Patents by Inventor Hisashi Yano

Hisashi Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7166884
    Abstract: As a method for fabricating a semiconductor device, a lower electrode is first formed on a semiconductor substrate and then a first ferroelectric film is formed on the lower electrode by CVD using a first source gas. Thereafter, a second ferroelectric film is formed on the first ferroelectric film by CVD using a second source gas. Subsequently, an upper electrode is formed on the second ferroelectric film. In this method, the concentration of bismuth contained in the first source gas is different from the concentration of bismuth contained in the second source gas.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: January 23, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hisashi Yano, Shinichiro Hayashi
  • Publication number: 20070015337
    Abstract: A semiconductor device includes a lower electrode having a bend in its cross-section,FIG a capacitor dielectric film of a ferroelectric deposited on the top face of the lower electrode and an upper electrode deposited on the top face of the capacitor dielectric film. The upper electrode is deposited by chemical vapor deposition.
    Type: Application
    Filed: September 27, 2006
    Publication date: January 18, 2007
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Hisashi Yano
  • Publication number: 20060076600
    Abstract: In a method for fabricating a semiconductor device according to the present invention, a groove is formed in a second interlayer insulating film, and then a storage electrode is formed which covers bottom and side surfaces of the groove. A capacitor insulating film is formed on the storage electrode, and a CVD method at a low temperature of 400° C. or lower and annealing with ammonia are repeated to form a TiOxNy film on the capacitor insulating film. A TiN film is formed on the TiOxNy film, and the TiN film is etched using the TiOxNy film as a stopper. The exposed TiOxNy film is then removed to form a plate electrode made of the TiOxNy film and the TiN film.
    Type: Application
    Filed: July 26, 2005
    Publication date: April 13, 2006
    Inventors: Takashi Nakabayashi, Hideyuki Arai, Takashi Ohtsuka, Hisashi Yano
  • Publication number: 20050153462
    Abstract: As a method for fabricating a semiconductor device, a lower electrode is first formed on a semiconductor substrate and then a first ferroelectric film is formed on the lower electrode by CVD using a first source gas. Thereafter, a second ferroelectric film is formed on the first ferroelectric film by CVD using a second source gas. Subsequently, an upper electrode is formed on the second ferroelectric film. In this method, the concentration of bismuth contained in the first source gas is different from the concentration of bismuth contained in the second source gas.
    Type: Application
    Filed: December 28, 2004
    Publication date: July 14, 2005
    Inventors: Hisashi Yano, Shinichiro Hayashi
  • Publication number: 20050127425
    Abstract: A semiconductor device includes a lower electrode having a bend in its cross-section, a capacitor dielectric film of a ferroelectric deposited on the top face of the lower electrode and an upper electrode deposited on the top face of the capacitor dielectric film. The upper electrode is deposited by chemical vapor deposition.
    Type: Application
    Filed: November 17, 2004
    Publication date: June 16, 2005
    Inventor: Hisashi Yano
  • Patent number: 6410408
    Abstract: It is an object of the present invention, when forming a high-density plasma CVD film, to suppress the production of particles, which are the cause of unsatisfactory formation of a micropattern, without causing a drop in productivity, and thus improve the yield of a semiconductor device. For this purpose, a CVD film is formed on a predetermined plurality of semiconductor substrates by repeating, in order, a process #101a in which a plasma CVD film is formed on a semiconductor substrate, and a process #101b in which low-pressure cleaning of the inside of a reaction chamber is performed by way of exhaustion to a first exhaust line on which a turbo pump employed in #101a is placed. In this manner, reactant, which has adhered to the first exhaust line, can be removed during the low-pressure cleaning.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: June 25, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Hisashi Yano
  • Publication number: 20020028566
    Abstract: It is an object of the present invention, when forming a high-density plasma CVD film, to suppress the production of particles, which are the cause of unsatisfactory formation of a micropattern, without causing a drop in productivity, and thus improve the yield of a semiconductor device. For this purpose, a CVD film is formed on a predetermined plurality of semiconductor substrates by repeating, in order, a process #101a in which a plasma CVD film is formed on a semiconductor substrate, and a process #101b in which low-pressure cleaning of the inside of a reaction chamber is performed by way of exhaustion to a first exhaust line on which a turbo pump employed in #101a is placed. In this manner, reactant, which has adhered to the first exhaust line, can be removed during the low-pressure cleaning.
    Type: Application
    Filed: August 30, 2001
    Publication date: March 7, 2002
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventor: Hisashi Yano
  • Patent number: 5688433
    Abstract: The present invention provides a working fluid composition for a refrigerating machine obtained by mixing an ammonia refrigerant with a lubricating oil which is extremely excellent in solubility with the ammonia refrigerant, and a method for lubricating a refrigerating machine suitable for the use of the working fluid composition.The working fluid composition comprises a mixture of ammonia and one or more kinds of polyether compounds represented by the formula (I); the refrigerating machine is characterized by constituting a refrigerating cycle or a heat pump cycle through which the working fluid composition is circulated; and the method for lubricating a refrigerating compressor is characterized by lubricating the ammonia refrigerant compressor with the lubricating oil comprising one or more kinds of ether compounds represented by the formula (I)R.sub.1 --?--O--(PO).sub.m --(EO).sub.n --R.sub.2 !.sub.x (I)wherein R.sub.1 is a hydrocarbon group having 1 to 6 carbon atoms, R.sub.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: November 18, 1997
    Assignees: Japan Energy Corporation, Mayekawa Manufacturing Co., Ltd.
