Patents by Inventor Hitoshi Oka

Hitoshi Oka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7729692
    Abstract: There is provided an inspection system capable of easily performing inspection of a radio section under an actual environment and enabling a user to easily identify a trouble. In this system, an analysis/display device (400) analyzes the data outputted from an inspection device (200, 300) and extracts a radio parameter. By using the radio parameter extracted from the data obtained by inspection of a cabled section, an inspection device (100) inspects the state of radio communication between a communication terminal device (50) and abase station device (150). The analysis/display device (400) aligns the cabled message and the radio message obtained by analyzing the data outputted from the inspection devices (100, 200, 300) in time series or in sequence of calls and displays them.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: June 1, 2010
    Assignees: Panasonic Corporation, Agilent Technologies, Inc.
    Inventors: Hitoshi Oka, Yukinori Amao, Yojiro Hiranuma, Taiji Katsube
  • Publication number: 20100077673
    Abstract: To improve the endurance of the antiloading effect of an antiloading composition for an abrasive article. The antiloading composition for an abrasive article, comprising a metal salt of a fatty acid and a binding resin, wherein a coating formed therefrom has wetting tension of more than 44 mN/m.
    Type: Application
    Filed: March 25, 2008
    Publication date: April 1, 2010
    Inventors: Hitoshi Oka, Satoru Takinami
  • Publication number: 20080191708
    Abstract: There is provided an inspection system capable of easily performing inspection of a radio section under an actual environment and enabling a user to easily identify a trouble. In this system, an analysis/display device (400) analyzes the data outputted from an inspection device (200, 300) and extracts a radio parameter. By using the radio parameter extracted from the data obtained by inspection of a cabled section, an inspection device (100) inspects the state of radio communication between a communication terminal device (50) and abase station device (150). The analysis/display device (400) aligns the cabled message and the radio message obtained by analyzing the data outputted from the inspection devices (100, 200, 300) in time series or in sequence of calls and displays them.
    Type: Application
    Filed: April 28, 2005
    Publication date: August 14, 2008
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Hitoshi Oka, Yukinori Amao, Yojiro Hiranuma, Taiji Katsube
  • Publication number: 20080081546
    Abstract: The present disclosure is directed to a dust vacuuming abrasive tool comprising an abrasive sheet material having an abrasive surface, a back surface and 20 or more perforations; and a backup pad having a support surface, a back surface and 20 or more perforations, or a plurality of perforations and also having, in the supporting surface. The configuration of the abrasive sheet and back-up pad eliminate the need to align perforations in the abrasive sheet and back-up pad.
    Type: Application
    Filed: September 28, 2007
    Publication date: April 3, 2008
    Inventors: SATORU TAKINAMI, HITOSHI OKA
  • Publication number: 20070257228
    Abstract: A piezoelectric ceramics having ceramic particles, wherein said ceramic particles comprises bismuth layer compound containing at least Sr, Ln (note that Ln is a lanthanoid element), Bi, Ti and O and including MIIBi4Ti4O15 type crystal (MII is an element composed of Sr and Ln) as a main component, and an oxide of Mn as a subcomponent; and an average particle diameter by the code length measuring method is 0.8 to 4.7 ?m: by which it is possible to provide piezoelectric ceramics having a large Qmax in a third harmonic mode of thickness vertical vibration in a relatively high frequency band (for example, 16 to 65 MHz), a resonator an other piezoelectric element comprising the piezoelectric ceramics as a piezoelectric substance thereof.
    Type: Application
    Filed: December 3, 2004
    Publication date: November 8, 2007
    Inventors: Takeo Tsukada, Tomohisa Azuma, Masakazu Hirose, Hitoshi Oka
  • Publication number: 20070243803
    Abstract: An abrasive tool for collecting dust, comprising: an abrasive material in sheet form having not less than 20 dust collecting holes; and a backup pad, including: a base material having a first major surface, a second major surface opposite to the first major surface, and at least one hole for collecting dust penetrating through the first major surface and the second major surface; and a ventilative member connected to the first major surface of the base material, having an attaching surface to which the abrasive material is attached, and a plurality of holes extending from the attaching surface towards the first major surface of the base material; the ventilative member working jointly with the base material and making dust flow out from the attaching surface to the second major surface of the base material.
