Patents by Inventor Hisashi Yano

Hisashi Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220411752
    Abstract: Provided is an excellent method for producing an IL-4 non-secreting and IFN-? secreting (Th1-type) or IFN-? non-secreting and IL-4 secreting (Th2-type) CD4 single-positive T cell (CD4SP T cell). The method for producing the Th1-type or Th2-type CD4SP T cell of the present invention comprises a step of inducing a CD4 single-positive T cell from a hematopoietic stem cell (HSC) and/or a hematopoietic progenitor cell (HPC) substantially defective in a factor involved in IL-4 secretion or a factor involved in IFN-? secretion.
    Type: Application
    Filed: October 30, 2020
    Publication date: December 29, 2022
    Applicants: Kyoto University, Takeda Pharmaceutical Company Limited
    Inventors: Shin KANEKO, Hisashi YANO, Tokuyuki SHINOHARA
  • Patent number: 10483125
    Abstract: A semiconductor device includes a first interlayer film formed on an upper surface of a substrate, a first metal wiring line, a second interlayer film, a second metal wiring line, a first via electrically connecting the first metal wiring line and the second metal wiring line, a landing pad embedded in an upper portion of the first interlayer film and penetrating the second interlayer film, and a second via penetrating the substrate and the first interlayer film from a back side of the substrate and connected to the landing pad. The lower surface position of the landing pad is different from that of the first metal wiring line.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: November 19, 2019
    Assignee: TOWERJAZZ PANASONIC SEMICONDUCTOR CO., LTD.
    Inventors: Yuka Inoue, Mitsunori Fukura, Nobuyoshi Takahashi, Masahiro Oda, Hisashi Yano, Yutaka Ito, Yasunori Morinaga
  • Publication number: 20180366342
    Abstract: A semiconductor device includes a first interlayer film formed on an upper surface of a substrate, a first metal wiring line, a second interlayer film, a second metal wiring line, a first via electrically connecting the first metal wiring line and the second metal wiring line, a landing pad embedded in an upper portion of the first interlayer film and penetrating the second interlayer film, and a second via penetrating the substrate and the first interlayer film from a back side of the substrate and connected to the landing pad. The lower surface position of the landing pad is different from that of the first metal wiring line.
    Type: Application
    Filed: August 28, 2018
    Publication date: December 20, 2018
    Inventors: Yuka INOUE, Mitsunori FUKURA, Nobuyoshi TAKAHASHI, Masahiro ODA, Hisashi YANO, Yutaka ITO, Yasunori MORINAGA
  • Patent number: 9129875
    Abstract: In a pixel unit of a solid-state imaging device, a semiconductor substrate is provided with a plurality of photodiodes, a first insulating film includes a recess in a portion above each of the photodiodes, a second insulating film embeds the recess, a plurality of color filters is formed on the second insulating film, the color filters each corresponding to one of the photodiodes, a partition is provided between adjacent ones of the color filters, the partition being a part of a third insulating film, and in an area outside of the pixel unit, (i) a conductive film at least partially covered by the third insulating film is formed on the second insulating film, and (ii) the third insulating film formed on the conductive film and on the second insulating film near the conductive film has a film thickness smaller than a film thickness of the partition.
    Type: Grant
    Filed: April 3, 2014
    Date of Patent: September 8, 2015
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hisashi Yano, Shigeru Suzuki, Gen Okazaki, Akira Oodaira, Motonari Katsuno, Tetsuya Nakamura
  • Patent number: 9108161
    Abstract: The present invention provides a water purifier which is easily removable from a drinking water supply apparatus, and has a built-in filtration filter with high efficiency of purifying raw water of a bottle. The water purifier is removable from a drinking water supply apparatus, and the drinking water supply apparatus including a bottle for containing water and a main body which has a recess into which a neck of the bottle is insertable. The water purifier is characterized by being placed between the recess of the main body and the neck of the bottle.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: August 18, 2015
    Assignee: MITSUBISHI RAYON CO., LTD.
