Patents by Inventor Hitoshi KUNITAKE

Hitoshi KUNITAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220375521
    Abstract: A computer system with a small circuit area and reduced power consumption is used. The computer system includes a computer node including a processor and a three-dimensional NAND memory device. The three-dimensional NAND memory device includes a first string and a second string in different blocks. The first string includes a first memory cell, and the second string includes a second memory cell. On reception of first data and a signal including an instruction to write the first data, the controller writes the first data to the first memory cell. Then, the controller reads the first data from the first memory cell and writes the first data to the second memory cell. Thus, the computer node can eliminate a main memory such as a DRAM from the structure.
    Type: Application
    Filed: November 9, 2020
    Publication date: November 24, 2022
    Inventors: Shunpei YAMAZAKI, Takayuki IKEDA, Hitoshi KUNITAKE
  • Publication number: 20220375529
    Abstract: A low-power memory device in which a NAND flash memory and a controller are connected to each other with a short wiring, the controller and a cache memory are connected to each other with a short wiring, and signal transmission delay is small is provided. For example, the NAND flash memory is formed using a Si transistor formed with a single crystal silicon substrate. Since an OS transistor can be formed by a method such as a thin-film method, the cache memory formed using the OS memory can be stacked over the NAND flash memory. When the NAND flash memory and the cache memory are formed in one chip, the NAND flash memory and the controller can be connected to each other with a short wiring, and the controller and the cache memory can be connected to each other with a short wiring.
    Type: Application
    Filed: October 16, 2020
    Publication date: November 24, 2022
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei YAMAZAKI, Takayuki IKEDA, Hitoshi KUNITAKE
  • Publication number: 20220350571
    Abstract: A novel information processing device with least signal transmission delay and low power consumption is provided. A storage device includes a first layer, a second layer, and a third layer. The first layer is provided with a circuit. The second layer is provided with a memory cell portion. The third layer is provided with a first electrode. The circuit has a function of switching and performing reading or writing of first data or second data from or to the memory cell portion. At least part of the second layer is stacked above the first layer. At least part of the third layer is stacked above the second layer. An arithmetic device includes a fourth layer and a fifth layer. The fourth layer is provided with a central processing device. The fifth layer is provided with a second electrode. At least part of the fifth layer is stacked above the fourth layer. The circuit is electrically connected to the central processing device through the first electrode and the second electrode.
    Type: Application
    Filed: November 25, 2020
    Publication date: November 3, 2022
    Inventors: Shunpei YAMAZAKI, Takayuki IKEDA, Tatsuya ONUKI, Hitoshi KUNITAKE
  • Publication number: 20220352865
    Abstract: An amplifier is formed in a wiring layer. A semiconductor device includes a second layer over a first layer with a metal oxide therebetween. The first layer includes a first transistor including a first semiconductor layer containing silicon. The second layer includes an impedance matching circuit, and the impedance matching circuit includes a second transistor including a second semiconductor layer containing gallium. The first transistor forms first coupling capacitance between the first transistor and the metal oxide, and the impedance matching circuit forms second coupling capacitance between the impedance matching circuit and the metal oxide. The impedance matching circuit is electrically connected to the metal oxide through the second coupling capacitance. The metal oxide inhibits the influence of first radiation noise emitted from the impedance matching circuit on the operation of the first transistor.
    Type: Application
    Filed: October 5, 2020
    Publication date: November 3, 2022
    Inventors: Kazuaki OHSHIMA, Hitoshi KUNITAKE, Yuto YAKUBO, Takayuki IKEDA
  • Publication number: 20220345095
    Abstract: A semiconductor device is provided in which power consumption is reduced and an increase in circuit area is inhibited. The semiconductor device includes a high frequency amplifier circuit, an envelope detection circuit, and a power supply circuit. The power supply circuit has a function of supplying a power supply potential to the high frequency amplifier circuit, an output of the high frequency amplifier circuit is connected to the envelope detection circuit, and an output of the envelope detection circuit is connected to the power supply circuit. The power supply circuit can reduce the power consumption by changing the power supply potential in accordance with the output of the high frequency amplifier circuit. The use of an OS transistor in the envelope detection circuit can inhibit an increase in circuit area.
