Patents by Inventor Hitoshi Fukushima

Hitoshi Fukushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050146588
    Abstract: A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.
    Type: Application
    Filed: February 28, 2005
    Publication date: July 7, 2005
    Inventors: Hiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
  • Publication number: 20050079528
    Abstract: Aspects of the invention can provide a method capable of easily realizing immobilization with the optimum density derived from a concentration control and without phase separation in coadsorption of a number of molecules. The immobilization method can include the step of dissolving a plurality of molecules to be immobilized to a solid phase substrate with a solvent to obtain a solution of the plurality of molecules, and the step of incubating the solution and the solid phase substrate in touch therewith. Each of the molecules can include a solid phase substrate joint portion having a jointing property to the solid phase substrate, a functional portion having a specific function, and a linker portion positioned between the solid phase substrate joint portion and the functional portion.
    Type: Application
    Filed: August 27, 2004
    Publication date: April 14, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hiroshi Takiguchi, Hitoshi Fukushima
  • Patent number: 6877853
    Abstract: A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: April 12, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
  • Publication number: 20050063870
    Abstract: Aspects of the invention can be an inexpensive biosensor capable of measuring a number of samples in a short time, and suitable for only one-time use (expendable). The biosensor according to the invention can include a light transmissive substrate, a probe fixing region provided on one face of the light transmissive substrate, a light emitting element provided on the other face of the substrate that irradiates the probe fixing region from the back side thereof, and a light receiving element provided on the other face of the substrate that detects the light intensity of the reflected light from the back side of the probe fixing region. Thereby, a biosensor formed in one substrate can be obtained.
    Type: Application
    Filed: August 5, 2004
    Publication date: March 24, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hitoshi Fukushima, Takayuki Kondo
  • Publication number: 20040248165
    Abstract: A superior adsorption method for immobilizing nucleic acid probe on the surface of a solid phase substrate is provided. A nucleic acid immobilization method for immobilizing nucleic acid on a solid phase substrate comprising: bringing the above-mentioned solid phase substrate into contact with a composition comprising a total concentration of 0.
    Type: Application
    Filed: March 10, 2004
    Publication date: December 9, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hiroshi Takiguchi, Hitoshi Fukushima
  • Publication number: 20040169004
    Abstract: The present invention is a substrate for forming a patterned thin film by causing a specific fluid to adhere. More particularly, this substrate comprises a pattern formation region that is patterned in a specific shape in order to form a film. This pattern formation region is constituted such that an affinity region having an affinity to the fluid is disposed according to specific rules within a non-affinity region not having an affinity to the fluid. The fluid can be uniformly made to adhere to the required region, without spreading out too much or splitting up, allowing a uniform thin film to be formed.
    Type: Application
    Filed: March 10, 2004
    Publication date: September 2, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Sadao Kanbe, Shunichi Seki, Hitoshi Fukushima, Hiroshi Kiguchi
  • Patent number: 6762050
    Abstract: In order to form organic thin films on electrodes, a solution of a material for the organic thin film is accurately printed via an ink-jet onto the surface of microelectrodes as required, thereby producing a high density array of microelectrodes. Further, a solution of a sample substance or a liquid substance to be sensed is ejected into air via an ink-jet nozzle to fall to the surface of organic thin membranes on the microelectrodes so that the sample can be evaluated.
    Type: Grant
    Filed: June 1, 2001
    Date of Patent: July 13, 2004
    Assignees: Seiko Epson Corporation, University Court of the University of Glasgow
    Inventors: Hitoshi Fukushima, Tatsuya Shimoda, Hywel Morgan
  • Patent number: 6733868
    Abstract: The present invention is a substrate for forming a patterned thin film by causing a specific fluid to adhere. More particularly, this substrate comprises a pattern formation region that is patterned in a specific shape in order to form a film. This pattern formation region is constituted such that an affinity region having an affinity to the fluid is disposed according to specific rules within a non-affinity region not having an affinity to the fluid. The fluid can be uniformly made to adhere to the required region, without spreading out too much or splitting up, allowing a uniform thin film to be formed.
