Patents by Inventor Hisayuki Kuwahara
Hisayuki Kuwahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11078355Abstract: Provided is a resin composition which is capable of forming a molded body that has excellent surface hardness, transparency, hue and weather resistance, while exhibiting excellent wet heat resistance. A resin composition which contains a (meth)acrylic copolymer (A) and a polycarbonate-based resin (B), and wherein: the (meth)acrylic copolymer (A) contains an aromatic (meth)acrylate unit (a1), a methyl (meth)acrylate unit (a2) and a (meth)acrylate unit (a3) represented by formula (1); the mass ratio (a1)/(a2) is from 5/95 to 85/15; the content of the unit (a3) is 0.1-10 parts by mass relative to 100 parts by mass of the total of the units (a1) and (a2); and the unit (a1) is different from the unit (a3).Type: GrantFiled: September 25, 2017Date of Patent: August 3, 2021Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki Kouno, Hisayuki Kuwahara
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Publication number: 20190203031Abstract: Provided is a resin composition which is capable of forming a molded body that has excellent surface hardness, transparency, hue and weather resistance, while exhibiting excellent wet heat resistance. A resin composition which contains a (meth)acrylic copolymer (A) and a polycarbonate-based resin (B), and wherein: the (meth)acrylic copolymer (A) contains an aromatic (meth)acrylate unit (a1), a methyl (meth)acrylate unit (a2) and a (meth)acrylate unit (a3) represented by formula (1); the mass ratio (a1)/(a2) is from 5/95 to 85/15; the content of the unit (a3) is 0.1-10 parts by mass relative to 100 parts by mass of the total of the units (a1) and (a2); and the unit (a1) is different from the unit (a3).Type: ApplicationFiled: September 25, 2017Publication date: July 4, 2019Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki KOUNO, Hisayuki KUWAHARA
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Patent number: 10273359Abstract: Disclosed is a polyamide resin composition, including: a polyamide (A) containing a diamine unit including 70 mol % or more of a p-xylylenediamine unit and a dicarboxylic acid unit including 70 mol % or more of a linear aliphatic dicarboxylic acid unit having 6 to 18 carbon atoms; and a filler (B), in which the polyamide (A) includes a polyamide having a phosphorus atom concentration of 50 to 1,000 ppm and a YI value of 10 or less in a color difference test in accordance with JIS-K-7105, and a content of the filler (B) is 1 to 200 parts by mass with respect to 100 parts by mass of the polyamide (A).Type: GrantFiled: September 14, 2010Date of Patent: April 30, 2019Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Shun Ogawa, Hisayuki Kuwahara, Shinichi Ayuba, Takahiko Sumino, Kentaro Ishii
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Patent number: 10150865Abstract: According to one embodiment, the present invention provides a resin composition, which comprises a polymer (A) containing 45% by mass or more of a (meth)acrylate unit (a) represented by the following formula (1), a polymer (B) containing 60% by mass or more of a methyl (meth)acrylate unit (b) and having a mass average molecular weight of 5,000 to 20,000, and a polycarbonate-based resin (C).Type: GrantFiled: March 14, 2016Date of Patent: December 11, 2018Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki Kouno, Hisayuki Kuwahara
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Patent number: 10138372Abstract: Provided is a resin composition that, according to one embodiment, contains a (meth)acrylic copolymer (A), a polycarbonate-based resin (B), an ultraviolet absorber (C), and an antioxidant (D), the (meth)acrylic copolymer (A) containing 5-85% by mass of (meth)acrylate units (a) represented by general formula (1) and 15-95% by mass of methyl (meth)acrylate units (b), wherein the resin composition contains 0.1-1.5 parts by mass of (C) and 0.05-1.0 part by mass of (D) per 100 parts by mass of the resin component containing (A) and (B).Type: GrantFiled: December 24, 2015Date of Patent: November 27, 2018Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki Kouno, Hisayuki Kuwahara
