Abstract: A display filter having a gradation, in use for a display device has a display module therein. The display filter includes a base substrate; and a light blocking section having a light blocking material formed on a periphery area of the base substrate to define an effective image-displaying area of the base substrate. The light blocking material blocks light, and at least a portion of the light blocking section becomes gradually darker in a predetermined direction.

Abstract: An optical filter for a display device can be provided with excellent fracture strength without using heat-treated tempered glass. The optical filter is used in the display device having a display module therein and is disposed in front of the display module. The optical filter includes an annealed glass substrate, an optical film laminated on the surface of one side of the annealed glass substrate, and a protective layer formed on the surface of the other side of the annealed glass substrate. The protective layer serves to prevent a substance from being eluted from inside the annealed glass substrate.

Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

Abstract: Disclosed are a novel tactic acid bacterium, Lactobacillus sakei Probio-65, and the use thereof. The L. sakei Probio-65 strain has acid tolerance, bile acid tolerance and antibiotic resistance, inhibits the growth of harmful pathogenic microorganisms in the body and the intestine of animals, and has immunuenhancing activity. In particular, the novel strain inhibits the growth of Staphylocccus aureus, which is known to be a factor aggravating atopic dermatitis. Thus, the novel strain is useful for preventing or treating atopic dermatitis and allergy-related disorders. Also, the novel strain stabilizes intestinal microflors by inhibiting the abnormal proliferation of harmful microorganisms in the intestine. The L. sakei Probio-65 strain or a culture thereof is useful in pharmaceutical, feed, food, and cosmetic compositions.

Abstract: An optical filter for a display device placed in front of a display panel 1000 of the display device includes a first layer 310 which is formed at a first area A1 and has a first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through an adjacent area to the first area A1 such that the first area A1 becomes distinguished to form a dark mark or the adjacent area becomes distinguished to form a bright mark. The optical filter further includes a second layer 320 which is formed at a second area A2 and has a second light blocking ratio lower than the first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through the second area A2 such that the first area A1 becomes distinguished to form the dark mark or the second area becomes distinguished to form a bright mark.

Abstract: A channel-switching apparatus and method in a digital broadcasting system omits conditional access control in logical channel-switching in one physical channel from processes that are executed for channel-switching in a digital broadcasting system, thereby reducing channel-switching time.

Abstract: The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.

Abstract: A channel changing apparatus and method in a digital broadcasting system can reduce channel changing time by including a plurality of broadcast programs in one logical channel, and in response to channel changing, selectively displaying a corresponding program in the logical channel.

Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

Abstract: The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.

Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.