Patents by Inventor Hsien Chang

Hsien Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050023639
    Abstract: An inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type and at least two deep wells of opposite conductivity type in the substrate underneath the track. In another embodiment, an inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type; a shallow trench isolation region formed in the substrate underneath the trace; and at least two deep wells of opposite conductivity type in the substrate underneath the shallow trench isolation region. The present invention also includes methods of manufacturing the aforementioned inductors.
    Type: Application
    Filed: July 31, 2003
    Publication date: February 3, 2005
    Inventors: Tzu-Jin Yeh, Hsien-Chang Wu, Ming-Ta Yang, Yu-Tai Chia
  • Patent number: 6843189
    Abstract: A sewing machine includes a thread tension adjusting device, and a thread tension releasing device. The thread tension adjusting device includes a thread press member formed with a release extension portion. The thread tension releasing device presses the release extension portion of the thread press member to pivot the thread press member so as to move the thread clamping portion of the thread press member. Thus, the thread tension releasing device directly presses the release extension portion of the thread press member, so as to release the tension of the sewing thread, so that the tension of the sewing thread can be released easily and rapidly.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: January 18, 2005
    Inventor: Tseng Hsien Chang
  • Patent number: 6843292
    Abstract: The invention generally relates to thermoplastic blends having improved properties. Optionally, these blends may be dynamically vulcanized. More specifically, this invention is directed to a composition comprising a blend of chloromethylated(styrene-isobutylene) polymer and a thermoplastic resin selected from the group consisting of polyamides, polyesters, polycarbonates, polysulfones, polyacetals, polyacetones, acrylonitrile-butadiene styrene resins, polyphenylene oxide, polyphenylene sulfide, styrene-acrylonitrile resins, styrene-maleic anhydride resins, polyamides, aromatic polyketones, ethylene vinyl alcohol polymer and mixtures thereof. Tires and tire components such as air permeation prevention films comprising these compositions are also provided.
    Type: Grant
    Filed: June 8, 2001
    Date of Patent: January 18, 2005
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventor: Hsien-Chang Wang
  • Publication number: 20050004311
    Abstract: The invention generally relates to thermoplastic blends having improved properties. Optionally, these blends may be dynamically vulcanized. More specifically, this invention is directed to a composition comprising a blend of chloromethylated(styrene-isobutylene) polymer and a thermoplastic resin selected from the group consisting of polyamides, polyesters, polycarbonates, polysulfones, polyacetals, polyacetones, acrylonitrile-butadiene styrene resins, polyphenylene oxide, polyphenylene sulfide, styrene-acrylonitrile resins, styrene-maleic anhydride resins, polyamides, aromatic polyketones, ethylene vinyl alcohol polymer and mixtures thereof. Tires and tire components such as air permeation prevention films comprising these compositions are also provided.
    Type: Application
    Filed: June 29, 2004
    Publication date: January 6, 2005
    Inventor: Hsien-Chang Wang
  • Patent number: 6838734
    Abstract: High-voltage-tolerant ESD protection devices (ESDPD) for deep-submicron CMOS process were activated between LDD implanting and forming sidewall spacers. ESD-Implant (ESDI) regions are located at the ESDPD, without covering the center region under the drain contact (DC). The ESDI LDD concentration and doping profile are deep to contain drain diffusion. Regions with the ESDI have a high junction breakdown voltage (JBV) and a low junction capacitance. After forming gate sidewall spacers, high doping concentration ions implanted into active D/S regions formed a shallower doping profile of the D/S diffusion. The drain has a JBV as without this ESDI, so the ESD current (ESDC) is discharged through the center junction region under the DC to bulk, far from the ESDPD surface channel region. The ESDPD sustains a high ESD level. In an original drain JBV of an MOS this ESDI method is unchanged, i.e.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: January 4, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming-Dou Ker, Tung-Yang Chen, Hun-Hsien Chang
  • Patent number: 6825281
    Abstract: The invention provides a thermoplastic composition of C4-C7 isoolefin copolymers including halomethylstyrene derived units blended with a hindered amine or phosphine of the structure R1 R2 R3 N or R1 R2 R3 P wherein R1, R2 and R3 are preferably lower and higher alkyl groups. The resulting ionically associated, amino or phosphine modified elastomers are used to prepare thermoplastic elastomer blend compositions, including dynamically vulcanized compositions, containing more finely dispersed elastomers which results in compositions having improved mechanical properties.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: November 30, 2004
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Mun Fu Tse, Hsien-Chang Wang, Pawan K. Agarwal, Ramanan Krishnamoorti
  • Patent number: 6823876
    Abstract: A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM (preventive maintenance) computer program, can automatically and quickly clean the interior of the etching tool. By setting the appropriate parameters of PM program, single or all of process chambers can be well cleaned. Also, the DI water dropping positions on the wafer can be altered to create more splashing angles. To clean the sidewalls of the etching chambers, the wafer supporting means is moved between the process chamber and the rotating speed thereof is preferably alter while it is moving. The PM program of the present invention can be executed whenever the cleaning job needs to be done. It not only is timesaving and easy to apply, but also keeps the wafer in a almost-no-particle environment while being etched.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: November 30, 2004
    Assignee: Macronix International Co., Ltd.