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Publication number: 20170327685Abstract: According to one embodiment, the present invention provides a resin composition, which comprises a polymer (A) containing 45% by mass or more of a (meth)acrylate unit (a) represented by the following formula (1), a polymer (B) containing 60% by mass or more of a methyl (meth)acrylate unit (b) and having a mass average molecular weight of 5,000 to 20,000, and a polycarbonate-based resin (C).Type: ApplicationFiled: March 14, 2016Publication date: November 16, 2017Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki KOUNO, Hisayuki KUWAHARA
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Patent number: 9745410Abstract: There are provided a novel aromatic aldehyde compound capable of providing an epoxy resin coating film and an epoxy resin cured material satisfying all of the excellent surface property (smoothness, gloss), drying property, water resistance, transparency and adhesion, and an epoxy resin curing agent and an epoxy resin composition containing the aromatic aldehyde compound. The aromatic aldehyde has a branched alkyl group having 10 to 14 carbon atoms.Type: GrantFiled: May 17, 2013Date of Patent: August 29, 2017Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Mitsuharu Kitamura, Yutaka Matsuura, Hisayuki Kuwahara, Tomotaka Wada, Yuiga Asai
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Publication number: 20170198139Abstract: Provided is a resin composition that, according to one embodiment, contains a (meth)acrylic copolymer (A), a polycarbonate-based resin (B), an ultraviolet absorber (C), and an antioxidant (D), the (meth)acrylic copolymer (A) containing 5-85% by mass of (meth)acrylate units (a) represented by general formula (1) and 15-95% by mass of methyl (meth)acrylate units (b), wherein the resin composition contains 0.1-1.5 parts by mass of (C) and 0.05-1.0 part by mass of (D) per 100 parts by mass of the resin component containing (A) and (B).Type: ApplicationFiled: December 24, 2015Publication date: July 13, 2017Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki KOUNO, Hisayuki KUWAHARA
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Patent number: 9233909Abstract: The present invention relates to a process for producing an amino compound by subjecting a polyamine and an alkenyl compound to addition reaction in the presence of an alkali metal hydride compound which is capable of supplying the amino compound in a stable manner without occurrence of odor.Type: GrantFiled: January 16, 2012Date of Patent: January 12, 2016Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hisayuki Kuwahara, Tomotaka Wada
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Publication number: 20150166726Abstract: A polyamide resin which comprises a diamine unit containing 70 mol % or more of a paraxylylenediamine unit and a dicarboxylic acid unit containing 70 mol % or more of a linear aliphatic dicarboxylic acid unit having from 6 to 18 carbon atoms, and which has a phosphorus atom concentration of from 50 to 1,000 ppm and a YI value of 10 or less in the color difference test in accordance with JIS-K-7105.Type: ApplicationFiled: September 19, 2014Publication date: June 18, 2015Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Shun Ogawa, Shinichi Ayuba, Takahiko Sumino, Hisayuki Kuwahara, Kentaro Ishii
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Publication number: 20150111991Abstract: There are provided a novel aromatic aldehyde compound capable of providing an epoxy resin coating film and an epoxy resin cured material satisfying all of the excellent surface property (smoothness, gloss), drying property, water resistance, transparency and adhesion, and an epoxy resin curing agent and an epoxy resin composition containing the aromatic aldehyde compound. The aromatic aldehyde has a branched alkyl group having 10 to 14 carbon atoms.Type: ApplicationFiled: May 17, 2013Publication date: April 23, 2015Applicant: Mitsubishi Gas Chemical Company, Inc.Inventors: Mitsuharu Kitamura, Yutaka Matsuura, Hisayuki Kuwahara, Tomotaka Wada, Yuiga Asai