    Inventors: Keisuke Kasahara, Kuniaki Kawamura, Takashi Kaimai, Hisashi Yano
  • Patent number: 5651257
    Abstract: The present invention provides a working fluid composition for a refrigerating machine obtained by mixing an ammonia refrigerant with a lubricating oil which is extremely excellent in solubility with the ammonia refrigerant. The working fluid composition comprises a mixture of ammonia and one or more kinds of polyether compounds; the refrigerating machine is characterized by constituting a refrigerating cycle or a heat pump cycle through which the working fluid composition is circulated.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: July 29, 1997
    Assignee: Japan Energy Corporation & Mayekawa Manufacturing Co. Ltd.
    Inventors: Keisuke Kasahara, Kuniaki Kawamura, Takashi Kaimai, Hisashi Yano
  • Patent number: 5295083
    Abstract: A device for dynamically measuring the bubble content of a flowing liquid is arranged in a conveyance passage for a flowing liquid or provided in a simple bypass for the conveyance passage of the liquid so that the bubble content of the flowing liquid and the bubble quantity of dissolved gas in the flowing liquid can be dynamically measured due to a change in the pressure of the liquid in the passage or the bypass without extracting any of the liquid therefrom.
    Type: Grant
    Filed: November 4, 1991
    Date of Patent: March 15, 1994
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Mitulu Fujioka, Koji Tsuchimoto, Junsuke Yabumoto
  • Patent number: 5114575
    Abstract: An improvement in an oil filter is provided, the oil filter being of the type which comprise a housing opened at one end thereof, a cylindrical first separator unit disposed in the housing for removing solid contaminants from the oil introduced into the housing, and a second separator unit disposed within the first separator unit for removing gaseous contaminants from the oil that has passed through the first separator unit, the second separator unit including a funnel-shaped cyclone defining a chamber arranged to generate a vortical flow of the oil introduced therein to thereby separate gas-rich oil and a removal pipe extending into the chamber along an axial center thereof for discharging the gas-rich oil. The improvement comprises a wall of the cyclone defining the chamber having a lower portion and an upper portion, and a plurality of pores formed in the lower portion for allowing the oil to flow out of the cyclone.
    Type: Grant
    Filed: January 15, 1991
    Date of Patent: May 19, 1992
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto, Ryuzi Kuwavara
  • Patent number: 5085561
    Abstract: A gas removable pump for liquid comprising a housing having an inlet for introducing the liquid thereinto and an outlet for feeding the liquid therefrom, a drive shaft extending into the housing and having formed therein an axial bore, a rotary pump disposed within the housing, and a discharging chamber defined within the housing and separated from the rotary pump in a liquid-tight manner. The rotary pump includes a rotor secured to the drive shaft for co-rotation therewith and a plurality of cells for feeding the liquid, each cell constituting a separator for gas-rich liquid upon rotation of the rotor. A stationary shaft extends in the axial bore between the rotary pump and the discharging chamber. A connecting arrangement is provided in the drive shaft and stationary shaft for selectively connecting each cell with the discharging chamber. Also provided is an injector for ejecting into the discharging chamber the gas-rich liquid separated in the cells through the connecting arrangement.
    Type: Grant
    Filed: December 7, 1990
    Date of Patent: February 4, 1992
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto, Akiharu Kitada
  • Patent number: 5064452
    Abstract: A gas removable pump for liquid comprising a housing having an inlet for introducing the liquid thereinto and an outlet for feeding the liquid therefrom, a drive shaft extending into the housing and a rotary pump disposed within the housing, the rotary pump including a rotor secured to the drive shaft for co-rotation therewith and a plurality of cells for feeding the liquid, each cell constituting a separator for gas-rich liquid upon rotation of the rotor. An ejector is provided for ejecting the gas-rich liquid separated in each cell through a passage formed in the drive shaft and the rotor. Also provided is a valve in the passage for opening and closing the same, the valve being arranged to operate in response to a pressure in the cell. The gas rich liquid gathers at inner portion of the cell due to a centrifugal force and is discharged by means of the ejector through the passage when the valve is in an open position.