    Type: Application
    Filed: April 6, 2007
    Publication date: October 18, 2007
    Inventors: HITOSHI OKA, SATORU TAKINAMI
  • Publication number: 20060016128
    Abstract: To determine what fine structure of the surface on which antiloading agents are applied performs the function of antiloading agents sufficiently. An abrasive material having an antiloading coating on an outermost surface thereof, in which the antiloading coating contains an antiloading agent and a binding resin, the binding resin is formed into a film with cracks, and a reticulate fine structure is formed on an entire surface of the antiloading coating by the cracks.
    Type: Application
    Filed: June 24, 2005
    Publication date: January 26, 2006
    Inventor: Hitoshi Oka
  • Patent number: 6551522
    Abstract: Piezoelectric ceramics include a bismuth layer compound containing MII, Bi, Ti, Ln and O, wherein MII represents at least one element selected from the group consisting of Sr, Ba and Ca, and Ln represents at least one element selected from the group consisting of lanthanoids. The piezoelectric ceramics include MIIBi4Ti4O15 typed crystals, and a mole ratio of Ln/(Ln+MII) is 0<Ln/(Ln+MII)<0.5. In the case where MII is Sr, a mole ratio of 4Bi/Ti is 4.000<4Bi/Ti≦4.030. Preferably, piezoelectric ceramics further include Y oxide.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: April 22, 2003
    Assignee: TDK Corporation
    Inventors: Masakazu Hirose, Takeo Tsukada, Hitoshi Oka, Junji Terauchi
  • Patent number: 6539959
    Abstract: At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which are caused by an amount of charged electricity of the plate-like part, chuck pins (chuck members) 201 which chuck the plate-like part 1 such as the wafer or the like and upper and lower cleaning plates 101 and 121 which oppose to the plate-like part 1 are constituted by a resin material containing carbon powders, and a desired potential difference is applied to a portion between the plate-like part and the cleaning plates by a voltage control unit 601 which is provided in an outer portion.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: April 1, 2003
    Assignees: Hitachi, Ltd., Kokusai Electronic Co., Ltd.
    Inventors: Noriyuki Ohroku, Yuichirou Tanaka, Yoichi Takahara, Tomonori Saeki, Susumu Aiuchi, Hitoshi Oka, Fumio Morita, Masataka Fujiki, Akinobu Yamaoka
  • Patent number: 6461532
    Abstract: A piezoelectric ceramic material comprising a bismuth layer compound containing MII, Bi, Ti and O wherein MII is selected from Sr, Ba and Ca, and containing MIIBi4Ti4O15 type crystals, wherein MII, is represented by SrxBayCaz wherein x+y+z=1, utilizes thickness shear vibration when 0≦x≦ 1, 0≦y≦0.9, and 0≦z≦1, and thickness extensional vibration when 0≦x<0.9, 0≦y≦0.9, and 0≦z<1. Also provided is a piezoelectric ceramic material comprising a bismuth layer compound containing Ca, Bi, Ti, Ln and 0 wherein Ln is a lanthanoid, and containing CaBi4Ti4O15 type crystals, wherein the atomic ratio Ln/(Ln+Ca) is in the range: 0<Ln/(Ln+Ca)<0.5. These piezoelectric ceramic materials are free of lead, and have a high Curie point and improved piezoelectric characteristics.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: October 8, 2002
    Assignee: TDK Corporation
    Inventors: Hitoshi Oka, Masakazu Hirose, Yasuo Watanabe, Junji Terauchi
  • Patent number: 6443168
    Abstract: The fluid treatment apparatus, as disclosed, comprises upper and lower Bernoulli-plates 12 and 14, each of which includes a metal plate 25 provided on overall outer surface thereof. On each of the metal plates 25, there is arranged a spiral-shaped circulating pipe 24 through which a heating medium or a cooling medium are circulated so as to rapidly heat or cool the upper and lower Bernoulli-plates. During the treatment of a wafer 16 by the apparatus, the upper and lower Bernoulli-plates are disposed in parallel with each other to define a narrow gap therebetween while a clearance between the wafer 16 and the upper Bernoulli-plate and a clearance between the wafer 16 and the lower Bernoulli-plate are kept to be equal to each other. Thus, the present invention can achieve various purpose such as a time saving for the cleaning, reduction of consumption of the cleaning liquid and inhibition of cleaning irregularity.