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Patent number: 8927647Abstract: A polyamide resin composed of constitutional units derived from a diamine component 70 mol % or more of which is derived from p-xylylenediamine and constitutional unit derived from a dicarboxylic acid 70 mol % or more of which is derived from an aliphatic dicarboxylic acid having 6 to 18 carbon atoms. The polyamide resin has a number average molecular weight (Mn) of 10,000 to 50,000 and a degree of dispersion (weight average molecular weight/number average molecular weight=Mw/Mn) satisfying the following formula (1): 1.5?(Mw/Mn)?6.0, wherein Mw and Mn are determined by gel permeation chromatography (GPC).Type: GrantFiled: September 15, 2009Date of Patent: January 6, 2015Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Tomomichi Kanda, Hisayuki Kuwahara, Shun Ogawa, Takahiko Sumino, Kentaro Ishii
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Patent number: 8841407Abstract: Provided is a polyamide resin having high heat resistance, excellent moldability and excellent mechanical properties. The polyamide resin comprises a diamine unit containing 70 mol % or more of a xylylenediamine unit and a dicarboxylic acid unit containing 70 mol % or more of a straight chain aliphatic dicarboxylic acid unit, wherein the xylylenediamine unit is composed of 50 to 95 mol % of p-xylylenediamine and 50 to 5 mol % of m-xylylenediamine; the straight chain aliphatic dicarboxylic acid unit is composed of 50 to 100 mol % of adipic acid and 0 to less than 50 mol % of sebacic acid or other straight chain aliphatic dicarboxylic acids; the molar ratio of reacted diamine units to reacted dicarboxylic acid units (the number of moles of reacted diamine units/the number of moles of reacted dicarboxylic acid units) is less than 0.994; and the polyamide resin has a number average molecular weight of 10,000 to 25,000 and a melting point of 285° C. or more.Type: GrantFiled: November 8, 2011Date of Patent: September 23, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hatsuki Oguro, Jun Mitadera, Hisayuki Kuwahara
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Patent number: 8835596Abstract: A method of producing polyamide by the direct polycondensation of a diamine component and a dicarboxylic acid component without using a solvent, such as water. The diamine component containing 70 mol % or more of p-xylylenediamine is added to a reaction system containing the dicarboxylic acid component under pressure while maintaining the reaction system in a molten state. After the addition of the diamine component, the pressure of the reaction system is reduced to atmospheric pressure over 50 min or more at a pressure falling speed of 1.0 MPa/h or less. By the production method, polyamide with a small molecular weight dispersion is easily produced.Type: GrantFiled: September 11, 2009Date of Patent: September 16, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hisayuki Kuwahara, Tomomichi Kanda, Shun Ogawa, Shinichi Ayuba, Kentaro Ishii, Takahiko Sumino
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Publication number: 20130303805Abstract: The present invention relates to a process for producing an amino compound by subjecting a polyamine and an alkenyl compound to addition reaction in the presence of an alkali metal hydride compound which is capable of supplying the amino compound in a stable manner without occurrence of odor.Type: ApplicationFiled: January 16, 2012Publication date: November 14, 2013Applicant: Mitsubishi Gas Chemical Company, Inc.Inventors: Hisayuki Kuwahara, Tomotaka Wada
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Publication number: 20130184431Abstract: Provided is a polyamide resin having high heat resistance, excellent moldability and excellent mechanical properties. The polyamide resin comprises a diamine unit containing 70 mol % or more of a xylylenediamine unit and a dicarboxylic acid unit containing 70 mol % or more of a straight chain aliphatic dicarboxylic acid unit, wherein the xylylenediamine unit is composed of 50 to 95 mol % of p-xylylenediamine and 50 to 5 mol % of m-xylylenediamine; the straight chain aliphatic dicarboxylic acid unit is composed of 50 to 100 mol % of adipic acid and 0 to less than 50 mol % of sebacic acid or other straight chain aliphatic dicarboxylic acids; the molar ratio of reacted diamine units to reacted dicarboxylic acid units (the number of moles of reacted diamine units/the number of moles of reacted dicarboxylic acid units) is less than 0.994; and the polyamide resin has a number average molecular weight of 10,000 to 25,000 and a melting point of 285° C. or more.Type: ApplicationFiled: November 8, 2011Publication date: July 18, 2013Applicant: Mitsubishi Gas Chemical Company ,Inc.Inventors: Hatsuki Oguro, Jun Mitadera, Hisayuki Kuwahara
