Patents by Inventor Hitoshi Sunaoshi

Hitoshi Sunaoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6606149
    Abstract: A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: August 12, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Munehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Naoharu Shimomaura
  • Publication number: 20010025931
    Abstract: A charged particle beam system includes a chamber having an opening in a ceiling, a table placed immediately below the opening and movable in one direction, a laser interferometer set in the chamber, including a laser oscillator placed along the moving direction of the table, a movable mirror placed on the table side opposing the oscillator, a beam splitter placed to cross the laser beam and a fixed mirror fixed, immediately above the beam splitter, on the ceiling of the chamber, an optical lens barrel having an opening communicating with the opening of the chamber, and a beam gun set on a ceiling of the optical lens barrel to irradiate a specimen placed on the table with a charged particle beam through the first and second openings. At least an upper wall portion from the opening to the fixed mirror of the chamber is made of an invar alloy.
    Type: Application
    Filed: March 19, 2001
    Publication date: October 4, 2001
    Inventors: Jun Takamatsu, Kiyoshi Hattori, Hitoshi Sunaoshi, Naoharu Shimomura, Kiminobu Akeno, Munehiro Ogasawara
  • Patent number: 6028317
    Abstract: An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam passing direction and to form curves obtained by deforming hyperbolas in a direction perpendicular to the beam passing direction, in order that an electric field whose effective part except for an arbitrary constant of the field potential is given by.phi.=(k/2)r.sup.2 -.alpha.lnr-kz.sup.2is spatially partially formed in a cylindrical coordinate system defined by (r, z, .theta.).
    Type: Grant
    Filed: January 12, 1998
    Date of Patent: February 22, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ken-ichi Murooka, Munehiro Ogasawara, Hitoshi Sunaoshi
  • Patent number: 5843603
    Abstract: A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1/n one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions; a second step of irradiating the shaped line beam upon a surface of the sample or the movable stage for a constant time or longer; a third step of shaping a beam by adding a bias value .delta.
    Type: Grant
    Filed: August 22, 1996
    Date of Patent: December 1, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Atsushi Ando, Hitoshi Sunaoshi, Hirotsugu Wada, Kazuyoshi Sugihara