Patents by Inventor Hung-Jen Hsu

Hung-Jen Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050001281
    Abstract: A packaged image sensing device of improved sensitivity is formed by providing a mechanism for enhancing the focusing of embedded microlenses on the photosensitive elements of the image sensor. Normally, the bonding material interposed between the packaging layers and the microlenses defocuses the microlenses. In one embodiment of the present invention, the focus is restored by interposing an intermediate optically refractive layer between the bonding material and the lenses. In another embodiment, a bonding material with a lower index of refraction is used. In a final embodiment, the microlenses are formed in a material of a higher index of refraction.
    Type: Application
    Filed: June 1, 2004
    Publication date: January 6, 2005
    Inventors: Hung-Jen Hsu, Chiu-Kung Chang, Fu-Tien Wong, Te-Fu Tseng
  • Publication number: 20040265752
    Abstract: A method of fabricating microlens devices. The method includes filling the bond pad areas and scribe lines, or other areas, to improve the topography of the semiconductor wafer surface. A microlens material is applied to the surface after the bond pad areas and scribe lines have been filled. Because of the improved topography, the thickness of the microlens material is more uniform, thereby facilitating the formation of uniformly shaped microlenses.
    Type: Application
    Filed: June 30, 2003
    Publication date: December 30, 2004
    Inventors: Hung-Jen Hsu, Chih-Kung Chang, Fu-Tien Weng, Te-Fu Tseng, Chin-Chen Kuo, Chiung-Yuan Chang
  • Publication number: 20040248384
    Abstract: A method for processing a semiconductor substrate includes providing a substrate having at least one filter region with a plurality of bond pads in it. Metal is deposited above the bond pads, to reduce the bond pad step height. A planarization layer is formed such that the deposited metal has a height near to a height of the planarization layer. At least one color resist layer is formed above the planarization layer.
    Type: Application
    Filed: February 17, 2004
    Publication date: December 9, 2004
    Inventors: Chin Chen Kuo, Chih-Kung Chang, Hung-Jen Hsu, Fu-Tien Weng, Te-Fu Tseng
  • Publication number: 20040248383
    Abstract: A method for processing a semiconductor substrate comprises the steps of: providing a substrate having a plurality of scribe lines arranged to form at least one filter region surrounded by the scribe lines, the scribe lines having a step height; at least partially filling the scribe lines with a resist material to reduce the step height of the scribe lines; and forming at least one color resist layer within the at least one filter region while the insoluble resist material remains in the scribe lines.
    Type: Application
    Filed: June 6, 2003
    Publication date: December 9, 2004
    Inventors: Fu-Tien Weng, Yu-Kung Hsiao, Hung-Jen Hsu, Yi-Ming Dai, Chin-Chen Kuo, Te-Fu Tseng
  • Publication number: 20040147105
    Abstract: A method for fabricating a microelectronic product provides for forming a planarizing layer upon a bond pad and a topographic feature, both formed laterally separated over a substrate. The planarizing layer is formed with a diminished thickness upon the bond pad such that it may be readily etched to expose the bond pad while employing as a mask an additional layer formed over the topographic feature but not over the bond pad. The method is particularly useful for forming color filter sensor image array optoelectronic products with attenuated bond pad corrosion.
    Type: Application
    Filed: January 29, 2003
    Publication date: July 29, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Kung Chang, Yu-Kung Hsiao, Sheng-Liang Pan, Fu-Tien Wong, Chin-Chen Kuo, Chung-Sheng Hsiung, Hung-Jen Hsu, Yi-Ming Dai, Po-Wen Lin, Te-Fu Tseng
  • Patent number: 6759276
    Abstract: A new method is provided of treating the wafer prior to the process of singulating the wafer into individual die. A surface of the wafer over which CMOS image sensor devices have been created is coated with a layer of material that is non-soluble in water. The wafer is singulated by sawing through the layer of material that has been coated over the surface of the wafer and by then sawing through the wafer. The singulated die is then further processed by applying steps of die mount, wire bonding, surrounding the die in a mold compound and marking the package.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: July 6, 2004
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Hung-Jen Hsu, Yu-Kung Hsiao, Chih-Kung Chang, Sheng-Liang Pan
  • Publication number: 20040023470
    Abstract: A new method is provided of treating the wafer prior to the process of singulating the wafer into individual die. A first surface of the wafer over which CMOS image sensor devices have been created is coated with a layer of material that is non-soluble in water. The wafer is attached to a tape by bringing a second surface of the wafer in contact with the tape. The wafer is singulated by approaching the first surface of the wafer and by sawing first through the layer of material that has been coated over the first surface of the wafer and by then sawing through the wafer, stopping at the surface of the tape. A thorough water rinse is applied to the surface of the singulated wafer, followed by a wafer clean applying specific chemicals for this purpose. The singulated die is now removed from the tape and further processed by applying steps of die mount, wire bonding, surrounding the die in a mold compound and marking the package.
    Type: Application
    Filed: May 7, 2003
    Publication date: February 5, 2004
    Inventors: Hung-Jen Hsu, Yu-Kung Hsiao, Chih-Kung Chang, Sheng-Liang Pan