Patents by Inventor Hung-Cheng Sung
Hung-Cheng Sung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Method of converting between non-volatile memory technologies and system for implementing the method
Patent number: 9589095Abstract: A method of designing a charge trapping memory array includes designing a memory array layout. The memory array layout includes a first type of transistors; electrical connections between memory cells of the memory array layout; a first input/output (I/O) interface; and a charge pump. The method further includes modifying the memory array layout, using a processor, to replace the first type of transistors with a second type of transistors different than the first type of transistors. The method further includes modifying the memory array layout, using the processor, to modify the charge pump based on an operating voltage of the second type of transistors.Type: GrantFiled: October 8, 2015Date of Patent: March 7, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hung-Cheng Sung, Yue-Der Chih, Chia-Hsing Chen -
METHOD OF CONVERTING BETWEEN NON-VOLATILE MEMORY TECHNOLOGIES AND SYSTEM FOR IMPLEMENTING THE METHOD
Publication number: 20160034629Abstract: A method of designing a charge trapping memory array includes designing a memory array layout. The memory array layout includes a first type of transistors; electrical connections between memory cells of the memory array layout; a first input/output (I/O) interface; and a charge pump. The method further includes modifying the memory array layout, using a processor, to replace the first type of transistors with a second type of transistors different than the first type of transistors. The method further includes modifying the memory array layout, using the processor, to modify the charge pump based on an operating voltage of the second type of transistors.Type: ApplicationFiled: October 8, 2015Publication date: February 4, 2016Inventors: Hung-Cheng SUNG, Yue-Der CHIH, Chia-Hsing CHEN -
Method of converting between non-volatile memory technologies and system for implementing the method
Patent number: 9171120Abstract: A method of designing a charge trapping memory array including designing a floating gate memory array layout. The floating gate memory layout includes a first type of transistors, electrical connections between memory cells of the floating gate memory array layout, a first input/output (I/O) interface, a first type of charge pump, and an I/O block. The method further includes modifying the floating gate memory array layout, using a processor, to replace the first type of transistors with a second type of transistors different than the first type of transistors. The method further includes determining an operating voltage difference between the I/O block and the second type of transistors. The method further includes modifying the floating gate memory array layout, using the processor, to modify the first charge pump based on the determined operating voltage difference.Type: GrantFiled: December 11, 2014Date of Patent: October 27, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hung-Cheng Sung, Yue-Der Chih, Chia-Hsing Chen -
METHOD OF CONVERTING BETWEEN NON-VOLATILE MEMORY TECHNOLOGIES AND SYSTEM FOR IMPLEMENTING THE METHOD
Publication number: 20150095868Abstract: A method of designing a charge trapping memory array including designing a floating gate memory array layout. The floating gate memory layout includes a first type of transistors, electrical connections between memory cells of the floating gate memory array layout, a first input/output (I/O) interface, a first type of charge pump, and an I/O block. The method further includes modifying the floating gate memory array layout, using a processor, to replace the first type of transistors with a second type of transistors different than the first type of transistors. The method further includes determining an operating voltage difference between the I/O block and the second type of transistors. The method further includes modifying the floating gate memory array layout, using the processor, to modify the first charge pump based on the determined operating voltage difference.Type: ApplicationFiled: December 11, 2014Publication date: April 2, 2015Inventors: Hung-Cheng SUNG, Yue-Der CHIH, Chia-Hsing CHEN -
Method of converting between non-volatile memory technologies and system for implementing the method
Patent number: 8930866Abstract: A method of designing a charge trapping memory array including designing a floating gate memory array layout. The floating gate memory layout includes a first type of transistors, electrical connections between memory cells of the floating gate memory array layout, a first input/output (I/O) interface, a first type of charge pump, and an I/O block. The method further includes modifying the floating gate memory array layout, using a processor, to replace the first type of transistors with a second type of transistors different than the first type of transistors. The method further includes determining an operating voltage difference between the I/O block and the second type of transistors. The method further includes modifying the floating gate memory array layout, using the processor, to modify the first charge pump based on the determined operating voltage difference.Type: GrantFiled: March 11, 2013Date of Patent: January 6, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hung-Cheng Sung, Yue-Der Chih, Chia-Hsing Chen -
Patent number: 8906767Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant.Type: GrantFiled: December 13, 2013Date of Patent: December 9, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yue-Der Chih, Jam-Wem Lee, Cheng-Hsiung Kuo, Tsung-Che Tsai, Ming-Hsiang Song, Hung-Cheng Sung, Hung Cho Wang
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Publication number: 20140094009Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant.Type: ApplicationFiled: December 13, 2013Publication date: April 3, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yue-Der Chih, Jam-Wem Lee, Cheng-Hsiung Kuo, Tsung-Che Tsai, Ming-Hsiang Song, Hung-Cheng Sung, Hung Cho Wang
