Patents by Inventor Ho-Young Kang
Ho-Young Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230020449Abstract: The present disclosure relates to a device that calculates a fire insurance premium discount rate applied to a distribution board so as to provide the same to an insurance company server, and provides a device for calculating a fire insurance premium discount rate for a distribution board, comprising: a control unit for receiving distribution board information from the distribution board and controlling the distribution board; and a discount rate calculation unit for receiving, from the insurance company server, fire insurance premium information applied to the distribution board, and calculating a discount rate of the fire insurance premium on the basis of the distribution board information and the fire insurance premium information.Type: ApplicationFiled: April 2, 2020Publication date: January 19, 2023Inventor: Ho Young KANG
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Publication number: 20220235356Abstract: Provided are an aptamer specifically binding to KRAS protein, and a method of using the same. An aptamer of one aspect has excellent binding affinity to KRAS, which is a major factor regulating a cell growth signaling system in vivo, to inhibit binding between KRAS mutant in cancer cells and a Raf-1 kinase protein which is a downstream protein constituting the cell growth signaling system, thereby effectively suppressing cancer cell growth and cancer development. Further, the aptamer may specifically bind to KRAS in cancer cells, and thus may be widely applied to a pharmaceutical composition for treating or preventing cancer, a diagnostic agent, a reagent, etc.Type: ApplicationFiled: July 9, 2020Publication date: July 28, 2022Inventors: Ho Young KANG, Do Hyung KIM, Kyoung Ryoung PARK, Seol Hwa BAEK
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Patent number: 10382299Abstract: In some embodiments, a data processing apparatus includes a communications unit configured to collect data items from data acquisition apparatuses and transmit the collected data items to clients; and a control unit configured to determine event data from among the collected data items, select the determined event data, compare the selected event data with reference event data to transmit only event data that meets predetermined conditions to the clients.Type: GrantFiled: August 26, 2016Date of Patent: August 13, 2019Assignee: LSIS CO., LTD.Inventors: Pil-Suk Kim, Jae-Hyung Lee, Jae-Hong Cha, Ho-Young Kang
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Patent number: 10277483Abstract: Disclosed embodiments relate to apparatuses, systems, and methods for transmitting/receiving data. In some embodiments, a system includes a server operative to collect data from remote apparatuses and transmit the collected data to a client group, and at least one client group including at least one client, the client group checking data received from the server and acquiring data requested by the client.Type: GrantFiled: July 29, 2016Date of Patent: April 30, 2019Assignee: LSIS CO., LTD.Inventors: Jae-Hong Cha, Pil-Suk Kim, Ho-Young Kang, Jae-Hyung Lee, Seok-Chan Lee
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Publication number: 20170063655Abstract: In some embodiments, a data processing apparatus includes a communications unit configured to collect data items from data acquisition apparatuses and transmit the collected data items to clients; and a control unit configured to determine event data from among the collected data items, select the determined event data, compare the selected event data with reference event data to transmit only event data that meets predetermined conditions to the clients.Type: ApplicationFiled: August 26, 2016Publication date: March 2, 2017Inventors: Pil-Suk KIM, Jae-Hyung LEE, Jae-Hong CHA, Ho-Young KANG
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Publication number: 20170034260Abstract: Disclosed embodiments relate to apparatuses, systems, and methods for transmitting/receiving data. In some embodiments, a system includes a server operative to collect data from remote apparatuses and transmit the collected data to a client group, and at least one client group including at least one client, the client group checking data received from the server and acquiring data requested by the client.Type: ApplicationFiled: July 29, 2016Publication date: February 2, 2017Inventors: Jae-Hong CHA, Pil-Suk KIM, Ho-Young KANG, Jae-Hyung LEE, Seok-Chan LEE
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Publication number: 20160314988Abstract: Substrate heat treatment apparatus and method are provided. According to an embodiment of the present invention, there is provided a substrate heat treatment apparatus including an inner shell configured to form a substrate housing space to house at least one substrate, an outer shell configured to cover the inner shell, and having at least one gas hole, and at least one heater configured to heat the substrate, wherein the at least one gas hole is configured to allow a first gas to be injected into a space between the inner shell and the outer shell.Type: ApplicationFiled: July 6, 2016Publication date: October 27, 2016Inventors: Sung Guk An, Jun Heo, Jong Hyun Yun, Kyoung Wan Park, Ho Young Kang, Byung Il Lee