    Type: Grant
    Filed: May 30, 2000
    Date of Patent: September 3, 2002
    Assignees: Hitachi Kokusai Electric Inc., Hitachi, Ltd.
    Inventors: Fumio Morita, Masataka Fujiki, Hitoshi Oka, Noriyuki Oroku, Yuichirou Tanaka
  • Patent number: 6431190
    Abstract: To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid. A retention member for the object to be processed 18 that retains the object to be processed 17 and a rear shielding plate 15 that prevents the rear surface of the object to be processed from becoming contaminated by excessive fluid flow are mechanically separated. The rear shielding plate 15 is fixed in like manner to a front shielding plate 11, only the retention member for the object to be processed 18 is allowed to rotate making it possible to rigidly connect a supply pipe 22 (that supplies fluid through the rear shielding plate 15) to the rear shielding plate 15. Further, a circulation system is provided that collects fluid which underwent front surface processing in a collection tube 13, circulates that fluid and then supplies it to the rear surface of the object to be processed from a supply pipe.
    Type: Grant
    Filed: September 19, 2001
    Date of Patent: August 13, 2002
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Hitoshi Oka, Fumio Morita, Masataka Fujiki, Akinobu Yamaoka
  • Patent number: 6401734
    Abstract: A substrate treating apparatus and method can recover a substrate treating liquid such as a cleaning liquid in an efficient manner and positively avoid occurrences of treatment defects such as formation of cleaning spots, water marks and the like. A fixed upper plate and a fixed lower plate are disposed in opposition to each other so as to define a space therebetween. A substrate such as a semiconductor wafer is inserted into the space between the fixed upper and lower plates, supported there by a support and adapted to be rotated through rotation of the support. A substrate treating medium such as a cleaning liquid is introduced into the space to treat the substrate while the substrate is rotating. The treating medium after having treated the substrate is discharged from the space through a discharge passage which is defined between an outer peripheral surface of the support and an inner surface of a housing which covers the outer peripheral surface of the support.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: June 11, 2002
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Fumio Morita, Masataka Fujiki, Hitoshi Oka, Noriyuki Oroku, Yuichirou Tanaka
  • Patent number: 6398978
    Abstract: A piezoelectric ceramic is a bismuth-layer compound having SrBi4Ti4O15-type crystal. The axial ratio c/a of crystal lattice is in the range of 7.46 to 7.67.
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: June 4, 2002
    Assignee: TDK Corporation
    Inventors: Masakazu Hirose, Hitoshi Oka, Takeo Tsukada
  • Publication number: 20020050281
    Abstract: To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid.
    Type: Application
    Filed: September 19, 2001
    Publication date: May 2, 2002
    Applicant: Kokusai Electric Co., Ltd.
