Patents by Inventor Hung-Yu Chen

Hung-Yu Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250075019
    Abstract: A method for manufacturing a nitrile butadiene rubber includes: subjecting a material composition containing water, butadiene, acrylonitrile, an emulsifying agent, an initiator, and a molecular weight regulator to an emulsion polymerization reaction, so as to form an emulsion; and adding a reactive antioxidant and a non-reactive antioxidant to the emulsion to form a mixture, followed by subjecting the mixture to a coagulation process, so as to form the nitrile butadiene rubber.
    Type: Application
    Filed: December 11, 2023
    Publication date: March 6, 2025
    Inventors: Chun-Chuan SHIH, Yen-Ju CHEN, Hung-Yu CHEN, Pen-Hsin CHOU
  • Publication number: 20250048668
    Abstract: A nitride-based semiconductor device includes a first and second nitride-based semiconductor layers, two or more source/drain (S/D) electrodes, a gate electrode, a doped III-V semiconductor layer, a gate protection layer and a first passivation layer. The doped III-V semiconductor layer is disposed between the second nitride-based semiconductor layer and the gate electrode. The gate protection layer caps the gate electrode and the doped III-V semiconductor layer and is separated from the S/D electrodes. The first passivation layer covers the second nitride-based semiconductor layer and the gate protection layer and abuts against sidewalls of the S/D electrodes which are separated from the gate protection layer by the first passivation layer.
    Type: Application
    Filed: June 11, 2021
    Publication date: February 6, 2025
    Inventors: Liuchang MENG, Hung-Yu CHEN, Kaiming FAN
  • Publication number: 20240371725
    Abstract: A method of forming a semiconductor structure includes: attaching a semiconductor device to a first surface of a substrate; placing a thermal interface material (TIM) film over a first side of the semiconductor device distal from the substrate, where the TIM film is pre-formed before the placing, where after the placing, a peripheral portion of the TIM film extends laterally beyond sidewalls of the semiconductor device; and attaching a lid to the first surface of the substrate to form an enclosed space between the lid and the substrate, where after attaching the lid, the semiconductor device and the TIM film are disposed in the enclosed space, where a first side of the TIM film distal from the substrate contacts the lid.
    Type: Application
    Filed: July 17, 2024
    Publication date: November 7, 2024
    Inventors: Chih-Hao Chen, Hung-Yu Chen, Pu Wang, Li-Hui Cheng, Szu-Wei Lu
  • Patent number: 12126265
    Abstract: A switch mode power supply circuit with high voltage output, an electrostatic spray apparatus and agricultural plant protection apparatus using the same are provided. The switch mode power supply circuit is electrically connected in series with at least a pre-stage power converter and a post-stage power converter. In order to simplify the control, the switch of the pre-stage power converter is omitted, only one switch of the post-stage power converter is adopted to perform synchronous control. Since the multiple sets of power conversion circuits in the previous stage are connected in series, the turn ratio of the transformer in the power converter in the subsequent stage can be reduced. Therefore, the transformer can be miniaturized and the power supply circuit would be more suitable for agricultural plant protection machine and electrostatic spray apparatus.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: October 22, 2024
    Assignee: NATIONAL FORMOSA UNIVERSITY
    Inventors: Yu-Kai Chen, Chau-Chung Song, Hung-Yu Chen
  • Patent number: 12100640
    Abstract: A method of forming a semiconductor structure includes: attaching a semiconductor device to a first surface of a substrate; placing a thermal interface material (TIM) film over a first side of the semiconductor device distal from the substrate, where the TIM film is pre-formed before the placing, where after the placing, a peripheral portion of the TIM film extends laterally beyond sidewalls of the semiconductor device; and attaching a lid to the first surface of the substrate to form an enclosed space between the lid and the substrate, where after attaching the lid, the semiconductor device and the TIM film are disposed in the enclosed space, where a first side of the TIM film distal from the substrate contacts the lid.
    Type: Grant
    Filed: June 2, 2023
    Date of Patent: September 24, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Hao Chen, Hung-Yu Chen, Pu Wang, Li-Hui Cheng, Szu-Wei Lu
  • Publication number: 20240188303
    Abstract: An apparatus for novel high-speed low power non-volatile memory for the next generation electronic memory and computing technology is provided. The apparatus may include a ferroelectric tunnel junction (FTJ) that can switch between two or more conductance states in a reversible and non-volatile manner. A ferroelectric tunnel junction (FTJ) having two electrodes separated by a thin ferroelectric (FE) insulating layer has potential to replace existing volatile and non-volatile memory. Through the application of electrical pulses, the electrical resistance of an FTJ can be reversibly changed in a non-volatile manner by switching the ferroelectric polarization in the ferroelectric insulator layer.