    Inventors: Manabu Yanou, Futomitsu Horiuchi, Hisashi Yano
  • Patent number: 9029176
    Abstract: The present invention achieves an optical characteristic exhibiting excellent sensitivity or the like, by increasing the opening dimension of an optical waveguide without changing the interconnection layout, so that the optical waveguide can surely be filled with a film having high refractive index. Pixel portion A of a solid-state imaging device includes photodiode PD formed on a semiconductor substrate; a first insulating film including a concave portion above photodiode PD; and a second insulating film formed on the first insulating film such that the concave portion is filled with the second insulating film. Peripheral circuit portion B of the solid-state imaging device includes an internal interconnection formed in the first insulating film and a pad electrode formed on the internal interconnection to be electrically connected to the internal interconnection. The pad electrode is formed on the second insulating film.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: May 12, 2015
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventor: Hisashi Yano
  • Patent number: 8828886
    Abstract: Disclosed is a low dielectric constant insulating film formed of a polymer containing Si atoms, O atoms, C atoms, and H atoms, which includes straight chain molecules in which a plurality of basic molecules with an SiO structure are linked in a straight chain, binder molecules with an SiO structure linking a plurality of the straight chain molecules. The area ratio of a signal indicating a linear type SiO structure is 49% or more, and the signal amount of the signal indicating Si(CH3) is 66% or more.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: September 9, 2014
    Assignee: Tohoku University
    Inventors: Seiji Samukawa, Shigeo Yasuhara, Shingo Kadomura, Tsutomu Shimayama, Hisashi Yano, Kunitoshi Tajima, Noriaki Matsunaga, Masaki Yoshimaru
  • Publication number: 20140210033
    Abstract: In a pixel unit of a solid-state imaging device, a semiconductor substrate is provided with a plurality of photodiodes, a first insulating film includes a recess in a portion above each of the photodiodes, a second insulating film embeds the recess, a plurality of color filters is formed on the second insulating film, the color filters each corresponding to one of the photodiodes, a partition is provided between adjacent ones of the color filters, the partition being a part of a third insulating film, and in an area outside of the pixel unit, (i) a conductive film at least partially covered by the third insulating film is formed on the second insulating film, and (ii) the third insulating film formed on the conductive film and on the second insulating film near the conductive film has a film thickness smaller than a film thickness of the partition.
    Type: Application
    Filed: April 3, 2014
    Publication date: July 31, 2014
    Applicant: Panasonic Corporation
    Inventors: Hisashi YANO, Shigeru SUZUKI, Gen OKAZAKI, Akira OODAIRA, Motonari KATSUNO, Tetsuya NAKAMURA
  • Patent number: 8438720
    Abstract: A coil component, in which a space on an outer periphery of a winding interposed between a pair of flange portion is coated with a resin with magnetic powder, has a problem of long-term reliability that a thermosetting resin expands and contracts due to change in a temperature and the flange portions are fatigued to be broken. An object of the present invention is to provide the coil component of which core is hardly broken even when the resin with magnetic powder expands and contracts and a method of manufacturing the same.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: May 14, 2013
    Assignee: Toko, Inc.
    Inventors: Keita Muneuchi, Yusuke Kito, Takeo Ohaga, Hisashi Yano
  • Publication number: 20120267742
    Abstract: The present invention achieves an optical characteristic exhibiting excellent sensitivity or the like, by increasing the opening dimension of an optical waveguide without changing the interconnection layout, so that the optical waveguide can surely be filled with a film having high refractive index. Pixel portion A of a solid-state imaging device includes photodiode PD formed on a semiconductor substrate; a first insulating film including a concave portion above photodiode PD; and a second insulating film formed on the first insulating film such that the concave portion is filled with the second insulating film. Peripheral circuit portion B of the solid-state imaging device includes an internal interconnection formed in the first insulating film and a pad electrode formed on the internal interconnection to be electrically connected to the internal interconnection. The pad electrode is formed on the second insulating film.
