a symmetry axis of an illuminating area corresponds with that of a mirror holder, and a center of the illuminating area in a mirror differs from a centroid of the mirror.

Abstract: An apparatus for adjusting temperature of an object includes a heat radiation member, a deflection member to deflect heat radiation from the heat radiation member toward a region of the object, and an adjusting system to adjust temperature of the heat radiation member.