    Type: Application
    Filed: June 16, 2020
    Publication date: October 27, 2022
    Inventors: Hitoshi KUNITAKE, Takayuki IKEDA, Kiyoshi KATO, Yuichi YANAGISAWA, Shota MIZUKAMI, Kazuki TSUDA
  • Publication number: 20220344334
    Abstract: A memory device with large storage capacity is provided. A NAND memory device includes a plurality of connected memory cells each provided with a writing transistor, a reading transistor, and a capacitor. An oxide semiconductor is used in a semiconductor layer of the writing transistor. The reading transistor includes a back gate. When a reading voltage is applied to the back gate, information stored in the memory cell is read out.
    Type: Application
    Filed: September 25, 2020
    Publication date: October 27, 2022
    Inventors: Satoru OHSHITA, Hitoshi KUNITAKE, Kazuki TSUDA
  • Publication number: 20220328516
    Abstract: A semiconductor device with high storage capacity is provided. The semiconductor device includes first to sixth insulators, first to third conductors, and first to third material layers. The first conductor overlaps with a first insulator and a first material layer. A first region of the first material layer overlaps with a second material layer, a second conductor, a second insulator, and a third insulator. The third material layer is positioned in a region including a second region of the first material layer and top surfaces of the second material layer, the second conductor, the second insulator, and the third insulator; a fourth insulator is positioned over the third material layer; the sixth insulator is positioned over the fourth insulator; and a fifth insulator is positioned over the sixth insulator. The third conductor is positioned over the fifth insulator overlapping with the second region of the first material layer.
    Type: Application
    Filed: September 15, 2020
    Publication date: October 13, 2022
    Inventors: Shunpei YAMAZAKI, Hajime KIMURA, Hitoshi KUNITAKE
  • Publication number: 20220328487
    Abstract: A semiconductor device with a novel structure is provided. One embodiment of the present invention is a semiconductor device including a memory module. The memory module includes a first memory cell, a first wiring, and a second wiring and a third wiring that include a metal oxide. The first memory cell includes a read transistor and a rewrite transistor. The first wiring includes a region functioning as a back gate of the read transistor and a region where the second wiring functions as a conductor. The second wiring includes a region functioning as a channel formation region of the read transistor, a region functioning as a back gate of the rewrite transistor, and a region where the third wiring functions as a conductor. The third wiring includes a region functioning as a channel formation region of the rewrite transistor and a region functioning as a conductor.
    Type: Application
    Filed: August 17, 2020
    Publication date: October 13, 2022
    Inventors: Hajime KIMURA, Tatsuya ONUKI, Hitoshi KUNITAKE
  • Publication number: 20220320330
    Abstract: A matching circuit which can handle a plurality of frequencies is provided. The matching circuit includes a transistor and an inductor. The matching circuit uses capacitance formed between a gate and a source/drain (referred to as capacitance Cgsd below) of the transistor as a condenser. The capacitance Cgsd changes with the voltage of the gate with respect to the source (referred to as voltage Vgs below). The transistor included in the matching circuit is an OS transistor including a metal oxide in a channel formation region. The OS transistor features larger variation in capacitance Cgsd with respect to the voltage Vgs than the MOSFET that uses silicon, which enables the matching circuit to handle alternating-current signals in a wide frequency range.
    Type: Application
    Filed: May 25, 2020
    Publication date: October 6, 2022
    Inventors: Hitoshi KUNITAKE, Kazuaki OHSHIMA
  • Publication number: 20220310148
    Abstract: To provide a semiconductor device with a novel structure. The semiconductor device includes a plurality of constant current circuits each given a digital signal. The constant current circuits each include a first transistor to a third transistor. The first transistor has a function of making a first current corresponding to set analog potential flow therethrough. The second transistor has a function of controlling the first current flowing between a source and a drain of the first transistor, in response to the digital signal. The third transistor has a function of holding the analog potential supplied to a gate of the first transistor, by being turned off. The first transistor to the third transistor each include a semiconductor layer including an oxide semiconductor in a channel formation region.