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Patent number: 8440756Abstract: Disclosed is a flame-retardant polyamide resin composition, including: a polyamide (A) containing a diamine unit including 70 mol % or more of a p-xylylenediamine unit and a dicarboxylic acid unit including 70 mol % or more of a linear aliphatic dicarboxylic acid unit having 6 to 18 carbon atoms; an organic halogen compound (B) that serves as a flame retardant; an inorganic compound (C) that serves as a flame retardant aid; and an inorganic filler (D), in which the polyamide (A) includes a polyamide having a phosphorus atom concentration of 50 to 1,000 ppm and a YI value of 10 or less in a color difference test in accordance with JIS-K-7105, and a content of the organic halogen compound (B), a content of the inorganic compound (C), and a content of the inorganic filler (D) are 1 to 100 parts by mass, 0.5 to 50 parts by mass, and 0 to 100 parts by mass, respectively, with respect to 100 parts by mass of the polyamide (A).Type: GrantFiled: September 14, 2010Date of Patent: May 14, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Kentaro Ishii, Hisayuki Kuwahara, Shun Ogawa, Shinichi Ayuba, Takahiko Sumino
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Patent number: 8431653Abstract: The present invention relates to a curing agent composition for epoxy resins comprising (A) a polyamine compound which is a reaction product of a compound having at least one glycidyl group in a molecule with a diamine having a specific structure, (B) a polyether-modified polysiloxane having a surface tension in the range of 19 dyne/cm to 25 dyne/cm and (C) an amino group-modified polysiloxane having a total amine value in the range of 150 mgKOH/g to 650 mgKOH/g which can provide excellent curing performances, excellent performances of epoxy resin cured coating films and excellent physical properties of epoxy resin cured products, an epoxy resin composition comprising said curing agent composition for epoxy resins and an epoxy resin cured product obtained by curing said epoxy resin composition.Type: GrantFiled: December 12, 2006Date of Patent: April 30, 2013Assignee: Mitsubishi Electric Company, Inc.Inventors: Shun Ogawa, Hisayuki Kuwahara
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Patent number: 8394501Abstract: The present invention provides a polyurethane resin composition containing an active hydrogen compound (A) formed by adding m-xylylene diisocyanate and/or hexamethylene diisocyanate to a specific compound (C) at a reaction equivalent ratio ([the number of isocyanate groups]/[the number of hydroxyl groups]) of 0.80 to 0.10; and an organic polyisocyanate compound (B) formed by adding a specific compound (D) to m-xylylene diisocyanate and/or hexamethylene diisocyanate at a reaction equivalent ratio ([the number of isocyanate groups]/[the number of hydroxyl groups]) of 2 to 10; an adhesive and a coating material containing the resin composition; and a multi-layer film and a packaging bag containing any of these.Type: GrantFiled: July 24, 2008Date of Patent: March 12, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Shun Ogawa, Hisayuki Kuwahara, Takeshi Koyama
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Publication number: 20120177937Abstract: Disclosed is a polyamide resin composition, including: a polyamide (A) containing a diamine unit including 70 mol % or more of a p-xylylenediamine unit and a dicarboxylic acid unit including 70 mol % or more of a linear aliphatic dicarboxylic acid unit having 6 to 18 carbon atoms; and a filler (B), in which the polyamide (A) includes a polyamide having a phosphorus atom concentration of 50 to 1,000 ppm and a YI value of 10 or less in a color difference test in accordance with JIS-K-7105, and a content of the filler (B) is 1 to 200 parts by mass with respect to 100 parts by mass of the polyamide (A).Type: ApplicationFiled: September 14, 2010Publication date: July 12, 2012Inventors: Shun Ogawa, Hisayuki Kuwahara, Shinichi Ayuba, Takahiko Sumino, Kentaro Ishii