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Publication number: 20160225266Abstract: The present disclosure relates to a monitoring technique for an Advanced-Surface Movement Guidance and Control Systeni (A-SMGCS) in real time. In the system for monitoring the A-SMGCS, which comprises the A-SMGCS and a high-level device for monitoring the A-SMGCS, an A-SMGCS server includes a monitoring module and a plurality of information transmit modules, each of which has its own status information and action information, and the monitoring module receives status information and action information sent from the plurality of information transmit modules and transmits them to the high-level device in real time.Type: ApplicationFiled: February 3, 2016Publication date: August 4, 2016Inventors: Ho-young Kang, Seok-Chan Lee, Tae-Weon Kim
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Publication number: 20160060757Abstract: Provided is a reactor of a substrate processing apparatus. The reactor of the substrate processing apparatus is a reactor of a substrate processing apparatus for processing at least one substrate, the reactor having a horizontal cross-section provided in a shape having at least two curvature radii.Type: ApplicationFiled: June 23, 2015Publication date: March 3, 2016Inventors: Byung Il LEE, Ho Young KANG
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Publication number: 20140242530Abstract: Substrate heat treatment apparatus and method are provided. According to an embodiment of the present invention, there is provided a substrate heat treatment apparatus including an inner shell configured to form a substrate housing space to house at least one substrate, an outer shell configured to cover the inner shell, and having at least one gas hole, and at least one heater configured to heat the substrate, wherein the at least one gas hole is configured to allow a first gas to be injected into a space between the inner shell and the outer shell.Type: ApplicationFiled: July 18, 2013Publication date: August 28, 2014Inventors: Sung Guk An, Jun Heo, Jong Hyun Yun, Kyoung Wan Park, Ho Young Kang, Byung Il Lee
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Patent number: 7195757Abstract: The present invention relates to immunogenic compositions comprising a live attenuated derivative of a pathogenic Enterobacteriaceae bacteria. The attenuated derivative of a pathogenic Enterobacteriaceae bacteria comprises a polynucleotide that encodes a foreign antigen. The attenuated derivative of the pathogenic Enterobacteriaceae bacteria has increased expression of Type 1 fimbriae relative to the pathogenic Enterobacteriaceae bacteria from which the attenuated derivative was derived. The present invention also relates to immunogenic compositions that elicit an enhanced Th2 immune response in an individual. The present invention further provides a method of modulating the immune response of an individual comprising administering to said individual the immunogenic compositions of the present invention.Type: GrantFiled: April 15, 2003Date of Patent: March 27, 2007Assignee: Washington UniversityInventors: Roy Curtiss, III, Ho Young Kang
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Publication number: 20040120962Abstract: The present invention relates to immunogenic compositions comprising a live attenuated derivative of a pathogenic Enterobacteriaceae bacteria. The attenuated derivative of a pathogenic Enterobacteriaceae bacteria comprises a polynucleotide that encodes a foreign antigen. The attenuated derivative of the pathogenic Enterobacteriaceae bacteria has increased expression of Type 1 fimbriae relative to the pathogenic Enterobacteriaceae bacteria from which the attenuated derivative was derived. The present invention also relates to immunogenic compositions that elicit an enhanced Th2 immune response in an individual. The present invention further provides a method of modulating the immune response of an individual comprising administering to said individual the immunogenic compositions of the present invention.Type: ApplicationFiled: April 15, 2003Publication date: June 24, 2004Inventors: Roy Curtiss, Ho Young Kang
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Publication number: 20040101531Abstract: Disclosed are vaccines and immunogenic compositions which use live attenuated pathogenic bacteria, such as Salmonella, to deliver ectopic antigens to the mucosal immune system of vertebrates. The attenuated pathogenic bacteria are engineered to secrete the antigen into the periplasmic space of the bacteria or into the environment surrounding the bacteria. The vertebrate mounts a Th2-mediated immune response toward the secreted antigen.Type: ApplicationFiled: April 15, 2003Publication date: May 27, 2004Inventors: Roy Curtiss, Ho Young Kang