    Type: Application
    Filed: June 30, 2020
    Publication date: September 29, 2022
    Inventors: Takayuki IKEDA, Hitoshi KUNITAKE
  • Publication number: 20220302312
    Abstract: A semiconductor device that can be miniaturized or highly integrated is provided. The semiconductor device includes a first insulator; a first oxide over the first insulator; a second oxide over the first oxide; a first conductor, a second conductor, a third oxide, a fourth oxide, and a second insulator over the second oxide; a third insulator over the first conductor, the second conductor, the third oxide, and the fourth oxide; a fourth insulator over the second insulator; and a third conductor over the fourth insulator. The second insulator is positioned between the first conductor and the second conductor. The third oxide is positioned between the first conductor and the second insulator. The fourth oxide is positioned between the second conductor and the second insulator. The thickness of the third oxide between the first conductor and the second insulator is greater than or equal to 3 nm and less than or equal to 8 nm.
    Type: Application
    Filed: September 7, 2020
    Publication date: September 22, 2022
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hitoshi Kunitake, Yuichi YANAGISAWA, Shota MIZUKAMI, Kazuki TSUDA, Haruyuki BABA, Shunpei YAMAZAKI
  • Publication number: 20220293603
    Abstract: A semiconductor device that occupies a small area is provided. The semiconductor device includes a first transistor including a first oxide semiconductor; a second transistor including a second oxide semiconductor; a capacitor element; a first insulator; and a first conductor in contact with a source or a drain of the second transistor. The capacitor element includes a second conductor, a third conductor, and a second insulator. The first transistor, the second transistor, and the first conductor are placed to be embedded in the first insulator. The second conductor is placed in contact with a top surface of the first conductor and a top surface of a gate of the first transistor. The second insulator is placed over the second conductor and the first insulator. The third conductor is placed to cover the second conductor with the second insulator therebetween.
    Type: Application
    Filed: August 26, 2020
    Publication date: September 15, 2022
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hitoshi Kunitake, Tatsuya ONUKI, Hajime KIMURA, Takayuki IKEDA, Shunpei YAMAZAKI
  • Publication number: 20220285560
    Abstract: A transistor whose characteristic degradation due to stray light is small is provided. The transistor includes a first insulator, a second insulator over the first insulator, a metal oxide over the second insulator, a first and a second conductor over the metal oxide, a third insulator over the first insulator, the second insulator, the metal oxide, the first conductor, and the second conductor, a fourth insulator over the metal oxide, a fifth insulator over the fourth insulator, and a third conductor over the fifth insulator. The third insulator has an opening to overlap with a region between the first conductor and the second conductor. The fourth insulator, the fifth insulator, and the third conductor are positioned in the opening. The metal oxide has a bandgap greater than or equal to 3.3 eV. The transistor has Vsh higher than or equal to ?0.3 V.
    Type: Application
    Filed: February 24, 2022
    Publication date: September 8, 2022
    Inventors: Hitoshi KUNITAKE, Yasuhiro JINBO, Naoki OKUNO, Masahiro TAKAHASHI, Tomonori NAKAYAMA
  • Publication number: 20220278139
    Abstract: A display device with a novel structure is provided. The display device includes a first substrate provided with a plurality of pixels including a display element, and a second substrate including a first conductive layer provided with a plurality of first openings. The first conductive layer has a function of an antenna capable of transmitting and receiving a radio signal. The pixel and the first opening include a region where the pixel and the first opening overlap with each other. The second substrate includes an element layer. The element layer includes a transistor. The transistor has a function of an amplifier capable of amplifying the radio signal. The transistor each includes a semiconductor layer including a metal oxide in a channel formation region. The metal oxide contains In, Ga, and Zn.
    Type: Application
    Filed: July 10, 2020
    Publication date: September 1, 2022
    Inventors: Takayuki IKEDA, Hitoshi KUNITAKE, Koji KUSUNOKI, Yoshiaki OIKAWA, Shunpei YAMAZAKI
  • Patent number: 11430791
    Abstract: A semiconductor device capable of obtaining the threshold voltage of a transistor is provided. The semiconductor device includes a first transistor, a first capacitor, a first output terminal, a first switch, and a second switch. A gate and a source of the first transistor are electrically connected to each other. A first terminal of the first capacitor is electrically connected to the source. A second terminal and the first output terminal of the first capacitor are electrically connected to a back gate of the first transistor. The first switch controls input of a first voltage to the back gate. A second voltage is input to a drain of the first transistor. The second switch controls input of a third voltage to the source.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: August 30, 2022
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hitoshi Kunitake, Ryunosuke Honda, Tomoaki Atsumi
  • Publication number: 20220271669
    Abstract: A semiconductor device in which an increase in circuit area is inhibited is provided. The semiconductor device includes a first circuit layer and a second circuit layer over the first circuit layer; the first circuit layer includes a first transistor; the second circuit layer includes a second transistor; a gate of the second transistor is electrically connected to one of a source and a drain of the first transistor; a source and a drain of the second transistor are electrically connected to the other of the source and the drain of the first transistor; and a semiconductor layer of the second transistor contains a metal oxide.