    Type: Grant
    Filed: December 13, 1990
    Date of Patent: November 12, 1991
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto, Akiharu Kitada
  • Patent number: 5051072
    Abstract: A gas removable pump for liquid comprising a housing having an inlet for introducing a liquid thereinto and an outlet for feeding the liquid therefrom, a drive shaft extending into the housing, a pump disposed within said housing and secured to the shaft for co-rotatin therewith, the pump dividing in a liquid-tight manner the interior space of the housing into a suction side and a delivery side. A chamber is confined around the shaft within at least one of the suction side and the delivery side of the housing and is arranged to generate a vortical flow of the liquid introduced therein to thereby separate gas-rich liquid which gathers in an axially central portion of the chamber. A collecting space for collecting the liquid containing little gaseous contaminants is provided in at least one of the suction side and the delivery side radially outward of the chamber.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: September 24, 1991
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto, Akiharu Kitada
  • Patent number: 5041990
    Abstract: A method and apparatus measures the gas bubble content of a flowing fluid on a continuous basis without extracting a sample of the fluid. A flowing fluid flows into a density sensor via a temperature and pressure sensor where the temperature, pressure and density of the fluid are determined. As the fluid exits the density sensor, a second pressure sensor determines the pressure of the exiting fluid. The outputs of the sensors are amplified and then input into a data processor. An operating panel supplies required constant data regarding the fluid and gas. The data processor calculates the gas bubble content using the above information in accordance with a predetermined formula.
    Type: Grant
    Filed: October 19, 1989
    Date of Patent: August 20, 1991
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Junsuke Yabumoto, Hisashi Yano
  • Patent number: 5000766
    Abstract: A compact and efficient separator for removing both entrained bubbles and dissolved gases from fluid. Fluid containing gases is introduced tangentially into a vortex flow chamber which is disposed at the suction-side of a pump. The fluid, which is stripped of gaseous contaminants, flows out of the vortex flow chamber while gas-rich fluid collected near center of the chamber passes into a gas removal pipe which is communicated to a suction device.
    Type: Grant
    Filed: August 31, 1989
    Date of Patent: March 19, 1991
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto
  • Patent number: 4997556
    Abstract: An oil filter comprising a housing opened at one end, a first separator unit in the housing for removing solid contaminants from the oil and a second separator unit for removing gaseous contaminants. The first separator unit includes a cylindrical filter element and upper and lower end plates attached to the upper and lower ends of the filter element. The second separator unit is disposed in the space defined by the inner periphery of the filter element and between the upper and lower end plates. It includes a chamber arranged to generate a vortical flow of the oil introduced thereof to thereby separate gas-rich oil which gathers in an axially central portion of the chamber, a first outlet for discharging the gas-rich oil and a second outlet for the oil containing little gaseous contaminants, the first and second outlets extending into the housing from the open end thereof.
    Type: Grant
    Filed: October 11, 1989
    Date of Patent: March 5, 1991
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Hiroyuki Ihara, Junsuke Yabumoto, Ryuzi Kuwavara, Masanori Nishiya
  • Patent number: 4976854
    Abstract: An oil filter comprising a housing opened at one end, a first separator unit in the housing for removing solid contaminants from the oil, a mount block for the housing and a second separator unit for removing gaseous contaminants. The first separator unit comprises a cylindrical filter element defining a central space therein, and the mount block is formed with a recess in which the second separator unit is disposed. The second separator unit includes a chamber arranged to generate a vortical flow in the oil introduced therein to thereby separate gas-rich oil which gathers in an axially central portion of the chamber, means for introducing the oil from the central space to the chamber, a first outlet member for leading the oil containing little gaseous contaminants and a second outlet member for discharging the gas-rich oil.
    Type: Grant
    Filed: October 11, 1989
    Date of Patent: December 11, 1990
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Junsuke Yabumoto, Ryuzi Kuwavara
  • Patent number: 4878924
    Abstract: An integrated and compact separator for removing both solid and gaseous contaminants from engine oil. Oil to be cleaned is introduced tangentially into a vortex flow chamber. Oil stripped of gaseous contaminant passes through pores in the outer wall of the vortex flow chamber into a filter system, while gas-rich oil collected near the center of the chamber passes into a gas removal pipe extending in the chamber at its axial center. After solid contaminant is removed by the filter system, the oil is returned to the engine parts to be lubricated.
    Type: Grant
    Filed: July 22, 1988
    Date of Patent: November 7, 1989
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Hiroyuki Ihara, Junsuke Yabumoto
  • Patent number: 4865632
    Abstract: An integrated and compact separator for removing both solid and gaseous contaminants from fluid. Fluid to be cleaned is introduced tangentially into a vortex flow chamber before or after filtration of the fluid. The fluid stripped of gaseous contaminants passes through pores in the outer wall of the vortex flow chamber while gas-rich fluid collected near the center of the chamber passes into a gas removal pipe extending in the chamber at its axial center. After solid and gaseous contaminants are removed by the separator, the fluid flows out of the separator.
    Type: Grant
    Filed: October 6, 1988
    Date of Patent: September 12, 1989
    Assignee: Mitsubishi Oil Co., Ltd.
    Inventors: Hisashi Yano, Hiroyuki Ihara, Junsuke Yabumoto