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Patent number: 6218204Abstract: Reduction in focusing error of an exposure process includes forming a conductive layer over a wafer whose topology is to be measured by a capacitance gauge. The conductive layer is thick enough such that differences in capacitance measured by the capacitance gauge tracking apparatus are not due to differences in underlying material and structure on the wafer. Thus, accurate measurement of the real topology of wafer by capacitance gauge tracking apparatus may be realized. As a result, the subsequent exposure processing is reliable.Type: GrantFiled: June 7, 1999Date of Patent: April 17, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-Seog Hong, Jung-Hyeon Lee, Ho-Young Kang
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Patent number: 5978138Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+.first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.Type: GrantFiled: March 30, 1998Date of Patent: November 2, 1999Assignee: Samsung Electronics Co., Ltd.Inventors: Ho-young Kang, Cheol-hong Kim, Seong-oon Choi, Woo-sung Han, Chang-jin Sohn
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Patent number: 5853921Abstract: A phase shift mask is fabricated by forming a radiation blocking layer on a phase shift mask substrate and forming a photoresist layer on the radiation blocking layer. First portions of the photoresist layer are exposed at a first exposure dose. Second portions of the photoresist layer are exposed at a second exposure dose that is greater than the first exposure dose, such that the second portions of the photoresist layer are wider than the first portions of the photoresist layer. The radiation blocking layer is etched using the photoresist layer as an etch mask, to thereby produce first apertures in the radiation blocking layer beneath the first portions of the photoresist layer and second apertures in the radiation blocking layer which are wider than the first apertures, beneath the second portions of the photoresist layer. The phase shift mask substrate is then etched beneath the second apertures.Type: GrantFiled: July 28, 1997Date of Patent: December 29, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Seong-yong Moon, In-kyun Shin, Ho-young Kang
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Patent number: 5851706Abstract: A half tone phase shift mask includes a substrate which is transparent with respect to exposure radiation and a phase shifter pattern on the substrate. The phase shifter pattern comprises chromium oxide (Cr.sub.2 O.sub.3) and alumina (Al.sub.2 O.sub.3). Fine patterns can therefore be formed using phase shift masking of exposure radiation having a 193 nm wavelength, such as light from an ArF excimer laser.Type: GrantFiled: June 25, 1997Date of Patent: December 22, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Sung-chul Lim, Sang-gyun Woo, Ho-young Kang, Kwang-soo No
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Patent number: 5808796Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of -/+ first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.Type: GrantFiled: April 7, 1997Date of Patent: September 15, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Ho-young Kang, Cheol-hong Kim, Seong-oon Choi, Woo-sung Han, Chang-jin Sohn
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Patent number: 5679592Abstract: A process for forming a MOSFET, which includes the steps of: forming a gate insulating layer and a gate electrode on a semiconductor substrate, and forming lightly doped impurity regions on the left and right sides of the gate electrode and on the substrate; spreading photoresist, and forming a photoresist pattern for defining a side wall spacer formation portion on the gate electrode and on sides of the gate electrode; depositing an insulating layer on the surface of the substrate, and etching the insulating layer to remove an exposed surface portion and to form a side wall spacer on sides of the gate electrode; and removing the photoresist pattern, and forming a heavily doped source/drain region on the gate electrode and on sides of the side wall.Type: GrantFiled: December 18, 1995Date of Patent: October 21, 1997Assignee: LG Semicon Co., Ltd.Inventor: Ho-Young Kang
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Patent number: 5661601Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+. first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.Type: GrantFiled: June 6, 1995Date of Patent: August 26, 1997Assignee: Samsung Electronics Co., Ltd.Inventors: Ho-young Kang, Cheol-hong Kim, Seong-oon Choi, Woo-sung Han, Chang-jin Sohn