    Type: Application
    Filed: April 17, 2012
    Publication date: October 25, 2012
    Applicant: PANASONIC CORPORATION
    Inventor: HISASHI YANO
  • Publication number: 20120190212
    Abstract: Disclosed is a low dielectric constant insulating film formed of a polymer containing Si atoms, O atoms, C atoms, and H atoms, which includes straight chain molecules in which a plurality of basic molecules with an SiO structure are linked in a straight chain, binder molecules with an SiO structure linking a plurality of the straight chain molecules. The area ratio of a signal indicating a linear type SiO structure is 49% or more, and the signal amount of the signal indicating Si(CH3) is 66% or more.
    Type: Application
    Filed: April 5, 2012
    Publication date: July 26, 2012
    Inventors: Seiji SAMUKAWA, Shigeo Yasuhara, Shingo Kadomura, Tsutomu Shimayama, Hisashi Yano, Kunitoshi Tajima, Noriaki Matsunaga, Masaki Yoshimaru
  • Publication number: 20110309906
    Abstract: A coil component, in which a space on an outer periphery of a winding interposed between a pair of flange portion is coated with a resin with magnetic powder, has a problem of long-term reliability that a thermosetting resin expands and contracts due to change in a temperature and the flange portions are fatigued to be broken. An object of the present invention is to provide the coil component of which core is hardly broken even when the resin with magnetic powder expands and contracts and a method of manufacturing the same.
    Type: Application
    Filed: May 25, 2011
    Publication date: December 22, 2011
    Inventors: Keita Muneuchi, Yusuke Kito, Takeo Ohaga, Hisashi Yano
  • Patent number: 7892975
    Abstract: A method for selectively forming an electric conductor, the method including disposing a processing target and a metal compound in an atmosphere including a supercritical fluid, the processing target having formed thereon at least one recess for providing an electric conductor, the metal compound including a metal serving as a main component of the electric conductor, and dissolving at least part of the metal compound in the supercritical fluid, selectively introducing the metal compound dissolved in the supercritical fluid into the recess in contact with a surface of the processing target, and coagulating in the recess the metal compound introduced into the recess to precipitate the metal from the metal compound, and coagulating the metal precipitated in the recess, thereby providing the electric conductor in the recess.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: February 22, 2011
    Assignee: Semiconductor Technology Academic Research Center
    Inventors: Eiichi Kondoh, Michiru Hirose, Hitoshi Tanaka, Masayuki Satoh, Hisashi Yano, Masaki Yoshimaru
  • Publication number: 20100112776
    Abstract: A conductor forming apparatus includes a reaction container having housed therein a processing target on a surface of which a recess in which a conductor is to be provided is formed, and a process for providing the conductor in the recess being carried out inside the container after a supercritical fluid dissolved with a metal compound is supplied into the container, a supply device which supplies the fluid from an outside to the inside of the container, and a discharge device which discharges the fluid that is not submitted for the process from the inside to the outside of the container, wherein while an amount of the fluid in the container is adjusted by continuously supplying the fluid into the container by the supply device and continuously discharging the fluid that is not submitted for the process to the outside of the container by the discharge device.
    Type: Application
    Filed: January 11, 2010
    Publication date: May 6, 2010
    Applicant: SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
    Inventors: Eiichi Kondoh, Michiru Hirose, Hitoshi Tanaka, Masayuki Satoh, Hisashi Yano, Masaki Yoshimaru
  • Publication number: 20080233705
    Abstract: A method for selectively forming an electric conductor, the method including disposing a processing target and a metal compound in an atmosphere including a supercritical fluid, the processing target having formed thereon at least one recess for providing an electric conductor, the metal compound including a metal serving as a main component of the electric conductor, and dissolving at least part of the metal compound in the supercritical fluid, selectively introducing the metal compound dissolved in the supercritical fluid into the recess in contact with a surface of the processing target, and coagulating in the recess the metal compound introduced into the recess to precipitate the metal from the metal compound, and coagulating the metal precipitated in the recess, thereby providing the electric conductor in the recess.
