Patents by Inventor Hitoshi Itoh
Hitoshi Itoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10401287Abstract: A lighting device includes: a light emitting device including a plurality of light emitting elements arranged in curve having a first curvature; and a honeycomb member having an extendable and contractible honeycomb structure, arranged in curve having a second curvature larger than the first curvature, in an emission direction of light emitted from the light emitting device.Type: GrantFiled: January 26, 2018Date of Patent: September 3, 2019Assignee: Ricoh Company, Ltd.Inventors: Hitoshi Itoh, Fumihiro Nakashige, Kenji Kobayashi
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Publication number: 20180209904Abstract: Alighting device includes: a light emitting device including a plurality of light emitting elements arranged in curve having a first curvature; and a honeycomb member having an extendable and contractible honeycomb structure, arranged in curve having a second curvature larger than the first curvature, in an emission direction of light emitted from the light emitting device.Type: ApplicationFiled: January 26, 2018Publication date: July 26, 2018Inventors: Hitoshi ITOH, Fumihiro NAKASHIGE, Kenji KOBAYASHI
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Patent number: 9852892Abstract: A microwave supply apparatus includes a waveguide, a circulator, and a matcher, a first port of the circulator receives a microwave from an input end. First and second ends of the waveguide are coupled to second and third ports of the circulator, respectively. The matcher is provided between the input end and the first port of the circulator. The waveguide includes a rectangular waveguide having first and second walls facing each other, and third and fourth walls facing each other. A slot hole is formed in the first wall, and the slot hole is provided at a region deviated to the third wall side. The waveguide includes a first ridge portion provided therein. The first ridge portion faces the slot hole, is in contact with the second wall and third wall, and is separated from the first wall and fourth wall.Type: GrantFiled: June 19, 2017Date of Patent: December 26, 2017Assignees: TOKYO ELECTRON LIMITED, National University Corporation Nagoya UniversityInventors: Hitoshi Itoh, Masaru Hori, Hirotaka Toyoda, Haruka Suzuki, Makoto Sekine
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Publication number: 20170365446Abstract: A microwave supply apparatus includes a waveguide, a circulator, and a matcher, a first port of the circulator receives a microwave from an input end. First and second ends of the waveguide are coupled to second and third ports of the circulator, respectively. The matcher is provided between the input end and the first port of the circulator. The waveguide includes a rectangular waveguide having first and second walls facing each other, and third and fourth walls facing each other. A slot hole is formed in the first wall, and the slot hole is provided at a region deviated to the third wall side. The waveguide includes a first ridge portion provided therein. The first ridge portion faces the slot hole, is in contact with the second wall and third wall, and is separated from the first wall and fourth wall.Type: ApplicationFiled: June 19, 2017Publication date: December 21, 2017Applicants: TOKYO ELECTRON LIMITED, National University Corporation Nagoya UniversityInventors: Hitoshi ITOH, Masaru HORI, Hirotaka TOYODA, Haruka SUZUKI, Makoto SEKINE
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Patent number: 9266146Abstract: A film forming method performs a film forming process on a target object having on a surface thereof an insulating layer. The film forming method includes a first thin film forming step of forming a first thin film containing a first metal, an oxidation step of forming an oxide film by oxidizing the first thin film, and a second thin film forming step of forming a second thin film containing a second metal on the oxide film.Type: GrantFiled: June 24, 2011Date of Patent: February 23, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Kenji Matsumoto, Shigetoshi Hosaka, Hitoshi Itoh
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Patent number: 9252000Abstract: A microwave waveguide apparatus for generating plasma includes a waveguide which has first and second ends and propagates microwave from input end such that the microwave propagates from the first end to the second end, a circulator device having a first port, a second port coupled to the first end, and a third port coupled to the second end, the circulator device being structured such that the microwave is received at the first port, propagates from the second port to the first end, is received at the third port from the second end and is returned toward the input end, and a matching device which is interposed between the input end and the circulator device and reflects part of the microwave received at the third port and returned toward the input end to the first port. The waveguide has a slot-hole extending along the microwave propagation direction in the waveguide.Type: GrantFiled: January 21, 2014Date of Patent: February 2, 2016Assignees: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, TOKYO ELECTRON LIMITEDInventors: Hitoshi Itoh, Yusuke Kubota, Hirotaka Toyoda, Masaru Hori
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Publication number: 20150056381Abstract: A method for forming a conductive film on a substrate includes forming a precursor-containing film on the substrate; and irradiating plasma of a treatment gas to the precursor-containing film by an atmospheric pressure plasma treatment device, removing the organic substances and forming a conductive film from the metallic fine particles or the metallic compounds, the atmospheric pressure plasma treatment device including: a microwave generator, a hollow waveguide, a gas supply device, and an antenna portion configured to discharge to the outside, whereby the treatment gas being converted to plasma by the microwaves, the plasma thus generated being irradiated to the precursor-containing film on the substrate, and a hydrogen radical density of the plasma at a position spaced apart 7 mm from the slot holes being equal to or higher than 2×1014/cm3.Type: ApplicationFiled: February 14, 2013Publication date: February 26, 2015Inventors: Masaru Hori, Hirotaka Toyoda, Makoto Sekine, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yusuke Kubota, Hitoshi Itoh, Hidenori Miyoshi
