Patents by Inventor Hitoshi Kasai

Hitoshi Kasai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080219910
    Abstract: Manufacture at lower cost of off-axis GaN single-crystal freestanding substrates having a crystal orientation that is displaced from (0001) instead of (0001) exact. With an off-axis (111) GaAs wafer as a starting substrate, GaN is vapor-deposited onto the starting substrate, which grows GaN crystal that is inclined at the same off-axis angle and in the same direction as is the starting substrate. Misoriented freestanding GaN substrates may be manufactured, utilizing a misoriented (111) GaAs baseplate as a starting substrate, by forming onto the starting substrate a mask having a plurality of apertures, depositing through the mask a GaN single-crystal layer, and then removing the starting substrate. The manufacture of GaN crystal having a misorientation of 0.1° to 25° is made possible.
    Type: Application
    Filed: May 16, 2008
    Publication date: September 11, 2008
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Hitoshi Kasai, Kensaku Motoki
  • Publication number: 20080169483
    Abstract: There is provided a method of producing a thin GaN film-joined substrate, including the steps of: joining on a GaN bulk crystalline body a substrate different in type or chemical composition from GaN; and dividing the GaN bulk crystalline body at a plane having a distance of at least 0.1 ?m and at most 100 ?m from an interface thereof with the substrate different in type, to provide a thin film of GaN on the substrate different in type, wherein the GaN bulk crystalline body had a surface joined to the substrate different in type, that has a maximum surface roughness Rmax of at most 20 ?m. Thus a GaN-based semiconductor device including a thin GaN film-joined substrate including a substrate different in type and a thin film of GaN joined firmly on the substrate different in type, and at least one GaN-based semiconductor layer deposited on the thin film of GaN, can be fabricated at low cost.
    Type: Application
    Filed: June 28, 2007
    Publication date: July 17, 2008
    Inventors: Hitoshi Kasai, Akihiro Hachigo, Yoshiki Miura, Katsushi Akita
  • Patent number: 7396560
    Abstract: A method for preparation of inorganic fine particle-organic crystal hybrid fine particle comprising; pouring an organic material having ?-conjugated bond as a water soluble solution into aqueous dispersion in which inorganic fine particles of 50 nm or less selected from the compound group consisting of metal fine particles, semi-conductor fine particles, fine particles of inorganic fluorescent material and fine particle of inorganic luminescent material, are dispersed, co-precipitating said inorganic fine particle which forms a core into said organic material which forms a shell in said dispersion and forming shell of fine crystal of said organic material on the surface of the core of said inorganic fine particles of 50 nm or less by controlling the size of said inorganic fine particle and by controlling the adding amount of said organic material.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: July 8, 2008
    Assignee: Japan Science and Technology Agency
    Inventors: Hachiro Nakanishi, Hidetoshi Oikawa, Shuji Okada, Hitoshi Kasai
  • Publication number: 20070280872
    Abstract: The GaN facet growth method produces defect accumulating regions H on masks by forming a dotmask or a stripemask on an undersubstrate, growing GaN in a reaction furnace in vapor phase, inducing GaN crystals on exposed parts without covering the masks, inviting facets starting from verges of the masks and producing defect accumulating regions H on the mask. The defect accumulating regions H have four versions, that is, non (O), polycrystal (P), c-axis inclining single crystal (A) and orientation inversion (J). The best is the orientation inversion region (J). A sign of occurrence of the orientation inversion regions (J) is beaks of inversion orientation appearing on facets. GaN is grown on a masked undersubstrate by supplying a carbon material at a hydrocarbon partial pressure of 10 Pa to 5 kPa for 0.5 hour to 2 hour by an HVPE facet growth method without burying facets.
    Type: Application
    Filed: June 5, 2007
    Publication date: December 6, 2007
    Inventors: Takuji Okahisa, Kensaku Motoki, Koji Uematsu, Seiji Nakahata, Ryu Hirota, Hideyuki Ijiri, Hitoshi Kasai, Shunsuke Fujita, Fumitaka Sato, Toru Matsuoka
  • Publication number: 20070228400
    Abstract: A GaN crystal substrate has a crystal growth surface on which a crystal is grown, and a rear surface opposite to the crystal growth surface. The crystal growth surface has a roughness Ra(C)of at most 10 nm, and the rear surface has a roughness Ra(R) of at least 0.5 ?and at most 10 ?m. A ratio Ra(R)/Ra(C) of the surface roughness Ra(R) to the surface roughness Ra(C) is at least 50. Thus, a GaN crystal substrate of which front and rear surfaces are distinguishable from each other is provided, without impairing the morphology of a semiconductor layer grown on the GaN crystal substrate.
