Patents by Inventor Hsiu-Yu Cheng
Hsiu-Yu Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11916091Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A device includes a substrate and a plurality of photosensitive regions in the substrate. The substrate has a first side and a second side opposite to the first side. The device further includes an interconnect structure on the first side of the substrate, and a plurality of recesses on the second side of the substrate. The plurality of recesses extend into a semiconductor material of the substrate.Type: GrantFiled: April 15, 2021Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Patent number: 11315972Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: GrantFiled: November 12, 2020Date of Patent: April 26, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Publication number: 20210233945Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A device includes a substrate and a plurality of photosensitive regions in the substrate. The substrate has a first side and a second side opposite to the first side. The device further includes an interconnect structure on the first side of the substrate, and a plurality of recesses on the second side of the substrate. The plurality of recesses extend into a semiconductor material of the substrate.Type: ApplicationFiled: April 15, 2021Publication date: July 29, 2021Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Publication number: 20210066357Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: ApplicationFiled: November 12, 2020Publication date: March 4, 2021Inventors: Hung-Wen Hsu, Jieh-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Patent number: 10847560Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: GrantFiled: April 15, 2019Date of Patent: November 24, 2020Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Publication number: 20190252423Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: ApplicationFiled: April 15, 2019Publication date: August 15, 2019Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Patent number: 10269843Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: GrantFiled: February 26, 2018Date of Patent: April 23, 2019Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Publication number: 20180197903Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: ApplicationFiled: February 26, 2018Publication date: July 12, 2018Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Patent number: 9917121Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: GrantFiled: March 24, 2016Date of Patent: March 13, 2018Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Publication number: 20170278881Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.Type: ApplicationFiled: March 24, 2016Publication date: September 28, 2017Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
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Patent number: 8901210Abstract: The present embodiment relates to a Plasticizer, which is fabricated by mixing monomers of biodegradable polymer with bio-molecules subsequently to deal the mixture with thermal treatment. The Biodegradable material comprising the Plasticizer has high melt index which is contributive for the processing of thermal processing, and the microwave-tolerance and water-resistance of the material makes the material suitable for food packaging.Type: GrantFiled: December 3, 2013Date of Patent: December 2, 2014Assignee: Industrial Technology Research InstituteInventors: Hsiu-Yu Cheng, Guang-Way Jang, Yin-Ju Yang, Shu-Chen Li
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Publication number: 20140094544Abstract: The present embodiment relates to a Plasticizer, which is fabricated by mixing monomers of biodegradable polymer with bio-molecules subsequently to deal the mixture with thermal treatment. The Biodegradable material comprising the Plasticizer has high melt index which is contributive for the processing of thermal processing, and the microwave-tolerance and water-resistance of the material makes the material suitable for food packaging.Type: ApplicationFiled: December 3, 2013Publication date: April 3, 2014Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Hsiu-Yu CHENG, Guang-Way JANG, Yin-Ju YANG, Shu-Chen LI
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Patent number: 8623944Abstract: The present invention relates to a Plasticizer, which is fabricated by mixing monomers of biodegradable polymer with bio-molecules subsequently to deal the mixture with thermal treatment. The Biodegradable material comprising the Plasticizer has high melt index which is contributive for the processing of thermal processing, and the microwave-tolerance and water-resistance of the material makes the material suitable for food packaging.Type: GrantFiled: December 19, 2011Date of Patent: January 7, 2014Assignee: Industrial Technology Research InstituteInventors: Hsiu-Yu Cheng, Guang-Way Jang, Yin-Ju Yang, Shu-Chen Lee