    Inventors: Hitoshi Oka, Fumio Morita, Masataka Fujiki, Akinobu Yamaoka
  • Patent number: 6315836
    Abstract: A clean, recirculating and processing method which prevents surface contamination of an object, such as a semiconductor, semi-conductor wafer, glass for LCD or magnetic disk is provided which includes covering the front and rear surfaces of an object to be processed with front and rear shielding plates and allows the object to rotate relative to the front and rear shielding plates. The fluid is supplied between the front surface of the object and the front shielding plate allowing the front surface to be processed. The remaining fluid is collected and recirculated between the rear surface of the object and the rear shielding plate allowing the rear surface of the object to be processed. An apparatus for accomplishing the method is also disclosed.
    Type: Grant
    Filed: July 12, 1999
    Date of Patent: November 13, 2001
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Hitoshi Oka, Fumio Morita, Masataka Fujiki, Akinobu Yamaoka
  • Publication number: 20010015420
    Abstract: Piezoelectric ceramics include a bismuth layer compound containing MII, Bi, Ti, Ln and O, wherein MII represents at least one element selected from the group consisting of Sr, Ba and Ca, and Ln represents at least one element selected from the group consisting of lanthanoids. The piezoelectric ceramics include MIIBi4Ti4O15 typed crystals, and a mole ratio of Ln/(Ln+MII) is 0<Ln/(Ln+MII)<0.5. In the case where MII is Sr, a mole ratio of 4Bi/Ti is 4.000<4Bi/Ti≦4.030. Preferably, piezoelectric ceramics further include Y oxide.
    Type: Application
    Filed: February 7, 2001
    Publication date: August 23, 2001
    Applicant: TDK CORPORATION
    Inventors: Masakazu Hirose, Takeo Tsukada, Hitoshi Oka, Junji Terauchi
  • Patent number: 6241908
    Abstract: Piezoelectric ceramics which is made of compounds shaped in bismuth layer containing Sr, Bi, Ti and Ln (lanthanoid). The compound contains SrBi4Ti4O15 typed crystals. In the piezoelectric ceramics, an atomic ratio of Ln/(Sr+Ln) is 0<Ln/(Sr+Ln)<0.5.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: June 5, 2001
    Assignee: TDK Corporation
    Inventors: Masakazu Hirose, Hitoshi Oka, Takeo Tsukada, Yasuharu Miyauchi, Toshiyuki Suzuki, Yoshinori Asakura
  • Patent number: 6184541
    Abstract: On the polycrystal semiconductor film 3 formed on the insulating substrate 1, the source 6 and drain 7 in LDD structure having a low concentration region 4 and a high concentration region 5 are formed. The region 4 has a low impurity concentration, and the region 5 has a high impurity concentration. The length of the low concentration region 4 measured from the edge of gate insulating film 9 is not smaller than the average grain size of the polycrystal semiconductor film 3. The LCD device employing the TFT thus constructed is free from white spots (micro brighter spots) in a high temperature atmosphere.
    Type: Grant
    Filed: December 3, 1998
    Date of Patent: February 6, 2001
    Assignee: Matsushita Electronics Corporation
    Inventors: Hitoshi Oka, Yutaka Ito
  • Patent number: 6129886
    Abstract: The object of the present invention is to realize the piezoelectric ceramics which, even when used as high frequency elements utilizing third harmonics wave of thickness longitudinal vibration, are small in temperature coefficient of resonant frequency and high in mechanical Q value and easy to correspond to the trend toward miniaturization and low voltage driving. When the piezoelectric ceramics with lead titanate as its main component are manufactured in order to achieve this object, it was decided that the piezoelectric ceramics be manufactured by the manufacturing method, wherein a heat treatment is performed between a firing process and a polarization process in the atmosphere of oxygen partial pressure less than the oxygen partial pressure of the atmospheric pressure at temperatures more than 500.degree. C. and not more than the firing temperatures.
    Type: Grant
    Filed: March 27, 1998
    Date of Patent: October 10, 2000
    Assignee: TDK Corporation
    Inventors: Kazushi Tachimoto, Mahoko Takada, Kenji Horino, Kazuo Miyabe, Hitoshi Oka