    Type: Application
    Filed: April 3, 2007
    Publication date: October 4, 2007
    Inventors: Shunsuke Fujita, Hitoshi Kasai
  • Publication number: 20070148920
    Abstract: A fabrication method of a group III nitride crystal substance includes the steps of cleaning the interior of a reaction chamber by introducing HCl gas into the reaction chamber, and vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber. A fabrication apparatus of a group III nitride crystal substance includes a configuration to introduce HCl gas into the reaction chamber, and a configuration to grow a group III nitride crystal substance by HVPE. Thus, a fabrication method of a group III nitride crystal substance including the method of effectively cleaning deposits adhering inside the reaction chamber during crystal growth, and a fabrication apparatus employed in the fabrication method are provided.
    Type: Application
    Filed: December 22, 2006
    Publication date: June 28, 2007
    Inventors: Hitoshi Kasai, Takuji Okahisa, Shunsuke Fujita, Naoki Matsumoto, Hideyuki Ijiri, Fumitaka Sato, Kensaku Motoki, Seiji Nakahata, Koji Uematsu, Ryu Hirota
  • Publication number: 20070086949
    Abstract: This invention provides nanocrystals or polymer doped nanocrystals of hydrophobic organic fluorescent dyes as stable dispersions in an aqueous system. The dispersions can be prepared without stabilizers such as surfactants and the like. The aqueous dispersions of the nanocrystals or the polymer doped nanocrystals can be used for bioimaging.
    Type: Application
    Filed: June 20, 2006
    Publication date: April 19, 2007
    Inventors: Paras Prasad, Koichi Baba, Haridas Pudavar, Indrajit Roy, Tymish Ohulchanskyy, Hachiro Nakanishi, Akito Masuhara, Hitoshi Kasai
  • Patent number: 7192477
    Abstract: The process for producing highly concentrated nanometer-size fine particles of an organic pigment, which comprises dissolving the organic pigment in an amide solvent, especially an organic solvent comprising at least 50 vol % 1-methyl-2-pyrrodinone, and pouring the resultant organic pigment solution with stirring into a poor solvent which is not compatible with the organic pigment. The pigment may be a quinacridone pigment, phthalocyanine pigment etc. Any atmospheric pressure to a sub-critical and/or supercritical state can be employed as the production conditions.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: March 20, 2007
    Assignee: Japan Science and Technology Agency
    Inventors: Hachiro Nakanishi, Koich Baba, Hitoshi Kasai, Hidetoshi Oikawa, Shuji Oikawa
  • Publication number: 20060293425
    Abstract: A rewritable photomemory material obtained by combining a polymer possessing a carbonyl group in a main chain or a side chain with a function-imparting component such as a compound which produces rare earth ions is disclosed. The magnitude of fluorescence level of the rewritable phtomemory material can be intensified by light irradiation, while an initial state can be recovered by a heat treatment. Fine particle materials imparted with functions such as fluorescence characteristics, magnetic characteristics, coloration or non-linear characteristics are also disclosed, and particularly a fine particle material imparted with heat resistance through combination with polyimide is disclosed.
    Type: Application
    Filed: February 26, 2004
    Publication date: December 28, 2006
    Applicant: Japan Science and Technology Agency
    Inventors: Hachiro Nakanishi, Hitoshi Kasai, Takayuki Ishizaka
  • Publication number: 20060107793
    Abstract: A method for concentration of fine particles dispersed in a dispersion into an ionic liquid comprising, adding an ionic liquid, especially an organic ionic liquid at ordinary temperature, e.g., a salt of 1-butyl-3-methylimidazolium with PF6? to a dilute dispersion of fine particles so as to concentrate the fine particles into the ionic liquid.
