Abstract: A manufacturing method of a metal layer, a functional substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of a metal layer includes: forming an insulating layer on a base substrate; forming an etching buffer layer on the insulating layer; patterning the etching buffer layer and the insulating layer to form a plurality of recessed microstructures in the insulating layer; stripping the etching buffer layer; and forming a metal layer on the insulating layer, a surface of the metal layer adjacent to the insulating layer is formed with a plurality of protruded portions which are filled into the plurality of recessed microstructures. The manufacturing method of a metal layer may form a metal layer with anti-reflection effect.

Abstract: An array substrate, a display device, and a method for manufacturing the array substrate are disclosed. The array substrate includes a base substrate and a pixel array structure disposed on the base substrate, the pixel array structure includes at least one light shielding layer made of a light shielding material, and the light shielding material can prevent light leakage or light reflection, thereby increasing an opening ratio of the display device.

Abstract: The present application discloses A thin film transistor (TFT), including: a substrate; a source-drain layer comprising a source electrode and a drain electrode over the substrate; and an active layer comprising a poly-Si pattern and an amorphous-Si pattern having contact with the poly-Si pattern over the substrate. The amorphous-Si pattern is between the poly-Si pattern and the source-drain layer; the source electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in a direction substantially perpendicular to a surface of the substrate; and the drain electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in the direction substantially perpendicular to the surface of the substrate.

Abstract: The present disclosure provides a display substrate and a method for manufacturing the same, a display panel and a display device. The display substrate comprises a base substrate; and a composite film structure formed on the base substrate and composed of at least two thin films having different refractive indexes, wherein the composite film structure is capable of absorbing light with a wavelength in a predetermined wavelength range, and the predetermined wavelength range is located between two adjacent peaks of visible light waves.

Abstract: The present application discloses a shift register unit for outputting a gate driving signal to control image display in an operation cycle including sequentially an input phase, an output phase, an output-suspending phase, the shift register unit including a first node-control circuit connected to a pull-up node and a first pull-down node; a second node-control circuit connected to a pull-down control node and the pull-up node; a pull-up circuit connected to the pull-up node, a first input terminal for receiving a first clock signal, and an output terminal for outputting the gate driving signal, and configured to control the first clock signal to be passed from the first input terminal to the output terminal when the pull-up node is at a first potential level; a third node-control circuit connected to the pull-up node, the first pull-down node, the pull-down control node, and a second input terminal for receiving a second clock signal; and configured to control the first pull-down node to receive the second

Abstract: A method of manufacturing a thin-film transistor (TFT) array substrate, including: forming a gate layer, a gate insulating layer, an oxide semiconductor layer, a source/drain electrode layer and a pixel electrode layer on a base substrate. The step of forming the source/drain electrode layer and the pixel electrode layer includes: forming a transparent conductive film and a first metallic film on the oxide semiconductor layer in sequence, to form a stack layer of the transparent conductive film and the first metallic film, in which the transparent conductive film contacts the oxide semiconductor layer; and forming source electrodes, drain electrodes and pixel electrodes by a single patterning process on the stack layer of the transparent conductive film and the first metallic film. One patterning process is saved, the production time is shortened, and the production cost is reduced.

Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are disclosed. The method for manufacturing an array substrate includes: forming a first via hole for connecting a second transparent electrically conductive layer and a gate line layer, a second via hole for connecting a first transparent electrically conductive layer and the second transparent electrically conductive layer, and a third via hole for connecting the second transparent electrically conductive layer and a source/drain electrode layer on a base substrate through patterning process; performing a filling process on the first via hole, the second via hole and the third via hole during a pattern of second transparent electrically conductive layer is being formed, such that each of the three via holes has a top surface which is flush with the second transparent electrically conductive layer surrounding the respective via holes.

Abstract: The disclosure provides a thin film transistor (TFT) and a fabrication method thereof, an array substrate and a fabrication method thereof, and a display apparatus. The fabrication method of a TFT includes: forming a protection layer in an area on an active layer between a source electrode and a drain electrode to be formed, forming a source-drain metal layer above the active layer having the protection layer formed thereon, coating a photoresist on the source-drain metal layer, and forming a photoresist reserved area corresponding to areas of the source electrode and the drain electrode to be formed and a photoresist non-reserved area corresponding to the other area; etching off the source-drain metal layer corresponding to the photoresist non-reserved area to form the source and drain electrodes and expose the protection layer above the active layer; and removing the photoresist above the source and drain electrodes and the protection layer.

Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate, a signal line disposed on the base substrate, an extinction layer disposed between the base substrate and the signal line, the extinction layer being configured to reduce an ambient light when the array substrate is located on a light exiting side. An orthographic projection of the signal line in a plane of the base substrate is coincided with an orthographic projection of the extinction layer in the plane of the base substrate.

Abstract: The present invention provides an array substrate comprising a substrate, a metal conductive film layer, and an anti-reflective film layer located between the substrate and the metal conductive film layer, and a method for manufacturing the same, as well as a display device. The method comprises step S1: forming an anti-reflective film layer on a substrate by adjusting the reaction power and/or reactive gas flow during the formation of film by the chemical vapor deposition process; and step S2: forming a metal conductive film layer on the substrate finished in step S1. Through the preparation method of the array substrate, the anti-reflective film layer can have a sand-like granulation structure, such that light reflected from the metal conductive film layer can be blocked, thereby weakening or avoiding the light reflected from the surface of the metal conductive film layer, further improving the display effect of the array substrate.