    Type: Application
    Filed: March 20, 2007
    Publication date: September 25, 2008
    Applicant: SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
    Inventors: Eiichi Kondoh, Michiru Hirose, Hitoshi Tanaka, Masayuki Satoh, Hisashi Yano, Masaki Yoshimaru
  • Publication number: 20080206949
    Abstract: A conductor forming apparatus includes a reaction container having housed therein a processing target on a surface of which a recess in which a conductor is to be provided is formed, and a process for providing the conductor in the recess being carried out inside the container after a supercritical fluid dissolved with a metal compound is supplied into the container, a supply device which supplies the fluid from an outside to the inside of the container, and a discharge device which discharges the fluid that is not submitted for the process from the inside to the outside of the container, wherein while an amount of the fluid in the container is adjusted by continuously supplying the fluid into the container by the supply device and continuously discharging the fluid that is not submitted for the process to the outside of the container by the discharge device.
    Type: Application
    Filed: August 27, 2007
    Publication date: August 28, 2008
    Applicant: SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
    Inventors: Eiichi Kondoh, Michiru Hirose, Hitoshi Tanaka, Masayuki Satoh, Hisashi Yano, Masaki Yoshimaru
  • Publication number: 20080093709
    Abstract: A semiconductor substrate in a state that an inter-layer insulation film is formed is loaded in a chamber, air in the chamber is purged by introducing a large amount of a nitrogen gas in the chamber, and an atmospheric gas in the chamber is substituted with a nitrogen gas. After that, UV cure is performed by introducing a small amount of an oxygen gas adjusted to an atmospheric pressure or a little more positive pressure in the chamber by nitrogen purge. For the introduction of an oxygen gas, an oxygen gas is introduced while controlling the flow rate by using a flow meter, and adjustment is performed using the flow meter so that the oxygen concentration in the chamber becomes a constant value in the range of 5 ppm to 400 ppm.
    Type: Application
    Filed: October 19, 2007
    Publication date: April 24, 2008
    Inventors: Masazumi Matsuura, Kinya Goto, Hisashi Yano, Kotaro Nomura
  • Publication number: 20080017565
    Abstract: The present invention provides a water purifier which is easily removable from a drinking water supply apparatus, and has a built-in filtration filter with high efficiency of purifying raw water of a bottle. The water purifier is removable from a drinking water supply apparatus, and the drinking water supply apparatus including a bottle for containing water and a main body which has a recess into which a neck of the bottle is insertable. The water purifier is characterized by being placed between the recess of the main body and the neck of the bottle.
    Type: Application
    Filed: May 17, 2005
    Publication date: January 24, 2008
    Applicant: MITSUBISHI RAYON CO., LTD
    Inventors: Manabu Yanou, Futomitsu Horiuchi, Hisashi Yano
  • Publication number: 20070145591
    Abstract: The semiconductor device manufacturing method includes the steps of: applying a first wire including a barrier metal film, a seed film, and a wiring material film in a first wire trench formed in a first interlayer dielectric film; after a second interlayer dielectric film is formed on the first interlayer dielectric film, forming a via hole and a second wire trench in the second interlayer dielectric film so as to expose the wiring material film; applying a barrier metal film on the semiconductor device; and after the barrier metal film on the wiring material film is removed by using, for example, a re-sputtering process, applying a barrier metal film on the wiring material film. The re-sputtering process can remove an oxide film of impurity metal in the seed film applied on the wiring material film.
    Type: Application
    Filed: December 28, 2006
    Publication date: June 28, 2007
    Inventors: Hisashi Yano, Masakazu Hamada, Kazuyoshi Maekawa, Kenichi Mori
  • Publication number: 20070145600
    Abstract: A semiconductor device includes an embedded wire in a first wire trench formed in a first interlayer dielectric film, the embedded wire having a barrier metal, a first seed film, a second seed film, and a copper film. The first seed film is formed by a copper film containing metal, and the second film is formed by a copper film. The second seed film suppresses that the metal contained in the first seed film diffuses into a wiring material film in a manufacturing process.
    Type: Application
    Filed: December 28, 2006
    Publication date: June 28, 2007
    Inventors: Hisashi Yano, Masakazu Hamada, Kazuyoshi Maekawa, Kenichi Mori