    Type: Application
    Filed: August 4, 2003
    Publication date: May 25, 2006
    Inventors: Chiaki Yokoyama, Hitoshi Kasai, Eiji Sarashina, Hiroshi Inomata, Hachiro Nakanishi
  • Publication number: 20060076298
    Abstract: The process for producing highly concentrated nanometer-size fine particles of an organic pigment, which comprises dissolving the organic pigment in an amide solvent, especially an organic solvent comprising at least 50 vol % 1-methyl-2-pyrrodinone, and pouring the resultant organic pigment solution with stirring into a poor solvent which is not compatible with the organic pigment. The pigment may be a quinacridone pigment, phthalocyanine pigment etc. Any atmospheric pressure to a sub-critical and/or supercritical state can be employed as the production conditions.
    Type: Application
    Filed: April 2, 2003
    Publication date: April 13, 2006
    Inventors: Hachiro Nakanishi, Koichi Baba, Hitoshi Kasai, Hidetoshi Oikawa, Shuji Okada
  • Publication number: 20060039984
    Abstract: A method for preparation of porous polyimide microparticles comprising, forming polyamide acid microparticles by pouring polymer solution prepared by dissolving polyamide acid containing 0.5 to 80 weight % of alkali metal salt to polyamide acid by 0.1 to 15 weight % concentration into a poor solvent selected from the group consisting of aliphatic solvents, alicyclic solvents, aromatic solvents, CS2 and mixture of two or more these solvents and the temperature of which is adjusted to the range from ?20° C. to 60° C., wherein particle size of said polyamide acid microparticles is adjusted to 50 nm to 10000 nm by controlling the temperature of said poor solvent, pore size of said polyamide acid microparticles is adjusted to the range from 20 nm to 500 nm and porosity of said polyamide acid microparticles is adjusted to the range from 0.
    Type: Application
    Filed: July 9, 2003
    Publication date: February 23, 2006
    Inventors: Hachiro Nakanishi, Hitoshi Kasai, Hirohiko Miura, Hidetoshi Oikawa, Shuji Okada
  • Publication number: 20050208687
    Abstract: Manufacture at lower cost of off-axis GaN single-crystal freestanding substrates having a crystal orientation that is displaced from (0001) instead of (0001) exact. With an off-axis (111) GaAs wafer as a starting substrate, GaN is vapor-deposited onto the starting substrate, which grows GaN crystal that is inclined at the same off-axis angle and in the same direction as is the starting substrate. Misoriented freestanding GaN substrates may be manufactured, utilizing a misoriented (111) GaAs baseplate as a starting substrate, by forming onto the starting substrate a mask having a plurality of apertures, depositing through the mask a GaN single-crystal layer, and then removing the starting substrate. The manufacture of GaN crystal having a misorientation of 0.1° to 25° is made possible.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Hitoshi Kasai, Kensaku Motoki
  • Patent number: 6818053
    Abstract: The method for preparation quinacridone pigment nanocrystals with sub micrometer to nanometer in average size comprising, supplying supercritical or semi-critical liquid, which dissolves quinacridone pigment, into a specimen tube (ST) composing a reactor possessing a filter of desired opening to the upper stream side and to the down stream side in which quinacridone pigment is set up, flowing out the supercritical or semi-critical liquid in which quinacridone pigment is dissolved from said reactor to a mixing apparatus to which coolant is supplied, and by selecting the kind of supercritical of semi-critical liquid and combination of conditions e.g. supplying speed of each liquids, temperature of the liquid and the reacting pressure.
    Type: Grant
    Filed: March 13, 2003
    Date of Patent: November 16, 2004
    Assignee: Japan Science and Technology Corporation
    Inventors: Hitoshi Kasai, Hachiro Nakanishi, Kunio Arai
  • Patent number: 6468882
    Abstract: GaN single crystal substrates are produced by slicing a GaN single crystal ingot in the planes parallel to the growing direction. Penetration dislocations which have been generated in the growing direction extend mainly in the bulk of the GaN substrate. A few of the threading dislocations appear on the surface of the GaN substrate. GaN substrates of low-dislocation density are obtained.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: October 22, 2002
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kensaku Motoki, Hitoshi Kasai, Takuji Okahisa
  • Publication number: 20020028564
    Abstract: GaN single crystal substrates are produced by slicing a GaN single crystal ingot in the planes parallel to the growing direction. Penetration dislocations which have been generated in the growing direction extend mainly in the bulk of the GaN substrate. A few of the threading dislocations appear on the surface of the GaN substrate. GaN substrates of low-dislocation density are obtained.