Abstract: An array substrate, a display panel, a display device, and a method for fabricating an array substrate are provided. The array substrate comprises gate lines and data lines on a substrate plate which are insulated from each other and intersect to define sub-pixel units, and the data lines comprise a first data line and a second data line which are arranged side by side between two neighboring columns of sub-pixel units. Between two of the sub-pixel units which are neighbors in a column direction, at least a portion of the first data line is arranged in a layer different from the neighboring second data line. At least a part of the first data line is arranged in a layer different from that of the neighboring second data line, to overcome the problem of short circuit between dual data lines.

Abstract: A substrate and a manufacturing method thereof, and a display device are provided. The substrate comprises a base substrate (101), a metal black matrix (111) and an anti-reflection pattern (112A, 112B) for reducing optical reflectivity of the metal black matrix (111), which are arranged on the base substrate (101), and the anti-reflection pattern (112A, 112B) is arranged on a side of the metal black matrix (111) close to a light emission side of the substrate. The anti-reflection pattern (112A, 112B) reduces reflectivity of the metal black matrix (111) on outside ambient light, increases a display contrast of a display device that includes the substrate, and thus improves display quality of the pictures.

Abstract: The present disclosure provide an array substrate and a method of manufacturing the same, and a display panel. The array substrate includes: a base substrate; a first signal transmission layer comprising a common electrode line; a first insulating layer covering the first signal transmission layer and having a first through hole at a position corresponding to the common electrode line; a first electrode layer located on the first insulating layer, the first electrode layer comprising a connection electrode located at the position of the first through hole; a second insulating layer covering the first electrode layer and having a second through hole at a position corresponding to the connection electrode; and a second electrode layer comprising a common electrode that covers the second through hole; the connection electrode contacts the common electrode line and the common electrode respectively.

Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are disclosed.

Abstract: The present invention discloses a method for manufacturing a thin-film transistor, comprising the steps of: forming a semiconductor active layer, and a doped semiconductor active layer; forming a source-drain metal layer; forming a channel region; and implanting ions for lowering the TFT leakage current into the surface of the semiconductor active layer in the channel region via ion implantation after forming the channel region. The invention further relates to a thin-film transistor, a TFT array substrate and a display device. The invention has the following beneficial effects: by implanting ions for lowering the TFT leakage current into the channel region, the electrical performance of a TFT may be improved, and the thickness of a semiconductor active layer in a channel region may be changed controllably.

Abstract: A touch display panel, a manufacturing method thereof and a method of detecting a touch for the same are disclosed. The touch display panel includes a first substrate (01) and a second substrate (02). The first substrate (01) includes, within its non-display region, a plurality of gate lines (10) parallel to each other, a plurality of data lines (20) parallel to each other, a plurality of first touch electrode lines (30) parallel to the gate lines (10), and a plurality of second touch electrode lines (40) parallel to the data lines (20). The first substrate (01) further includes first touch electrodes (50) electrically connected to the first touch electrode lines (30) and second touch electrodes (60) electrically connected to the second touch electrode lines (40). Between two adjacent data lines (20), there are two sub-pixels arranged in the same row on the first substrate (01). A second touch electrode line (40) is located between the two sub-pixels.

Abstract: An array substrate and a manufacturing method thereof, a display panel, and a display device are provided. The array substrate includes a substrate; a source-drain metallic layer and a first passivation metallic protective layer formed in sequence on the substrate, the source-drain metallic layer including a source electrode and a drain electrode not contacted with each other; a conductive protection layer formed on the substrate on which the first passivation metallic protection layer has been formed; and a pixel electrode formed on the substrate on which the conductive protection layer has been formed, the pixel electrode contacting the conductive protection layer.

Abstract: The invention discloses an array substrate, and a method for repairing a broken data line on an array substrate. The method for repairing a broken data line on an array substrate includes steps: performing a treatment on a part of a semiconductor layer corresponding to an opening in a data line so that the part of the semiconductor layer becomes a conductive region, and the ends of the opening in the data line are electrically connected to each other by the conductive semiconductor layer. The above method for repairing a broken data line provided by the invention is not affected by the linewidth of the data line so that the broken data line can be repaired in the case that the linewidth of the data line is relatively small.

Abstract: An embodiment of the present invention discloses a 3D barrier substrate and a method for manufacturing the same, and a display device in order to improve the utilization of facilities, increase the production efficiency, and decrease the cost of production. The method of manufacturing 3D barrier substrate comprises: forming a transparent electrode thin film on a substrate, and forming a passivation layer on the transparent electrode thin film; forming an transparent electrode and a passivation layer via hole by a patterning process, wherein the via hole is used for coupling the transparent electrode to the signal line; and forming a signal line, wherein the signal line is coupled to the transparent electrode through the via hole.

Abstract: A thin film transistor and manufacturing method thereof, an array substrate comprising the thin film transistor and manufacturing method thereof are provided. The method of manufacturing the thin film transistor comprises forming an active layer and a source-drain electrode layer, forming a photoresist layer on the source-drain electrode layer and forming a pattern of the photoresist layer by a pattern process; etching the source-drain electrode layer by using the pattern of the photoresist layer as a mask to form a pattern of the source-drain electrode layer including a source electrode and a drain electrode; and removing the photoresist, then etching the active layer by using the pattern of the source-drain electrode layer as a mask to form a pattern of the active layer.