Abstract: Advanced atomic force microscopy (AFM) methods and apparatuses are presented. An embodiment may comprise performing a first scan at a first angle, a second scan at a second angle, and correcting a system drift error in the first scan based on the second scan. Another embodiment may comprise performing a global scan of a first area, a local scan of a second area within the first area, correcting a leveling error in the local scan based on the global scan, and outputting a corrected sample image. Another embodiment may comprise performing a first scan at a first position at a first angle, a second scan at a flat region using the same scan angle and scan size to correct a scanner runout error in the first scan based on the second scan.

Abstract: An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.

Abstract: A semi-automated method for atomic force microscopy (“AFM”) scanning of a sample is disclosed. The method can include manually teaching a sample and AFM tip relative location on an AFM tool; then scanning, via a predefined program, on the same sample or other sample with same pattern to produce more images automatically.

Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.

Abstract: In certain embodiments, a probe scans a surface to produce a first scan. The first scan is used to estimate a vertical offset for scanning the surface to produce a second scan. In certain embodiments, an AFM device engages a probe to a surface using a piezo voltage. The probe scans the surface to produce a first scan. The first scan is used to estimate a vertical offset such that the probe uses the piezo voltage to engage the surface for a second scan at a different vertical position.

Abstract: A method and associated apparatus for topographically characterizing a workpiece. The workpiece is scanned with a scanning probe along a first directional grid, thereby scanning a reference surface and an area of interest subportion of the reference surface, at a variable pixel density including a first pixel density outside the area of interest and a second pixel density inside the area of interest to derive a first digital file characterizing topography of the workpiece. The workpiece is further scanned along the reference surface and the area of interest with the scanning probe along a second directional grid that is substantially orthogonal to the first directional grid and at a constant pixel density to derive a second digital file characterizing topography of the workpiece. A processor executes computer-readable instructions stored in memory that generate a topographical profile of the workpiece in relation to the first and second digital files.

Abstract: An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.

Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.

Abstract: A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.

Abstract: A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.

Abstract: A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.

Abstract: Macrolide and ketolides, and compositions containing the same, useful in the treatment of tuberculosis are disclosed. Methods of treating tuberculosis using the macrolides and ketolides, and compositions containing the same, also are disclosed.