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Patent number: 8610220Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant.Type: GrantFiled: May 16, 2012Date of Patent: December 17, 2013Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yue-Der Chih, Jam-Wem Lee, Cheng-Hsiung Kuo, Tsung-Che Tsai, Ming-Hsiang Song, Hung-Cheng Sung, Roger Wang
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Publication number: 20130307080Abstract: A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant.Type: ApplicationFiled: May 16, 2012Publication date: November 21, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yue-Der Chih, Jam-Wem Lee, Cheng-Hsiung Kuo, Tsung-Che Tsai, Ming-Hsiang Song, Hung-Cheng Sung, Roger Wang
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Patent number: 8384149Abstract: A semiconductor memory device includes a substrate, and a trench formed in the substrate. First and second floating gates, each associated with corresponding first and second memory cells, extend into the trench. Since the trench can be made relatively deep, the floating gates may be made relatively large while the lateral dimensions of the floating gates remains small. Moreover, the insulator thickness between the floating gate and a sidewall of the trench where a channel region is formed can be made relatively thick, even though the lateral extent of the memory cell is reduced. A programming gate extends into the trench between the first and second floating gates, and is shared, along with a source region, by the two memory cells.Type: GrantFiled: April 19, 2007Date of Patent: February 26, 2013Assignee: Taiwan Semiconductor Manufacturing Company, LtdInventors: Shih Wei Wang, Te-Hsun Hsu, Hung-Cheng Sung
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Patent number: 7951670Abstract: A split gate memory cell. A floating gate is disposed on and insulated from a substrate comprising an active area separated by a pair of isolation structures formed therein. The floating gate is disposed between the pair of isolation structures and does not overlap the upper surface thereof. A cap layer is disposed on the floating gate. A control gate is disposed over the sidewall of the floating gate and insulated therefrom, partially extending to the upper surface of the cap layer. A source region is formed in the substrate near one side of the floating gate.Type: GrantFiled: March 6, 2006Date of Patent: May 31, 2011Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chen-Ming Huang, Hung-Cheng Sung, Wen-Ting Chu, Chang-Jen Hsieh, Ya-Chen Kao
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Patent number: 7880217Abstract: A programmable non-volatile memory (PNVM) device and method of forming the same compatible with CMOS logic device processes to improve a process flow, the PNVM device including a semiconductor substrate active area; a gate dielectric on the active area; a floating gate electrode on the gate dielectric; an inter-gate dielectric disposed over the floating gate electrode; and, a control gate damascene electrode extending through a dielectric insulating layer in electrical communication with the inter-gate dielectric, the control gate damascene electrode disposed over an upper portion of the floating gate electrode.Type: GrantFiled: July 30, 2005Date of Patent: February 1, 2011Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hung-Cheng Sung, Te-Hsun Hsu, Shih-Wei Wang
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Patent number: 7667261Abstract: Split-gate memory cells and fabrication methods thereof. A split-gate memory cell comprises a plurality of isolation regions formed on a semiconductor substrate along a first direction, between two adjacent isolation regions defining an active region having a pair of drains and a source region. A top level of the active regions is lower than a top level of the isolation regions. A pair of floating gates is disposed on the active regions and aligned with the isolation regions, wherein a passivation layer is disposed on the floating gate to prevent thinning from CMP. A pair of control gates is self-aligned with the floating gates and disposed on the floating gates along a second direction. A source line is disposed between the pair of control gates along the second direction. A pair of select gates is disposed on the outer sidewalls of the pair of control gates along the second direction.Type: GrantFiled: April 17, 2007Date of Patent: February 23, 2010Assignee: Taiwan Semiconductor Manufacturing Co., LtdInventors: Chang-Jen Hsieh, Hung-Cheng Sung, Wen-Ting Chu, Chen-Ming Huang, Ya-Chen Kao, Shih-Chang Liu, Chi-Hsin Lo, Chung-Yi Yu, Chia-Shiung Tsai
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Patent number: 7652318Abstract: Split-gate memory cells and fabrication methods thereof. A split-gate memory cell comprises a plurality of isolation regions formed on a semiconductor substrate along a first direction, between two adjacent isolation regions defining an active region having a pair of drains and a source region. A pair of floating gates are disposed on the active regions and self-aligned with the isolation regions, wherein a top level of the floating gate is equal to a top level of the isolation regions. A pair of control gates are self-aligned with the floating gates and disposed on the floating gates along a second direction. A source line is disposed between the pair of control gates along the second direction. A pair of select gates are disposed on the outer sidewalls of the pair of control gates along the second direction.Type: GrantFiled: November 3, 2006Date of Patent: January 26, 2010Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chang-Jen Hsieh, Hung-Cheng Sung, Wen-Ting Chu, Chen-Ming Huang, Ya-Chen Kao, Shih-Chang Liu, Chi-Hsin Lo, Chung-Yi Yu, Chia-Shiung Tsai