    Type: Grant
    Filed: August 2, 2000
    Date of Patent: May 11, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Sadao Kanbe, Shunichi Seki, Hitoshi Fukushima, Hiroshi Kiguchi
  • Publication number: 20040048001
    Abstract: A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.
    Type: Application
    Filed: May 27, 2003
    Publication date: March 11, 2004
    Inventors: Hiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
  • Patent number: 6696225
    Abstract: A method of manufacturing a substrate with a pattern showing hydrophilic property formed on a pattern surface comprising the steps of applying a silane coupling agent to the pattern surface of the base and forming a silane coupling film, forming a mask conforming to the pattern to be provided on the silane coupling film, and activating the silane coupling film provided with the mask by applying energy thereto in order to generate a polar group. In the regions where masking could not be performed, a polar group such as the hydroxyl group, carboxyl group, amino group, or amino carboxyl group is generated and shows hydrophilic property. The masked regions comprise hydrophobic property. This substrate functions as a universal substrate suitable for forming patterns with the inkjet system.
    Type: Grant
    Filed: July 16, 1999
    Date of Patent: February 24, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Sadao Kanbe, Hitoshi Fukushima, Hiroshi Kiguchi, Syunichi Seki
  • Patent number: 6629754
    Abstract: An object of the present invention is to provide a highly reliable ink jet printer head exhibiting a water-repellent property, low deterioration of ink drop ejection performance, and high friction resistance, along with a method of manufacturing this ink jet printer head. According to the present invention, in the case of an ink jet printer head wherein ink drops are ejected from nozzles formed in a nozzle surface, the ink jet printer head has a metal layer comprising metal formed on the nozzle surface and a self-organized film layer consisting of a polycyclic thiol compound formed on a top of the metal layer.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: October 7, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Hitoshi Fukushima, Satoru Miyashita
  • Publication number: 20030180441
    Abstract: The object of this invention is to provide a method by which to form molecule recognizing films on sensor electrodes efficiently, within a short period, uniformly and in a high quality state. Another object of this invention is to provide a method by which to accurately introduce a vast number of biological samples for evaluation to the plural minute sensor electrode dots within a short period and efficiently.
    Type: Application
    Filed: January 24, 2003
    Publication date: September 25, 2003
    Inventors: Hitoshi Fukushima, Tatsuya Shimoda
  • Publication number: 20030170913
    Abstract: The object of this invention is to provide a method by which to form molecule recognizing films on sensor electrodes efficiently, within a short period, uniformly and in a high quality state. Another object of this invention is to provide a method by which to accurately introduce a vast number of biological samples for evaluation to the plural minute sensor electrode dots within a short period and efficiently.
    Type: Application
    Filed: December 11, 2002
    Publication date: September 11, 2003
    Inventors: Hitoshi Fukushima, Tatsuya Shimoda
  • Patent number: 6599582
    Abstract: Provided is a substrate manufacturing technique for forming patterns on substrates with the aid of an ink-jet systems. Relates to a substrate manufacturing apparatus for forming arbitrary patterns on a substrate 1 from a fluid 11. This apparatus comprises an ink-jet print head 2 configured to allow the fluid 11 to be ejected onto the substrate 1; treatment means 3 for performing a specific treatment on the substrate 1; drive means 4 configured to allow the relative positions of the ink-jet print head 2, the treatment means 3, and the substrate 1 to be varied; and control means 5 for controlling the ejection of the fluid 11 from the ink-jet print head 2, the treatment performed by the treatment means 3, and the drive effected by the drive means 4. The control means 5 is configured to allow the treatment by the treatment means to be performed prior to the ejection of fluid from the ink-jet print head 2.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: July 29, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
  • Publication number: 20030032053
    Abstract: The object of this invention is to provide a method by which to form molecule recognizing films on sensor electrodes efficiently, within a short period, uniformly and in a high quality state. Another object of this invention is to provide a method by which to accurately introduce a vast number of biological samples for evaluation to the plural minute sensor electrode dots within a short period and efficiently.