    Type: Application
    Filed: June 22, 2022
    Publication date: June 6, 2024
    Applicant: UNIVERSITY OF SOUTHERN CALIFORNIA
    Inventors: Han Wang, Jiang-Bin Wu, Hung-Yu Chen
  • Publication number: 20240099695
    Abstract: A capacitive ultrasonic transducer device includes a substrate, a first capacitive structure, a second capacitive structure, a first film structure and a second film structure. The first capacitive structure is disposed on the substrate, and includes a first electrode and a second electrode. A first gap and a dielectric layer are located between the first electrode and the second electrode. The second capacitive structure is disposed on the substrate, and includes a third electrode and a fourth electrode. A second gap is located between the third electrode and the fourth electrode. The first film structure is configured to seal the first gap. The second film structure is connected to the third electrode and the fourth electrode, and configured to seal the second gap. A first width between the first electrode and the second electrode is different from a second width of the second gap.
    Type: Application
    Filed: December 18, 2022
    Publication date: March 28, 2024
    Inventors: Sheng-Shian LI, Hung-Yu CHEN, Ming-Huang LI, Po-I SHIH
  • Publication number: 20240030329
    Abstract: A semiconductor device includes a substrate, a first and a second nitride-based semiconductor layers, a doped nitride-based semiconductor layer, a gate electrode, a first and a second dielectric protection layers. The second nitride-based semiconductor layer has a bandgap greater than a bandgap of the first nitride-based semiconductor layer. The first and the second dielectric protection layers include oxygen. The first dielectric protection layer is conformal with a profile collectively constructed by the gate electrode, the doped nitride-based semiconductor layer, and the second nitride-based semiconductor layer. The second dielectric protection layer is in contact with the first dielectric protection layer. The first dielectric protection layer has an oxygen concentration less than that of the second dielectric protection layer.
    Type: Application
    Filed: August 17, 2021
    Publication date: January 25, 2024
    Inventors: Pan WANG, Wen-Yuan HSIEH, Hung-Yu CHEN
  • Publication number: 20230378017
    Abstract: An embodiment is a device including a package component including an integrated circuit die and conductive connectors connected to the integrated circuit die, the conductive connectors disposed at a first side of the package component. The device also includes a metal layer on a second side of the package component, the second side being opposite the first side. The device also includes a thermal interface material on the metal layer. The device also includes a lid on the thermal interface material. The device also includes a retaining structure on sidewalls of the package component and the thermal interface material. The device also includes a package substrate connected to the conductive connectors, the lid being adhered to the package substrate.
    Type: Application
    Filed: August 19, 2022
    Publication date: November 23, 2023
    Inventors: Ping-Yin Hsieh, Pu Wang, Li-Hui Cheng, Ying-Ching Shih, Hung-Yu Chen
  • Publication number: 20230317552
    Abstract: A method of forming a semiconductor structure includes: attaching a semiconductor device to a first surface of a substrate; placing a thermal interface material (TIM) film over a first side of the semiconductor device distal from the substrate, where the TIM film is pre-formed before the placing, where after the placing, a peripheral portion of the TIM film extends laterally beyond sidewalls of the semiconductor device; and attaching a lid to the first surface of the substrate to form an enclosed space between the lid and the substrate, where after attaching the lid, the semiconductor device and the TIM film are disposed in the enclosed space, where a first side of the TIM film distal from the substrate contacts the lid.
    Type: Application
    Filed: June 2, 2023
    Publication date: October 5, 2023
    Inventors: Chih-Hao Chen, Hung-Yu Chen, Pu Wang, Li-Hui Cheng, Szu-Wei Lu
  • Publication number: 20230291318
    Abstract: A switch mode power supply circuit with high voltage output, an electrostatic spray apparatus and agricultural plant protection apparatus using the same are provided. The switch mode power supply circuit is electrically connected in series with at least a pre-stage power converter and a post-stage power converter. In order to simplify the control, the switch of the pre-stage power converter is omitted, only one switch of the post-stage power converter is adopted to perform synchronous control. Since the multiple sets of power conversion circuits in the previous stage are connected in series, the turn ratio of the transformer in the power converter in the subsequent stage can be reduced. Therefore, the transformer can be miniaturized and the power supply circuit would be more suitable for agricultural plant protection machine and electrostatic spray apparatus.
