Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: Techniques and mechanisms for fabricating an eyepiece from a lens blank including blank bodies that are bonded to each other. In an embodiment, the blank bodies are formed by injection molding and adhered to one another. Fabrication of the eyepiece includes variously machining the blank bodies to shape respective lens bodies of the eyepiece. One or more blocking structures are coupled to reinforce the lens blank during at least part of such machining. In another embodiment, any blocking structures that are to resist forces of a particular machining process are coupled only indirectly to one of the blank bodies.

Abstract: Techniques and mechanisms for fabricating an eyepiece from a lens blank including blank bodies that are bonded to each other. In an embodiment, the blank bodies are formed by injection molding and adhered to one another. Fabrication of the eyepiece includes variously machining the blank bodies to shape respective lens bodies of the eyepiece. One or more blocking structures are coupled to reinforce the lens blank during at least part of such machining. In another embodiment, any blocking structures that are to resist forces of a particular machining process are coupled only indirectly to one of the blank bodies.

Abstract: Techniques and mechanisms for generating a laminate structure. In an embodiment, a layer of adhesive material is disposed on a surface of a glass plate or other constituent layer for a laminate. Prior to an application of another constituent layer, the adhesive layer is selectively cured to form in the adhesive layer at least a first portion which adjoins a second portion of the layer of adhesive material. In some embodiments, a level of cure of the first portion is greater than a level of cure of the second portion.

Abstract: An eyepiece includes a first lens body having a first interface side and a second lens body having a second interface side. At least one of the first and second interface sides includes a recess. The first and second lens bodies are mated together along the first and second interface sides to form a cavity at the recess. A lightguide insert is provided that has a shape and a size to fit within the cavity. The lightguide insert includes an in-coupling region to receive display light into the lightguide insert and an out-coupling region to direct the display light out of the lightguide insert through the first lens body.

Abstract: The present disclosure provides methods and systems for bonding multiple wafers. An example system may include a sealable chamber with a first and second substantially vertical post positioned inside of the sealable chamber. The system may also include a first latch connected to the first post via a first pin, wherein the first pin allows the first latch to rotate about the first pin. The system may also include a second latch similarly configured to the first latch. The system may also include a base plate positioned between the first and second posts. The base plate is arranged such that when a first wafer rests on the base plate and a second wafer rests on the first and second latches, moving the base plate from a first position to a second position causes a top surface of the first wafer to contact a bottom surface of the second wafer.

Abstract: An eyepiece for a head wearable display includes a first lens body having a first interface side in which a first recess is disposed and a second lens body having a second interface side in which a second recess is disposed. The first and second lens bodies are mated together along the first and second interface sides and the first and second recesses are aligned to form a cavity. A lightguide insert is provided that has a shape and a size to fit within the cavity defined by the first and second recesses. The lightguide insert includes an in-coupling region to receive display light into the lightguide insert and an out-coupling region to direct the display light out of the lightguide insert through the first lens body.

Abstract: A releasing and post-releasing method for making a micromirror device and a micromirror array device are disclosed herein. The releasing method removes the sacrificial materials in the micromirror and micromirror array so as to enabling movements of the movable elements in the micromirror and micromirror array device. The post-releasing method is applied to improve the performance and quality of the released micromirrors and micromirror array devices.

Abstract: A releasing and post-releasing method for making a micromirror device and a micromirror array device are disclosed herein. The releasing method removes the sacrificial materials in the micromirror and micromirror array so as to enabling movements of the movable elements in the micromirror and micromirror array device. The post-releasing method is applied to improve the performance and quality of the released micromirrors and micromirror array devices.

Abstract: Speckle effect in display system is reduced by utilizing the instability of phase-coherent light and the transmission of the instable phase-coherent light through a multi-mode optical fiber with a suitable length.

Abstract: Speckle effect in display system is reduced by utilizing the instability of phase-coherent light and the transmission of the instable phase-coherent light through a multi-mode optical fiber with a suitable length.

Abstract: The present invention provides a method for removing sacrificial materials in fabrications of microstructures using a selected spontaneous vapor phase chemical etchants. During the etching process, an amount of the etchant is fed into an etch chamber for removing the sacrificial material. Additional amount of the etchant are fed into the etch chamber according to a detection of an amount or an amount of an etching product so as to maintaining a substantially constant etching rate of the sacrificial materials inside the etch chamber. Accordingly, an etching system is provided for removing the sacrificial materials based on the disclosed etching method.

Abstract: System and method for increasing display brightness in laser illuminated display systems. An illumination source includes a light source to produce light, a disk having a set of lens elements arranged in a circular ring around a center of the disk, a motor coupled to the disk, and an external lens positioned in a light path of the coherent light source. As the disk rotates, the lens elements are moved sequentially through the light, angularly deflecting the light, which may be corrected by the external lens into a spatial deflection. The spatially deflected light may be used to simultaneously illuminate a surface with more than one color of light, thereby increasing the brightness of the light source.

Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.

Abstract: A method for making a micromirror device comprises is disclosed herein.

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material andlor solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.