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Patent number: 8268175Abstract: A method for transferring inorganic oxide nanoparticles from aqueous phase to organic phase. A modifier is used to change the surface polarity of inorganic oxide nanoparticles, followed by using proper solvents to transfer the modified inorganic oxide nanoparticles form aqueous phase to organic phase. The organic dispersion of modified inorganic oxide nanoparticles can be combined with a polymer to provide a polymer composite with the nanoparticles uniformly dispersed therein.Type: GrantFiled: September 2, 2009Date of Patent: September 18, 2012Assignee: Industrial Technology Research InstituteInventors: Guang-Way Jang, Yin-Ju Yang, Mei-Chih Hung, Hsiu-Yu Cheng, Jian-Yi Hang, Jen-Min Chen, Shu-Jiuan Huang
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Publication number: 20120088852Abstract: The present invention relates to a Plasticizer, which is fabricated by mixing monomers of biodegradable polymer with bio-molecules subsequently to deal the mixture with thermal treatment. The Biodegradable material comprising the Plasticizer has high melt index which is contributive for the processing of thermal processing, and the microwave-tolerance and water-resistance of the material makes the material suitable for food packaging.Type: ApplicationFiled: December 19, 2011Publication date: April 12, 2012Applicant: Industrial Technology Research InstituteInventors: Hsiu-Yu CHENG, Guang-Way JANG, Yin-Ju YANG, Shu-Chen LEE
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Publication number: 20120083560Abstract: The invention provides a bio-based material composition and an optical device employing the same. The composition can be a petroleum resin-free composition, including a polylactic acid resin, a filler, and a light diffusion agent. Further, the composition can be a composition with petroleum resin, including a polylactic acid resin, a petroleum resin, a light diffusion agent, and an antioxidant.Type: ApplicationFiled: January 25, 2011Publication date: April 5, 2012Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Cheng-Hsuan Lin, Chun-Hsiang Wen, HsunYu Lee, Yao-Chu Chung, Chun-Hsiung Liao, Shu-Chen Li, Hsiu-Yu Cheng, Guang-Way Jang
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Patent number: 7846990Abstract: A reactive organo-modified inorganic particle. Inorganic particles are modified with functional groups through chemical bonding, ionic bonding, hydrogen bond or complex formation. The functional groups of organo-modified inorganic particle can react with monomer or oligomer of biodegradable materials to facilitate crosslinking and functionalization, thus improving physical properties of the inorganic particle-biodegradable hybrid materials.Type: GrantFiled: December 18, 2007Date of Patent: December 7, 2010Assignee: Industrial Technology Research InstituteInventors: Guang-Way Jang, Hsiu-Yu Cheng
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Publication number: 20100270238Abstract: A method for transferring inorganic oxide nanoparticles from aqueous phase to organic phase. A modifier is used to change the surface polarity of inorganic oxide nanoparticles, followed by using proper solvents to transfer the modified inorganic oxide nanoparticles form aqueous phase to organic phase. The organic dispersion of modified inorganic oxide nanoparticles can be combined with a polymer to provide a polymer composite with the nanoparticles uniformly dispersed therein.Type: ApplicationFiled: September 2, 2009Publication date: October 28, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Guang-Way Jang, Yin-Ju Yang, Mei-Chih Hung, Hsiu-Yu Cheng, Jian-Yi Hang, Jen-Min Chen, Shu-Jiuan Huang
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Publication number: 20090149570Abstract: The present invention relates to a Plasticizer, which is fabricated by mixing monomers of biodegradable polymer with bio-molecules subsequently to deal the mixture with thermal treatment. The Biodegradable material comprising the Plasticizer has high melt index which is contributive for the processing of thermal processing, and the microwave-tolerance and water-resistance of the material makes the material suitable for food packaging.Type: ApplicationFiled: July 14, 2008Publication date: June 11, 2009Applicant: Industrial Technology Research InstituteInventors: Hsiu-Yu Cheng, Guang-Way Jang, Yin-Ju Yang, Shu-Chen Lee
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Publication number: 20080214697Abstract: A reactive organo-modified inorganic particle. Inorganic particles are modified with functional groups through chemical bonding, ionic bonding, hydrogen bond or complex formation. The functional groups of organo-modified inorganic particle can react with monomer or oligomer of biodegradable materials to facilitate crosslinking and functionalization, thus improving physical properties of the inorganic particle-biodegradable hybrid materials.Type: ApplicationFiled: December 18, 2007Publication date: September 4, 2008Inventors: Guang-Way Jang, Hsiu-Yu Cheng