Patents by Inventor Hitoshi Nakai
Hitoshi Nakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190027383Abstract: Pure water, a mixed solution, and an organic solvent are applied to a substrate in this order. The organic solvent is then removed by rotation. The mixed solution is a mixture of pure water and the organic solvent, and has a surface tension lower than that of the pure water. Since the mixed solution has a solubility in pure water, which is higher than that of the organic solvent, local drying on the upper surface becomes less likely at an interface between the mixed solution and the pure water, which suppresses collapse of pattern elements. Since the temperature of the substrate is raised by the mixed solution having a temperature higher than room temperature, it is possible to reduce the time required for a process related to drying.Type: ApplicationFiled: January 24, 2017Publication date: January 24, 2019Inventors: Hitoshi NAKAI, Koji ANDO
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Publication number: 20180301357Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.Type: ApplicationFiled: June 19, 2018Publication date: October 18, 2018Inventors: Hitoshi NAKAI, Yasuhiko OHASHI
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Publication number: 20180301356Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.Type: ApplicationFiled: June 19, 2018Publication date: October 18, 2018Inventors: Hitoshi Nakai, Yasuhiko Ohashi
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Publication number: 20180301358Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.Type: ApplicationFiled: June 19, 2018Publication date: October 18, 2018Inventors: Hitoshi NAKAI, Yasuhiko OHASHI
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Patent number: 10103020Abstract: A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, a processing liquid supply part for supplying a processing liquid onto the substrate, a cup part for receiving the processing liquid spattering from the substrate being rotated, by its inner peripheral surface, a top plate disposed above the substrate, and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as the substrate does, on the inner peripheral surface of the cup part, by supplying a liquid onto an upper surface of the top plate rotating in the same direction as the substrate rotates, in parallel with a processing of the substrate with the processing liquid. It is possible to prevent droplets caused by collision of the processing liquid spattering from the substrate against the cup part from being deposited on the substrate.Type: GrantFiled: March 3, 2015Date of Patent: October 16, 2018Assignee: SCREEN Holdings Co., Ltd.Inventor: Hitoshi Nakai
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Patent number: 10026627Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.Type: GrantFiled: December 19, 2016Date of Patent: July 17, 2018Assignee: SCREEN Holdings Co., Ltd.Inventors: Hitoshi Nakai, Yasuhiko Ohashi
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Patent number: 9997380Abstract: In a substrate processing apparatus, a chamber bottom has a plurality of large chamber exhaust ports arranged in a circumferential direction. A cup rotation mechanism rotates a cup part so that a cup exhaust port selectively overlaps with one of the large chamber exhaust ports. With the cup exhaust port overlapping with one large chamber exhaust port, the gas in the cup part is discharged to the outside of the chamber via a first exhaust mechanism. With the cup exhaust port overlapping with another large chamber exhaust port, the gas in cup part is discharged to the outside of the chamber via a second exhaust mechanism. By rotating the cup part in the chamber via the cup rotation mechanism, the substrate processing apparatus can easily switch the exhaust mechanism for exhausting gas from the cup part.Type: GrantFiled: December 22, 2014Date of Patent: June 12, 2018Assignee: SCREEN Holdings Co., Ltd.Inventor: Hitoshi Nakai
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Publication number: 20180012778Abstract: In a substrate processing apparatus, a cup part is moved in an up-down direction to cause a cup exhaust port to selectively overlap a first chamber exhaust port or a second chamber exhaust port. In the state in which the cup exhaust port overlaps the first chamber exhaust port, gas in the cup part is discharged through the cup exhaust port and the first chamber exhaust port by a first exhaust mechanism. In the state in which the cup exhaust port overlaps the second chamber exhaust port, the gas in the cup part is discharged through the cup exhaust port and the second chamber exhaust port by a second exhaust mechanism. In this way, an exhaust mechanism for exhausting gas from the cup part can be easily switched between the first exhaust mechanism and the second exhaust mechanism.Type: ApplicationFiled: January 7, 2016Publication date: January 11, 2018Inventor: Hitoshi NAKAI
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Publication number: 20170098538Abstract: A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, a processing liquid supply part for supplying a processing liquid onto the substrate, a cup part for receiving the processing liquid spattering from the substrate being rotated, by its inner peripheral surface, a top plate disposed above the substrate, and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as the substrate does, on the inner peripheral surface of the cup part, by supplying a liquid onto an upper surface of the top plate rotating in the same direction as the substrate rotates, in parallel with a processing of the substrate with the processing liquid. It is possible to prevent droplets caused by collision of the processing liquid spattering from the substrate against the cup part from being deposited on the substrate.Type: ApplicationFiled: March 3, 2015Publication date: April 6, 2017Inventor: Hitoshi NAKAI
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Publication number: 20170098553Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.Type: ApplicationFiled: December 19, 2016Publication date: April 6, 2017Inventors: Hitoshi NAKAI, Yasuhiko OHASHI
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Patent number: 9555437Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.Type: GrantFiled: August 19, 2013Date of Patent: January 31, 2017Assignee: SCREEN Holdings Co., Ltd.Inventors: Hitoshi Nakai, Yasuhiko Ohashi
