Patents by Inventor Hsun Chao

Hsun Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240193792
    Abstract: A device and a method for calculating a swinging direction of a human face in an obscured human face image are provided. The method includes the following. An obscured human face image including a human face is captured. Non-obscured face detection technology is used to obtain a feature anchor point to be replaced in the obscured human face image, obscured face detection technology is used to obtain a plurality of candidate feature anchor points in the obscured human face image, and the plurality of candidate feature anchor points are used to determine an updated feature anchor point corresponding to the feature anchor point to be replaced. An adjustment operation is performed on a three-dimensional model to obtain an adjusted three-dimensional model. The updated feature anchor point and the adjusted three-dimensional model are used to calculate a swinging direction of the human face.
    Type: Application
    Filed: February 20, 2023
    Publication date: June 13, 2024
    Applicant: Industrial Technology Research Institute
    Inventors: Jian-Lung Chen, Ting-Hsun Cheng, Yu-Ju Chao, Yu-Hsin Lin
  • Publication number: 20220372632
    Abstract: The presently claimed invention relates to compositions and methods for inhibition of etching. The presently claimed invention particularly relates to a composition and methods for inhibition of tungsten etching.
    Type: Application
    Filed: August 4, 2020
    Publication date: November 24, 2022
    Inventors: Michael LAUTER, Haci Osman GUEVENC, Te Yu WEI, Ching Hsun CHAO
  • Patent number: 11201665
    Abstract: A blockchain-based distributed network is disclosed which includes a plurality of moveable devices coupled to each other by a shortrange wireless channel, one or more ground systems coupled to the shortrange wireless channel, and one or more data centers coupled to the one or more ground systems via a long-range channel, each of the devices coupled to the shortrange wireless channel including an onboard system adapted to i) receive one or more blockchains; ii) verify authenticity of the one or more blockchains; iii) update data based on the verified one or more blockchains; iv) select one of the one or more blockchains; v) append a new block to last block of the selected blockchain; and vi) broadcast the appended blockchain, the one or more ground systems adapted to relay information from and to the plurality of moveable devices to and from the one or more data centers.
    Type: Grant
    Filed: April 4, 2020
    Date of Patent: December 14, 2021
    Assignee: Purdue Research Foundation
    Inventors: Hsun Chao, Apoorv Maheshwari, Daniel DeLaurentis
  • Publication number: 20200322041
    Abstract: A blockchain-based distributed network is disclosed which includes a plurality of moveable devices coupled to each other by a shortrange wireless channel, one or more ground systems coupled to the shortrange wireless channel, and one or more data centers coupled to the one or more ground systems via a long-range channel, each of the devices coupled to the shortrange wireless channel including an onboard system adapted to i) receive one or more blockchains; ii) verify authenticity of the one or more blockchains; iii) update data based on the verified one or more blockchains; iv) select one of the one or more blockchains; v) append a new block to last block of the selected blockchain; and vi) broadcast the appended blockchain, the one or more ground systems adapted to relay information from and to the plurality of moveable devices to and from the one or more data centers.
    Type: Application
    Filed: April 4, 2020
    Publication date: October 8, 2020
    Applicant: Purdue Research Foundation
    Inventors: Hsun Chao, Apoorv Maheshwari, Daniel DeLaurentis
  • Patent number: 9299585
    Abstract: A method for chemical mechanical polishing of a substrate comprising ruthenium and copper is provided wherein the substrate is contacted with a polishing slurry containing an abrasive, hypochlorite, a copolymer of acrylic acid and methacrylic acid, benzotriazole, poly(methyl vinyl ether) and a non-ionic surfactant at a pH of 9 to 11.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: March 29, 2016
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Hongyu Wang, Lee Melbourne Cook, Jiun-Fang Wang, Ching-Hsun Chao
  • Publication number: 20160027663
    Abstract: A method for chemical mechanical polishing of a substrate comprising ruthenium and copper.
