Patents by Inventor Hsin-Ta Hsieh

Hsin-Ta Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR FABRICATING MICROLENSES AND PROCESS OF SINGLE PHOTOMASK PATTERN-BASED PHOTOLITHOGRAPHY
    Publication number: 20090267249
    Abstract: A method for fabricating micro-lenses and a method for fabricating micro-lenses by photolithography are provided. The method includes forming a plurality of micro-cavities in a substrate, filling lens material into each of the micro-cavities, and heating the lens material, thereby reflowing the lens material so as to form a plurality of micro-lenses in the substrate. The micro-cavities define a boundary of each of the micro-lenses formed by reflowing the lens material, thereby preventing adjacent micro-lenses from fusing together by reflowing when overheated. The process uses negative photoresist and positive photoresist as micro-cavities and lens material respectively, thereby streamlining the fabrication method and its steps.
    Type: Application
    Filed: January 20, 2009
    Publication date: October 29, 2009
    Applicant: National Taiwan University
    Inventors: Guo-Dung Su, Hsin-Ta Hsieh