    Type: Application
    Filed: September 30, 1998
    Publication date: February 13, 2003
    Inventors: HITOSHI FUKUSHIMA, TATSUYA SHIMODA, HYWEL MORGAN
  • Publication number: 20030003231
    Abstract: Provided is a substrate manufacturing technique for forming patterns on substrates with the aid of an ink-jet systems. Relates to a substrate manufacturing apparatus for forming arbitrary patterns on a substrate 1 from a fluid 11. This apparatus comprises an ink-jet print head 2 configured to allow the fluid 11 to be ejected onto the substrate 1; treatment means 3 for performing a specific treatment on the substrate 1; drive means 4 configured to allow the relative positions of the ink-jet print head 2, the treatment means 3, and the substrate 1 to be varied; and control means 5 for controlling the ejection of the fluid 11 from the ink-jet print head 2, the treatment performed by the treatment means 3, and the drive effected by the drive means 4. The control means 5 is configured to allow the treatment by the treatment means to be performed prior to the ejection of fluid from the ink-jet print head 2.
    Type: Application
    Filed: January 19, 1999
    Publication date: January 2, 2003
    Inventors: HIROSHI KIGUCHI, HITOSHI FUKUSHIMA, SATOSHI NEBASHI, TATSUYA SHIMODA
  • Publication number: 20020197879
    Abstract: A self-assembled monolayer (SAM) is fabricated using either a semi-fluorinated sulphur containing compound, or a sem-fluorinated silane derivative and compressed carbon dioxide (CO2) as the solvent medium. The temperature and/or pressure of the compressed CO2 may be varied during the fabrication process to improve the molecular packing density of the monolayer.
    Type: Application
    Filed: December 4, 2001
    Publication date: December 26, 2002
    Inventors: Hitoshi Fukushima, Satoru Miyashita, Masaya Ishida, Andrew Holmes, Wilhelm Huck, Christine K. Luscombe
  • Patent number: 6482988
    Abstract: A liquid crystalline sulfur compound exhibiting high anisotropic factor of dipolemoment is provided. A terphenyl skeleton sulfur compound expressed by the general formula (I) is provided. A compound is preferred wherein, in the general formula (I), m is 1, n is 5 to 18, and R3 is an alkyl group wherein the number of carbon atoms is n or fewer than n. A method of synthesisng the terphenyl skeleton sulfur compound wherein, after implementing the synthesizing processes for a methoxy terphenyl derivative, a hydroxy terphenyl derivative, and terphenyl alkyloxy bromide derivative, that bromide derivative and thiourea are caused to react, etc. A self-assembled monolayer made using the terphenyl skeleton sulfur compound noted above is also provided.
    Type: Grant
    Filed: February 23, 2001
    Date of Patent: November 19, 2002
    Assignees: Seiko Epson Corporation, National Institute of Advanced Industrial Science and Technology
    Inventors: Hitoshi Fukushima, Takashi Tamaki
  • Publication number: 20020164419
    Abstract: A self-assembled monolayer (SAM) is fabricated using either a semi-fluorinated sulphur containing compound, or a sem-fluorinated silane derivative and compressed carbon dioxide (CO2) as the solvent medium. The temperature and/or pressure of the compressed CO2 may be varied during the fabrication process to improve the molecular packing density of the monolayer.
    Type: Application
    Filed: December 3, 2001
    Publication date: November 7, 2002
    Inventors: Hitoshi Fukushima, Satoru Miyashita, Masaya Ishida, Andrew Holmes, Wilhelm Huck
  • Patent number: 6336697
    Abstract: This invention relates to a liquid jetting structure which comprises a nozzle or nozzles 11 for jetting a liquid 6. What is characteristic of this liquid jetting structure is that a flow path inside the nozzle or nozzles is set so that the degree of affinity for the liquid 6 to be jetted changes in the direction of liquid flow (140, 130). By controlling the affinity in this way, the liguid getting structure is possible to improve the linearity of advance of the liquid droplets, and to stabilize the liquid droplet diameter. Such a liquid jetting structure is suitable for an ink jet recording head.
    Type: Grant
    Filed: September 28, 1999
    Date of Patent: January 8, 2002
    Assignee: Seiko Epson Corporation
    Inventor: Hitoshi Fukushima