    Type: Application
    Filed: July 10, 2001
    Publication date: March 7, 2002
    Inventors: Kensaku Motoki, Hitoshi Kasai, Takuji Okahisa
  • Patent number: 5043895
    Abstract: A method of controlling the gear changing operation in an automatic transmission having a gear transmission actuatable by a gear changing actuator assembly controlled by an electronic control system. When operating the gear changing actuator assembly for a gear changing operation, an interval of time, which elapses after the gear changing actuator assembly is operated, is measured with a timer. The measured interval of time is compared with a preset interval of time. When a lock is detected as being caused at the time the gear changing operation is not completed within the preset interval of time, the gear changing actuator assembly is operated to a gear position different from a gear position which the gear changing actuator assembly has originally been operated to select.
    Type: Grant
    Filed: July 5, 1989
    Date of Patent: August 27, 1991
    Assignees: Izuzu Motors Limited, Fujitsu Limited
    Inventors: Toshihiro Hattori, Jyunzo Kuroyanagi, Yasuyoshi Asagi, Hitoshi Kasai
  • Patent number: 4979117
    Abstract: Herein disclosed is a method of processing a malfunction of an accelerator pedal sensor of an automobile. An output voltage is outputted according to changes in a resistance depending upon depression of an accelerator pedal. A malfunction of the accelerator pedal sensor is shot to process and determine an acceleration value for controlling the run of the automobile in accordance with said output voltage. The acceleration value is set at a predetermined value in accordance with the malfunction of either of an idle switch for generating a signal indicating the idle position of the accelerator pedal and a wide-open switch for generating a signal indicating the wide open position of the accelerator pedal when the malfunction of the accelerator pedal sensor is judged. This judgement is conducted by detecting a plurality of times that said output voltage is outside of the predetermined voltage range.
    Type: Grant
    Filed: September 5, 1989
    Date of Patent: December 18, 1990
    Assignee: Isuzu Motors, Limited
    Inventors: Toshihiro Hattori, Masaki Ishihara, Hitoshi Kasai, Shigeki Moride
  • Patent number: 4858131
    Abstract: A clutch target position control system of an engine includes a clutch actuator for controlling a clutch stroke, a sensor for detecting a parameter corresponding to an accelerator pedal depression amount, an engine revolution sensor for detecting a revolution speed of the engine and an input shaft revolution sensor for detecting a revolution speed of the input shaft. The disclosed system utilizes the steps of: reading clutch engagement amounts from map tables of registered data corresponding to each of the sensors, the detected signals from each sensor being converted into and used as address signals; calculating a total of three read clutch engagement amounts; and controlling the clutch actuator to control the actual clutch engagement amount on the basis of the calculated total amount.
    Type: Grant
    Filed: August 28, 1987
    Date of Patent: August 15, 1989
    Assignee: Fujitsu Limited
    Inventors: Toshiya Sugimura, Hitoshi Kasai, Hiroshi Yoshimura
  • Patent number: 4843555
    Abstract: Herein disclosed is a signal processing system for a motor vehicle with high responsiveness to the will of a driver. The output voltage of an acceleration sensor using a potentiometer is converted into a digital value by an analog-digital converter. The nonlinearity of the output voltage is corrected by polynominally calculating the digital value. This digital value is controlled by a central processing unit which processes the digital value to generate an acceleration signal having a linear relationship to the changes in the resistance of the potentiometer during actuation of an accelerator. The central processing unit further includes a memory for storing the acceleration signal at an idling position to determine a calibrated acceleration signal using a ratio of an actual acceleration signal obtained from the accelerator pedal to the stored value thereof.
    Type: Grant
    Filed: September 16, 1987
    Date of Patent: June 27, 1989
    Assignees: Isuzu Motors Limited, Fujitsu Limited
    Inventors: Toshihiro Hattori, Masaki Ishihara, Hitoshi Kasai, Yasuyoshi Asagi