    Inventors: Yuan-Hsun Chang, Ming-Hsien Chang, Chung-Ping Lin, Tzu-Hao Liu
  • Publication number: 20040231576
    Abstract: A sewing machine includes a thread tension adjusting device, and a thread tension releasing device. The thread tension adjusting device includes a thread press member formed with a release extension portion. The thread tension releasing device presses the release extension portion of the thread press member to pivot the thread press member so as to move the thread clamping portion of the thread press member. Thus, the thread tension releasing device directly presses the release extension portion of the thread press member, so as to release the tension of the sewing thread, so that the tension of the sewing thread can be released easily and rapidly.
    Type: Application
    Filed: May 23, 2003
    Publication date: November 25, 2004
    Inventor: Tseng Hsien Chang
  • Publication number: 20040213737
    Abstract: This invention provides a process for producing a radioactive arsenic-containing compound, comprising the steps of: (i) subjecting an arsenic-containing compound to a neutron irradiation treatment, said arsenic-containing compound being selected from a group consisting of As2O3, As2S3, AS2S2, and a combination thereof, such that the arsenic element contained in the arsenic-containing compound is converted to a radioactive arsenic isotope; and (ii) recovering the resultant product from step (i).
    Type: Application
    Filed: March 3, 2004
    Publication date: October 28, 2004
    Applicants: TTY BIOPHARM COMPANY, LIMITED, INSTITUTE OF NUCLEAR ENERGY RESEARCH ROCAEC
    Inventors: Chun-Ying Huang, Ming-Shiuan Wu, Te-Wei Lee, Te-Jung Chen, Kwo-Ping Chang, Shyh-Yi Chyi, Yin-Mao Hsu, Kuo-Hsien Fan, Wei-Chuan Hsu, Ying-Kai Fu, Charng-Feng Kao, Shiang-Rong Chang, Chih-Hsien Chang
  • Patent number: 6803129
    Abstract: The present invention relates to an organic light emitting diode (OLED) device, comprising an anode disposed on a substrate, an organic EL layer disposed on the anode and a cathode disposed on the organic EL layer.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: October 12, 2004
    Assignee: RiTdisplay Corporation
    Inventors: Hsien-Chang Lin, Chih-Hao Kung, Chung-Cheng Pai, Shwu-Ju Shieh, Tzu-Chin Tang
  • Publication number: 20040180163
    Abstract: Pharmaceutical containers containing at least one shaped component serving as a sealing barrier such as closure, stopper or plunger, for the contents of the container are disclosed. Such sealing barriers are made from elastomeric compositions containing a silylated copolymer of isobutylene/isoprene (butyl rubber) and para-methylstyrene which are curable by contact with moisture.
    Type: Application
    Filed: October 31, 2003
    Publication date: September 16, 2004
    Inventors: Hsien-Chang Wang, Wal Keung Wong
  • Publication number: 20040147639
    Abstract: The invention provides a method for increasing the viscosity of halogenated (brominated) elastomeric copolymers of a C4 to C7 isomonoolefin (isobutylene) and a para-alkylstryrene (p-methylstyrene) by mixing the copolymer with a silica or clay particulate filler which has been contacted with an aminosilane containing at least one C1 to C4 alkoxy group and at least one primary, secondary or tertiary amine group. The resulting elastomer compositions are used to prepare thermoplastic elastomer blend compositions, containing more finely dispersed elastomers which results in compositions having improved mechanical properties.