    Type: Application
    Filed: July 28, 2014
    Publication date: January 28, 2016
    Inventors: Hongyu Wang, Lee Melbourne Cook, Jiun-Fang Wang, Ching-Hsun Chao
  • Publication number: 20090259066
    Abstract: A method for preparing a prostaglandin F analogue represented by the following formula (I) is disclosed, wherein R1, and are as defined in the specification.
    Type: Application
    Filed: July 3, 2008
    Publication date: October 15, 2009
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Hsiang Yao, Chun-Mei Yang, Hou-Hsun Chao, Ge-Ray Lee
  • Patent number: 7594841
    Abstract: A method for fabricating a carbon nanotube field emitter array is disclosed, which has the steps of (a) providing a substrate; (b) forming a cathode layer having a first pattern on the substrate; (c) forming an opaque insulating layer having a second pattern on the substrate, wherein a predetermined part of the cathode layer is exposed; (d) forming a gate layer having the second pattern on the opaque insulating layer; (e) forming a carbon nanotube layer on the entire top surface of the substrate; and (f) exposing the carbon nanotube layer to a light beam coming from the backside of the substrate.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: September 29, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Jyh-Rong Sheu, Ching-Hsun Chao, Liang-You Jiang, Yu-Yang Chang, Cheng-Chung Lee
  • Patent number: 7418978
    Abstract: In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: September 2, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Sandy Shih-Hsun Chao, Songjae Lee, Ho Seon Shin
  • Patent number: 7413763
    Abstract: A method of transferring imprint carbon nano-tube (CNT) field emitting source is disclosed. Firstly, cathode lines are screen printed on a substrate. Then a dielectric layer formation on the cathode lines and substrate is followed. Afterward, gate lines formed on the dielectric layer by screen printing are performed. Next a patterning process is carried out to form openings. Subsequently, an imprint negative mold is dipped with CNT paste and imprinted the CNT paste on the cathode lines through the openings. After drawing of pattern from the imprint mold, the CNT paste is cured by annealing. Since the emitting sources are formed through the imprint negative mold, as a result, the size and shape can be predetermined. Moreover, the intervals between gate line and the emitting source are readily control, which resolve the circuit short problem between gate and cathode. Consequently, the current density, brightness, and uniformity of the emitter sources are significantly improved.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: August 19, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Hsun Chao, Jyh-Rong Sheu, Liang-Yu Chiang, Yu-Yang Chang, Cheng-Chung Lee
  • Patent number: 7322869
    Abstract: A structure of a coplanar gate-cathode of triode CNT-FED and a manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, and formed on the substrate by Imprint Lithography and the plurality of dielectric openings are made by Imprint Lithography. The gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.
    Type: Grant
    Filed: July 21, 2006
    Date of Patent: January 29, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Hsun Chao, Jane-Hway Liao, Jyh-Rong Sheu, Yu-Yang Chang, Cheng-Chung Lee
  • Patent number: 7154214
    Abstract: A structure of a coplanar gate-cathode of triode CNT-FED and a manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, and formed on the substrate by Imprint Lithography and the plurality of dielectric openings are made by Imprint Lithography. The gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.
    Type: Grant
    Filed: June 9, 2004
    Date of Patent: December 26, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Hsun Chao, Jane-Hway Liao, Jyh-Rong Sheu, Yu-Yang Chang, Cheng-Chung Lee
  • Publication number: 20060258252
    Abstract: The present inventions provide a structure of coplanar gate-cathode of triode CNT-FED and the manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, made by forming on the substrate by Imprint Lithography and the plurality of dielectric opening made by Imprint Lithography too. Besides, the gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.
    Type: Application
    Filed: July 21, 2006
    Publication date: November 16, 2006
    Inventors: Ching-Hsun Chao, Jane-Hway Liao, Jyh-Rong Sheu, Yu-Yang Chang, Cheng-Chung Lee
  • Publication number: 20050253501
    Abstract: The present inventions provide a structure of coplanar gate-cathode of triode CNT-FED and the manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, made by forming on the substrate by Imprint Lithography and the plurality of dielectric opening made by Imprint Lithography too. Besides, the gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.
