Patents by Inventor Hitoshi Masuda

Hitoshi Masuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of selective separation and concentration of gallium and/or indium from solutions containing low levels of them and high levels of other metal ions
    Patent number: 4517096
    Abstract: A novel method is disclosed which enables gallium and/or indium to be selectively separated and concentrated from a solution containing them in very low concentrations together with many other metal ions in rather high concentrations. The solution is passed through a bed of a chelating ion exchange resin having an amino carboxylic acid group either immediately or after the pH adjustment. Gallium and/or indium adsorbed on the chelate resin is desorbed by eluting with a mineral acid. The eluate, after the pH adjustment, is passed through another bed of a chelating ion exchange resin having an amino carboxylic acid group, and the resin is treated with a mineral acid to elute the metal ions adsorbed on the resin to thereby recover gallium and/or indium in the form of a concentrated solution.
    Type: Grant
    Filed: April 4, 1984
    Date of Patent: May 14, 1985
    Assignees: Dowa Mining Co., Ltd., Unitika, Ltd.
    Inventors: Kunio Sekine, Hitoshi Masuda, Kodo Ishibashi, Masahide Hirai, Shozo Tomoshige, Kozo Kondo