    Type: Application
    Filed: October 31, 2003
    Publication date: July 29, 2004
    Inventors: Andy H Tsou, Hsien-Chang Wang, Kenneth O McElrath, Ilan Duvdevani, Michael K Lyon, Mun Fu Tse
  • Patent number: 6766752
    Abstract: A sewing machine includes a hook having a distal end formed with a thread hooking portion, and a thread hooking device mounted on the thread hooking portion of the hook. Thus, the thread hooking device includes a plurality of thread guide portions provided on the bottom of the thread hooking portion to draw a plurality of sewing threads of different patterns and colors, thereby enhancing the diversity of the sewing threads so as to satisfy the user's different requirements. In addition, the sewing threads can be introduced into the thread hooking portion rapidly and conveniently, thereby facilitating operation and replacement of the sewing threads.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: July 27, 2004
    Inventor: Tseng Hsien Chang
  • Patent number: 6765771
    Abstract: An ESD protection component with a deep-N-well structure in CMOS technology and the relevant circuit designs are proposed in this invention. The ESD protection component comprises a lateral silicon controlled rectifier (SCR) and a deep N-well. The SCR comprises a P-type layer, an N-type layer, a first N-well and a first P-well. The P-type layer is used as an anode of the SCR; the N-type layer is used as a cathode of the SCR; the first N-well is located between the P-type layer and the N-type layer and is contacted with the P-type layer; and the first P-well is contacted to the first N-well and the N-type layer. The deep N-well is located between the first P-well and the P-substrate, and is used to isolate the electric connection between the P-substrate and the first P-well. A plurality of these ESD protection components arbitrarily connected in series increases the total holding voltage of ESD protection circuit, thus preventing occurrences of latch-up.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: July 20, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming-Dou Ker, Hun-Hsien Chang, Wen-Tai Wang
  • Publication number: 20040136650
    Abstract: An optical sub-assembly (OSA) module for suppressing optical back-reflection and effectively guiding light from a light source to an optical waveguide is disclosed. The module comprises a light source for emitting light to said optical waveguide and at least one light transmitting element installed between said light source and said optical waveguide. The at least one light transmitting element is arranged to have a configuration for avoiding light to reflect back to the light source and to cause a light beam from said light source to point to said core of said optical waveguide. Thereby, the working distance is increased, and the assembling process of the OSA module is simplified. This new optical design scheme will greatly improve the optical characteristics of an OSA module, increase the optical transceiver propagation distance, and reduce the difficulty of OSA assembly process.
    Type: Application
    Filed: January 10, 2003
    Publication date: July 15, 2004
    Inventors: Wen-Tzung Chen, Chien-Cheng Yang, Chun-Chieh Chang, Chun-Te Lee, Chih-Hsien Chang, Cheng-Ta Chen, Bao-Jen Pong
  • Publication number: 20040131885
    Abstract: An organic electroluminescent device comprises an anode disposed on a substrate, an organic electroluminescent layer disposed on the anode and a cathode disposed on the organic electroluminescent layer, wherein the organic electroluminescent layer comprises a compound represented by the formula (1) below.
    Type: Application
    Filed: October 27, 2003
    Publication date: July 8, 2004
    Inventors: Hsien-Chang Lin, Chih-Hao Kung, Chung-Cheng Pai, Shwu-Ju Shieh, Tzu-Chin Tang
  • Publication number: 20040131814
    Abstract: Protective liners or coatings for metal conduits, pipes and tanks subjected to corrosive liquids are disclosed. The liners comprise a composition containing a silylated copolymer of, for example, isobutylene and para-methylstyrene, which are curable by contact with moisture.
    Type: Application
    Filed: October 31, 2003
    Publication date: July 8, 2004
    Inventors: Hsien-Chang Wang, Wai Keung Wong
  • Publication number: 20040126040
    Abstract: A fluid dynamic bearing module for cooling fans connects the fixed part and the rotating part of a cooling fan and provides lubrication and support when the rotating part rotates relative to the fixed part. In the design of the invention the fluid dynamic bearing is a module that utilizes a bearing seat, a wear-resistant element and an anti-lift element to make the bearing module leak-proof, lift-proof, wear-resistant and able to create a balance of the lubricant and air.
    Type: Application
    Filed: March 5, 2003
    Publication date: July 1, 2004
    Inventors: Wun-Chang Shih, Ching-Hsing Huang, Yu-Hsiu Chang, Kuang-Hsien Chang, Mei-Lin Lai
  • Patent number: 6750821
    Abstract: A folded dual-band monopole antenna apparatus is disclosed, which includes a radiation body, a transmission line and a conductor. The radiation body resonates at a first and a second operating frequency. The radiation body connects the transmission line by way of the conductor. The radiation body includes a first side and a corresponding second side, and slits are set alternately on the first side and the second side to make the radiation body to be a meandered structure. The radiation body is folded along an extended direction of the slits to form a pillar structure for size miniaturization. The radiation body can cover a surface of a pillar dielectric material structure by printing technology for further size miniaturization and improving the strength of the radiation body.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: June 15, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Shyh-Tirng Fang, Fa-Hsien Chang, Kin-Lu Wong
  • Publication number: 20040106735
    Abstract: The improved green strength, green elongation, and green relaxation properties of isobutylene-based elastomers at elevated temperatures along with improved aging and barrier properties are achieved by blending semi-compatible, semi-crystalline copolymers with the isobutylene elastomers. The semi-crystalline copolymers are typically copolymers of ethylene and an alpha-olefin having from 4 to 16 carbon atoms. The improved properties are maintained in subsequent rubber compounds containing said blends and are particularly useful in tire and pharmaceutical container applications.
    Type: Application
    Filed: April 16, 2003
    Publication date: June 3, 2004
    Inventors: Andy H Tsou, Ilan Duvdevani, Hsien-Chang Wang