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Patent number: 8865590Abstract: A film forming method is disclosed in which a thin film comprising manganese is formed on an object to be processed which has, on a surface thereof, an insulating layer constituted of a low-k film and having a recess. The method comprises a hydrophilization step in which the surface of the insulating layer is hydrophilized to make the surface hydrophilic and a thin-film formation step in which a thin film containing manganese is formed on the surface of the hydrophilized insulating layer by performing a film forming process using a manganese-containing material gas on the surface of the hydrophilized insulating layer. Thus, a thin film comprising manganese, e.g., an MnOx film, is effectively formed on the surface of the insulating layer constituted of a low-k film, which has a low dielectric constant.Type: GrantFiled: June 16, 2010Date of Patent: October 21, 2014Assignees: Tokyo Electron Limited, National University Corporation Tohoku UniversityInventors: Kenji Matsumoto, Hitoshi Itoh, Hidenori Miyoshi, Shigetoshi Hosaka, Hiroshi Sato, Koji Neishi, Junichi Koike
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Publication number: 20140251955Abstract: A microwave waveguide apparatus for generating plasma includes a waveguide which has first and second ends and propagates microwave from input end such that the microwave propagates from the first end to the second end, a circulator device having a first port, a second port coupled to the first end, and a third port coupled to the second end, the circulator device being structured such that the microwave is received at the first port, propagates from the second port to the first end, is received at the third port from the second end and is returned toward the input end, and a matching device which is interposed between the input end and the circulator device and reflects part of the microwave received at the third port and returned toward the input end to the first port. The waveguide has a slot-hole extending along the microwave propagation direction in the waveguide.Type: ApplicationFiled: January 21, 2014Publication date: September 11, 2014Applicants: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, TOKYO ELECTRON LIMITEDInventors: Hitoshi Itoh, Yusuke Kubota, Hirotaka Toyoda, Masaru Hori
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Patent number: 8765221Abstract: A film forming method includes a step of arranging a wafer, on which an insulating film is formed, in a processing chamber of a film forming apparatus and a surface modification step of supplying a compound gas containing silicon atoms and an OH group-donating gas into the processing chamber so that Si—OH groups are formed on the surface of the insulating film. The film forming method further includes a film forming step of supplying a film forming gas containing a manganese-containing material into the processing chamber so that a manganese-containing film is formed on the surface of the insulating film on which the Si—OH groups have been formed through a CVD method.Type: GrantFiled: September 14, 2012Date of Patent: July 1, 2014Assignee: Tokyo Electron LimitedInventors: Hidenori Miyoshi, Hitoshi Itoh, Hiroshi Sato
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Patent number: 8724925Abstract: A correction-coefficient calculating unit calculates a correction coefficient to correct misalignment between a first print image and a second print image. A correcting unit corrects the first print image based on the correction coefficient to obtain a corrected first image. A pixel-value determining unit assigns a pixel value based on pixel-value matching state at corresponding positions in the corrected first image and the second print image. An image generating unit generates a misalignment display image from the corrected first image and the second print image that is assigned a predetermined pixel value. An output unit that outputs the misalignment display image.Type: GrantFiled: March 13, 2007Date of Patent: May 13, 2014Assignee: Ricoh Company, Ltd.Inventors: Fumihiro Hasegawa, Hitoshi Itoh, Mitsuyoshi Mineyama
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Patent number: 8634108Abstract: An image inspecting apparatus includes a first light illuminating unit that irradiates a measured object on which an image is formed with illuminating light from a diagonal direction; an imaging unit that receives specular light of the illuminating light with which the measured object is irradiated by the first light illuminating unit; and an image inspecting unit that inspects the image. The image inspecting unit generates gloss reference data from density distribution data included in print data used for forming the image by using a converting unit. The image inspecting unit inspects a gloss distribution of the image by using the gloss reference data and a gloss distribution of the image that is generated based on an amount of the specular light received by the imaging unit.Type: GrantFiled: April 28, 2011Date of Patent: January 21, 2014Assignee: Ricoh Company, Ltd.Inventors: Keiji Kojima, Fumihiro Nakashige, Hitoshi Itoh