    Type: Application
    Filed: May 19, 2020
    Publication date: August 25, 2022
    Inventors: Yuto YAKUBO, Hitoshi KUNITAKE, Takayuki IKEDA
  • Publication number: 20220262858
    Abstract: A highly reliable memory device is provided. On a side surface of a first conductor extending in a first direction, a first insulator, a first semiconductor, a second insulator, a second semiconductor, and a third insulator are provided in this order when seen from the first conductor side. A first region overlapping with a second conductor with the first insulator, the first semiconductor, the second insulator, the second semiconductor, and the third insulator therebetween, and a second region overlapping with a third conductor with the first insulator, the first semiconductor, the second insulator, the second semiconductor, and the third insulator therebetween are provided in the first conductor. In the second region, a fourth conductor is provided between the first insulator and the first semiconductor.
    Type: Application
    Filed: July 31, 2020
    Publication date: August 18, 2022
    Inventors: Shunpei YAMAZAKI, Hajime KIMURA, Takanori MATSUZAKI, Tatsuya ONUKI, Yuki OKAMOTO, Hideki UOCHI, Satoru OKAMOTO, Hiromichi GODO, Kazuki TSUDA, Hitoshi KUNITAKE
  • Publication number: 20220255579
    Abstract: A communication device capable of transmitting and receiving high-potential signals is provided. The communication device includes a duplexer including first to fourth transistors, a transmission terminal, a reception terminal, an antenna terminal, and first and second control terminals. The transmission terminal is electrically connected to one of a source and a drain of each of the first and second transistors. The reception terminal is electrically connected to one of a source and a drain of each of the third and fourth transistors. The antenna terminal is electrically connected to the other of the source and the drain of each of the second and fourth transistors. The first control terminal is electrically connected to gates of the second and third transistors. The second control terminal is electrically connected to gates of the first and fourth transistors. A semiconductor of each of the first to fourth transistors contains a metal oxide.
    Type: Application
    Filed: June 3, 2020
    Publication date: August 11, 2022
    Inventors: Takayuki IKEDA, Hitoshi KUNITAKE
  • Patent number: 11410716
    Abstract: A novel storage device and a novel semiconductor device are provided. In the storage device, a cell array including a plurality of memory cells is stacked above a control circuit, and the cell array operates separately in a plurality of blocks. Furthermore, a plurality of electrodes are included between the control circuit and the cell array. The electrode is provided for a corresponding block to overlap with the block, and a potential of the electrode can be changed for each block. The electrode has a function of aback gate of a transistor included in the memory cell, and a potential of the electrode is changed for each block, whereby the electrical characteristics of the transistor included in the memory cell can be changed. Moreover, the electrode can reduce noise caused in the control circuit.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: August 9, 2022
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kiyoshi Kato, Tomoaki Atsumi, Shuhei Nagatsuka, Hitoshi Kunitake
  • Publication number: 20220246615
    Abstract: A semiconductor device in which temperature dependence is reduced is provided. A switched capacitor is formed using a second transistor, a third transistor, and a second capacitor. Semiconductor layers of the second transistor and the third transistor that include an oxide can reduce temperature dependence. An AC signal supplied to the gates of the second transistor and the third transistor is converted into a DC voltage through the switched capacitor. Note that the level of the DC voltage is adjusted by the levels of the voltages supplied to the back gates of the second transistor and the third transistor.
    Type: Application
    Filed: May 19, 2020
    Publication date: August 4, 2022
    Inventors: Kazuaki OHSHIMA, Hitoshi KUNITAKE, Takahiro FUKUTOME