    Type: Application
    Filed: June 9, 2004
    Publication date: November 17, 2005
    Inventors: Ching-Hsun Chao, Jane-Hway Liao, Jyh-Rong Sheu, Yu-Yang Chang, Cheng-Chung Lee
  • Patent number: 6924503
    Abstract: An organic integrated device for thin film transistor and light emitting diode. The organic integrated device of the present invention includes a top-gate organic thin film transistor (top-gate OTFT) and an organic light emitting diode (OLED), both formed on the same substrate. In the organic integrated device, some layers can be commonly used by both OTFT and OLED, and some layers can be made of the same material and formed in the same course, which simplifies the entire process.
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: August 2, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Horng-Long Cheng, Yu-Wu Wang, Ching-Hsun Chao, Cheng-Chung Lee, Chai-Yuan Sheu
  • Publication number: 20050067937
    Abstract: A method for fabricating a carbon nanotube field emitter array is disclosed, which has the steps of (a) providing a substrate; (b) forming a cathode layer having a first pattern on the substrate; (c) forming an opaque insulating layer having a second pattern on the substrate, wherein a predetermined part of the cathode layer is exposed; (d) forming a gate layer having the second pattern on the opaque insulating layer; (e) forming a carbon nanotube layer on the entire top surface of the substrate; and (f) exposing the carbon nanotube layer to a light beam coming from the backside of the substrate.
    Type: Application
    Filed: June 2, 2004
    Publication date: March 31, 2005
    Applicant: Industrial Technology Research Institute
    Inventors: Jyh-Rong Sheu, Ching-Hsun Chao, Liang-You Jiang, Yu-Yang Chang, Cheng-Chung Lee
  • Publication number: 20050062195
    Abstract: A method of transferring imprint carbon nano-tube (CNT) field emitting source is disclosed. Firstly, cathode lines are screen printed on a substrate. Then a dielectric layer formation on the cathode lines and substrate is followed. Afterward, gate lines formed on the dielectric layer by screen printing are performed. Next a patterning process is carried out to form openings. Subsequently, an imprint negative mold is dipped with CNT paste and imprinted the CNT paste on the cathode lines through the openings. After drawing of pattern from the imprint mold, the CNT paste is cured by annealing. Since the emitting sources are formed through the imprint negative mold, as a result, the size and shape can be predetermined. Moreover, the intervals between gate line and the emitting source are readily control, which resolve the circuit short problem between gate and cathode. Consequently, the current density, brightness, and uniformity of the emitter sources are significantly improved.
    Type: Application
    Filed: November 14, 2003
    Publication date: March 24, 2005
    Inventors: Ching-Hsun Chao, Jyh-Rong Sheu, Liang-Yu Chiang, Yu-Yang Chang, Cheng-Chung Lee
  • Patent number: 6769945
    Abstract: A triode structure of a field emission display is manufactured with thick-film technology. The triode structure includes a cathode electrode layer that comprises a metallic catalyst. Isomeric carbon emitters can be grown on the cathode electrode layer by CVD process at a low temperature because of the metallic catalyst. Instead of mixing the metallic catalyst in the cathode electrode layer, a metallic catalyst layer can be formed on the cathode electrode layer to facilitate the growth of the isomeric carbon emitters. The combination of thick film technology and low temperature CVD process provide a low cost method for fabricating a large area field emission display with isomeric carbon emitters.
    Type: Grant
    Filed: August 24, 2002
    Date of Patent: August 3, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Yu-Yang Chang, Hua-Chi Cheng, Jyh-Rong Sheu, Ching-Hsun Chao, Kuang-Chung Chen
  • Patent number: D788134
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: May 30, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Vincent Wong, Ronald Ramnarine, Robert Housley, Sandy Shih-Hsun Chao, Mukesh Shah, Robert Ahrens
  • Patent number: D814488
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: April 3, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Vincent Wong, Ronald Ramnarine, Robert Housley, Sandy Shih-Hsun Chao, Mukesh Shah, Robert Ahrens