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Publication number: 20140008326Abstract: A plasma generation device has a microwave generation device which generates microwave, a waveguide tube having hollow interior and connected to the microwave device such that the tube has longitudinal direction in transmission direction of microwave and rectangular cross section in direction orthogonal to the transmission direction, a phase-shifting device which cyclically shifts phase of standing wave generated in the tube by microwave, and a gas supply device which supplies processing gas into the tube. The tube has antenna portion having one or more slot holes which release plasma generated by microwave to the outside, the slot hole is formed on wall forming short or long side of the antenna portion, and the tube plasmatizes the gas in atmospheric pressure state supplied into the tube by the microwave in the slot hole and releases the plasma to the outside from the slot hole.Type: ApplicationFiled: September 10, 2013Publication date: January 9, 2014Applicants: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, TOKYO ELECTRON LIMITEDInventors: Hirotaka TOYODA, Masaru Hori, Makoto Sekine, Keigo Takeda, Hidenori Miyoshi, Hitoshi Itoh, Yusuke Kubota
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Patent number: 8619278Abstract: A printed matter examination apparatus includes a master data acquiring unit configured to acquire master data that is data for printing and contains code information that is converted for printing; a code information acquiring unit configured to acquire unconverted code information; a code information recognition unit configured to recognize the converted code information from the acquired master data; and a code information examination unit configured to compare the converted code information recognized by the code information recognition unit with the acquired unconverted code information and determine that the converted code information is incorrect when the converted code information is not identical to the unconverted code information.Type: GrantFiled: November 19, 2010Date of Patent: December 31, 2013Assignee: Ricoh Company, LimitedInventors: Keiji Kojima, Hitoshi Itoh
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Publication number: 20130344703Abstract: In a film forming method, a coating composition containing film components is coated on a plastic substrate to form a coating film. By irradiating electromagnetic waves to the coating film, the coating film is dried and/or modified to form a film. The film can be a conductor film, a semi-conductor film or a dielectric film. When forming a conductor film, a coating composition containing metallic nanoparticles is used as the coating composition; when forming a semi-conductor film, an organic semi-conductor material is used as the coating composition; and when forming a dielectric film, an organic dielectric material is used as the coating composition.Type: ApplicationFiled: August 23, 2013Publication date: December 26, 2013Applicant: TOKYO ELECTRON LIMITEDInventors: Masahiro SHIMIZU, Hitoshi Itoh
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Patent number: 8610353Abstract: An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.Type: GrantFiled: September 2, 2011Date of Patent: December 17, 2013Assignees: Tokyo Electron Limited, National University Corporation Nagoya UniversityInventors: Hitoshi Itoh, Hidenori Miyoshi, Masaru Hori, Hirotaka Toyoda, Makoto Sekine
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Patent number: 8587844Abstract: An image inspecting apparatus includes a first light illuminating unit irradiating a measured object on which an image is formed with light from an inclined direction; a second light illuminating unit irradiating the measured object with light from a different direction; an imaging unit receiving reflected light of the light with which the measured object is irradiated by the first light illuminating unit and the second light illuminating unit; a first and a second reference plate having a mirror surface and a diffuse surface, respectively; and an image inspecting unit inspecting a gloss distribution of the image based on the amount of light received by the imaging unit and a correcting coefficient.Type: GrantFiled: May 27, 2011Date of Patent: November 19, 2013Assignee: Ricoh Company, Ltd.Inventors: Hitoshi Itoh, Fumihiro Nakashige, Keiji Kojima
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Patent number: 8562751Abstract: A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with ?-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and ?-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to ?-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.Type: GrantFiled: January 17, 2012Date of Patent: October 22, 2013Assignees: Tokyo Electron Limited, Central Glass Company, LimitedInventors: Isao Gunji, Yusaku Izawa, Hitoshi Itoh, Tomonori Umezaki, Yuta Takeda, Isamu Mori
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Patent number: 8551565Abstract: Disclosed is a film forming method including the steps of: producing a monovalent carboxylic acid metal salt gas by reacting a bivalent carboxylic acid metal salt with a carboxylic acid; supplying the monovalent carboxylic acid metal salt gas on a substrate to accumulate a monovalent carboxylic acid metal salt film; and decomposing the monovalent carboxylic acid metal salt film by supplying energy to the substrate formed with the monovalent carboxylic acid metal salt film so as to form a metallic film.Type: GrantFiled: December 25, 2008Date of Patent: October 8, 2013Assignee: Tokyo Electron LimitedInventors: Isao Gunji, Hidenori Miyoshi, Hitoshi Itoh
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Patent number: 8537421Abstract: An image processing apparatus includes a scanning unit configured to scan at least one of two surfaces of a printed material on both of which information is printed and to obtain a density image representing intensity distribution of diffuse reflection light from the scanned surface and a gloss image representing intensity distribution of specular reflection light from the scanned surface, a mask image generating unit configured to generate a mask image for the scanned surface based on the obtained gloss image, and a show-through removing unit configured to perform mask processing on the density image using the generated mask image to generate a show-through-removed image that does not include show-through information for the scanned surface.Type: GrantFiled: October 14, 2011Date of Patent: September 17, 2013Assignee: Ricoh Company, Ltd.Inventors: Hitoshi Itoh, Fumihiro Nakashige, Keiji Kojima