    Type: Application
    Filed: October 4, 2022
    Publication date: September 14, 2023
    Inventors: YU-KAI CHEN, CHAU-CHUNG SONG, HUNG-YU CHEN
  • Patent number: 11705381
    Abstract: A method of forming a semiconductor structure includes: attaching a semiconductor device to a first surface of a substrate; placing a thermal interface material (TIM) film over a first side of the semiconductor device distal from the substrate, where the TIM film is pre-formed before the placing, where after the placing, a peripheral portion of the TIM film extends laterally beyond sidewalls of the semiconductor device; and attaching a lid to the first surface of the substrate to form an enclosed space between the lid and the substrate, where after attaching the lid, the semiconductor device and the TIM film are disposed in the enclosed space, where a first side of the TIM film distal from the substrate contacts the lid.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: July 18, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Hao Chen, Hung-Yu Chen, Pu Wang, Li-Hui Cheng, Szu-Wei Lu
  • Publication number: 20220392823
    Abstract: A method of forming a semiconductor structure includes: attaching a semiconductor device to a first surface of a substrate; placing a thermal interface material (TIM) film over a first side of the semiconductor device distal from the substrate, where the TIM film is pre-formed before the placing, where after the placing, a peripheral portion of the TIM film extends laterally beyond sidewalls of the semiconductor device; and attaching a lid to the first surface of the substrate to form an enclosed space between the lid and the substrate, where after attaching the lid, the semiconductor device and the TIM film are disposed in the enclosed space, where a first side of the TIM film distal from the substrate contacts the lid.
    Type: Application
    Filed: July 14, 2021
    Publication date: December 8, 2022
    Inventors: Chih-Hao Chen, Hung-Yu Chen, Pu Wang, Li-Hui Cheng, Szu-Wei Lu
  • Patent number: D999765
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: September 26, 2023
    Assignee: HTC CORPORATION
    Inventors: Shu-Kuen Chang, Natalia Amijo, Ian James McGillivray, Chin-Wei Chou, Yi-Shen Wang, Chih-Sung Fang, Hung-Yu Chen
  • Patent number: D1009034
    Type: Grant
    Filed: May 24, 2023
    Date of Patent: December 26, 2023
    Assignee: HTC Corporation
    Inventors: Shu-Kuen Chang, Natalia Amijo, Ian James McGillivray, Chin-Wei Chou, Yi-Shen Wang, Chih-Sung Fang, Hung-Yu Chen
  • Patent number: D1018537
    Type: Grant
    Filed: November 7, 2023
    Date of Patent: March 19, 2024
    Assignee: HTC CORPORATION
    Inventors: Shu-Kuen Chang, Natalia Amijo, Ian James McGillivray, Chin-Wei Chou, Yi-Shen Wang, Chih-Sung Fang, Hung-Yu Chen
  • Patent number: D1026910
    Type: Grant
    Filed: November 7, 2023
    Date of Patent: May 14, 2024
    Assignee: HTC CORPORATION
    Inventors: Shu-Kuen Chang, Natalia Amijo, Ian James McGillivray, Chin-Wei Chou, Yi-Shen Wang, Chih-Sung Fang, Hung-Yu Chen
  • Patent number: D1033430
    Type: Grant
    Filed: November 22, 2022
    Date of Patent: July 2, 2024
    Assignee: HTC Corporation
    Inventors: Zhi-Qing Wu, Hung-Yu Chen, Yien-Chun Kuo, Meng-Sheng Chiang
  • Patent number: D1037249
    Type: Grant
    Filed: November 7, 2023
    Date of Patent: July 30, 2024
    Assignee: HTC Corporation
    Inventors: Shu-Kuen Chang, Natalia Amijo, Ian James McGillivray, Chin-Wei Chou, Yi-Shen Wang, Chih-Sung Fang, Hung-Yu Chen
  • Patent number: D1051830
    Type: Grant
    Filed: April 21, 2022
    Date of Patent: November 19, 2024
    Assignee: HTC Corporation
    Inventors: Wei-Hsin Chang, Yi-Shen Wang, Hung-Yu Chen