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Publication number: 20160329220Abstract: In a substrate processing apparatus, a chamber bottom has a plurality of large chamber exhaust ports arranged in a circumferential direction. A cup rotation mechanism rotates a cup part so that a cup exhaust port selectively overlaps with one of the large chamber exhaust ports. With the cup exhaust port overlapping with one large chamber exhaust port, the gas in the cup part is discharged to the outside of the chamber via a first exhaust mechanism. With the cup exhaust port overlapping with another large chamber exhaust port, the gas in cup part is discharged to the outside of the chamber via a second exhaust mechanism. By rotating the cup part in the chamber via the cup rotation mechanism, the substrate processing apparatus can easily switch the exhaust mechanism for exhausting gas from the cup part.Type: ApplicationFiled: December 22, 2014Publication date: November 10, 2016Inventor: Hitoshi NAKAI
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Patent number: 9452361Abstract: A network game system includes a game server in which a plurality of players respectively operating a plurality of portable communication terminals are registered in advance. When any one of the players logs in the game server through a communication network, a game is supplied to the portable communication terminal of the player. A game screen is shown on a display, and both characters in the course of logging-in and logging out are displayed on the game screen. If the player selects the logging-out character, a selection signal is transmitted to the game server. The game server transmits a log-in operation request to the portable communication terminal of the player operating the selected character.Type: GrantFiled: June 18, 2004Date of Patent: September 27, 2016Assignee: Nintendo Co., Ltd.Inventor: Hitoshi Nakai
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Publication number: 20160023108Abstract: A network game system includes a game server in which a plurality of players respectively operating a plurality of portable communication terminals are registered in advance. When any one of the players logs in the game server through a communication network, a game is supplied to the portable communication terminal of the player. A game screen is shown on a display, and both characters in the course of logging-in and logging out are displayed on the game screen. If the player selects the logging-out character, a selection signal is transmitted to the game server. The game server transmits a log-in operation request to the portable communication terminal of the player operating the selected character.Type: ApplicationFiled: October 7, 2015Publication date: January 28, 2016Inventor: Hitoshi NAKAI
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Publication number: 20140060423Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.Type: ApplicationFiled: August 19, 2013Publication date: March 6, 2014Applicant: DAINIPPON SCREEN MFG. CO., LTD.Inventors: Hitoshi NAKAI, Yasuhiko OHASHI
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Patent number: 7396237Abstract: A first recessed portion shaped so as to be open toward an outer periphery of a substrate is disposed on the substrate, and a conductive pattern is provided on an edge portion of the first recessed portion. A connector mounted on the substrate includes a body and terminals which are surface-mounted on the substrate and protrude from the body. The connector is mounted on the substrate such that a bottom of the terminals is positioned higher than a bottom of the body by a predetermined height. The connector is mounted on the substrate such that the body is disposed in the first recessed portion and the terminals contact the conductive pattern on the substrate.Type: GrantFiled: October 24, 2006Date of Patent: July 8, 2008Assignee: Nintendo Co., Ltd.Inventors: Tomoyuki Sakiyama, Masato Kuwahara, Hitoshi Nakai
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Publication number: 20070149010Abstract: A first recessed portion shaped so as to be open toward an outer periphery of a substrate is disposed on the substrate, and a conductive pattern is provided on an edge portion of the first recessed portion. A connector mounted on the substrate includes a body and terminals which are surface-mounted on the substrate and protrude from the body. The connector is mounted on the substrate such that a bottom of the terminals is positioned higher than a bottom of the body by a predetermined height. The connector is mounted on the substrate such that the body is disposed in the first recessed portion and the terminals contact the conductive pattern on the substrate.Type: ApplicationFiled: October 24, 2006Publication date: June 28, 2007Applicant: NINTENDO CO., LTD.Inventors: Tomoyuki Sakiyama, Masato Kuwahara, Hitoshi Nakai
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Patent number: 7007536Abstract: A synchronizer sleeve adapted for use in a gear synchronizer mechanism of a power transmission, the synchronizer sleeve being formed at its inner periphery with inner spline teeth for meshing engagement to be meshed with a clutch gear of a change-speed gear train and inner spline teeth for synchronization positioned among the inner spline teeth for meshing engagement in a circumferential direction to be meshed with a synchronizer ring, wherein the inner spline teeth for meshing engagement and for synchronization are provided respectively at their one ends with a pair of chamfer surfaces formed by plastic deformation in a press-process, and wherein the inner spline teeth for synchronization are formed shorter in axial length than the inner spline teeth for meshing engagement. In the synchronizer sleeve, a ridge of each pair of the chamfer surfaces and an intersection of each of the chamfer surfaces and each tooth flank of the inner spline teeth are rounded off by plastic deformation in the press-process.Type: GrantFiled: August 14, 2003Date of Patent: March 7, 2006Assignee: Aisin Ai Co., Ltd.Inventor: Hitoshi Nakai
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Publication number: 20040224774Abstract: A network game system includes a game server in which a plurality of players respectively operating a plurality of portable communication terminals are registered in advance. When any one of the players logs in the game server through a communication network, a game is supplied to the portable communication terminal of the player. A game screen is shown on a display, and both characters in the course of logging-in and logging out are displayed on the game screen. If the player selects the logging-out character, a selection signal is transmitted to the game server. The game server transmits a log-in operation request to the portable communication terminal of the player operating the selected character.Type: ApplicationFiled: June 18, 2004Publication date: November 11, 2004Applicant: Nintendo Co., Ltd.Inventor: Hitoshi Nakai
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Patent number: D535617Type: GrantFiled: November 10, 2004Date of Patent: January 23, 2007Assignees: Nintendo Co., Ltd., Hosiden CorporationInventors: Kazuo Yoneyama, Hitoshi Nakai, Mitsuhiro Asano