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Patent number: 7608884Abstract: A system and method provides an improved source-coupling ratio in flash memories. In one embodiment, a flash memory cell system with high source-coupling ratio includes at least a conventional floating gate device having a floating gate, a drain and a source. The floating gate is formed over a first junction for charging the floating gate by electron injection from the source to the floating gate and at least a first dielectric is layered on top of the floating gate to form a second junction. At least a first polycrystalline silicon is layered on top of the first dielectric, the first polycrystalline silicon electrically connected to the source. Electron tunneling provided through the second junction to the floating gate charges the floating gate, thereby increasing the source-coupling ratio of the floating gate and increasing the efficiency of storing electrical charge.Type: GrantFiled: March 24, 2005Date of Patent: October 27, 2009Assignee: Taiwan Semiconductor Manufactruing Co., Ltd.Inventors: Te-Hsun Hsu, Hung-Cheng Sung
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Patent number: 7557402Abstract: An embedded flash cell structure comprising a structure, a first floating gate having an exposed side wall over the structure, a second floating gate having an exposed side wall over the structure and spaced apart from the first floating gate, a first pair of spacers over the respective first floating gate and the second floating gate, a second pair of spacers at least over the respective exposed side walls of the first and second floating gates, a source area in the structure between the second pair of spacers, a plug over the source implant, and first and second control gates outboard of the first pair of spacers and exposing outboard portions of the structure and respective drain areas in the exposed outboard portions of the structure is provided. A method of forming the embedded flash cell structure is also provided.Type: GrantFiled: November 15, 2006Date of Patent: July 7, 2009Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Der-Shin Shyu, Hung-Cheng Sung, Chen-Ming Huang
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Publication number: 20080258200Abstract: A semiconductor memory device includes a substrate, and a trench formed in the substrate. First and second floating gates, each associated with corresponding first and second memory cells, extend into the trench. Since the trench can be made relatively deep, the floating gates may be made relatively large while the lateral dimensions of the floating gates remains small. Moreover, the insulator thickness between the floating gate and a sidewall of the trench where a channel region is formed can be made relatively thick, even though the lateral extent of the memory cell is reduced. A programming gate extends into the trench between the first and second floating gates, and is shared, along with a source region, by the two memory cells.Type: ApplicationFiled: April 19, 2007Publication date: October 23, 2008Inventors: Shih Wei Wang, Te-Hsun Hsu, Hung-Cheng Sung
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Patent number: 7417278Abstract: A split-gate flash memory cell having a three-dimensional source capable of three-dimensional coupling with the floating gate of the cell, as well as a method of forming the same are provided. This is accomplished by first forming an isolation trench, lining it with a conformal oxide, then filling with an isolation oxide and then etching the latter to form a three-dimensional coupling region in the upper portion of the trench. A floating gate is next formed by first filling the three-dimensional region of the trench with polysilicon and etching it. The control gate is formed over the floating gate with an intervening inter-poly oxide. The floating gate forms legs extending into the three-dimensional coupling region of the trench thereby providing a three-dimensional coupling with the source which also assumes a three-dimensional region. The leg or the side-wall of the floating gate forming the third dimension provides the extra area through which coupling between the source and the floating gate is increased.Type: GrantFiled: May 5, 2005Date of Patent: August 26, 2008Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chia-Ta Hsieh, Yai-Fen Lin, Di-Son Kuo, Hung-Cheng Sung, Jack Yeh
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Publication number: 20080121975Abstract: Split-gate memory cells and fabrication methods thereof. A split-gate memory cell comprises a plurality of isolation regions formed on a semiconductor substrate along a first direction, between two adjacent isolation regions defining an active region having a pair of drains and a source region. A pair of floating gates are disposed on the active regions and self-aligned with the isolation regions, wherein a top level of the floating gate is equal to a top level of the isolation regions. A pair of control gates are self-aligned with the floating gates and disposed on the floating gates along a second direction. A source line is disposed between the pair of control gates along the second direction. A pair of select gates are disposed on the outer sidewalls of the pair of control gates along the second direction.Type: ApplicationFiled: November 3, 2006Publication date: May 29, 2008Inventors: Chang-Jen Hsieh, Hung-Cheng Sung, Wen-Ting Chu, Chen-Ming Huang, Ya-Chen Kao, Shih-Chang Liu, Chi-Hsin Lo, Chung-Yi Yu, Chia-Shiung Tsai
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Publication number: 20080105917Abstract: Split-gate memory cells and fabrication methods thereof. A split-gate memory cell comprises a plurality of isolation regions formed on a semiconductor substrate along a first direction, between two adjacent isolation regions defining an active region having a pair of drains and a source region. A top level of the active regions is lower than a top level of the isolation regions. A pair of floating gates is disposed on the active regions and aligned with the isolation regions, wherein a passivation layer is disposed on the floating gate to prevent thinning from CMP. A pair of control gates is self-aligned with the floating gates and disposed on the floating gates along a second direction. A source line is disposed between the pair of control gates along the second direction. A pair of select gates is disposed on the outer sidewalls of the pair of control gates along the second direction.Type: ApplicationFiled: April 17, 2007Publication date: May 8, 2008Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chang-Jen Hsieh, Hung-Cheng Sung, Wen-Ting Chu, Chen-Ming Huang, Ya-Chen Kao, Shih-Chang Liu, Chi-Hsin Lo, Chung-Yi Yu, Chia-Shiung Tsai